Microwave Plasma Diamond Deposition at High Growth Rates

Information

• NSF Award
• 9060510

Owner

• Applied Science & Technology, Inc.

• Award Id

  9060510

• Award Effective Date

  1/1/1991 - 34 years ago

• Award Expiration Date

  9/30/1991 - 33 years ago

• Award Amount

  $ 50,000.00

• Award Instrument

  Standard Grant

Recently developed CVD diamond thin films can be used in a wide variety of applications from electronics to cutting tools, infrared optics to abrasives. High quality diamond films are presently grown at rates of about 1 micron/hr. Crucial to the successful commercialization of the technology is the attainment of larger growth rates. Atmospheric pressure plasma torches have been used to obtain high diamond growth rates but are limited to small areas. A high power density, 1 kW/cm2 at 200 Torr pressure, microwave plasma discharge is proposed to increase growth rates by at least one order-or- magnitude. A microwave discharge is chosen for scale-up of the deposition area, and the high quality films which are obtained. A study of power density, neutral pressure, substrate temperature and plasma chemistry is proposed, for understanding the mechanisms for diamond growth. A commercially available high growth rate diamond reactor could be designed as a direct consequence of this research.

• Program Officer

  Ritchie B. Coryell

• Min Amd Letter Date

  12/26/1990 - 34 years ago

• Max Amd Letter Date

  12/26/1990 - 34 years ago

• ARRA Amount

• Name

  Applied Science and Technology Inc

• City

  Woburn

• State

  MA

• Country

  United States

• Address

  35 Cabot Road

• Postal Code

  018011053

• Phone Number

  6179335560

• First Name

  Richard

• Last Name

  Post

• Start Date

  1/1/1991 12:00:00 AM

• Name

  Engineering-Metallurgy & Material

• Code

  57