The present disclosure relates to multi-stage power amplifiers employed in wireless communications.
The efficiency of a power amplifier is a key parameter for any communication systems as power amplifiers in a transmitter unit consume a considerable part of the supplied power. Thermal conductivity of a package and solid-state material, insertion loss of matching networks, and load impedance are among the main parameters that establish efficiency of a single-stage power amplifier. Furthermore, in a multi-stage power amplifier, efficiency and gain of each stage determine the overall (lineup) efficiency of a power amplifier. For example, in a two-stage power amplifier, gain and efficiency of the final stage together with efficiency of first stage determine the lineup efficiency. While improving efficiency of each stage has been explored, gain (of last stage, especially) has been overlooked given that there are not too many options available (such as engineering solid-state material).
Disclosed herein are methods and techniques to improve the gain of the final stage amplifier (in a two-stage power amplifier) and eventually lineup efficiency, without sacrificing other key parameters such as output power and stability.
A power amplifier cell is disclosed having a first transistor with a first terminal coupled to ground, a second terminal, and a first control terminal. A second transistor has a third terminal coupled to the second terminal, a fourth terminal, and a second control terminal. Further included is a capacitor having a first plate coupled directly to the second control terminal and a second plate coupled to the ground. As such, there is no intervening inductor component coupled between the first plate and the second control terminal, leaving only parasitic inductance between the first plate and the second control terminal. The capacitor has a capacitance sized to resonate with the parasitic inductance at a resonant frequency substantially higher than a desired frequency of operation of the power amplifier cell.
In some embodiments, the first transistor and the second transistor are field-effect transistors. In these embodiments, the first current terminal and the third current terminal are source terminals, while the second current terminal and the fourth current terminal are drain terminals. Moreover, in these embodiments, the first control terminal and the second control terminal are gate terminals. The fixed voltage node is typically ground.
In another aspect, any of the foregoing aspects individually or together, and/or various separate aspects and features as described herein, may be combined for additional advantage. Any of the various features and elements as disclosed herein may be combined with one or more other disclosed features and elements unless indicated to the contrary herein.
Those skilled in the art will appreciate the scope of the present disclosure and realize additional aspects thereof after reading the following detailed description of the preferred embodiments in association with the accompanying drawing figures.
The accompanying drawing figures incorporated in and forming a part of this specification illustrate several aspects of the disclosure and, together with the description, serve to explain the principles of the disclosure.
The embodiments set forth below represent the necessary information to enable those skilled in the art to practice the embodiments and illustrate the best mode of practicing the embodiments. Upon reading the following description in light of the accompanying drawing figures, those skilled in the art will understand the concepts of the disclosure and will recognize applications of these concepts not particularly addressed herein. It should be understood that these concepts and applications fall within the scope of the disclosure and the accompanying claims.
It will be understood that, although the terms first, second, etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, a first element could be termed a second element, and, similarly, a second element could be termed a first element, without departing from the scope of the present disclosure. As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items.
It will be understood that when an element such as a layer, region, or substrate is referred to as being “on” or extending “onto” another element, it can be directly on or extend directly onto the other element or intervening elements may also be present. In contrast, when an element is referred to as being “directly on” or extending “directly onto” another element, there are no intervening elements present. Likewise, it will be understood that when an element such as a layer, region, or substrate is referred to as being “over” or extending “over” another element, it can be directly over or extend directly over the other element or intervening elements may also be present. In contrast, when an element is referred to as being “directly over” or extending “directly over” another element, there are no intervening elements present. It will also be understood that when an element is referred to as being “connected” or “coupled” to another element, it can be directly connected or coupled to the other element or intervening elements may be present. In contrast, when an element is referred to as being “directly connected” or “directly coupled” to another element, there are no intervening elements present.
Relative terms such as “below” or “above” or “upper” or “lower” or “horizontal” or “vertical” may be used herein to describe a relationship of one element, layer, or region to another element, layer, or region as illustrated in the Figures. It will be understood that these terms and those discussed above are intended to encompass different orientations of the device in addition to the orientation depicted in the Figures.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the disclosure. As used herein, the singular forms “a,” “an,” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprises,” “comprising,” “includes,” and/or “including” when used herein specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It will be further understood that terms used herein should be interpreted as having a meaning that is consistent with their meaning in the context of this specification and the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
Embodiments are described herein with reference to schematic illustrations of embodiments of the disclosure. As such, the actual dimensions of the layers and elements can be different, and variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and/or tolerances, are expected. For example, a region illustrated or described as square or rectangular can have rounded or curved features, and regions shown as straight lines may have some irregularity. Thus, the regions illustrated in the figures are schematic and their shapes are not intended to illustrate the precise shape of a region of a device and are not intended to limit the scope of the disclosure. Additionally, sizes of structures or regions may be exaggerated relative to other structures or regions for illustrative purposes and, thus, are provided to illustrate the general structures of the present subject matter and may or may not be drawn to scale. Common elements between figures may be shown herein with common element numbers and may not be subsequently re-described.
The present disclosure pertains to increasing lineup (overall) efficiency in power amplifiers, including power amplifier modules and integrated circuits, which is a critical requirement for designing transmitter units for communication and radar applications. Methods and techniques disclosed herein result in higher lineup efficiency, at least 4 percentage points in one embodiment, without modifying solid-stage material or sacrificing other key performance parameters such as power and stability. The key elements of the methods and techniques disclosed herein include, but are not limited to, the following:
In a multi-stage power amplifier, overall or lineup efficiency is determined by the efficiency and gain of each stage. Increasing the efficiency of each stage is a common practice that must be done to improve lineup efficiency of a power amplifier. However, the gain of the final stage plays an important role when the efficiency of each stage is limited by solid-state technology, packaging, or insertion loss of matching networks.
In general, the lineup efficiency of the two-stage power amplifier 10 as shown in
where ηLU is lineup efficiency, η1 is first stage efficiency, η2 is second (final) stage efficiency, and G2 is second stage gain. Based on this equation, ηLU can be improved by increasing any or all three other parameters. In a specific case where η1 and η2 are constant, lineup efficiency can still be enhanced by increasing G2.
In one example that is shown in
For a typical common source (CS) amplifier or a typical common emitter (CE) amplifier, gain is mainly limited by solid-state technology, assuming proper source and load impedances are provided to a transistor making up the CS amplifier or CE amplifier. Therefore, other architectures must be implemented to improve gain of the final stage of a multi-stage power amplifier.
An embodiment of a cascode power amplifier 20 disclosed in accordance with the present disclosure is depicted
In this exemplary embodiment, the first FET Q1 has a first source S1 coupled to the fixed voltage node and a first drain D1 coupled to a second source S2 of the second FET Q2. A first gate GA1 of the first FET Q1 is coupled to an interstage RF input 26 labeled DR_IN and to gate DC bias circuitry 28 that is configured to generate gate bias from a first gate voltage VG1 at a first gate voltage terminal 30. The second drain D2 of the second FET Q2 is coupled to the RF output 18, which is labeled RFOUT. A second gate GA2 of the second FET Q2 is coupled through a parasitic gate inductance LG2 to a second gate voltage VG2 at a second gate voltage terminal 32. At least one decoupling capacitor CDCP1 is coupled between the second gate voltage terminal 32 and the fixed voltage node GND1. Additionally, a bypass capacitor CBPY1 is also coupled between the second gate voltage terminal 32 and the fixed voltage node GND1.
In one example, the cascode transistor, formed by the first FET and the second FET, is a gallium nitride (GaN) high electron mobility transistor (HEMT) that has 3 dB to 5 dB higher gain compared with its common source counterpart designed in the same technology and with the same periphery, also known as gate periphery. Like all other transistors, the gain of a cascode transistor is determined by class of operation and varies as a function of source and load impedance that are provided to the transistor. Some of these conditions are described in the following examples.
In a first exemplary embodiment, a cascode transistor, which in this embodiment is formed by the first FET Q1 and the second FET Q2, is biased in class AB, and load impedances are chosen in such a way as to maximize efficiency of the transistor at a specific power level (e.g., 3 dB to 4 dB lower than maximum power). Source impedances are chosen to maximize gain at the aforementioned load condition. These conditions are identical to a common method used to design main (carrier) amplifiers for a Doherty power amplifier (DPA) where the load impedance is called ZMOD. In this case, the gain that a transistor can deliver is limited to the gain at the ZMOD load impedance, which is typically lower than maximum gain. However, the cascode transistor still provides 3 dB to 5 dB higher gain compared with a common source FET under the same load and bias conditions. For the application described in the first embodiment, VG2 of the disclosed cascode power amplifier is configured to achieve maximum gain while output power and drain efficiency are kept close to output power and drain efficiency of a counterpart common source power amplifier with the same solid-state technology.
In a second exemplary embodiment, the cascode transistor is biased in class AB and load impedances are chosen in such a way as to maximize efficiency of the transistor at maximum power level. These conditions are identical to a common method used to design main (carrier) amplifiers for a DPA, and the load impedance is called ZOPT. In this case, gain that the transistor can deliver is limited to the gain (typically lower than maximum gain) at ZOPT load impedance. However, the cascode FET can still provide 3 dB to 5 dB higher gain compared with a common source FET under the same load and bias conditions.
In third exemplary embodiment, the second FET is biased in class C and load impedances are chosen in such a way as to maximize efficiency of transistor at maximum power level. These conditions are identical to a common method used to design auxiliary (peaking) amplifiers for a DPA, and the load impedance is called ZOPT. In this case, gain that the transistor can deliver is limited to the gain (typically lower than maximum gain) at ZOPT load impedance. However, a cascode FET can still provide 3 dB to 5 dB higher gain compared with a common source FET under the same load and bias conditions.
In other exemplary embodiments shown in
Second stage or final stage Doherty gain and efficiency at average output power is 18 dB and 55%, respectively, which are optimized by adjusting gate voltage of the common gate FET, in this embodiment VG2, in the cascode structure. Efficiency of the first stage 12 is 14% at average output power. Therefore, lineup efficiency of the two-stage power amplifier 10 is 52%, which is 4 percentage points higher than lineup efficiency of a two-stage power amplifier where all amplifiers are common source FETs with η1=16%, η2=55%, and G2=14 dB.
In
Further disclosed herein are cascode power amplifiers with enhanced stability. The cascode power amplifiers provide higher gain compared with common source power amplifiers or common emitter power amplifiers. However, higher gain in cascode power amplifiers results in instability issues that make implementing some embodiments relatively more challenging. Disclosed is a layout structure at the transistor level to resolve the stability issue of the cascode power amplifiers for a desired frequency band.
Returning to the cascode power amplifier 20 shown in
To eliminate a need for a matching network between the first FET Q1 and the second FET Q2 and to minimize undesirable effects of the parasitic inductances and capacitances, an improved cascode structure for the cascode power amplifier 20 can be realized as unit cells 20-1, 20-2, 20-(N−1), and 20-N, as shown in
Disclosed is a cascode FET structure and layout to further reduce the parasitic inductance on the second gates, like GA2 of Q2, by moving the bypass capacitor CBPY1 substantially closer to the gate of the common gate FET Q2. This configuration is repeated in each of the unit cells 20-1 through 20-N, as shown in
It should be noted that decreasing capacitance of the capacitors C1-CN below an optimized range impacts RF termination at gate of the cascode common gate FETs such as the FET Q2, which results in gate voltage swing during operation and eventually reduces overall gain of the second stage 14 by up to 40% in some applications. On the other hand, increasing capacitance of the capacitors C1 through CN above an optimized range reduces the resonance frequency of circuits made up of L1 through LN and C1 through CN in each of the unit cells 20-1 through 20-N and results in instability in the desired operating frequency range.
Since LM1 is coupled to C1 through CN, it forms another resonant circuit made up of LM1, CDCP1, and the capacitors C1 through CN, which resonates at a frequency much lower than resonance frequency of L1-C1, as in unit cell 1, because the inductance of LM1 is orders of magnitude greater than the inductance of any of L1 through LN. Typically, this lower resonance will be less than 2 GHZ. This can result in an instability issue as gain of the cascode is considerably high at low frequencies. So, a gate resistor RG1 added between the bypass capacitances C1 through CN and the decoupling capacitor CDCP1. Resistance for the gate resistor RG2 is chosen to attenuate the magnitude of resonance and therefore to improve the stability of the cascode FET Q2 at low frequencies.
As mentioned, the capacitors C1 through CN are placed substantially close to the gates of the common gate transistors such as the FET Q2. In one example, a bottom plate of the first capacitor C1 is placed substantially on top of source vias or source pads of the common source FET Q1 to minimize inductance between C1 and the fixed voltage node GND1, which in this case is ground. This configuration is repeated in each of unit cells 20-1 through 20-N. In one example, bypass capacitors, such as C2 and C3, of adjacent unit cells, such as 20-2 and 20-3, that share same source vias or source pads for common source FETs, Q4 and Q6, can be combined into one capacitor. It is important to minimize inductance between source pads of common source FETs, such as Q1, since it has impact on the stability of the second stage 14. This can be achieved by implementing typical methods such as increasing the number of ground vias, via size, or ground pad size.
Layouts in
Disclosed is a cascode FET structure and layout to further improve the stability of the cascode in
With reference to
The baseband processor 46 processes the digitized received signal to extract the information or data bits conveyed in the received signal. This processing typically comprises demodulation, decoding, and error correction operations. The baseband processor 46 is generally implemented in one or more digital signal processors (DSPs) and application-specific integrated circuits (ASICs).
For transmission, the baseband processor 46 receives digitized data, which may represent voice, data, or control information, from the control system 44, which it encodes for transmission. The encoded data are output to the transmit circuitry 48, where they are used by a modulator (not shown) to modulate a carrier signal that is at a desired transmit frequency or frequencies. A power amplifier (not shown) amplifies the modulated carrier signal to a level appropriate for transmission and delivers the modulated carrier signal to the antennas 54 through the antenna switching circuitry 52. The antennas 54 and the replicated transmit circuitry 48 and receive circuitry 50 may provide spatial diversity. Modulation and processing details will be understood by those skilled in the art.
It is contemplated that any of the foregoing aspects, and/or various separate aspects and features as described herein, may be combined for additional advantage. Any of the various embodiments as disclosed herein may be combined with one or more other disclosed embodiments unless indicated to the contrary herein.
Those skilled in the art will recognize improvements and modifications to the preferred embodiments of the present disclosure. All such improvements and modifications are considered within the scope of the concepts disclosed herein and the claims that follow.
This application claims the benefit of provisional patent application Ser. No. 63/513,974, filed Jul. 17, 2023, and claims the benefit of provisional patent application Ser. No. 63/479,788, filed Jan. 13, 2023, the disclosures of which are hereby incorporated herein by reference in their entireties. This application claims the benefit of provisional patent application Ser. No. 63/539,384, filed Sep. 20, 2023, and claims the benefit of provisional patent application Ser. No. 63/511,352, filed Jun. 30, 2023, and claims the benefit of provisional patent application Ser. No. 63/502,268, filed May 15, 2023, and claims the benefit of provisional patent application Ser. No. 63/479,790, filed Jan. 13, 2023, and claims priority to provisional patent application Ser. No. 63/479,787, filed Jan. 13, 2023, the disclosures of which are hereby incorporated herein by reference in their entireties. This application is related to U.S. patent application Ser. No. ______, filed ______; U.S. patent application Ser. No. ______, filed ______; and U.S. patent application Ser. No. ______, filed ______; the disclosures of which are hereby incorporated herein by reference in their entireties.
Number | Date | Country | |
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63513974 | Jul 2023 | US | |
63479788 | Jan 2023 | US | |
63539384 | Sep 2023 | US | |
63511352 | Jun 2023 | US | |
63502268 | May 2023 | US | |
63479790 | Jan 2023 | US | |
63479787 | Jan 2023 | US |