Claims
- 1. A process of producing multi-layer cathode structures, which comprises:providing a carbonaceous cathode substrate, and forming at least one layer of a metal boride-containing composite refractory material over the substrate, wherein the surface of the carbonaceous substrate to be coated is roughened by drawing a rake across the surface to form grooves therein prior to the formation of the layer overlying the said surface.
- 2. A process according to claim 1 wherein the metal of the metal boride is selected from the group consisting of titanium, zirconium, vanadium, hafnium, niobium, tantalum, chromium and molybdenum.
- 3. A process according to claim 2 wherein the metal is TiB2.
- 4. A process according to claim 3 wherein at least two layers of TiB2-containing composite refractory material are provided over the substrate, the surface of each layer being raked prior to applying a further layer.
- 5. A process according to claim 4 wherein each TiB2-containing layer has a thickness of at least 10% of the total cathode thickness.
- 6. A process according to claim 5 wherein the content of TiB2 in the coating layers increases progressively as the distance of the layer from the substrate increases.
- 7. A process according to claim 3 wherein a single TiB2-containing composite refractory layer is applied over the roughened substrate, said TiB2-containing layer having a thickness of at least 20% of the total cathode thickness.
- 8. A process according to claim 1 wherein the carbonaceous cathode substrate with the at least one layer of said composite refractory material placed on the roughened surface are compressed and baked.
- 9. A process of producing multi-layer cathode structures, which comprises:providing a carbonaceous cathode substrate, and forming at least two coating layers of a metal boride-containing composite refractory material successively over the substrate, wherein the content of metal boride in the coating layers increases progressively as the distance of the layer from the substrate increases.
- 10. A process according to claim 9 wherein the metal of the metal boride is selected from the group consisting of titanium, zirconium, vanadium, hafnium, niobium, tantalum, chromium and molybdenum.
- 11. A process according to claim 10 wherein the metal is TiB2.
- 12. A process according to claim 11 wherein the carbonaceous substrate is formed of anthracite, graphite, pitch, tar or mixtures thereof.
- 13. A process according to claim 12 wherein each TiB2-containing layer comprises TiB2 mixed with a carbonaceous material selected from the group consisting of anthracite, pitch and tar.
- 14. A process according to claim 13 wherein each TiB2-containing layer has a thickness of at least 10% of the total cathode thickness.
- 15. A process according to claim 14 wherein the TiB2-containing layer most remote from the substrate contains 50-90 wt % TiB2.
- 16. A process according to claim 15 wherein the TiB2-containing layer closest to the substrate contains 10-20 wt % TiB2.
- 17. A process according to claim 16 wherein an intermediate TiB2-containing layer is provided containing 20-50 wt % TiB2.
- 18. A process of producing multi-layer cathode structures, which comprises:providing a carbonaceous cathode substrate, roughening the surface of the substrate, placing at least one layer of a metal boride-containing composite refractory material over the roughened substrate, compressing the carbonaceous cathode substrate and at least one layer of composite refractory material into a green cathode and baking the green cathode.
- 19. A process according to claim 18 wherein the metal of the metal boride is selected from the group consisting of titanium, zirconium, vanadium, hafnium, niobium, tantalum, chromium and molybdenum.
- 20. A process according to claim 19 wherein the metal boride is TiB2.
- 21. A process according to claim 20 wherein at least two layers of TiB2-containing composite refractory material are provided over the substrate, the surface of each layer being roughened prior to applying a further layer.
- 22. A process according to claim 21 wherein each TiB2-containing layer has a thickness of at least 10% of the total cathode thickness.
- 23. A process according to claim 22 wherein the content of TiB2 in the coating layer increases progressively as the distance of the layer from the substrate increases.
- 24. A process according to claim 20 wherein a single TiB2-containing composite refractory layer is applied over the roughened substrate, said TiB2-containing layer having a thickness of at least 20% of the total cathode thickness.
Parent Case Info
This application claims the benefit of U.S. Provisional Application No. 60/112,458, filed Dec. 16, 1998.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
5961811 |
Keller |
Oct 1999 |
|
6001236 |
de Nora et al. |
Dec 1999 |
|
Provisional Applications (1)
|
Number |
Date |
Country |
|
60/112458 |
Dec 1998 |
US |