Claims
- 1. A moisture-curing polyamide containing reactive alkoxysilane groups, of the formula ##STR4## wherein: PA is a polyamide unit; n is 0, 1 or 2; R.sup.1 is a non-reactive organic moiety selected from the group consisting of linear aliphatic groups, branched aliphatic groups; cyclic aliphatic groups and aromatic groups each containing up to 20 carbon atoms, R.sup.4 is an alkyl group containing from 1 to 5 carbon atoms, R.sup.2 is an alkyl group containing from 1 to 5 carbon atoms, a methoxy alkyl group, or two alkyl groups containing from 1 to 5 carbon atoms bonded to form a cyclic group with an O--Si--O bridge, and R.sup.3 is hydrogen wherein the moisture-curing polyamide has a number average molecular weight of from 2,000 to 30,000.
- 2. The moisture-curing polyamide of claim 1 having a number average molecular weight of from 5.000 to 20,000.
- 3. The moisture-curing polyamide of claim 2 wherein R.sup.1 is an alkyl group having from 2 to 5 carbon atoms.
- 4. The moisture-curing polyamide of claim 1 wherein R.sup.1 is an alkyl group having from 2 to 5 carbon atoms.
- 5. The moisture-curing polyamide of claim 4 wherein R.sup.1 is an alkyl group having 3 carbon atoms.
- 6. The moisture-curing polyamide of claim 1 wherein R.sup.2 and R.sup.4, independently of each other are alkyl groups containing from 1 to 5 carbon atoms.
- 7. The moisture-curing polyamide of claim 2 wherein R.sup.1, R.sup.2 and R.sup.4, independently of each other are C.sub.1 to C.sub.5 alkyl groups.
- 8. The moisture-curing polyamide of claim 2 wherein R.sup.2 is a methoxy alkyl group.
- 9. The moisture-curing polyamide of claim 2 wherein two substituents R.sup.2 are bonded to each other.
- 10. The moisture-curing polyamide of claim 1 wherein R.sup.1 is a C.sub.2 to C.sub.5 alkyl group and R.sup.2 and R.sup.4 independently of each other are C.sub.1 to C.sub.5 alkyl groups.
- 11. The moisture-curing polyamide of claim 1 wherein PA is a polyamide unit comprising diacarboxylic acid and diamine residues wherein a major portion of the acid residues are residues of dimer fatty acids.
- 12. The moisture-curing polyamide of claim 11 wherein n is 0 or 1.
- 13. The moisture-curing polyamide of claim 12 wherein n is 0.
- 14. The moisture-curing polyamide of claim 1 wherein n is 0 or 1.
- 15. The moisture-curing polyamide of claim 14 wherein n is 0.
- 16. A process for producing a moisture-curing polyamide, containing reactive alkoxysilane groups, of the formula ##STR5## by mixing and reacting an ester functional polyamide with an aminoterminated alkoxysilane of the formula: ##STR6## or mixing and reacting an aminofunctional polyamide with an ester terminated alkoxysilane of the formula: ##STR7## under conditions whereby the alkoxysilane containing group is joined to the polyamide by an amide linkage, wherein n is 0, 1 or 2, R.sup.1 is a nonreactive organic moiety selected from the group consisting of linear aliphatic groups, branched aliphatic groups, cyclic aliphatic groups, and aromatic groups each containing up to 20 carbon atoms, R.sup.4 is an alkyl group containing from 1 to 5 carbon atoms, R.sup.2 is an alkyl group containing 1 to 5 carbon atoms, a methoxy alkyl group, or two alkyl groups containing from 1 to 5 carbon atoms bonded to form a cyclic group with an --O--Si--O bridge, R.sup.3 is hydrogen, R.sup.5 is an alkyl group containing 1 to 5 carbon atoms or a methoxyalkyl group, and R.sup.6 is an aliphatic group containing up to 9 carbon atoms, to form a polyamide containing reactive alkoxysilane groups, wherein the moisture-curing polyamide has a number average molecular weight of from 2,000 to 30,000.
- 17. The process of claim 16 wherein R.sup.1 is a C.sub.2 to C.sub.5 aliphatic group and R.sup.2 and R.sup.4 are independently a C.sub.1 to C.sub.2 aliphatic group.
- 18. The process of claim 16 wherein R.sup.5 is a C.sub.6 to C.sub.9 alkyl group.
- 19. The process of claim 16 wherein the number average molecular weight is from 5,000 to 20,000.
- 20. The process of claim 16 wherein acid residues in the polyamide comprise a major portion of dimer fatty acid residues.
- 21. The process of claim 20 wherein the polyamide comprises a small portion of trimer fatty acid residues.
Priority Claims (1)
Number |
Date |
Country |
Kind |
40 32 911.9 |
Oct 1990 |
DEX |
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CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation of U.S. Ser. No. 08/039,281 filed Apr. 19, 1993, now abandoned.
1. Field of the Invention
US Referenced Citations (3)
Number |
Name |
Date |
Kind |
4409373 |
Wiemers et al. |
Oct 1983 |
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4647630 |
Schmid et al. |
Mar 1987 |
|
5055249 |
Schmid |
Oct 1991 |
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Non-Patent Literature Citations (2)
Entry |
Henkel Corporation Emery Group, Technical Bulletin 100F, Specifications and Characteristics of Emery Chemicals, p. 5, Table 10, "Dimer, Trimer and Polybasic Acids." Date Unknown. |
Kirk-Othmer Concise Encyclopedia of Chemical Technology, A. Wiley--Interscience Publication, 1985; p. 361, "Dimer Acids", Edward C. Leonard. |
Continuations (1)
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Number |
Date |
Country |
Parent |
39281 |
Apr 1993 |
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