Claims
- 1. A microbial control system for control of microbial growth in water comprising antimicrobial treatment media within a containment vessel, the treatment media including any one or more of transition metals and transition metal oxides.
- 2. The system of claim 1 wherein the treatment media further comprises an inert support material.
- 3. The system of claim 2 wherein treatment media are in the form of any one of solid particles or layers transition metals or metal oxides on the support material.
- 4. The system of claim 3 wherein the transition metal is selected from the group consisting of Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Ag, Cd, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Rf, Db, Sg, Bh, Hs, Mt, Uun, Uuu and Uub.
- 5. The system of claim 3 wherein the transition metal is selected from the group consisting of Ag, Cu and Zn.
- 6. The system of claim 3 wherein the transition metal oxide is an oxide of any one of Ag, Cu, Zn and Sn.
- 7. The system of claim 3 wherein the transition metal oxide is an oxide of any one of Ag and Cu.
- 8. The system of claim 3 wherein the transition metal is a transition metal alloy of CuZn.
- 9. The system of claim 2 wherein the transition metal is Ag and the microbial control system provides solvated silver ions at a concentration of about 1 ppb to about 1000 ppb.
- 10. The system of claim 2 wherein the support material is selected from the group consisting of activated carbon, alumina, silica, titanium oxide, tin oxide, lanthanum oxide, copper oxide, vanadium oxide, manganese oxide, nickel oxide, iron oxide, zinc oxide, zirconium oxide, magnesium oxide thorium oxide, polyethylene, polypropylene, polyvinylchloride, polystyrene and polyethylene terephthalate.
- 11. The system of claim 2 wherein the support materials are selected from the group consisting of alumina and polyethylene terephthalate.
- 12. The system of claim 2wherein the treatment media has a metal content of about 0.01 wt. % to about 15 wt. %.
- 13. The system of claim 4 wherein the treatment media has a metal content of about 0.35 wt. % to about 3.5 wt. %.
- 14. The system of claim 3 wherein the treatment media is a mixture of Ag coated onto alumina and Cu coated on alumina wherein the Ag is present in an amount 0.7% Ag based on total weight of Ag and alumina and Cu is present in an amount of 4.0% Cu based on total weight of Cu and alumina.
- 15. The system of claim 2 wherein the treatment media are mixtures of nanoparticles of Ag and Cu wherein each of the Ag and Cu have a size of about 0.1 nm to about 10,000 nm.
- 16. The system of claim 2 wherein the treatment media is a mixture of nanoparticles of Ag and Cu wherein each of the Ag and Cu have a size of about 2 nm to about 500 nm and wherein the ratio of Ag to Cu in the mixture is about 1:1.
- 17. The system of claim 2 wherein the treatment media is a mixture of nanoparticles of silver and copper on alumina and wherein the silver nanoparticles have a median size of about 20 nm and the copper nanoparticles have a median size of about 100 nm.
- 18. The system of claim 17 wherein each of the silver nanoparticles and the copper nanoparticles are present in the mixture in an amount of about 0.2 wt. % to about 4.8 wt. % based on the total combined weight of the metal and the alumina support material.
- 19. The system of claim 17 wherein silver nanoparticles and the copper nanoparticles are present in the mixture in a ratio of 1:5.
- 20. The system of claim 2 wherein the treatment media comprises a mixture of silver oxide and copper oxide on alumna support material.
- 21. The system of claim 20 wherein the silver oxide is present in the mixture in an amount of about 0.1 wt. % to about 2 wt. %, remainder copper oxide.
- 22. The system of claim 3 wherein the treatment media is a mixture of nanoparticles of silver and copper in combination with nanoparticles of any one of additive metals or additive oxides wherein the additive metals are selected from the group consisting of Sc, Ti, V, Sn, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Cd, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Rf, Db, Sg, Bh, Hs, Mt, Uun, Uuu and Uub
and wherein the additive metal oxides are selected from the group consisting of alumina, silica, silver oxide, titanium oxide, tin oxide, lanthanum oxide, copper oxide, vanadium oxide, manganese oxide, nickel oxide, iron oxide, zinc oxide, zirconium oxide, magnesium oxide, thorium oxide.
- 23. An ice making machine having an microbial growth control system for control of microbial growth in any of influent water and sump water processed by the ice making machine wherein the microbial control system comprises antimicrobial treatment media, the antimicrobial treatment media including any of transition metals or transition metal oxides, wherein the transition metal is selected from the group consisting of Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Ag, Cd, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Rf, Db, Sg, Bh, Hs, Mt, Uun, Uuu and Uub.
- 24. The machine of claim 23 wherein the influent water has a flow rate of more than about one bed volume per minute.
- 25. The machine of claim 24 wherein the influent water has more than about 5×10−6 m dissolved oxygen.
- 26. The machine of claim 25 wherein the influent water has a temperature of less than about 45 C.
- 27. The machine of claim 23 wherein the microbial control system includes a 50:50 mixture of component A formed from 2-500 nm thick Ag on 2-3 mm alumina beads and component B formed from 2-500 nm thick Cu on 2-3 mm alumina beads.
- 28. The machine of claim 27 wherein component A has 0.7% Ag based on total weight of Ag and alumina and component B has 4.0% Cu based on total weight of Cu and alumina.
- 29. The machine of claim 23 wherein the transition metal oxide is an oxide of any one of Ag and Cu.
- 30. The machine of claim 26 wherein the temperature of the influent water is about 45 C and the amount of dissolved oxygen is about 5×10−3 m to about 3×10−4 m.
- 31. A humidifier comprising a microbial control system for control of microbial growth in water processed by the humidifier, a microbial control system comprising antimicrobial treatment media, the antimicrobial treatment media including any of transition metals or transition metal oxides, wherein the transition metal is selected from the group consisting of Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Ag, Cd, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Rf, Db, Sg, Bh, Hs, Mt, Uun, Uuu and Uub.
- 32. The humidifier of claim 31 wherein the influent water has more than about 5×10−6 m dissolved oxygen.
- 33. The humidifier of claim 32 wherein the influent water has a temperature of less than about 35 C.
- 34. The humidifier of claim 33 wherein the microbial control system includes a 50:50 mixture of component A formed from 2-500 nm thick Ag on 2-3 mm alumina beads and component B formed from 2-500 nm thick Cu on 2-3 mm alumina beads.
- 35. The humidifier of claim 34 wherein component A has 0.7% Ag based on total weight of Ag and alumina and component B has 4.0% Cu based on total weight of Cu and alumina.
- 36. The humidifier of claim 31 wherein the transition metal oxide is an oxide of any one of Ag and Cu.
- 37. The humidifier of claim 35 wherein the amount of dissolved oxygen is about 5×10−3 m to about 3×10−4 m.
- 38. The humidifier of claim 31 wherein the humidifier is a mist type humidifier.
- 39. A cooling tower comprising a microbial control system for control of microbial growth in water processed by the cooling tower, the microbial control system comprising antimicrobial treatment media, the antimicrobial treatment media including any of transition metals or transition metal oxides, wherein the transition metal is selected from the group consisting of Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Y, Zr, Nb, Mo, Tc, Ru, Rh, Pd, Ag, Cd, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Rf, Db, Sg, Bh, Hs, Mt, Uun, Uuu and Uub.
Parent Case Info
[0001] This application claims the benefit of priority to U.S. Provisional application No. 60/361,997 filed Mar. 6, 2002.
Provisional Applications (1)
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Number |
Date |
Country |
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60361997 |
Mar 2002 |
US |