Claims
- 1. Process for preparing a thin microporous foam film, the process comprising:
- (a) forming a film of a solution, said solution comprising an organic polymer, selected from the polymers having glass transition or crystallization temperature above about 20.degree. C., dissolved in a first solvent;
- (b) contacting, under a predetermined pressure, said film with a foam-forming agent which is a dense gas that is a solvent for said first solvent and wherein said organic polymer is substantially insoluble;
- (c) allowing the film to separate into two phases: a polymer-rich phase and a solvent-rich phase comprising the first solvent and the foam-forming agent; and
- (d) obtaining a microporous foam film from the polymer-rich phase by modifying temperature or pressure conditions to remove the solvent-rich phase.
- 2. The process of claim 1, wherein said contacting with a foam-forming agent comprises contacting with a dense gas selected from the group consisting of carbon dioxide, nitrogen, ethane, ethylene, propane, and propylene.
- 3. The process of claim 1, wherein said contacting under predetermined pressure comprises contacting with carbon dioxide in a supercritical state.
- 4. The process of claim 1, wherein said organic polymer is selected from the group consisting of polystyrene, polyurethane, polyethylene, polypropylene, poly(4-methyl-1-pentene), polyimide, polyamic acid, polylactic acid, polyglycolic acid, copolymers of lactic and glycolic acids, poly(epsilon-caprolactone), polyorthoesters, polyanhydrides, and poly(alphahydroxyesters).
- 5. The process of claim 1, wherein said forming of a film comprises forming a film of thickness ranging from about 1 to about 1,000 microns.
Government Interests
The United States Government has rights in this invention pursuant to Contract No. DEAC-04-76DP00789 between the Department of Energy and American Telephone and Telegraph Company.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
3852388 |
Kimura |
Dec 1974 |
|
4818254 |
Anand et al. |
Apr 1989 |
|