Claims
- 1. A micromachined O-ring assembly, comprising:
a substrate formed of a semiconductor material having a hole therein; and a sealing ring, formed of a material with a low Young's modulus and high elongation, formed in said hole, in a way that produces a force towards a centerline of said hole.
- 2. An assembly as in claim 1, wherein said sealing ring is an O-ring is formed of silicone rubber.
- 3. An assembly as in claim 2, wherein said sealing ring is formed in a way that allows it to deform to an area outside of said substrate when a capillary is inserted therein, wherein said force is produced in said area outside of said substrate.
- 4. An assembly as in claim 2, wherein said sealing ring is formed in a way that retains said sealing ring inside said substrate when a capillary is inserted therein.
- 5. An assembly as in claim 2, wherein said sealing is an O-ring is formed in the shape of an annulus with a circular inner diameter.
- 6. An assembly as in claim 1, wherein said sealing ring is an O ring, and said substrate includes a plurality of O rings thereon at a specified spacing.
- 7. An assembly as in claim 6, further comprising a plurality of capillaries, on another substrate, and having said same spacing as said specified spacing, thereby allowing said plurality of capillaries to be inserted into said plurality of O-rings as a unit.
- 8. An assembly as in claim 1, wherein said sealing ring is an O ring, and inner surfaces of said O-ring have a smaller diameter in inner surfaces of said hole.
- 9. An assembly as in claim 1, further comprising a microfluidic element, coupled to said sealing ring.
- 10. An assembly as in claim 9, wherein said it microfluidic element is one of a micropump, a micro valve, a micro heat exchanger, a micro mass spectrometer, a micro chromatograph, or a micro mixer.
- 11. A method of forming a sealing ring, comprising:
obtaining a substrate of material which can be processed using semiconductor processing techniques; forming a groove of a desired shape in a first surface of said substrate; filling said groove with an elastomeric material of a specified thickness; and removing said material from a second side of said substrate to leave a hole, and said elastomeric material in said hole.
- 12. A method as in claim 11, wherein said elastomeric material is a silicone rubber.
- 13. A method as in claim 11, further comprising forming an etch stop layer in said groove of the specified material.
- 14. A method as in claim 13, wherein said etch stop layer is formed of SiO2.
- 15. A method as in claim 13, further comprising forming an adhesion layer, on said etch stop layer, said adhesion layer being one which better adheres to a material of said elastomeric material.
- 16. A method as in claim 15, wherein said adhesion layer is SiNx.
- 17. A method as in claim 15, further comprising forming an adhesion layer, on said etch stop layer, said adhesion layer being one which better adheres to a material of said elastomeric material.
- 18. A method as in claim 17, wherein said adhesion layer is SiNx.
- 19. A method as in claim 13, wherein said removing comprises removing material from the second side of the substrate, using said etch stop layer as a stopping portion.
- 20. A method as in claim 19, further comprising removing said etch stop layer.
- 21. A method, comprising:
forming an O-ring in an opening in a substrate of a semiconductor material, which O-ring is formed of an elastomeric material with a low Young's modulus; inserting a capillary into said O-ring to cause said O-ring to distort to an area outside of said substrate of said semiconductor material and to apply force from said area outside of said substrate of semiconductor material.
- 22. A method as in claim 21, wherein said O-ring is formed of silicone rubber.
- 23. A method, comprising:
forming a first MEMS microfluidic device having a plurality of capillaries at specified spacings; forming a second microfluidic device having a substrate of a semiconductor material, and a plurality of openings at said specified spacings, in said semiconductor material substrate, said openings corresponding to the specified spacings of the plurality of capillaries kind, said openings each including an O-ring formed in said substrate; and mating said first microfluidic device with said second microfluidic device to establish removable seals between each of said capillaries and each of said openings.
- 24. A method as in claim 23, wherein each of said openings in said second microfluidic device includes a rubber O ring.
- 25. A method as in claim 23, wherein said mating comprises inserting said capillaries into said openings, and allowing said capillaries to deform said O-rings in said openings to a deformed shape.
- 26. A method as in claim 23, wherein said mating comprises inserting said capillaries into said openings, and using said O-rings to apply force on said capillaries towards a center of the opening.
- 27. A method as in claim 25, wherein said O-rings are formed of silicone rubber.
- 28. An apparatus, comprising:
a semiconductor substrate with a hole therein defining an inner surface; and a rubber O-ring part, of an elastomeric material, held within said hole, and having a portion which extends into said hole such that said portion has a smaller diameter than the diameter of said hole, said diameter of said hole being less than 1000 microns in diameter.
- 29. An apparatus as in claim 28, wherein said semiconductor substrate is formed of silicon.
- 30. An apparatus as in claim 28, wherein said O-ring is annular in shape.
- 31. A method as in claim 25, wherein openings are less than 1000 microns in size.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application claims benefit of U.S. Provisional Application No. 60/197,151, filed Apr. 13, 2001.
Provisional Applications (1)
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Number |
Date |
Country |
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60197151 |
Apr 2000 |
US |