1. Field of the Invention
The invention relates to a microwave supplying apparatus and microwave plasma system, and particularly, the invention relates to a microwave supplying apparatus capable of supplying a large-area and uniform microwave field and relates to a microwave plasma system using the same.
2. Description of the Prior Art
The microwave plasma is an important tool for the thin film deposition, precision finishing, and surface modification. Because of the high density of ions and high degree of dissociation, the microwave plasma has great activity, reproducibility, and low reaction temperature, and it could be used for PECVD and plasma etching processes in low temperature. Therefore, the microwave plasma is meaningful for the development of large scale integrated circuit, microelectronic device, photoelectric and communication IC, polymer materials, and thin film sensor processes.
Besides, in the electron cyclotron resonance (ECR) microwave plasma, the molecules could be accelerated to gain more energy to result in the density of ion beam, and the processing area of the plasma could be broadened. In other words, the development of the microwave plasma improves the application of ion source.
The usual microwave-plasma apparatus includes a magnetron to generate microwave, and then the microwave is transmitted by the waveguide in specific mode of oscillation through the quartz glass or the dielectric windows to the plasma chamber, so as to ionize the gas by the electric field to produce the plasma.
Recently, to obtain large volume and area plasma, many kinds of microwave plasma source have been developed. These microwave plasma techniques play an important role on the surface modification of large-area semiconductor, photoelectric materials, and polymer materials. The way of producing large-area and uniform plasma is a major issue in the relative field. If the electromagnetic wave could distribute uniform in space, the particles could easily distribute uniform and the plasma could be easily produced.
However, because of the short wavelength of microwave, it is difficult to form a large-area and uniform electromagnetic wave construction. Please refer to
The area of the chamber corresponding to the single micro generator is limited. In the prior art, for uniformly distributing the microwave power to a larger area of the reactive region, a microwave dividing device is configured in a microwave source system. Because the conventional microwave field focuses at two points, the microwave dividing device divides the microwave by the way of Y shape (one to two) to transfer the input microwave signal to two similar microwave signals along two directions.
As mentioned above, the microwave field appearance focusing at two points may result in non-uniform ionization of plasma. Besides, the conventional microwave dividing device only provides one-to-two effect in one level, so many levels of microwave dividing devices are needed to satisfy the requirement of the large area of the plasma processes in practice.
A scope of the invention is to provide a microwave supplying apparatus for providing a large-area and uniform microwave field to solve the above-mention problem.
According to an embodiment, the microwave supplying apparatus of the invention includes a microwave generator, a first power divider, a second power divider, a first waveguide, and a second waveguide. The input terminal of the first power divider is connected to the microwave generator, and the first power divider has a first output terminal and a second output terminal arranged along a first direction. The input terminal of the second power divider is connected to the first output terminal, and the second power divider has a third output terminal and a fourth output terminal arranged along the second direction. The first direction is substantially perpendicular to the second direction. The first waveguide is connected to the third output terminal and the second waveguide is connected to the fourth output terminal.
In the embodiment, the microwave generated by the microwave generator is outputted by the first output terminal and the second output terminal through the first power divider. The second power divider receives the microwave from the first output terminal and the further divides the microwave, and then the third output terminal and the fourth output terminal output microwaves. The first waveguide connected to the third output terminal and the second wave guide connected to the fourth output terminal receive the microwave and then output microwave fields, wherein the microwave fields outputted by the two waveguides have the approximate intensity distributions.
Another scope of the invention is to provide a microwave plasma system for providing a large-area and uniform microwave field to solve the above-mention problem.
According to an embodiment, the microwave plasma system includes a microwave supplying apparatus connected to a chamber of the microwave plasma system, wherein the chamber can contain the plasma gas. The plasma gas contained in the chamber could be ionized by the large-area and uniform microwave field supplied by the microwave supplying apparatus to form large-area and uniform plasma.
In the embodiment, the microwave supplying apparatus includes a microwave generator, a first power divider, a second power divider, a first waveguide, and a second waveguide. The input terminal of the first power divider is connected to the microwave generator, and the first power divider has a first output terminal and a second output terminal arranged along a first direction. The input terminal of the second power divider is connected to the first output terminal, and the second power divider has a third output terminal and a fourth output terminal arranged along the second direction. The first direction is substantially perpendicular to the second direction. The first waveguide is connected to the third output terminal and the second waveguide is connected to the fourth output terminal. Besides, the first waveguide and the second waveguide are connected to the chamber.
The microwave generated by the microwave generator could be transmitted to the first waveguide and the second waveguide through the first power divider and the second power divider, and the first waveguide and the second waveguide could respectively output the microwave fields with approximate intensity distributions to ionize the plasma gas to form the plasma.
Another scope of the invention is to provide a power divider for the microwave supplying apparatus. The microwave supplying apparatus can provide a large-area and uniform microwave field through the power divider.
According to an embodiment, the power divider of the invention can include a first guide tube, a second guide tube, a third guide tube, and a fourth guide tube. The first guide tube could be connected to the microwave generator of the microwave supplying apparatus to receive the microwave generated by the microwave generator. The second guide tube has a central part, a first terminal, and a second terminal. The first guide tube is connected to the central part of the second guide tube, and the first guide tube is substantially perpendicular to the second guide tube. The third guide tube and the fourth guide tube are respectively connected to the first terminal and the second terminal of the second guide tube, and the third guide tube and the fourth guide tube are substantially to the second guide tube.
In the embodiment, the microwave received by the first guide tube from the microwave generator could be divided in the second guide tube and then outputted through the third guide tube and the fourth guide tube.
The advantage and spirit of the invention may be understood by the following recitations together with the appended drawings.
Please refer to
In this embodiment, the first power divider 22 has a first input terminal 220 capable of being connected to the microwave generator M, therefore the microwave generated by the microwave generator M could be transmitted to the first power divider 22. Besides, the first power divider 22 has a first output terminal 222 and a second output terminal 224 arranged along a first direction D1. The second power divider 24 has a second input terminal 240 capable of being connected to the first output terminal 222 of the first power divider 22, and the second power divider 24 further has a third output terminal 242 and a fourth output terminal 244 arranged along a second direction D2. The first waveguide 260 and the second waveguide 262 could be respectively connected to the third output terminal 242 and the fourth output terminal 244. In practice, the first waveguide 260 and the second waveguide 262 could be respectively connected to a chamber for providing uniform microwave fields to ionize the plasma gas in the chamber to form the plasma.
The microwave generated by the microwave generator M could be respectively outputted by the first output terminal 220 and the second output terminal 222 through the first power divider 22. The second power divider 24 connected to the first output terminal 220 receives the microwave, and then outputs the microwave through the third output terminal 242 and the fourth output terminal 244. The first waveguide 260 and the second waveguide 262 could receive the microwave from the third output terminal 242 and the fourth output terminal 244 and then output the microwave fields with approximate intensity distributions through the output terminals thereof.
Besides, in this embodiment, the microwave supplying apparatus 2 further includes a third power divider 28. The third power divider 28 has a third input terminal 280 capable of being connected to the second output terminal 224 of the first power divider 22, and the third power divider 28 has a fifth output terminal 282 and a sixth output terminal 284 arranged the second direction D2. A third waveguide 264 and a fourth waveguide 266 could be respectively connected to the fifth terminal 282 and the sixth terminal 284. Similarly, the third waveguide 264 and the fourth waveguide 266 could be respectively connected to a chamber for providing uniform microwave fields to ionize the plasma gas in the chamber to form the plasma in practice.
The microwave generated by the microwave generator M could be respectively outputted by the first output terminal 220 and the second output terminal 222 through the first power divider 22. The third power divider 28 connected to the second output terminal 222 receives the microwave, and then outputs the microwave through the fifth output terminal 282 and the sixth output terminal 284. The third waveguide 264 and the fourth waveguide 266 could receive the microwave from the fifth output terminal 282 and the sixth output terminal 284 and then output the microwave fields through the output terminals thereof with approximate intensity distributions as those outputted by the first waveguide 260 and the second waveguide 262.
As described above, the microwave generated by the microwave generator M could be outputted as the microwave fields with approximate intensity distributions through fourth waveguide according to the microwave supplying apparatus 2 in the embodiment. Therefore, the four microwave fields could form a large-area and uniform microwave field.
To averagely distribute the microwave to four waveguide (the first waveguide 260, the second waveguide 262, the third waveguide 264, and the fourth waveguide 266), the first direction D1 which the first output terminal 222 and the second output terminal 224 of the first power divider 22 arranged along is substantially the same as the direction of the magnetic field of the microwave. Besides, the second direction D2 which the third output terminal 242, the fourth output terminal 244, the fifth output terminal 282, and the sixth output terminal 284 of the second power divider 24 and the third power divider 28 arranged along is substantially the same as the direction of the electric field of the microwave. Accordingly, the microwave could be averagely distribute to the third output terminal 242, the fourth output terminal 244, the fifth terminal 282, and the sixth terminal 284, so that the four waveguide could receive the microwave averagely and then output the microwave fields with approximate intensity distributions. Because the first direction D1 is the direction of the magnetic field of the microwave and the second direction D2 is the direction of the electric field of the microwave, the first direction D1 is perpendicular to the second direction D2.
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The first power divider 22, the second power divider 24, and the third power divider 28 could be rectangular guide tube, that is, each input terminal and output terminal could be rectangular and have the substantially equivalent areas. For example, the first input terminal 220 of the first guide tube 2260 of the first power divider 22 could be the same as the output terminals of the third guide tube 2264 and the fourth guide tube 2266. Therefore, the split flows of the microwave from the third guide tube 2264 and the fourth guide tube 2266 have the same phase. On the other hand, the second power divider 24 and the third power divider 2S respectively branch to two guide tubes and then width of the two guide tubes respectively enlarge to the guide tube before branching. Similarly, the split flows of the microwave from the second power divider 24 and the third power divider 28 have the same phase.
In practice, the second power divider 24 (or the third power divider 28) could make the waveguides arranged along the second direction D2 and then the microwave fields outputted by the waveguides could be arranged along the second direction D2. Besides, the first power divider 22 could make the waveguides and the microwave fields generated thereby arranged along the first direction D1. By the combination of the first power divider 22 and the second power divider 24, the microwave generated by a single microwave generator M could be distributed to a large area to form a large-area and uniform microwave field. It should be noted that the amount of the first power divider and the second power divider (the third power divider) could be determined by the require shape of the microwave field, and it would not be limited in this invention. For example, the two output terminals of the second power divider could be respectively connected to fourth power dividers similar as the second power divider, furthermore, the output terminals of these fourth power dividers are arranged along the second direction. Accordingly, four waveguides arranged along the second direction could be controlled to output microwave fields with approximate intensity distributions.
Please refer to
In this embodiment, the microwave supply apparatus 32 includes a first power divider 320, a second power divider 322, a third power divider 324, a first waveguide 3260, a second waveguide 3262, a third waveguide 3264, and a fourth waveguide 3266. Because the elements of the microwave supplying apparatus 32 in this embodiment are the same as the corresponding elements in the above-mentioned embodiment, it would not be described in detail here. Furthermore, the first waveguide 3260, the second waveguide 3262, the third waveguide 3264, and the fourth waveguide 3266 are connected to the chamber 34.
The microwave generated by the microwave generator 30 is received by the first power divider 320 and distributed to the two output terminals of the first power divider 320. The second power divider 322 and the third power divider 324 receive the microwave from the two output terminals of the first power divider 320, and then divide the microwave received. The first waveguide 3260, the second waveguide 3262, the third waveguide 3264, and the fourth waveguide 3266 connected to the first power divider 322 and the third power divider 324 respectively receive the microwave and output the microwave fields with approximate intensity distributions.
By the first power divider 320, the second power divider 322, and the third power divider 324, a large-area and uniform microwave field could be provided in the chamber 34 and then the plasma gas could be ionized to form large-area and uniform plasma. Besides, according to the amount of the first power divider and the second power divider (or the third power divider), the user or the designer could determine the size of the uniform microwave field.
Compared to the prior art, the microwave supplying apparatus has a simple power divider construction connected to a microwave source and then provides a large-area and uniform microwave field. The microwave supplying apparatus could be used in electron cyclotron resonance (ECR) plasma system. The large-area and uniform microwave field provided by the microwave supplying apparatus could be used for ionizing the plasma gas in the chamber to form large-area and uniform plasma. Therefore, the microwave supplying apparatus and the microwave plasma system of the invention could be used in the present plasma process which requires large-area processing, such as, large-area chip processes or carbon nanotube growth enhanced by the plasma.
With the example and explanations above, the features and spirits of the invention will be hopefully well described. Those skilled in the art will readily observe that numerous modifications and alterations of the device may be made while retaining the teaching of the invention. Accordingly, the above disclosure should be construed as limited only by the metes and bounds of the appended claims.
Number | Name | Date | Kind |
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6661309 | Chen et al. | Dec 2003 | B2 |
20100231144 | Leek | Sep 2010 | A1 |
Number | Date | Country | |
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20110156838 A1 | Jun 2011 | US |