Claims
- 1. A multi-channel diffusion-type gas sample chamber for conducting radiation through a gas, comprising in combination:
- an elongated hollow tube having a wall, composed of a gastight material, and having an inwardly-facing specularly-reflective surface that conducts radiation introduced at one end of said elongated hollow tube toward the other end with high efficiency by means of multiple reflections from said inwardly-facing specularly-reflective surface, said elongated hollow tube having a plurality of apertures extending through the wall and located intermediate the ends of said elongated hollow tube, said elongated hollow tube further having a plurality of detector ports extending through the wall of said elongated hollow tube; and,
- a sheet of a semi-permeable membrane covering each of said plurality of apertures, said sheet permitting airborne particles smaller than a specific size to diffuse through it into and out of the space within said elongated hollow tube and preventing airborne particles larger than said specific size from entering said space.
- 2. The multi-channel diffusion-type gas sample chamber of claim 1 further comprising in combination: means for heating said specularly-reflective surface to a temperature above the dew point of the gas to prevent condensation on said specularly-reflective surface.
- 3. The multi-channel gas sample chamber of claim 2 wherein said plurality of detector ports are spaced around the periphery of said elongated hollow tube adjacent one end of it.
- 4. The multi-channel gas sample chamber of claim 2 wherein said plurality of detector ports are spaced along the length of said elongated hollow tube.
- 5. The multi-channel gas sample chamber of claim 1 wherein said plurality of detector ports are spaced around the periphery of said elongated hollow tube adjacent one end of it.
- 6. The multi-channel gas sample chamber of claim 1 wherein said plurality of detector ports are spaced along the length of said elongated hollow tube.
REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of U.S. patent application Ser. No. 07/793,990, filed Nov. 18, 1991 for IMPROVED GAS SAMPLE CHAMBER, now U.S. Pat. No. 5,163,332, which was a continuation of U.S. application Ser. No. 07/604,615 filed Oct. 26, 1990, now abandoned which was a continuation-in-part of U.S. application Ser. No. 07/503,216 filed Apr. 2, 1990 and issued Oct. 29, 1991 as U.S. Pat. No. 5,060,508 for "Gas Sample Chamber."
US Referenced Citations (9)
Foreign Referenced Citations (4)
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0039049 |
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JPX |
0173734 |
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Continuations (1)
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Number |
Date |
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Parent |
604615 |
Oct 1990 |
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Continuation in Parts (2)
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Number |
Date |
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Parent |
793990 |
Nov 1991 |
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Parent |
503216 |
Apr 1990 |
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