Patent Application
20070257766
This invention relates generally to embodiments of a micro-transducer and a thermal switch that can be used, for example, to control the heat transfer into and out of mechanical, electrical, and electromechanical devices.
The need for miniaturized power sources for micro-electro-mechanical systems (MEMS) and micro-electronics has long been recognized. Much work has already been done on micro-scale batteries, and micro-scale heat engines. Micro-scale heat engines are a particularly attractive option, because of the very high density energy storage afforded by the hydrocarbon fuels they burn. Thus, a micro-heat engine which could convert the chemical energy stored in a hydrocarbon fuel to mechanical or electrical energy could form the basis of a very compact power supply.
Piezoelectric thin films have been used for years as power transducers in MEMS and micro-electronic devices. Piezoelectric films are an attractive option for power transduction because of the relative ease with which such devices can be produced using conventional micro-machining methods. Generally speaking, micro-machining involves processing techniques, such as microlithography and etching, that were developed and refined for use in the manufacture of integrated circuits. Micro-machining allows fine control of dimensions and is commonly employed for producing parts from silicon. However, micro-machining is not restricted in its application to the formation of workpieces from silicon or other materials conventionally used in the manufacture of integrated circuits, and it is known to apply micro-machining to other materials.
In most applications of piezoelectric films, such as in micro-actuators, pumps, and valves, electrical power is converted to mechanical power. Micro-sensors that utilize piezoelectric films also have been used for mechanical-to-electrical transduction, however, such devices are not capable of producing usable electrical power to any significant degree. Thus, it would be desirable to utilize piezoelectric thin films for converting energy in one form, such as thermal energy or kinetic energy, to useful electrical energy to power MEMS and micro-electronic devices.
Along with the need for miniaturized power sources is the need for micro-devices that are designed to remove heat from MEMS and micro-electronics. In particular, integrated-circuit manufacturers are already reaching limits on micro-processor speed and performance imposed by high operating temperatures. Consequently, reducing the operating temperatures of chips by removing waste heat through active cooling is considered to be among the most promising strategies available to the microprocessor industry for overcoming these obstacles. Thus, it would be desirable to implement a piezoelectric film in a micro-heat pump for cooling applications of MEMS and micro-electronics.
Many MEMS devices have been developed that rely on thermal energy for actuation. This energy can be supplied in a variety of ways. For example, there are micro-systems that receive heat from electrical resistance heaters, external sources, and chemical reactions. The ability to control the heat transfer into and out of these MEMS devices is essential to their performance. The necessity for precise thermal management is especially critical for micro-devices that operate at high frequencies, such as micro-thermopneumatic pumps, bi-layer electrical relays, and micro-heat engines. Often, it is the inability to rapidly reject heat that limits the operating frequencies of such devices. Thus, there is a strong need for a thermal switch that enables the precise control of heat transfer into and out of such MEMS devices.
The present disclosure concerns embodiments of a micro-transducer that can be used to convert energy in one form to energy in another form. For example, the micro-transducer can be operated as a micro-heat engine to convert heat energy into electrical energy or a micro-heat pump which consumes electrical energy to transfer heat from a heat source to a heat sink.
In particular embodiments, the micro-transducer comprises a fluid-tight cavity that contains a two-phase working fluid comprising a liquid and a gas. A deflectable membrane bounds at least a portion of cavity. The deflectable membrane is operable as an actuator to compress the working fluid whenever an electric field is applied to the membrane and operable as a generator to generate an electric charge whenever the working fluid expands. The deflectable membrane can be a piezoelectric transducer (e.g., a membrane comprising a piezoelectric material between two electrodes). A wick structure is formed on an inner surface of the cavity and holds a portion of the liquid. In an illustrated embodiment, the wick structure is formed on the inner surface of a stationary membrane of the micro-transducer. During use, heat can be added to the micro-transducer through the stationary membrane, causing substantially all of the liquid held in the wick structure to evaporate, and thereby increasing the overall volume of the working fluid. This causes the deflectable membrane to deflect outwardly and generate an electric charge.
The present disclosure also concerns embodiments of a thermal switch that is used to control the transfer of heat from a heat source to a heat sink. As used herein, the term “heat source” is used to refer to anything that gives off or rejects heat. The term “heat sink” is used to refer to anything that accepts or absorbs heat. According to one aspect, the thermal switch can be activated, or turned “on”, so as to establish a path of low thermal resistance between the heat source and the heat sink to facilitate the transfer of heat therebetween. The thermal switch can also be de-activated, or turned “off”, so as to establish a path of high thermal resistance between the heat source and the heat sink to minimize or totally prevent the transfer of heat between the heat source and heat sink.
The thermal switch can be implemented to control the flow of heat into and out of any of various mechanical, electrical, or electromechanical devices. In one implementation, for example, thermal switches control the flow of heat into and out of a micro-transducer, such as a micro-heat engine or a micro-heat pump. One thermal switch periodically thermally couples the micro-transducer to a heat source to allow heat to flow into the micro-transducer. Another thermal switch periodically thermally couples the micro-transducer to a heat sink to allow the micro-transducer to reject heat to the heat sink.
The micro-transducer can be arranged in a cascade of multiple micro-transducers, each operating over its own temperature range. The micro-transducers are thermally coupled to each other with thermal switches. Thus, in this configuration, heat rejected by one micro-transducer is transferred to another micro-transducer in an adjacent level of the cascade whenever a respective thermal switch thermally couples the micro-transducers to each other.
In one embodiment, the thermal switch comprises two opposed silicon contacts. The thermal switch is activated by bringing the contacts into contact with each other, which allows heat to be conducted from one contact to the other. The thermal switch is de-activated by creating a gap between the contacts, which increases the thermal resistance between the opposed surfaces, thereby inhibiting heat transfer.
In particular embodiments, the thermal switch includes at least one drop of a thermally conductive liquid, such as a liquid metal or liquid-metal alloy, positioned between the opposed surfaces of first and second thermally conductive members. The thermal switch is activated by bringing the drop into contact with the two surfaces, which allows heat to be conducted from one thermally conductive member to the other thermally conductive member through the drop. The thermal switch is de-activated by creating a gap between the drop and one of the surfaces, which increases the thermal resistance between the surfaces, thereby minimizing heat transfer.
The direction of heat transfer through the switch depends on the particular application in which the switch is being used. For example, if the first thermally conductive member is thermally coupled to a heat source and the second thermally conductive member is thermally coupled to a heat sink, heat is transferred from the first thermally conductive member to the second thermally conductive member through the drop whenever the thermal switch is activated.
In other embodiments, the thermal switch includes one or more nanostructures, such as one or more bundles of aligned carbon nanotubes, positioned between the opposed surfaces of first and second thermally conductive members. The thermal switch is activated by bringing the drop into contact with the ends of the nanostructures, which allows heat to be conducted from one thermally conductive member to the other thermally conductive member through the nanostructures.
The thermal switch can include an actuator that is operable to selectively activate and de-activate the thermal switch. In one embodiment, for example, the first thermally conductive member serves as a base for supporting a liquid drop (or a nanostructure) and the second thermally conductive member is a deflectable actuator, such as an electrostatic or piezoelectric transducer. In its normal, non-deflected position, the actuator is spaced from the drop to minimize heat transfer between the actuator and the base. To activate the thermal switch, the actuator is caused to deflect inwardly and contact the drop, thereby establishing a path of high thermal conductance between the actuator and the base. To de-activate the switch, the actuator is allowed to return to its non-deflected position.
In another embodiment, a thermal switch is operable to control the flow of heat into or away from a body. The thermal switch includes a drop of a thermally conductive liquid (or a nanostructure) and an activation element. The activation element is selectively movable between a first position to activate the thermal switch and to allow heat to flow into or away from the body, and a second position to de-activate the thermal switch to minimize the flow of heat into or away from the body.
According to another embodiment, a thermal-switch assembly comprises a first major layer and a second major layer. A plurality of thermal-switch elements are cooperatively formed between the first and second switch elements. Each thermal-switch element is selectively operable independently of each other to increase and decrease the transfer of heat between the first and second major layers.
In yet another embodiment, a thermal switch transfers heat from one surface to another surface of the switch through evaporation and condensation of a working fluid, in a manner similar to a conventional heat pipe. The thermal switch in this embodiment comprises a body that defines a fluid-tight cavity for containing the working fluid. A flexible membrane forms a wall of the cavity and is deflectable inwardly toward an opposed surface of cavity. The inner surface of the flexible membrane mounts one or more wicks configured to wick up working fluid that has condensed on the opposed surface of the cavity. During operation, heat applied to the flexible membrane causes fluid carried by the wicks to evaporate. The vapor flows across the switch and condenses on the opposed surface of the cavity, giving up latent heat. When all of the liquid on the wicks has evaporated, the flexible membrane is activated to deflect inwardly to cause liquid that has condensed to wick up onto the wicks.
Other exemplary applications for thermal switches are also disclosed. For example, a thermal switch can be used to control the transfer of heat in a thermoelectric cooler. In one representative embodiment, a thermoelectric cooler comprises a low-temperature heat source, a high-temperature heat sink, and a thermoelectric element that is thermally coupled to the high-temperature heat sink. A thermal switch comprising at least one drop of a thermally conductive liquid is configured to selectively thermally couple the low-temperature heat source to the thermoelectric element. By selectively thermally coupling the heat source to the thermoelectric element, the transfer of Joule heat to the heat source is avoided, which results in an overall increase in net cooling. In another embodiment, a thermal switch comprising at least one nanostructure is configured to selectively thermally couple the low-temperature heat source to the thermoelectric element.
In another application, one or more thermal switches can be used to selectively thermally couple a heat source and a cold source to micro-tubes of a thermal cycler, such as used to perform PCR analysis on DNA samples. According to one representative embodiment, a thermal cycler comprises a tube-support device that supports one or more micro-tubes for containing a sample to be processed by the thermal cycler. A heat source is configured to supply heat to the samples in the micro-tubes, and a cold source is configured to supply cold to the samples in the micro-tubes. A thermal switch is-configured to selectively thermally couple at least one of the heat source and cold source to the micro-tubes.
The foregoing and other features and advantages of the invention will become more apparent from the following detailed description of several embodiments, which proceeds with reference to the accompanying figures.
As used herein, the singular forms “a,” “an,” and “the” refer to one or more than one, unless the context clearly dictates otherwise.
As used herein, the term “includes” means “comprises.”
As used in this description, the term “transducer” is used to denote a device for converting useful energy in one form to useful energy in another form. For example, energy may be converted from the energy of mechanical motion to an electric current or from thermal energy to mechanical motion. Additionally, it is known that many transducers that can be operated in one mode can also be operated in a reverse mode. As an example, a device may be operated both as an electrical motor to convert energy from electric current to mechanical motion, or it may be operated as a generator to convert mechanical motion to electric current.
As used herein, “piezoelectric materials” refer to those materials in which a mechanical stress applied as a result of, for example, bending, deflection, or flexure, produces an electrical polarization, and conversely, an applied electric field induces a mechanical strain that causes a mechanical displacement of the material (e.g., in the form of bending, deflection, or flexure).
As used herein, the term “substrate” refers to any support material from which one or more micro-transducers can be constructed and is not limited to materials, such as silicon wafers, conventionally used in the manufacture of semiconductor devices.
As used herein, the term “body” refers to anything that can function as a heat source by rejecting or giving off heat and/or as a heat sink by accepting or absorbing heat.
According to one aspect, a micro-transducer can be used either as a micro-heat engine to convert thermal energy, flowing from a higher temperature to a lower temperature, into electric current or as a micro-heat pump, i.e., a micro-refrigerator, that consumes electric energy to pump thermal energy from a lower temperature to a higher temperature. The micro-transducer has particular applicability for use as a micro-heat engine for providing electrical power to MEMS or micro-electronic devices, for example, or as a micro-heat pump to remove heat from MEMS or micro-electronic devices.
A fluid cavity 8 is cooperatively formed between the first major layer 12 and the second major layer 14. In the present embodiment, for example, the fluid cavity 8 is bounded by a first membrane 18 (shown as an upper membrane 18 in
A working fluid 6 is contained within the fluid cavity 8. As shown in
In any event, the use of a two-phase working fluid is significant in that the thermal efficiency attained by the transducer approaches that of the ideal Carnot cycle. In conventional large-scale heat engines and heat pumps, two-phase fluids cannot be used because surface tension causes the liquid portion of a two-phase saturated mixture to form small droplets that can quickly destroy thermal machinery during expansion and compression processes. In the present embodiment, however, the use of a two-phase working fluid is possible because of the surface tension forces that occur on the micro-scale. Specifically, and as shown in
In
The first and second electrodes 28, 36, respectively, may comprise any suitable material. In a working embodiment, for example, the bottom electrode 36 comprises a layer of gold (Au). The first electrode 28 comprises a first layer 32 of platinum (Pt) and an optional second layer 30 of titanium (Ti) to facilitate adhesion of the platinum layer to the silicon oxide layer 26. The piezoelectric layer 34 may be made from any material having sufficient piezoelectric properties, such as lead zirconate titanate (PZT) or zinc oxide (ZnO).
The intermediate layer 38 comprises, for example, a layer of photoresist material, such as SU-8 (available from Shell Chemical Co.). An aperture is formed in the photoresist material so as to form the side walls 20 of the micro-transducer 10. The second membrane 16 of the micro-transducer 10 comprises the material of the second major layer (e.g., silicon in the present case). The second membrane 16 has a thickness greater than that of the first membrane 18, and therefore the second membrane 16 is generally more rigid than the first membrane. Consequently, the first membrane 18 flexes inwardly and outwardly while the second membrane 16 retains a substantially constant profile during operation of the micro-transducer 10.
Generally speaking, the piezoelectric layer 34 together with the electrodes 28 and 36 define a piezoelectric unit that functions as both a piezoelectric actuator (converting electrical work to mechanical work) and as a piezoelectric generator (converting mechanical work to electrical work). For operation as an actuator, a voltage applied to the top and bottom electrodes 28, 36, respectively, causes the piezoelectric layer 34, and thereby the first membrane 18, to flex inwardly, thereby compressing the vapor phase 22 of the working fluid 6. Conversely, for operation as a generator, a voltage is generated across the top and bottom electrodes, 28 and 36, respectively, whenever the vapor phase 22 of the working fluid 6 expands to cause the piezoelectric layer 34, and thereby the first membrane 18, to flex outwardly. Thus, the first membrane 18 flexes in and out, alternately expanding and compressing, respectively, the vapor phase of the working fluid contained within the transducer. Unlike sliding and rotating parts in conventional machinery, however, the micro-transducer 10 eliminates the problem of dissipative losses due to sliding friction. Further details of the operation and design of the micro-transducer 10 are described below, first with reference to a micro-heat engine and then with reference to a micro-heat pump.
The thermal contacts 48, 50 can be made of silicon or various other materials exhibiting good thermal conductivity. As shown, the thermal contacts 48, 50 in the illustrated embodiment are generally rectangular structures extending from the heat source 44 and the heat sink 46. However, the thermal contacts can have any of various other geometric shapes. For example, the thermal contacts can have a generally flat cross-sectional profile.
The thermodynamic cycle of the heat engine 42, which is based on the Carnot vapor cycle, consists of the following four processes: (1) compression, (2) high-temperature heat-addition, (3) expansion and electrical power production, and (4) low-temperature heat-rejection. During this four-process cycle, the first membrane 18 of the heat engine 42 completes one full oscillation.
The first process of the cycle, compression, is represented by
During the second process, high-temperature heat-addition, the high-temperature heat source 44 is thermally coupled to the first membrane 18 via thermal switches 48 to transfer thermal energy to the heat engine 42 by conduction (as shown in
Referring to
During the fourth process, low-temperature heat-rejection, the low-temperature heat sink 46 is thermally coupled to the second membrane 16 via thermal switches 50 to remove thermal energy from the heat engine 42 through conduction (as shown in
The efficiency of the mechanical-to-electrical conversion in the piezoelectric layer 34 will depend strongly upon how closely the frequency of oscillation of the first membrane 18 matches its resonant mechanical frequency. This is because only a portion (about one-tenth) of the mechanical energy transferred into the piezoelectric layer 34 as strain is converted into electrical energy (the remaining portion of mechanical energy is stored as spring energy). Thus, if the heat engine 42 is operated at or near the resonant mechanical frequency of the first membrane 18, mechanical energy not converted to electrical energy but stored as spring energy can be reclaimed later in the cycle. In particular, this stored spring energy can be used to achieve compression (process one,
Since thermal energy is transferred into the heat engine 42 from an external source, the heat engine 42 operates in a manner that is similar to that of a large-scale external-combustion engine. However, unlike conventional large-scale external-combustion engines, the working fluid does not circulate from the heat engine 42 to a separate heat-exchanger. Instead, heat is alternately transferred in and out of the heat engine via conduction through the second and first membranes 16, 18, while the working fluid remains inside the heat engine 42. In essence, the heat engine 42 functions as its own heat-exchanger, which is a consequence of the large surface-to-volume ratio that can be achieved on the micro-scale level. Thus, it should be apparent that the micro-heat engine 42 integrates all heat-engine functions into a self-contained cell-like structure. Such a design solution would be impossible in a large-scale engine.
Although a single heat engine 42 may be sufficient to supply the power requirements for certain applications, multiple heat engines may be connected in parallel to increase power output. For example, if one heat engine operating-at a predetermined cycling frequency generates one milliwatt, then ten heat engines connected in parallel and operating at the same frequency would generate ten milliwatts. It is then possible to provide a power source that is operable to generate anywhere from one milliwatt to several watts of power, or more, by varying the number of heat engines.
Referring to
A high-temperature heat source 82 is positioned adjacent to the second membranes 16 of the level operating in the highest temperature range in the cascade (shown as the uppermost pair 72 of substrates 74 and 76 in
In
The use of a cascading arrangement is advantageous because the temperature differential of each heat engine 42 is relatively small due to the limited expansion and compression ratio that can be achieved with the piezoelectric member. Thus, by configuring a cascade of heat engines 42, it is possible to provide a power source that works over any arbitrarily large temperature range. Operating in a cascading arrangement is also desirable in that it is possible to select a working fluid 6 that is most appropriate for the pressure and temperature range of a particular level.
To ensure that there is adequate heat transfer through the heat engine 42, the dimensions of the heat engine 42 desirably, although not necessarily, provide for a low aspect ratio (i.e., a low thickness-to-width ratio) in order to maximize heat-transfer area and minimize conduction-path lengths. A suitable aspect ratio that is sufficiently low can be obtained with a heat engine having first and second membranes each having a thickness of about 5 microns (μm) or less. The thickness of the engine cavity 8, i.e., the distance between the membranes 16, 18, desirably is about 50 microns or less. As such, the working fluid in the engine cavity 8 will be in the form of a thin layer. In contrast, the lengths of the membranes desirably are relatively larger than their thicknesses, for example, between 1 to 5 mm, although larger or smaller membranes may be used.
In one example of a micro-heat engine 42, the first membrane 18 has a thickness of about 2 microns, the second membrane 16 has a thickness of about 5 microns, and the thickness of the engine cavity is about 25 microns. The total length of the conduction path through the heat engine is therefore about 32 microns. The surfaces of the second and first membranes have dimensions of approximately 2.0 millimeters by 2.0 millimeters, which provides an aspect ratio of about 0.0160 and a heat-transfer area of 4.0 mm2 at each membrane. It has been found that the foregoing dimensions will ensure a maximum surface-area-per-unit volume of working fluid and a conduction path sufficiently short to drive heat through the heat engine. The thicknesses of the silicon layer 24 and the silicon oxide layer 26 of the first membrane 18 are about 600 nm and 400 nm, respectively. The top electrode 18 comprises a 20-nm thick layer of Ti and a 200-nm thick layer of Pt. The piezoelectric member 34 comprises a 500-nm thick layer of PZT. The bottom electrode comprises a 200-nm thick layer of Au. The working fluid is R11 refrigerant
Of course, those skilled in the art will realize that the foregoing dimensions (as well as other dimensions provided in the present specification) are given to illustrate certain aspects of the invention and not to limit them. These dimensions can be modified as needed in different applications or situations.
By reversing the operating cycle of the heat engine 42 shown in
During the working cycle of the heat pump 60, low-temperature thermal energy is transferred into the heat pump 60 from the low-temperature heat source 62 by conduction. By compressing the vapor 22 of the working fluid 6, the low-temperature thermal energy is transformed into high-temperature thermal energy, which is then transferred out of the heat pump 60 to the high-temperature heat sink 64 by conduction. According to the reverse order of the ideal Carnot vapor cycle, the thermodynamic cycle of the heat pump 60 is characterized by four processes: (1) compression, (2) high-temperature heat rejection, (3) expansion, and (4) low-temperature heat absorption. As with the heat engine 42, the first membrane 18 of the heat pump 60 completes one full oscillation during the cycle.
At the beginning of the first process, compression, the volume of the heat pump cavity is at its point of greatest volume, and the first membrane 18 is at its point of maximum outward deflection. Compression is accomplished by closing an electrical switch (not shown) connected to the top and bottom electrodes 28 and 36 (
During the second process, high-temperature heat rejection, the high-temperature heat sink 64 is thermally coupled to second membrane 16 via thermal switches 68 to remove thermal energy from the heat pump 60 through conduction. As heat is removed from the heat pump 60, some of the vapor 22 condenses, which causes a decrease in the volume of the working fluid 6. The temperature and pressure of the working fluid 6, however, remain constant because the working fluid is a saturated mixture of liquid and vapor. The decrease in the volume of the working fluid 6 allows the first membrane 18 to flex further toward the second membrane 16. Since this process occurs with the electrical switch open, the dipole moment of the piezoelectric layer 34, and thus the open-circuit voltage of the electrodes 28 and 36, decrease as the first membrane 18 flexes inward.
The third process, expansion, begins with the working fluid 6 being compressed to its smallest possible volume and the first membrane 18 at its point of maximum inward deflection. To commence the expansion process, the electrical switch is closed to allow for the removal of the electric charge stored in the electrodes 28 and 36. As charge is drained from the electrodes 28 and 36, the modulus of elasticity and the resulting strain of the piezoelectric layer 34 decreases from a higher open-circuit value to a lower closed-circuit value. Accordingly, the piezoelectric layer 34 relaxes, which allows the first membrane 18 to flex upwardly under the pressure of the working fluid 6. The working fluid 6 thus expands as pressure and temperature decrease until the first membrane 18 reaches its neutral point, or point of zero deflection.
Unlike conventional large-scale heat pumps, e.g., vapor compression and adsorption machines, which utilize a throttling valve to expand the working fluid in an isenthalpic process without producing any work, the micro-heat pump 60 produces work during the expansion process in the form of an electric current flowing from the electrodes 28, 36. By extracting work, the micro-heat pump 60 provides for the expansion of the working fluid 6 in a substantially isentropic process, which is significant for two reasons. First, the extraction of work in an isentropic process causes the internal energy and the temperature of the working fluid 6 to drop more than in an isenthalpic throttling process. As such, more cooling will result. Second, the efficiency of the cycle can be increased if the electric current generated during the expansion is used to offset the power required to compress the working fluid 6 in the first process.
During the fourth process, low-temperature heat absorption, the low-temperature heat source 62 is thermally coupled to the first membrane 18 via thermal switches 66 to transfer thermal energy to the heat pump 60 through conduction. As heat moves into the working fluid 6, some of the liquid portion 23 of the working fluid vaporizes, thereby increasing the volume of the working fluid 6. This causes an upward displacement of the first membrane 18 and an electrical current to flow from the electrodes 28 and 36. As in the heat-rejection process (process two), the temperature and pressure remain constant because the working fluid 6 is a saturated mixture of liquid and vapor. Following the heat-absorption process, the thermodynamic cycle then repeats itself, starting again with the compression process.
As with the heat engine 42 of the present-invention, the heat pump 60 integrates all heat-pump functions into self-contained cell-like structure. Also, similar to the system of cascading heat engines 42 of
The dimensions suggested for the heat engine 42 may also be used for the heat pump 60. Again, to ensure that there is adequate heat-transfer area through the heat pump, the dimensions desirably provide for a low aspect ratio.
The wick structure 11 is configured to hold at least a portion of the liquid phase 23 of the working fluid 6 against the inner surface of the second membrane 16. As shown in
In an alternative embodiment, as shown in
Additionally, the wick structure can have various other configurations. For example, the wick structure can comprise a plurality of spaced-apart, substantially straight or linear wicks.
The wick structure 11 desirably is made from a hydrophilic material, such as a photoresist material (e.g., SU-8) or an electroplated metal. The wick structure 11 can be formed using conventional techniques. In one embodiment, for example, a 5 to 10-micron thick layer of photoresist is applied to the membrane 16 using a suitable technique such as sputter-coating or spin-coating. The photoresist layer is patterned using photolithography and etched to define the wicks 13 (
During use, at least a portion of the liquid 23 collects in the grooves between adjacent wicks 13 and adjacent wicks 15 to form a liquid film on the second membrane 16. As heat is added to the micro-transducer 10′ by thermally contacting the membrane 16 to a heat source (e.g., during the heat-additional process of a thermodynamic cycle), the liquid in the wick structure 11 evaporates more efficiently, and therefore increases the overall efficiency of the micro-transducer.
In an alternative embodiment, the wick structure can be formed on the inner surface of the second membrane 18. Thus, in this alternative embodiment, heat would be added to the micro-heat engine via the second membrane 18 during operation of the micro-heat engine.
Using conventional micro-manufacturing techniques, an array of micro-transducers can be constructed from a pair of silicon wafers. Referring to
To form the piezoelectric layer 34 for each micro-transducer 10, a solution deposition route for PZT deposition is carried out on the first wafer 88. First, a solution containing the stoichiometric ratio of Pb, Zr, and Ti required for forming the Perovskite phase is spin-coated onto the layer of platinum. The first wafer 88 is then heated in air to 100° C. for 5 minutes and to 350° C. for 5 minutes. The spin-coating and heating processes are repeated until the PZT layer is about 500 nm thick, after which the first wafer 88 is heated in a furnace to 700° C. for 15 minutes. The steps of spin-coating and heating the wafer 88 in air to 100° C. for 5 minutes and to 350° C. for 5 minutes are repeated until the final thickness of the piezoelectric layer 34 is achieved, which desirably is about 500 nm. Once the final thickness of the piezoelectric layer 34 is achieved, the first wafer 88 is again heated in a furnace to 700° C. for 15 minutes.
To form the bottom electrodes 36 of the micro-transducers 10, a 200-nm thick layer of gold is deposited on the PZT surface via physical vapor deposition. The first wafer 88 is then placed into another anisotropic etchant in which the remaining 50 microns of silicon at the bottom of each pit 90 are removed until the desired layer thickness of silicon remains (e.g., between 1 and 10 microns).
To form the second membranes 16 of the micro-transducers 10, an array of square pits is machined on the back side of a second wafer (not shown), wherein the array on the second wafer corresponds to the array of pits 90 on the first wafer 88. Machining is continued on the second wafer until approximately 30 microns of silicon remains at the bottom of each pit. To form the side walls 20 of the fluid cavities 8, a layer of photoresist material such SU-8 is spin-coated on the front side of the second wafer. The cavity thickness of each micro-transducer 10, preferably about 50 microns, is defined by the thickness of the photoresist layer added to the second wafer. Photo-lithography is then used to define a pattern of squares on the photoresist material having the same foot print as the squares defining the first membranes 18 and the second membranes 16. The unmasked portions of the photoresist layer are etched to a depth of 50 microns to form the fluid cavities 8. After the cavities 8 are defined, a small amount of working fluid is added to each cavity using, e.g., a syringe dispenser. The first wafer 88 is then brought face-down into contact with the SU-8 photoresist deposited on the front side of the second wafer, with the square cavities on both wafers being in alignment with each other. Finally, the first and second wafers are secured together to form an array of identical micro-transducers. If desired, the individual transducers may be separated from the wafers for applications having power or cooling requirements that can be met using only a few transducers.
A micro-heat engine was constructed having an engine-cavity thickness of about 500 microns, a 4 mm×4 mm first membrane 16, a 3 mm×3 mm second membrane 18 having a 1-micron PZT layer, and an annular wick structure 11 formed on the inner surface of the first membrane 16. A continuous heat source was periodically thermally coupled to the first membrane 16 via a thermal switch comprising solid silicon contacts. The output voltage generated by the micro-heat engine operating at a frequency of about 20 Hz was measured, and is illustrated in the graph shown in
A micro-heat engine was constructed having an engine-cavity thickness of about 75 microns, a 4 mm×4 mm first membrane 16, a 4 mm×4 mm second membrane 18 having a 2-micron thick PZT layer, and an annular wick structure 11 formed on the inner surface of the first membrane 16. A continuous heat source was periodically thermally coupled to the first membrane 16 via a thermal switch comprising solid silicon contacts. The output voltage generated by the micro-heat engine operating at a frequency of about 50 Hz was measured, and is illustrated in the graph shown in
A thermal switch was constructed having two opposing silicon contacts. In one test, a variable heat source was connected to one of the silicon contacts. The contacts were pressed together under a 10-gram load and the temperature difference across the two contacts was measured.
In another test, a continuous heat source was connected to one of the silicon contacts and was cyclically moved toward and away from a stationary contact at a rate of about 20 Hz, alternately closing and opening the switch. The bottom graph in
In the embodiments of FIGS. 3, 2A-2D, and 5, the thermal switches (e.g., thermal switches 66, 68 of
One embodiment of a liquid-droplet thermal switch is shown in
In particular embodiments, the liquid drops 108 are drops of liquid metal, such as mercury, gallium, or indium, or metal alloys, such as gallium-indium alloy. As used herein, the term “metal” is used generically to refer to metals and metal alloys. Liquids other than metals which exhibit good thermal conductance also can be used.
The drops 108 may be supported on respective pads, or contacts, 112 that are also made of a thermally conductive material. The surface tension between the drops 108 and the contacts 112 retains the drops 108 on their respective contacts 112 during operation of the thermal switch.
The second thermally conductive member 106 in the illustrated embodiment is a flexible membrane (also referred to herein as a flexible member) which serves as an actuator or activation device that is selectively deflectable between a non-deflected position (shown in
When the membrane 106 is in the non-deflected position (
To maximize heat transfer through the thermal switch when it is in the “on” position, the membrane 106 desirably is configured to contact physically and thereby slightly compress the drops 108, as shown in
The direction of heat flow through the thermal switch 100 depends on the application in which the thermal switch is used. For example, if the base 102 is a heat source (or is coupled to a heat source) and the membrane 106 is a heat sink (or is coupled to a heat sink), then heat flows from the base 102 to the membrane 106 (as indicated by the arrow in
Any of various suitable techniques can be implemented to cause deflection of the membrane 106 and activate the thermal switch 100. In the illustrated embodiment, for example, one or more electrodes 116 are mounted to the upper surface 110 of the base 102 and one or more electrodes 118 are mounted on the lower surface 114 of the membrane 106. The electrodes 116, 118 may comprise any suitable material, such as gold, platinum, or various other metals or alloys. The electrodes 116 are electrically connected to one terminal of a power source (not shown) via respective leads (not shown), and the electrodes 118 are electrically connected to the other terminal of the power source via respective leads (not shown). When a voltage is applied to the electrodes 116, 118, an electrostatic force is generated that causes the membrane 106 to deflect inwardly toward the base 102 (
In another embodiment, the membrane 106 is a piezoelectric transducer comprising a piezoelectric member interposed between two electrodes, much like the first membrane 18 of the micro-transducer 10 depicted in
In certain embodiments, the space between the membrane 106 and the base 102 is a fluid-tight cavity that contains an insulating gas having a low thermal conductivity (e.g., argon). The gas increases the thermal resistance of the thermal switch whenever the switch is in the “off” position. Alternatively, a vacuum can be established inside cavity to increase the thermal resistance of the thermal switch whenever the switch is in the “off” position.
Conventional micro-manufacturing techniques can be used to fabricate one or more identical thermal switches 100. One embodiment for forming thermal switches is as follows. First, a 100-nm layer of silicon dioxide is formed on both sides of a silicon wafer using a wet oxidation process. A 5-nm layer of titanium/tungsten and a 325-nm layer of gold are then sputtered on both sides of the wafer. Using conventional photolithography, a pattern of 10 mm×18 mm rectangular dies is formed on the front surface of the wafer, and a grid of 30-μm gold contacts 112 is formed at the center of each die. In addition, a pattern of interwoven 30-Ω resistance heaters and resistance-based temperature detectors (RTDs) is formed on the back surface of the wafer such that a resistance heater and an RTD is located opposite a respective grid of gold contacts. After developing the photoresist on both sides of the wafer, the gold and titanium layers are chemically etched from the unprotected regions of the wafer surfaces so that only the contacts, the RTDs and the heater remain on the wafer surfaces. The wafer is then diced into individual die to form bases 102.
A deposition chamber be used form drops 108 on the contacts 112 of each die.
To perform mercury deposition, and according to one specific approach, the power supply is set to provide a constant voltage of about 3.3 V and a current of about 0.11 A to the resistance heater to achieve a surface temperature of about 50° C. on the die. The temperature of the oil bath, which is maintained at about 180° C., is increased until the vapor pressure of the mercury in the vessel is increased to about 1.5 kPa. After heating the vessel for about 30 minutes, the slide is opened to expose the gold contacts on the die to mercury vapor. The mercury vapor chemically reacts with the gold contacts, which results in preferential condensation of liquid droplets on the contacts. The total exposure time of the contacts to the mercury vapor governs the size of the droplets. For example, exposing the contacts to mercury vapor for about 3 hours will form droplets that are approximately 30 μm in diameter. The deposition process is completed by closing the slide and heating the die with the power supply for an additional 15 minutes to allow mercury trapped in the hole in the lid to deposit on the contacts.
Plural membranes 106 having spacers 104 can be fabricated from another silicon wafer using conventional techniques. The spacers 104 can be formed by applying a layer of photoresist, PMMA (polymethyl methacrylate), or equivalent material on the wafer and then selectively etching the material in the desired shape and size of the spacers. The wafer is diced into individual membranes having spacers, which are then secured to respective dies to form a batch of thermal switches.
In another embodiment, a thermal switch can have the same configuration as the thermal switch 100 shown in
The spacing between the thermally conductive members 122, 124 can be varied by moving one or both of the thermally conductive members toward and away from each other. Movement of one or both of the thermally conductive members 122, 124 can be accomplished in any suitable manner. In one implementation, for example, one or both of the thermally conductive members can be coupled to the piston of a respective solenoid or equivalent device.
A specific application of a thermal switch having one or more thermally conductive liquid droplets is shown in
As shown in
Thermal switches comprising one or more thermally conductive liquid droplets 132 are disposed on the second membranes 16 of the heat engines 42 and on the low-temperature heat sink 84. Each liquid droplet 132 can be disposed on a respective pad or contact 134. In particular embodiments, the droplets 132 have a diameter of about 10 to 1000 microns, with 30 microns being a specific example, although larger or smaller droplets can be used depending on the application. The liquid droplets 132 control the flow of heat into and away from each heat engine 42 by facilitating the transfer of heat into a heat engine during the heat-addition process and by facilitating the transfer of heat out of a heat engine during the heat-rejection process.
Apparatus 130 can be operated in the same manner as apparatus 70 of
More specifically, and referring to
As the thermodynamic cycle continues, the membranes 18 of the heat engines in levels 140b, 140d, and 140f flex outwardly and contact the droplets 132 supported on the heat engines of levels 140c, 140e, and the heat sink 84, and the heat source 82 contacts the droplets 132 supported on the heat engines of level 140a. This causes heat to flow into the heat engines of levels 140a, 140c, and 140e, and heat to be rejected by the heat engines of levels 140b, 140d, and 140f.
Referring to
Each membrane 160 functions as an actuator that is selectively deflectable between a non-deflected position (shown in
In addition, the membranes 160 can be activated independently of the each other to allow for selective activation of the thermal switches 152. A thermal switch 152 that is activated or turned “on” establishes a path of high thermal conductance between the first and second substrates 154, 156 at that portion of the assembly. Conversely, a path of low thermal conductance exists at each thermal switch 152 is that “off”. By selectively activating and de-activating individual thermal switches 152, the thermal conductivity of the assembly 150 can be varied spatially and temporally. In this regard, the assembly 150 exhibits a “digital” thermal conductivity that can be controlled by the selective activation of individual thermal switches 152.
Although the illustrated embodiment comprises a 3×3 array of thermal switches, it will be appreciated that the assembly can be modified as desired to include any number of thermal switches. In addition, each thermal switch 152 has a generally rectangular shape, although in other embodiments they can be circular or any of various other shapes. The substrates 154, 156 can comprise any of various suitable materials, such as silicon, quartz, sapphire, ceramic, or any of various metals or alloys.
In one specific application, the assembly 150 can be used to control the removal of heat from integrated circuits on a substrate. For example, the assembly 150 can be coupled to the substrate so that each thermal switch 152 is registered with a respective integrated circuit. In use, each thermal switch 152 is normally in the “off” position (i.e., the membranes 160 are not in thermal contact with droplets 162) so that substantially no heat is removed from any of the integrated circuits. When the temperature of an integrated circuit exceeds a predetermined threshold, the corresponding thermal switch 152 is activated to allow heat to be removed from the integrated circuit through the activated thermal switch. After the temperature of the integrated circuit drops below an acceptable level, the thermal switch is de-activated to avoid unnecessary further cooling of the circuit
In another application, the assembly 150 can be used to control the flow of heat from a heat source into a device, such as the apparatus 130 shown in
In an alternative embodiment, a thermal-switch assembly has a construction that is similar to the construction of assembly 150, except that each thermal switch defines a fluid-tight cavity between the first and second substrates 154, 156, respectively. The fluid-tight cavities can be formed by positioning between the first and second substrates an intermediate layer of material having an array of apertures that define the side walls of the cavities. The cavities can contain an insulating gas having a low thermal conductivity (e.g., argon) to increase the thermal resistance of the switches whenever they are de-activated. Alternatively, a vacuum can be established inside cavity to increase the thermal resistance of the thermal switch whenever the switch is in the “off” position.
In another embodiment, a thermal-switch assembly has a construction that is similar to the construction of assembly 150, except that each thermal switch 152 has a solid contact instead of a liquid droplet 162. Each contact is dimensioned to contact the inner surface of a membrane 160 whenever the thermal switch is activated. The contacts can be made of silicon or any of various other materials exhibiting good thermal conductivity. In one implementation, the membranes 160 are made of silicon and a silicon contact is formed on the substrate 156 opposite each membrane 160.
The assembly 150 can be made using conventional micro-manufacturing techniques. In one embodiment for making the assembly 150, for example, the first and second substrates 154, 156 are formed from first and second silicon wafers, respectively.
The first substrate 154 is prepared by forming an oxide layer on both sides of the first wafer. Using conventional photolithography, a 3×3 array is patterned on the back surface of the first wafer (the surface facing upwardly in
The second substrate 156 is prepared by forming an oxide layer on both sides of the second wafer. Using conventional photolithography, a 3×3 array of gold electrodes and corresponding leads are formed on the front surface of the second wafer (the surface facing downwardly in
Referring now to
In use, the thermal switches 152 are activated to establish a path of low thermal resistance between the heat source 204 and the thermoelectric element 202. A power source (not shown) provides a voltage across the thermoelectric element 202 to produce an electric current, as known in the art. During the flow of current, the thermoelectric element 202 absorbs heat from the heat source 204 and rejects heat to the heat sink 206. This phenomenon is known as the Peltier effect. The net cooling caused by the Peltier effect is offset by Joule heating caused by the electrical resistance of the thermoelectric element 202.
To minimize the effects of Joule heating, and therefore to increase the efficiency of the thermoelectric cooler 202, a current pulse is applied to the thermoelectric element 202. The power supply can be used to create the pulsed current or, alternatively, an electrical switch can be placed in series with the power source to provide-a pulsed current. Each current pulse causes instantaneous cooling of the heat source 204 and heating of the heat source 204. Immediately after each current pulse, the thermal-switch assembly 150 is opened by de-activating the switches 152 to prevent heat from Joule heating from being transferred to the heat source 204. After the thermal-switch assembly 150 is opened, any residual thermal energy in the thermoelectric element 202 due to Joule heating flows to the heat sink 206. When the temperature of the thermoelectric element 202 drops to an acceptable level, the thermal switch assembly 150 is closed by activating the switches 152 and another current pulse is supplied to the thermoelectric element 202. This process is repeated until further cooling is not required.
Referring now to
The illustrated thermal cycler 300 includes a tube support 302 that is configured to support one or more tubes or containers (commonly referred to as Eppendorf® tubes or micro-tubes) containing a biological or chemical sample (e.g., a DNA sample) to be processed by the thermal cycler. The tube support 302 can be, for example, a block or plate having an array of wells or openings (e.g., a 12×8 array) dimensioned to receive respective tubes, as known in the art. Each tube of the tube support 302 is thermally coupled to a heat source 304 through a thermal switch assembly 150 and to a cold source 306 through a thermal switch assembly 150′. In lieu of thermal-switch assemblies 150, 150′, the thermal cycler may incorporate other thermal-switch configurations disclosed herein to thermally couple the heat source 304 and the cold source 306 to the tubes.
The thermal-switch assemblies 150, 150′ control the flow of heat and cold to the tubes during operation of the thermal cycler 300. For example, to heat the samples contained in the tubes, the thermal switches 152 of the thermal-switch assembly 150 are closed and the thermal switches 152′ of the thermal-switch assembly 150′ are opened. This allows heat to be transferred from the heat source 304 to the samples contained in the tubes. To cool the samples contained in the micro-tubes, the thermal switches 152 of the thermal-switch assembly 150 are opened and the thermal switches 152′ of the thermal-switch assembly 150′ are closed to allow heat to flow from the samples to the cold source 306.
In particular embodiments, the thermal-switch assemblies 150, 150′ can have respective arrays of thermal switches 152, 152′ that correspond to the array of micro-tubes of the tube support 302. Each thermal switch 152 is operable to couple a respective tube thermally to the heat source 304, and each thermal switch 152′ is operable to couple a respective tube thermally to the cold source 306. Since the thermal switches 152, 152′ can be actuated independently of each other, the temperature of individual tubes can be independently controlled. Advantageously, the process parameters (e.g., start time and temperature pattern) for each tube can be varied. For example, if multiple tubes (e.g., 96 tubes) are to be processed using the thermal cycler 300, it is not necessary to delay processing until the sample in each and every tube has been prepared for processing by the thermal cycler.
In this example, the performance of two mercury-droplet thermal switches is illustrated. One thermal switch comprised a 10 mm×18 mm silicon die having a 20×20 array of 30-μm mercury droplets (referred to as the 400-droplet thermal switch). Another silicon die without droplets formed the opposite side of the thermal switch. The other thermal switch comprised a 10 mm×18 mm silicon die having a 40×40 array of 30-μm mercury droplets and another silicon die without droplets (referred to as the 1600-droplet thermal switch). The silicon dies were formed using the fabrication techniques previously described.
The dependence of the thermal resistance of each thermal switch on applied load is illustrated in
The change in thermal resistance between “on” and “off” states of the 1600-droplet switch can be determined by comparing
Referring to
The membrane 402 is operable to deflect between a non-deflected position (
Each of the wicks 412 can be a grooved structure formed on the inner surface 410 of the membrane 404. In one embodiment, for example, each wick 412 comprises a series of concentric grooves etched into a layer of material (e.g., photoresist) formed on the inner surface 410 of the membrane 402.
A working fluid 418 contained in the cavity 408 transports heat from the membrane 402 to the base 404 via the latent heat of the fluid, in a manner similar to the working fluid of a conventional heat pipe. The working fluid 418 can be any of various fluids commonly used in conventional heat pipes. For example, in relatively low-temperature applications (i.e., less than 200° F.), refrigerants such as R11 can be used. In moderate-temperature applications (i.e., above 200° F.), water may be used as the working fluid.
During operation, heat is transferred away from the membrane 402 by the evaporation of the liquid component of the working fluid 418 suspended on the wicks 412. The temperature difference between the membrane 402 and the base 404 creates a vapor pressure difference in the cavity 408, which forces the hot vapor to flow toward the heat-transfer contacts 414 where the vapor condenses (as indicated by the arrows in
After a predetermined time period, the membrane 402 is activated to deflect inwardly toward the base 404 (
A specific application of the thermal switch 400 is shown in
As shown in
For purposes of discussion, the heat engine 42 operates over a higher temperature range than the heat engine 42′ so that heat is transferred from the heat engine 42 to the heat engine 42′. The high-temperature side of the heat engine 42 (i.e., membrane 16) is thermally coupled to a high-temperature heat source or to the low-temperature side of another heat engine operating over a higher temperature range. The low-temperature side of the heat engine 42′ (i.e., membrane 18′) is thermally coupled to a low-temperature heat sink or to the high-temperature side of another heat engine operating over a lower temperature range.
During operation, the working fluid 418 transfers heat from the heat engine 42 to the heat engine 42′. More specifically, referring initially to
In an example of the cascade shown in
Another embodiment of a thermal switch utilizes a nanostructure, such as a bundle of aligned carbon nanotubes, to establish a path of high thermal conductance between a heat source and a heat sink. Carbon nanotubes are known structures, and are essentially chains of carbon atoms forming a generally tubular structure that is typically about one-nanometer wide. Carbon nanotubes can have a single cylindrical wall or multiple cylindrical walls.
Carbon nanotubes are particularly useful for a thermal switch because they are highly conductive of heat along their longitudinal axes. However, other types of nanoscale structures, such as nanocoils (also called nanosprings), nanowires, or nanobelts, also can be used. The nanoscale structures also can be formed from materials other than carbon, such as zinc oxide, silicon oxide, tungsten oxide, cadmium sulfide, silicon carbide, or various combinations thereof For example, nanotubes can be any type of nanoscale tubular materials, such as carbon nanotubes, silicon carbide nanotubes, tungsten sulfide nanotubes and other inorganic nanotubes.
In one aspect, a thermal switch includes a nanostructure that links a heat source to a heat sink to facilitate the flow of heat therebetween. As used herein, the term “nanostructure” refers to any nanoscale structure, including, but not limited to, nanotubes, nanocoils, nanowires, or nanobelts, synthesized from carbon or other material as noted above. A nanostructure can be a single-walled structure, a multi-walled structure, or a bundle of multiple nanoscale structures. A bundle can include multiple nanostructures embedded in a matrix. Various types of carbon nanostructures and methods of synthesizing nanostructures are described by Terrones, “Science and Technology of the Twenty-First Century: Synthesis, Properties and Applications of Carbon Nanotubes,” Annual Review of Materials Research, 33:419-501 (2003) (“Terrones”), which is incorporated herein by reference.
The nanostructures 602 can be bundles of aligned carbon nanotubes and can include a matrix material, although other types of nanostructures also can be used. The nanostructures 602 can be supported in respective recesses in the upper surface of the thermally conductive member 102 as shown or supported directly on the upper surface of the thermally conductive member 102 or on respective contacts on the upper surface of the thermally conductive member 102. As shown, the nanostructures 602 desirably are oriented such that the individual nanotubes extend lengthwise between the first thermally conductive member 102 and the second thermally conductive member 106 to maximize heat transfer between the thermally conductive members through the nanostructures.
The thermal switch 600 operates in the same manner as the thermal switch 100 of
The nanostructures 602 can be formed using any of various known techniques. In particular embodiments, for example, nanotubes are synthesized in defined locations via direct patterning and/or deposition of catalytic materials, such as described in International Patent Application Publication No. WO 2004/012932 to Jiao et al. (“Jiao”), which is incorporated herein by reference. In one specific approach described in Jiao, “pillars” are formed at defined locations on a substrate using a suitable technique, such as photolithography, electron beam (EB) induced deposition, or deposition induced by a focused ion beam (FIB). The pillars can be any of various metals, such as Al, Au, Fe, Ni, Co, Pt, or W, and various combinations thereof. The substrate can be any solid material, such as silicon, silicon nitride, glass, ceramic, plastic, oxide, semiconductor material, quartz, mica, or metal, or a combination thereof.
Catalytic material is then selectively deposited by FIB- or EB-induced deposition or other suitable technique on the pillars to define catalytic sites for synthesizing nanotubes. Alternatively, a layer of a catalyst can be deposited on the substrate over the pillars, using a suitable technique such as sputter-coating or spin-coating. The catalyst layer can then be patterned to define the catalytic sites on top of the pillars. Any suitable technique capable of patterning the catalytic sites can be used, such as thermal decomposition, FIB milling, or other micro-machining technique. Any of various catalysts known in the art can be used. Typically, catalysts include a metal, such as Fe, Co, Ni, Ti, Cu, Mg, Y, Zn, any of various alloys thereof, and any of various combinations thereof.
After the catalytic sites are formed, bundles of carbon nanotubes are synthesized on the catalytic sites using known techniques, such chemical vapor deposition (CVD). For example, U.S. Pat. No. 6,346,189 to Dai et al., which is incorporated herein by reference, discloses a CVD process suitable for the synthesis of predominantly single-walled nanotubes. Other processes also can be used, such as those disclosed in U.S. Pat. No. 5,500,200 to Mandeville, which is incorporated herein by reference. The processes disclosed in the '200 patent to Mandeville tend to yield predominantly multi-walled nanotubes. Each nanostructure is defined by a pillar, a catalytic layer, and multiple nanotubes extending from the catalytic layer. The foregoing process tends to produce nanotubes that are substantially aligned with each other, and therefore exhibit good thermal conductance.
In alternative embodiments, the catalytic sites can be formed directly on a substrate rather than on pillars. Also, any of various other known processes can be used to synthesize bundles of nanotubes or other nanostructures, such as described in Terrones, the '189 patent to Dai, and the '200 patent to Mandeville.
In particular embodiments, each nanostructure 602 can be a nanocomposite comprising individual nanotubes within a matrix material. The matrix material can be, for example, a polymer (e.g., PMMA, polystyrene, polyaniline, polycarbonate, or acetal), a ceramic, a metal, or a combination thereof. The matrix material can be applied to the nanotubes using known techniques. In certain embodiments, a capping layer is applied over the nanocomposite structures to secure the ends of the individual nanotubes, and the matrix material is removed via, for example, chemical dissolution. The capping layer can be made of the same material as the matrix material or a different material. For example, the matrix material can be a polymer and the capping layer can be a metal (e.g., Au, Ni, or other suitable metal), which can be applied using a known technique (e.g., sputtering or electroplating).
In certain embodiments, the substrate on which the nanostructures are formed is the thermally conductive layer 102 of the thermal switch. In other embodiments, the nanostructures are separated from each other and are subsequently deposited on a separate substrate forming the thermally conductive layer 102. In one approach, for example, the individual nanostructures are placed in an aqueous suspension. The layer 102 is then flooded with the aqueous suspension of nanostructures and agitated to cause the nanostructures to preferentially lodge in the recesses formed on the upper surface of the layer 102.
A method for fabricating the thermal switch 600, according to a specific example, includes synthesizing bundles of carbon at defined locations on a substrate, embedding the nanotubes within a matrix of PMMA to form a plurality of nanocomposite structures, and forming a capping layer of PMMA over the structures. The substrate is then separated into 300×100×10 micron nanostructures. The thermally conductive layer 102 is formed from a silicon wafer, which is selectively etched at defined locations to a depth of about 3-5 microns to form the recesses for receiving the nanostructures. The thermally conductive layer 102 is then flooded with an aqueous suspension of the nanostructures and agitated to cause the nanostructures to settle in the recesses. A 8-10 micron layer of PMMA is applied on the thermally conductive layer 102 and selectively etched to form the spacers 104. The second thermally conductive layer 106 is formed from a silicon wafer, which is positioned over the spacers 104 and secured in place.
In another embodiment, a thermal switch can have a configuration similar to that shown in
As shown, the nanostructures 704 can be positioned in respective recesses formed in the inner surface of the second substrate 156. During use, each membrane 160 functions as an actuator that is selectively deflectable between a non-deflected position (shown in
Thermal switches employing nanostructures can also be implemented in other types of devices. For example, the thermal-switch assembly 700 of
In other embodiments, a thermal switch (e.g., the thermal switch 600 of
The present invention has been shown in the described embodiments for illustrative purposes only. The present invention may be subject to many modifications and changes without departing from the spirit or essential characteristics thereof We therefore claim as our invention all such modifications as come within the spirit and scope of the following claims.
| Number | Date | Country | Kind |
|---|---|---|---|
| PCT/US03/36869 | Nov 2003 | US | national |
This application claims the benefit of U.S. Provisional Application No. 60/523,434, filed Nov. 18, 2003, which is incorporated herein by reference. This application also claims priority to PCT Application No. PCT/US2003/036869, filed Nov. 18, 2003, which claims the benefit of U.S. Provisional Application No. 60/427,619, filed Nov. 18, 2002. PCT Application No. PCT/US2003/036869 and U.S. Provisional Application No. 60/427,619 are incorporated herein by reference.
This invention was developed with support under Grant No. 99-80-837 from the National Science Foundation, Contract No. DASG60-02-C-0001 from the Defense Research Projects Agency, and Contract No. DASG60-02-C-0084 from the U.S. Army Space and Missile Defense Command. The U.S. government has certain rights in this invention.
| Filing Document | Filing Date | Country | Kind | 371c Date |
|---|---|---|---|---|
| PCT/US04/39134 | 11/18/2004 | WO | 6/19/2007 |
| Number | Date | Country | |
|---|---|---|---|
| 60523434 | Nov 2003 | US |
