Micro-pattern forming apparatus, micro-pattern structure, and method of manufacturing the same

Abstract

There is provided a micro-pattern forming apparatus including an electrospraying part for applying a voltage to a solution containing a sample to electrostatically atomizing the solution; a supporting part (30) for supporting a chip (26), on which the sample in the solution electrostatically atomized by the electrospraying part, is to be deposited; and a fine mask part (24) disposed between the electrospraying part and the supporting part, having a mask pattern for being passed through by the electrostatically atomized solution in order to form a micro-pattern of the sample upon the chip, wherein the mask pattern is made from a photoresist material with concavity and convexity on the side of the supporting part.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

Further objects, features and advantages of the invention will become apparent from the following detailed description taken in conjunction with the accompanying figures showing illustrative embodiments of the invention, in which:

FIG. 1 is a schematic diagram of a micro-pattern forming apparatus according to the present invention;

FIG. 2 is a flowchart showing the general outline of the mask forming process;

FIG. 3 a is a SEM micrograph of a stencil mask (a fine masking means) formed in the process described above;

FIG. 3 b is a SEM micrograph of a stencil mask (a fine masking means) formed in the process described above;

FIG. 3 c is a SEM micrograph of a stencil mask (a fine masking means) formed in the process described above;

FIG. 3 d is a SEM micrograph of a stencil mask (a fine masking means) formed in the process described above;

FIG. 4 a is a SEM micrograph of a line-shaped stencil mask;

FIG. 4 b is a SEM micrograph of a line-shaped stencil mask;

FIG. 4 c is a SEM micrograph of a line-shaped stencil mask;

FIG. 4 d is a SEM micrograph of a line-shaped stencil mask;

FIG. 5 a is a SEM micrograph of an example of deposit by the ESD, which is formed by using a fine stencil mask formed in the method above:

FIG. 5 b is a SEM micrograph of an example of deposit by the ESD, which is formed by using a fine stencil mask formed in the method above;

FIG. 6 is a schematic diagram showing one example of the basic configuration of a micro-pattern forming apparatus using a vibrating element according to the exemplary embodiment;

FIG. 7 is an exploded perspective view illustrating the parts constituting the micro-pattern forming apparatus of FIG. 6;

FIG. 8 is a perspective view depicting the configuration of an atomizer as an electrospraying means according to the exemplary embodiment, which is provided with wires as a charging means;

FIG. 9 is a pattern diagram representing the principle of the atomizer in a micro-pattern forming apparatus according to the exemplary embodiment;

FIG. 10 is a SEM micrograph of a micro-pattern structure of an organic material formed by a micro-pattern forming apparatus according to the exemplary embodiment;

FIG. 11 is a SEM micrograph of a micro-pattern structure of an organic material formed by a micro-pattern forming apparatus according to the exemplary embodiment; and

FIG. 12 is a SEM micrograph of a micro-pattern structure of an organic electroluminescence material formed with the micro pattern forming apparatus according to the exemplary embodiment.

Claims

1. A micro-pattern forming apparatus comprising: electrospraying means for applying a voltage to a solution containing a sample to electrostatically atomize the solution;supporting means for supporting a chip, on which the sample in the solution electrostatically atomized by said electrospraying means is to be deposited; andfine masking means disposed between said electrospraying means and said supporting means, having a mask pattern for being passed through by said electrostatically atomized solution in order to form a micro-pattern of said sample upon said chip, said mask pattern being made from a photoresist material with concavity and convexity on the side of said supporting means.

2. A micro-pattern forming apparatus according to claim 1, wherein said electrospraying means uses at least one capillary.

3. A micro-pattern forming apparatus according to claim 1, wherein said electrospraying means uses at least one vibrating element to vibrate said solution.

4. A micro-pattern forming apparatus according claim 1, wherein the concavity and convexity formed in the mask pattern of said fine masking means is formed by: forming a pattern for forming concavity and convexity made from a photoresist material, with use of lithography;forming a fluorocarbon layer on this pattern for forming concavity and convexity, with use of reactive ion etching;forming said mask pattern comprising a photoresist material on the fluorocarbon layer, with use of lithography; andpeeling said mask pattern off from said fluorocarbon layer on said substrate.

5. A micro-pattern forming apparatus according to claim 1, wherein the fine masking means has at least one reinforcing rib made from a photoresist material.

6. A micro-pattern structure formed by a micro-pattern forming apparatus according to claim 1, wherein said micro-pattern structure comprises a cluster including particles of at least one organic material of several tens of nanometers.

7. A method of manufacturing a micro-pattern structure of at least one organic material by a micro-pattern forming apparatus according to claim 1.