The present invention relates to inkjet printers, and more particularly, to methods of making inkjet print heads.
Modern ink jet printers may produce photographic-quality images. An inkjet printer includes a number of orifices or nozzles spatially positioned in a printer cartridge. Ink is heated when an electrical pulse energizes a resistive element forming a thermal resistor. The ink resting above the thermal resistor is ejected through the orifice towards a printing medium, such as an underlying sheet of paper as a result of the applied electrical pulse.
The thermal resistor is typically formed as a thin film resistive material on a semiconductor substrate as part of a semiconductor chip, for example. Several thin film layers may be formed on the semiconductor chip, including a dielectric layer carried by the substrate, a resistive layer forming the thermal resistor, and an electrode layer that defines electrodes coupled to the resistive layer to which the pulse is applied to heat the thermal resistor and vaporize the ink.
A first phase of making a print head, which may include the components described above, may follow standard semiconductor processing techniques to form circuitry for controlling the inkjet print head. The control circuitry may be formed on a front side of a silicon wafer, for example, a silicon wafer having a <100> crystalline orientation and 675-725 micron thickness.
Once the circuit formation processing steps are completed, two additional phases for making a print head are typically followed. These phases are generally classified as micro electro-mechanical systems (MEMS) processing steps. One of these MEMS phases may include forming three-dimensional structures that function as inkjet chambers, which may be formed on the same side of the wafer as the control circuitry. The thermal resistor or heater, which is described above, may be carried by a floor of each inkjet chamber. Each inkjet chamber acts as a small room into which ink flows. A roof of each inkjet chamber typically includes an opening, which may be referred to as an orifice, bore, or nozzle plate, for example.
The other MEMS processing phase may include forming through-wafer ink channels to allow ink to flow from a reservoir or supply at the backside of the wafer to each inkjet chamber. This MEMS phase may be relatively expensive. For example, one method of forming the through-wafer ink channels is deep reactive ion etching (DRIE) of silicon, which uses relatively expensive equipment and has a very low throughput. Another common method is laser cutting, which also uses relatively expensive equipment and has a very low throughput.
One technique for forming a through-wafer ink channel includes forming an ink feed slot in a substrate using a saw. More particularly, U.S. Pat. No. 7,966,728 to Buswell discloses using a circular cutting disk or saw positioned above a first surface of a substrate to cut a desired depth of the substrate.
A method of making a plurality of inkjet print heads may include forming, by sawing with a rotary saw blade, a first plurality of discontinuous slotted recesses in a first surface of a wafer. The first plurality of discontinuous slotted recesses may be arranged in parallel, spaced apart relation. The method may also include forming, by sawing with the rotary saw blade, a second plurality of discontinuous slotted recesses in a second surface of the wafer aligned and coupled in communication with the first plurality of continuous slotted recesses to define a plurality of through-wafer channels. In some embodiments, the first and second plurality of discontinuous slotted recesses may be formed with first and second rotary saw blades, respectively. Accordingly, the inkjet print heads may be made more efficiently, for example, with a reduced cost.
The first and second plurality of discontinuous slotted recesses may be formed to have a same depth into the wafer. In other embodiments, the first plurality of discontinuous slotted recesses may be formed to have a depth into the wafer greater than a depth of the second plurality of discontinuous slotted recesses, for example. The first and second plurality of discontinuous slotted recesses may also be formed by making overlapping cuts into the wafer with the rotary saw blade.
The method may further include forming a plurality of inkjet heaters and control circuitry on the wafer. The method may also include forming at least one layer on the wafer to define a plurality of inkjet chambers. The at least one layer may have a plurality of inkjet orifices formed therein, for example. The wafer may include a silicon wafer, for example.
a is a cross-sectional view of a wafer having first discontinuous slotted recesses being sawed therein according to the method in the flowchart of
b is a cross-sectional view of the wafer of
c is a cross-sectional view of the wafer of
d is a cross-section view of the wafer of
a is a cross-sectional view of a wafer having first discontinuous slotted recesses being sawed therein according to the method of
b is a cross-sectional view of the wafer of
c is a cross-sectional view of the wafer of
d is a cross-section view of the wafer of
The embodiments will now be described more fully hereinafter with reference to the accompanying drawings, in which preferred embodiments are shown. The embodiments may, however, be in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Like numbers refer to like elements throughout and prime notation is used to describe like elements in different embodiments.
Referring initially to
The orifices 24 are typically located at an inkjet print head 27 of the print head cartridge 20. In an example, the print head cartridge 20 may include 300 or more orifices 24, each orifice 24 having an associated inkjet chamber 30, as will be appreciated by those skilled in the art. During manufacture, many print heads 27 may be formed to be included on a single silicon wafer and separated. Such methods of making inkjet print heads are described in further detail below.
Referring now to the flowchart 60 in
Referring now to the flowchart 80 in
The method also includes forming, at Block 86, a dielectric layer 47 and a substrate layer 48 on the wafer 30 to define inkjet chambers 49. In some embodiments, a single silicon substrate (i.e., layer) or second wafer may be formed on the wafer 30 to define the inkjet chambers 49 (
At Block 88, the method includes forming, by sawing with a rotary saw blade 31, first discontinuous slotted recesses 32 in a first surface 33 of a wafer 30. The wafer 30 may be silicon, for example. The first discontinuous slotted recesses 32 are formed to be arranged in parallel, spaced apart relation (
To form the first discontinuous slotted recesses 32, the rotary saw blade 31 may be positioned at a starting point above the first surface 33 and moved to a desired x,y position for cutting a first discontinuous slotted recess (
The rotary saw blade 31 is moved downwardly to penetrate or cut into the first surface 33 and moved along the first surface in the x direction to a desired x,y position for the end of the first discontinuous slotted recess 32 (
The method includes, at Block 90 forming, by sawing with the rotary saw blade 31, second discontinuous slotted recesses 36 in a second surface 35 of the wafer 30 (
At Block 92, the wafer 30 is separated into inkjet print heads 27, for example, using silicon wafer dicing techniques as will be appreciated by those skilled in the art. If desired, the method may include removing additional portions of the wafer 30 within any of the first and second slotted discontinuous recesses 32, 36, for example, to modify the shape of the slotted discontinuous recesses, and particularly, the end regions of thereof. Additional portions of the wafer 30 may be removed, for example, by wet etching, dry or reactive ion etching, plasma etching, micro-abrasion, laser cutting, or any other or combination of techniques. The method ends at Block 94.
Referring now to the graph 50 in
Referring now to the flowchart 80′ in
Referring now to the flowchart 80″ in
As will be appreciated by those skilled in the art, the methods described herein may advantageously reduce production costs, for example, by using cutting techniques and equipment that is readily available for conventional wafer dicing. Additionally, production efficiency may also be increased by using these relatively high-speed cutting techniques with respect to prior art approaches of etching, particle erosion, ablation, or a combination of these techniques.
Many modifications and other embodiments will come to the mind of one skilled in the art having the benefit of the teachings presented in the foregoing descriptions and the associated drawings. Therefore, it is understood that the invention is not to be limited to the specific embodiments disclosed, and that modifications and embodiments are intended to be included within the scope of the appended claims.
Number | Date | Country | |
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Parent | 13906477 | May 2013 | US |
Child | 14941898 | US |