Claims
- 1. The process which comprises interacting, in an aqueous medium, fine particle fumed silica with at least one substantially crystalline mixed metal layered hydroxide, MMLH, conforming generally to the fomrula
- Li.sub.m D.sub.d T(OH)(m+2d+3n.multidot.a)(A.sup.n)a.multidot.qH.sub.2 O(I)
- where:
- m is from zero to about 1;
- D represents divalent metal ions;
- d is from zero to about 4;
- T represents trivalent metal ions;
- A represents monovalent or polyvalent anions or negative-valence radicals other than OH ions;
- a is the number of ions of A;
- n is the balance of A;
- n.multidot.a is from zero to about -3;
- q is zero or more;
- (m+d) is greater than zero; and
- (m+2d+3+n.multidot.a) is equal to or greater than 3, and whereby there is formed the adduct, MMLH.multidot. fumed silica.
- 2. The process of claim 1 wherein D represents at least one divalent metal of the group consisting of Mg, Ca, Ba, Sr, Mn, Fe, Co, Ni, Cu, and Zn and wherein T represents at least one trivalent metal of the group consisting of Al, Ga, Cr, and Fe.
- 3. The process of claim 1 wherein D represents at least one divalent metal of the group consisting of Mg, Ca, Co, Ni, Cu, and Zn, and wherein T represents at least one trivalent metal of the group consisting of Al and Fe.
- 4. The process of claim 1 wherein the D metal is Mg and the T metal is Al.
- 5. The process of claim 1 wherein the mixed metal layered hydroxide conforms essentially to the formula Mgal(OH(.sub.5-a (Cl.sup.-).sub.a, where a can be zero to 1.
- 6. The process of claim 1, wherein the weight ratio of mixed metal layered hydroxide to fumed silica is in the range of from about 1 to about 10.
- 7. The MMLH.multidot. fumed silica adduct produced by the process of claim 1.
Cross-Reference to Related Application
This is a continuation of application Ser. No. 07/577,405, filed Sep. 4, 1990, now abandoned.
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Continuations (1)
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Number |
Date |
Country |
Parent |
577405 |
Sep 1990 |
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