Claims
- 1. A solvent mixture for use in a vapor degreasing system, said solvent mixture comprising:
- 90 percent to about 96.5 percent n-propyl bromide; and
- 3.5 percent to about 5 percent of a mixture of low boiling solvents, said solvent mixture comprising 0.5 percent to about 1 percent nitromethane, 0.5 percent to about 1 percent 1,2-butylene oxide and 2.5 percent to about 3 percent 1,3-dioxolane.
- 2. A solvent mixture in accordance with claim 1 wherein said solvent mixture is non-flammable.
- 3. A solvent mixture in accordance with claim 1 wherein said solvent mixture has a high solvency with a Kauri-Butanol value above 120.
- 4. A solvent mixture in accordance with claim 1 wherein said solvent mixture has a high solvency with a Kauri-Butanol value of 125 or above.
- 5. A solvent mixture in accordance with claim 1 wherein said solvent mixture in operation in a vapor degreasing system leaves a non-volatile residue (NVR) of less than 2.5 mg.
- 6. A solvent mixture in accordance with claim 1 wherein said solvent mixture in operation in a vapor degreasing system leaves no residue.
- 7. A solvent mixture in accordance with claim 1 wherein said solvent mixture has an evaporation rate of at least 0.96 (1,1,1-trichloroethane=1).
- 8. A solvent mixture in accordance with claim 1 wherein said solvent mixture has a latent heat of evaporation of about 58.8 cal/g.
- 9. A solvent mixture in accordance with claim 1 wherein said solvent mixture has a ozone depletion potential between 0.001-0.04 and a halogen global warming potential of 0.0001-0.0003 or almost zero.
- 10. A method for cleaning an article in a vapor degreaser, said method comprising:
- (a) providing a vapor degreaser system;
- (b) adding to the solvent reservoir of said vapor degreaser system a solvent mixture, said solvent mixture comprising:
- 90 percent to about 96.5 percent n-propyl bromide; and,
- 3.5 percent to about 5 percent of a mixture of solvents, said solvent mixture comprising 0.5 percent to about 1 percent nitromethane, 0.5 percent to about 1 percent 1,2-butylene oxide and 2.5 percent to about 3 percent 1,3-dioxolane;
- (c) boiling said solvent mixture to form a vapor layer;
- (d) introducing into said vapor layer said article to be cleaned, said vapor layer condensing on said article, thereby subjecting the surface of said article to a solvent-flushing action; and
- (e) removing said article from said vapor layer.
- 11. A method in accordance with claim 10 wherein said solvent mixture is non-flammable.
- 12. A method in accordance with claim 10 wherein said solvent mixture has a high solvency with a Kauri-Butanol value above 80.
- 13. A method in accordance with claim 10 wherein said solvent mixture has a high solvency with a Kauri-Butanol value above 125.
- 14. A method in accordance with claim 10 wherein said solvent mixture in operation in a vapor degreasing system leaves a non-volatile residue (NVR) of less than 2.5 mg.
- 15. A method in accordance with claim 10 wherein said solvent mixture in operation in a vapor degreasing system leaves no residue.
- 16. A method in accordance with claim 10 wherein said solvent mixture has an evaporation rate of at least 0.96 where 1,1,1-trichloroethane=1.0.
- 17. A method in accordance with claim 10 wherein said solvent mixture has a latent heat evaporation of about 58.8 cal/g.
CROSS-REFERENCE TO RELATED APPLICATION
This is a continuation of U.S. patent application Ser. No. 08/580,860 filed Dec. 29, 1995, now U.S. Pat. No. 5,616,549 issued Apr. 1, 1997, the entire disclosure of which is incorporated by reference.
US Referenced Citations (24)
Foreign Referenced Citations (13)
Number |
Date |
Country |
EP-0609004 |
Aug 1994 |
EPX |
2 732 963 |
Oct 1996 |
FRX |
02135296 |
May 1990 |
JPX |
02185597 |
Jul 1990 |
JPX |
03097793 |
Apr 1991 |
JPX |
6-128591 |
May 1994 |
JPX |
7-150197 |
Jun 1995 |
JPX |
7-292393 |
Nov 1995 |
JPX |
7-310097 |
Nov 1995 |
JPX |
8-067643 |
Mar 1996 |
JPX |
1 276 783 |
Jun 1972 |
GBX |
9716583 |
May 1997 |
WOX |
9716524 |
May 1997 |
WOX |
Non-Patent Literature Citations (1)
Entry |
Kirk-Othmer, Enclyopedia of Chemical Technology, 4th ed., John Wiley and Sons, pp. 569, 570, 574, 575 (Month of publication is unknown). |
Continuations (1)
|
Number |
Date |
Country |
Parent |
580840 |
Dec 1995 |
|