Claims
- 1. An improved nail polish composition for application to human nails, the composition consisting essentially of a conventional nail polish composition containing:
- ______________________________________ Quantity by Weight in %'s of the con- ventional nailIngredient polish composition______________________________________Ethyl acetate 36.7%Isopropyl alcohol 24.2%Butyl acetate (solvent system) 9.9%Butyl alcohol 1.4%Toluene 7.4%Toluene sulfonamide/formaldehyderesin (hardener) 14.4%Camphor 0.9% (plasticizers)Dibutyl phthalate 1.2%Nitrocellulose (film former) 3.6%to which is added an improvement containing:Water 6%Urea 0.1%Polyvinyl butyral resin 2.2%______________________________________
- 2. An improved liquid nail polish composition for application to human nails constituting a conventional liquid nail polish of the type essentially including 2-15 percent nitrocellulose, a plasticizer, including 0.5-8 percent camphor and 0.5-8 percent dibutyl phthalate, a hardener constituting 5-20 percent toluene sulfonamide/formaldehyde resin, and a solvent system including 20-40 percent ethyl acetate, 15-30 percent isopropyl alcohol, 3-25 percent butyl acetate, 0.5-10 percent butyl alcohol and 2-30 percent toluene, all the percentages being by weight of the conventional nail polish, said conventional nail polish having admixed therewith a moisturizing composition essentially consisting of:
- (a) 1-3 percent polyvinyl butyral resin;
- (b) 3-10 percent water; and
- (c) 0.02-0.5 percent urea,
- the percentages of the moisturizing composition being percentages by weight of the improved liquid nail polish composition, whereby the improved liquid nail polish composition supplies moisture to a polished nail.
- 3. The improved nail polish composition of claim 2, wherein the water is present in an amount of about 6 percent by weight of the improved liquid nail polish composition.
- 4. The improved nail polish composition of claim 2, wherein urea is present in an amount of about 0.1 percent of the improved liquid nail polish composition.
- 5. The improved nail polish composition of claim 2, wherein the polyvinyl butyral resin is present in an amount of about 2.2 percent by weight of the improved liquid nail polish composition.
Parent Case Info
This is a continuation, of application Ser. No. 254,731 filed Apr. 16, 1981.
US Referenced Citations (3)
Non-Patent Literature Citations (2)
Entry |
Balsam et al., Cosmetic Science and Technology, N.Y., Wiley Interscience, vol. II, 1972, pp. 521-530. |
Gregory, Uses and Applications of Chemicals and Related Materials, N.Y., Reinhold Publishing Corporation, 1939, p. 630. |
Continuations (1)
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Number |
Date |
Country |
Parent |
254731 |
Apr 1981 |
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