Claims
- 1. A microscope system for inspection during semiconductor manufacture comprising:
a laser module having a pulsed laser for inspection illumination, said inspection illumination being in the UV range; a microscope; a coupling connecting the laser module to the microscope; and at least one rotating diffusion disk arranged behind the laser for the homogenization of the inspection illumination.
- 2. The microscope system according to claim 1, wherein the at least one rotating diffusion disk includes two diffusion disks rotating in opposite directions arranged directly or indirectly behind each other in an illumination ray path.
- 3. The microscope system according to claim 1, wherein the diffusion disk is either of a granulated or of a holographically produced design.
- 4. The microscope system according to claim 1, wherein the rotation speed of the diffusion disk is sufficiently fast to rotate by at least one grain size of the diffusion disk or by the resolution limit of a holographically generated structure between two laser pulses.
- 5. The microscope system according to claim 1, wherein an illumination laser wavelength essentially corresponds to an illumination wavelength during the manufacture of semiconductors.
- 6. The microscope system according to claim 5, wherein the illumination wavelength is in the range of 193 nm or 248 nm or 266 nm or 366 nm, all with a tolerance of +/−2 nm.
- 7. In an inspection device for use in semiconductor manufacture, having a laser microscope, an improvement comprising:
a pulsed laser operable to generate an inspection illumination in the U range; and at least one rotating diffusion disk arranged behind the laser for the homogenization of the inspection illumination.
- 8. A microscope system for inspection of masks or processed wafers during semiconductor manufacture comprising:
a laser module having a pulsed laser operable to generate an inspection illumination, said inspection illumination being in the UV range; a microscope; a coupling connecting the laser module to the microscope; and at least one continuously rotating diffusion disk arranged behind the laser for the homogenization of the inspection illumination.
- 9. A microscope system for inspection of masks prior to a micro-lithography process using the masks comprising:
a laser module having a pulsed laser operable to generate an inspection illumination for a mask, said inspection illumination being in the UV range; a microscope; a coupling connecting the laser module to the microscope; and at least one continuously rotating diffusion disk arranged behind the laser for the homogenization of the illumination.
- 10. The microscope system according to claim 6, further comprising a second diffusion element arranged near the at least one diffusion disk in the inspection illumination ray path.
- 11. A microscope, especially for the inspection in semiconductor manufacture, with a pulsed laser for illumination, preferably in the UV range, wherein at least one rotating diffusion disk is arranged behind the laser for the homogenization of the illumination.
Priority Claims (1)
Number |
Date |
Country |
Kind |
199 46 594.0 |
Sep 1999 |
DE |
|
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is a continuation of U.S. application Ser. No. 09/856,222, filed Aug. 20, 2001, which claims priority of International Application No. PCT/EP00/09199, filed Sep. 20, 2000 and German Application No. 199 46 594.0, filed Sep. 29, 1999, the complete disclosures of which are hereby incorporated by reference.
Continuations (1)
|
Number |
Date |
Country |
Parent |
09856222 |
Aug 2001 |
US |
Child |
10875934 |
Jun 2004 |
US |