Majority of the electronic computation today is carried out in Boolean logic in digital computers and electronics. Boolean logic is a form of algebra in which all values are reduced to either TRUE (1) or FALSE (0). Boolean logic gates have scaled following the Moore's law as transistor characteristic lengths have scaled (e.g., to 20 nm). Some limitations to Boolean logic are: limited density of logic gates limited by algebraic constrains in two level logic (Galois field-2 algebra); limited density of interconnect bandwidth limited by the number representation in base 2 number system; and limited density of memory states limited by the information content per logic element.
The embodiments of the disclosure will be understood more fully from the detailed description given below and from the accompanying drawings of various embodiments of the disclosure, which, however, should not be taken to limit the disclosure to the specific embodiments, but are for explanation and understanding only.
Various embodiments describe a 4-state logic memory element which has four uniquely defined logic states. In some embodiments, the four states are separated by high energy barrier (e.g., from 40 kT to 60 kT) to provide low error rate operation. In some embodiments, a metal interconnect is provided which can conduct four uniquely defined interconnect states. In some embodiments, a quaternary logic gate is described which comprises two quaternary magnetic elements sharing a spin channel. In some embodiments, the quaternary logic gate is operable to function as a buffer or non-inverting gate that can buffer or invert spin current in two different orientations (e.g., +/−x and +/−y orientations). In some embodiments, the quaternary logic gate is operable to function as an inverter that can invert an input spin current. This input spin current can be in +/−x or +/−y orientations.
In some embodiments, four orientations (0, 1, 2, and 3) are defined for the 4-state logic memory element such that orientations ‘0’ and ‘1’ are separated by 90 degrees, orientations ‘1’ and ‘3’ are separated by 90 degrees, orientations ‘3’ and ‘2’ are separated by 90 degrees, orientations ‘0’ and ‘3’ are separated by 180 degrees, and orientations ‘1’ and ‘2’ are separated by 180 degrees. In some embodiments, with reference to a four quadrant two dimensional (2D) vector space, magnetic orientation facing +x direction (e.g., East) is orientation ‘0’; magnetic orientation facing +y direction (e.g., North) is orientation ‘1’, magnetic orientation facing −x direction (e.g., West) is orientation ‘3’, and magnetic orientation facing −y direction (e.g., South) is orientation ‘2’.
In the following description, numerous details are discussed to provide a more thorough explanation of embodiments of the present disclosure. It will be apparent, however, to one skilled in the art, that embodiments of the present disclosure may be practiced without these specific details. In other instances, well-known structures and devices are shown in block diagram form, rather than in detail, in order to avoid obscuring embodiments of the present disclosure.
Note that in the corresponding drawings of the embodiments, signals are represented with lines. Some lines may be thicker, to indicate more constituent signal paths, and/or have arrows at one or more ends, to indicate primary information flow direction. Such indications are not intended to be limiting. Rather, the lines are used in connection with one or more exemplary embodiments to facilitate easier understanding of a circuit or a logical unit. Any represented signal, as dictated by design needs or preferences, may actually comprise one or more signals that may travel in either direction and may be implemented with any suitable type of signal scheme.
Throughout the specification, and in the claims, the term “connected” means a direct physical, electrical, or wireless connection between the things that are connected, without any intermediary devices. The term “coupled” means either a direct electrical or wireless connection between the things that are connected or an indirect electrical or wireless connection through one or more passive or active intermediary devices. The term “circuit” means one or more passive and/or active components that are arranged to cooperate with one another to provide a desired function. The term “signal” means at least one current signal, voltage signal, magnetic signal, electromagnetic signal, or data/clock signal. The meaning of “a,” “an,” and “the” include plural references. The meaning of “in” includes “in” and “on.”
The terms “substantially,” “close,” “approximately,” “near,” and “about,” generally refer to being within +/−10% of a target value (unless specifically specified). Unless otherwise specified the use of the ordinal adjectives “first,” “second,” and “third,” etc., to describe a common object, merely indicate that different instances of like objects are being referred to, and are not intended to imply that the objects so described must be in a given sequence, either temporally, spatially, in ranking or in any other manner.
Unless otherwise specified the use of the ordinal adjectives “first,” “second,” and “third,” etc., to describe a common object, merely indicate that different instances of like objects are being referred to, and are not intended to imply that the objects so described must be in a given sequence, either temporally, spatially, in ranking or in any other manner.
For the purposes of the present disclosure, phrases “A and/or B” and “A or B” mean (A), (B), or (A and B). For the purposes of the present disclosure, the phrase “A, B, and/or C” means (A), (B), (C), (A and B), (A and C), (B and C), or (A, B and C). The terms “left,” “fight,” “front,” “back,” “top,” “bottom,” “over,” “under,” and the like in the description and in the claims, if any, are used for descriptive purposes and not necessarily for describing permanent relative positions.
4-State Magnet and their Respective Orientations
In some embodiments, the four orientations are defined for the 4-state logic memory element such that orientations ‘0’ and ‘1’ are separated by 90 degrees, orientations ‘1’ and ‘3’ are separated by 90 degrees, orientations ‘3’ and ‘2’ are separated by 90 degrees, orientations ‘0’ and ‘3’ are separated by 180 degrees, and orientations ‘1’ and ‘2’ are separated by 180 degrees. In some embodiments, with reference to a four quadrant 2D vector space, magnetic orientation facing +x direction (e.g., East) is orientation ‘0’; magnetic orientation facing +y direction (e.g., North) is orientation ‘1’, magnetic orientation facing −x direction (e.g., West) is orientation ‘3’, and magnetic orientation facing −y direction (e.g., South) is orientation ‘2’.
In some embodiments, 4-state magnet 104 is formed using cubic magnetic crystalline anisotropy magnets. In some embodiments, 4-state magnet 104 is formed by combining shape and exchange coupling to create two equal easy axes for nanomagnets. In some embodiments, 4-state magnet 104 comprises a material selected from a group consisting of: Fe, Ni, Co and their alloys, magnetic insulators, and Heusler alloys of the form X2YZ. In some embodiments, the magnetic insulators comprises a material selected from a group consisting of: magnetite Fe3O4 and Y3Al5O12. In some embodiments, the Heusler alloys comprises one of: Co2FeSi and Mn2Ga.
In some embodiments, 4-state magnet 104 is formed with high spin polarization materials. Heusler alloys are an example of high spin polarization materials. Heusler alloys are ferromagnetic metal alloys based on Heusler phase. Heusler phases are intermetallics with particular composition and face-centered cubic crystal structure. Heusler alloys are ferromagnetic because of double-exchange mechanism between neighboring magnetic ions. The neighboring magnetic ions are usually manganese ions, which sit at the body centers of the cubic structure and carry most of the magnetic moment of the alloy.
In some embodiments, 4-state magnet 104 is formed with a sufficiently high anisotropy effective field (Hk) and sufficiently low saturated magnetization (Ms) to increase injection of spin currents. For example, Heusler alloys of high Hk and low Ms are used to form 4-state magnet 104.
Saturated magnetization Ms is generally the state reached when an increase in applied external magnetic field H cannot increase the magnetization of the material. Here, sufficiently low Ms refers to Ms less than 200 kA/m (kilo-Amperes per meter). Anisotropy effective field Hk generally refers to the material property which is directionally dependent. Materials with Hk are materials with material properties that are highly directionally dependent. Here, sufficiently high Hk in context of Heusler alloys is considered to be greater than 2000 Oe (Oersted). For example, a half metal that does not have bandgap in spin up states but does have bandgap in spin down states (e.g., at the energies within the bandgap, the material has 100% spin up electrons). If the Fermi level of the material is in the bandgap, injected electrons will be close to 100% spin polarized. In this context, “spin up” generally refers to the positive direction of magnetization, and “spin down” generally refers to the negative direction of magnetization. Variations of the magnetization direction (e.g. due to thermal fluctuations) result in mixing of spin polarizations.
In some embodiments, Heusler alloys such as Co2FeAl and Co2FeGeGa are used for forming 4-state magnet 104. Other examples of Heusler alloys include: Cu2MnAl, Cu2MnIn, Cu2MnSn, Ni2MnAl, Ni2MnIn, Ni2MnSn, Ni2MnSb, Ni2MnGa, Co2MnAl, CO2MnSi, Co2MnGa, Co2MnGe, Pd2MnAl, Pd2MnIn, Pd2MnSn, Pd2MnSb, Co2FeSi, Fe2Val, Mn2VGa, Co2FeGe, etc.
4-State Spin Torque Logic Device (Buffer or Inverter)
In some embodiments, device 200 comprises a first metal layer 201a, First 4-state Magnet 203a, Second 4-state Magnet 203b, Oxide 205a between First and Second 4-state Magnets 203a/b, Spin Channel 206a/b/c, Oxide layer 205b over Spin Channel 206a/b/c, Via 207, and second metal layer 201b. Here, Power and Ground metal layers 201a and 201b, respectively, may be collectively referred to as metal layers 201; First and Second 4-state Magnets 203a and 203b, respectively, may be collectively referred to as 4-state Magnets 203; Oxide layers 205a and 205b may be collectively referred to as oxide 205; and Spin Channel 206a/b/c may be collectively referred to as Spin Channel 206.
In some embodiments, the material(s) used for forming metal layers 201, Via 207, and Spin Channel 206 is/are the same. For example, Copper (Cu) can be used for forming metal layers 201, Via 207, and Spin Channel 206. In other embodiments, material(s) used for forming metal layers 201, Via 207, and Spin Channel 206 are different. For example, metal layers 201 may be formed of Cu while Via 207 may be formed of Tungsten (W). Any suitable metal or combination of metals can be used for forming metal layers 201, Via 207, and Spin Channel 206. For example, Spin Channel 206 can be formed of Silver (Ag), Aluminum (Al), Graphene, and other 2D conducting materials.
In some embodiments, First and Second 4-state Magnets 203a/b are formed using cubic magnetic crystalline anisotropy magnets. In some embodiments, First and Second 4-state Magnets 203a/b are formed by combining shape and exchange coupling to create two equal easy axes (e.g., axes with lower energy when magnetization is aligned with them) for a nanomagnets. First and Second 4-state Magnets 203a/b may be formed of the same materials as described with reference to 4-state magnet 104.
In some embodiments, Spin Channel 206 is partitioned into segments or regions 206a, 206b, and 206c such that Oxide 205b forms a barrier between the channel segments. One purpose of the barrier is to control the transfer of spin polarized current to direction of magnetization and vice versa. In some embodiments, the gap between First and Second Magnets 203a/b, provided by Oxide 205b, is chosen to be sufficient to permit isolation of the two magnets 203a/b. In some embodiments, a layer of oxide 205b is deposited before the Spin Channel 206 and then a via hole is etched for Via 207. In some embodiments, Via 207 couples Channel segment 206b to Ground supply layer 201b which is formed over Oxide layer 205b.
In some embodiments, spin device 200 of
In some embodiments, First 4-state Magnet 203a dictates the flow of the spin current in channel 206b. This is realized by the asymmetry of First 4-state Magnet 203a overlap with channel 206b. Here, First 4-state Magnet 203a overlaps more with channel 206b than Second 4-state Magnet 203b. For example, overlap1 is greater than overlap2. This asymmetry in the overlap sets the direction of spin through channel 206b, in accordance with some embodiments.
In some embodiments, magnet 203a dictates the flow of the spin current in channel 206b due to proximity of via 207 which conducts charge current to the ground electrode 201b.
In some embodiments, spin logic device 300 comprises first filter layer 301a and second filter layer 301b. In some embodiments, first filter layer 301a is formed between First 4-state Magnet 203a and the portions of channel regions (or segments) 206a and 206b. As such, unlike First 4-state Magnet 203a being directly coupled or adjacent to the portions of channel regions (or segments) 206a and 206b as described with reference to
In some embodiments, first and second filter layers 301a/b comprises a material selected from a group consisting of: MgO, Al2O3, BN, MgAl2O4, ZnAl2O4, SiMg2O4, and SiZn2O4, and NiFeO. One purpose of the filter layers is to provide high tunneling magnetoresistance, for example.
In some embodiments, First 4-state magnet 203a and the first filter layer 301a overlap the spin channel region 206b more than Second 4-state magnet 203b and second filter layer 301b overlap the second spin channel region. This asymmetry in the overlap sets the direction of spin through channel 206b, in accordance with some embodiments.
In some embodiments, engineered interfaces are formed between magnets. For example, first set of interfaces 504a/b are formed between First and Second 4-state Magnets 203a/b, respectively and Spin Channel 206a. In some embodiments, second set of engineered interfaces 502 are coupled to Ground 201b. In some embodiments, the dimensions (width, length, and height/thickness) of Ground 201b is chosen to optimize (e.g., reduce) the energy-delay of spin device 200/300/400/500. In some embodiments, first set of engineered interfaces 504a/b and second set of engineered interfaces 502 are formed of non-magnetic material(s) such that the interface layers and the magnets together have sufficiently matched atomistic crystalline layers. For example, the non-magnetic material has a crystal periodicity which is matched through rotation or by mixing of elements.
Here, sufficiently matched atomistic crystalline layers refer to matching of the lattice constant ‘a’ within a threshold level above which atoms exhibit dislocation which is harmful to the device (e.g., the number and character of dislocations lead to a significant (e.g., greater than 10%) probability of spin flip while an electron traverses the interface layer). For instance, the threshold level is within 5% (i.e., threshold levels in the range of 0% to 5% of the relative difference of the lattice constants). As the matching improves (e.g., matching gets closer to perfect matching), spin injection efficiency from spin transfer from 4-state magnets 203 to Spin Channel 206 increases. Poor matching (e.g., matching worse than 5%) implies dislocation of atoms that is harmful for the device. In some embodiments, the non-magnetic material is Ag with a crystal lattice constant a=4.05 A which is matched to Heusler alloys CFA (i.e., Co2FeAl) and CFGG (i.e., Co2FeGeGa with a=5.737 A) provided the direction of the crystal axes is turned by 45 degrees. Then the projection of the lattice constant is expressed as:
a/√{square root over (2)}≈5.737 A/1.414≈4.057 A
As such, the magnetic structure stack (e.g., stack of 203a and 504a) allows for interfacial matching of Heusler alloys interfaces with the spin channel. In some embodiments, the stack also allows for templating of the bottom surface of the Heusler alloy.
In some embodiments, interface layers 504a/b (e.g., Ag) provide electrical contact to magnets 203. As such, a template is provided with the right crystal orientation to seed the formation of the Heusler alloy (which forms 4-state magnets 203). In some embodiments, the directionality of spin logic may be set by the geometric asymmetry in spin device 200/300/400/500. In some embodiments, the area of overlap of First 4-state magnet 203a (e.g., the input magnet) with Spin Channel 206b is larger than the area of overlap of Second 4-state magnet 203b (e.g., the output magnet) causing asymmetric spin in channel 206b.
One technical effect of the engineered interface layers 504a/b (e.g., Ag) between Heusler alloy based magnets 203a/b and Spin Channel 206 is that it provides for higher mechanical barrier to stop or inhibit the inter-diffusion of magnetic species with Spin Channel 206. In some embodiments, the engineered interface layers 504a/b maintain high spin injection at the interface between Spin Channel 206 and magnets 203. As such, engineered interface layers 504a/b improve the performance of spin device 500.
In some embodiments, the fabrication of Heusler alloy and the matching layer is via the use of an in situ processing flow. Here, in situ processing flow refers to a fabricating processing flow that does not break vacuum. As such, oxidation on interface layers 504a/b are avoided resulting in smooth surfaces at interfaces 504a/b.
In some embodiments, First 4-state magnet 203a and the first interface layer 504a overlap the spin channel region 206b more than Second 4-state magnet 203b and second interface layer 504b overlap the second spin channel region. This asymmetry in the overlap sets the direction of spin through channel 206b, in accordance with some embodiments.
Stacks 600 and 620 illustrate a naturally templated magnet using the magnetic structure of some embodiments. A characteristic of templated stacks is that the crystalline growth of a layer is not adversely affected by the crystal symmetry of the underlying layer. Stacks 600 and 620 are a stack of interface layer 502 (e.g., Ag), magnet layer 203a, and interface layer 504a (e.g., Ag). Stack 600 shows matching of Ag with Co2FeAl while stack 620 shows matching of Ag with Co2FeGeGa. Here, there is a 2% difference in crystal periodicity which makes the interface between Ag with Co2FeAl, and Ag with Co2FeGeGa, well matched (e.g., Ag has a crystal periodicity which is matched well with the magnet through in-plane rotation).
In some embodiments, the direction of the injected spins is reverse of the magnet polarity for inverter. The direction of spins in the channel below the two magnets can be the same. For inverter, the spins under the injection magnet is opposite of the injector while for a buffer, the direction is identical, in accordance with some embodiments.
In some embodiments, the spin injection from the 4-state magnets is setup to produce a spin population in the spin interconnect such that a spin current is generated that flows along the channel. Here, spin current in the +x direction is in channel region 206a under the First 4-state Magnet 203a. This spin current is also referred to as the injected spin current (e.g., injected in channel region 206a). The dominant spin current is shown by spin direction 701 in the +x direction while some minority spin 702 in channel 206a points in the −x direction.
In some embodiments, when a negative voltage (e.g., −Vdd) is applied to metal layer 201a and ground is applied to metal layer 201b, then device 700 behaves as a buffer. In this case, if the magnetic orientation ‘M’ of First 4-state Magnet 203a (i.e., the input magnet) is in +x direction (i.e., M=+x), it causes the majority of spins to traverse through channel 206b towards Second 4-state Magnet 203b (i.e., the output magnet). The spins (e.g., majority and minority spins) in channel region 206b are shown by the arrows channel 206b. The magnetic orientation ‘M’ of Second 4-state Magnet 203b is switched to the +x direction (i.e., M=+x) due to spin torque from the received spin current 703 in the +x direction. Spin current 703 is the spin current in channel region 206c under Second 4-state Magnet 206b. As such, the 4-state magnets allow the injected +x direction spin current 701 to be received as spin current 703 in the same direction (i.e., +x direction) at the receiving channel 206c.
In some embodiments, the input magnet 203a dictates the flow of the spin current in channel 206b. This is realized by the asymmetry of First 4-state Magnet 203a overlap with channel 206c. Here, First 4-state Magnet 203a overlaps more with channel 206b than Second 4-state Magnet 203b. In some embodiments, when −Vdd voltage is applied to metal layer 201a, the direction of the spin current in channel 206b is the same as the direction of the spins of First 4-state Magnet 203a. As such, a flow of spin current from First 4-state Magnet 203a to Second 4-state Magnet 203b comprises spins with the polarity of First 4-state Magnet 203a. For the buffer (or non-inverting gate of
Here, spin current in the +y direction is in channel region 206a under First 4-state Magnet 203a. This spin current is also referred to as the injected spin current (e.g., injected in channel region 206a). The dominant spin current is shown by spin direction 801 in the +y direction while minority spin 802 in channel 206a points in the −y direction.
In some embodiments, when a negative voltage (e.g., −Vdd) is applied to metal layer 201a and ground is applied to metal layer 201b, then device 800 behaves as a buffer. In this case, the magnetic orientation ‘M’ of First 4-state Magnet 203a (i.e., input magnet) in the +y direction (i.e., M=+y pointing out of the figure) influences the majority of spins in the +y direction to traverse through channel 206b towards Second 4-state Magnet 203a (i.e., the output magnet). The magnetic orientation ‘M’ of Second 4-state Magnet 203b is switched to the +y direction (i.e., M=+y pointing out of the figure) due to spin torque produced by the received spin current 803 in the +y direction. As such, the 4-state magnets allow the injected +y direction spin current 801 to be received in the same direction (i.e., +y direction) at the receiving channel 206c.
In some embodiments, the input magnet 203a dictates the flow of the spin current in channel 206b. This is realized by the asymmetry of First 4-state Magnet 203a overlap with channel 206c. Here, First 4-state Magnet 203a overlaps more with channel 206b than Second 4-state Magnet 203b. In some embodiments, when −Vdd voltage is applied to metal layer 201a, the direction of the spin current in channel 206b is the same as the direction of the spins of First 4-state Magnet 203a. As such, a flow of spin current from First 4-state Magnet 203a to Second 4-state Magnet 203b comprises spins with polarity of First 4-state Magnet 203a. In this example, the prevalence of majority spin current relative to minority spin current decreases along the channel (i.e., decreases from channel region 206a to channel region 206c). For the buffer (or non-inverting gate of
Here, spin current in the −x direction is injected in channel region 206a. Note, here input magnet 203a is magnetized in the +x direction (i.e., M=+x), the spin under input magnet 203a is in the −x direction, and the spin under channel region 206b is in the −x direction. The dominant spin current is shown by spin direction 901 in the −x direction while some minority spin 902 in channel 206a points in the +x direction. The propagation of the spin current through device 900 depends on the magnetization of First and Second 4-state Magnets 203a/b. The spin current received in channel region 206c is in the −x direction as indicated by majority spin current 903. The prevalence of majority spin current relative to minority spin current decreases along the channel (i.e., decreases from channel region 206a to channel region 206c).
In some embodiments, when a positive voltage (e.g., +Vdd) is applied to metal layer 201a and ground is applied to metal layer 201b, then device 900 behaves as an inverter. In this case, the magnetic orientation of First 4-state Magnet 203a (i.e., the input magnet) is in +x direction causing the majority of spins to traverse through channel 206b towards Second 4-state Magnet 203a (i.e., the output magnet). In some embodiments, the input magnet (203a) dictates the flow of the spin current in channel 206b. This is realized by the asymmetry of the magnet overlap with the channel. For example, First 4-state Magnet 203a overlaps more with channel 206b than Second 4-state Magnet 203a.
In some embodiments, a flow of spin current from First 4-state Magnet 203a to Second 4-state Magnet 203b comprises spins with opposite polarity of First 4-state Magnet 203a (e.g., the ratio of majority spin current relative to minority spin current decreases along the channel from channel region 206a to channel region 206c). In some embodiments, for an inverter, the direction of the injected spins is reverse of the magnet polarity for inverter. For example, the direction of majority spins 901 is in the −x direction while the direction of magnetization of Second Magnet 203b is in the +x direction. In some embodiments, the direction of spins in channel region 206b below the two magnets can be the same for an inverter.
Here, spin current in the −y direction is injected in channel region 206a. The dominant spin current is shown by spin direction 1001 in the −y direction while some minority spin 1002 in channel 206a points in the +y direction. The propagation of the spin current through device 1000 depends on the magnetization of First and Second 4-state Magnets 203a/b.
In some embodiments, when a positive voltage (e.g., +Vdd) is applied to metal layer 201a and ground is applied to metal layer 201b, then device 1000 behaves as an inverter. In this case, the magnetic orientation ‘M’ of First 4-state Magnet 203a (i.e., input magnet) is in the +y direction (i.e., M=+y) causing the majority of spins to traverse through channel 206b towards Second 4-state Magnet 203b (i.e., output magnet). In some embodiments, the input magnet 203a dictates the flow of the spin current in channel 206b. This is realized by the asymmetry of the magnet overlap with the channel. For example, First 4-state Magnet 203a overlaps more with channel 206b than Second 4-state Magnet 203b.
In some embodiments, flow of spin current from First 4-state Magnet 203a to Second 4-state Magnet 203b comprises spins with opposite polarity of First 4-state Magnet 203a. In some embodiments, for an inverter, the direction of the injected spins is reverse of the magnet polarity for inverter. For example, the direction of majority spins in channel region 206c is in the −y direction (as indicated by majority spin current 1003) while the direction of magnetization of First Magnet 203a is in the +y direction. In some embodiments, the direction of spins in channel region 206b below the two magnets can be the same for an inverter.
The 4-state inverter operation can be described with reference to Table 1. In Table 1, the power supply to metal layer 201a is a positive supply +Vdd.
The 4-state buffer operation can be described with reference to Table 2. In Table 2, the power supply to metal layer 201a is a negative supply −Vdd.
Although the blocks in the flowchart with reference to
At block 1201, first metal layer 201a is deposited. In some embodiments, first metal layer 201a is coupled to supply, either +Vdd or −Vdd depending on the desired logic function to be an inverter or buffer. At block 1202, interface layer 522 is deposited over first metal layer 201a. In some embodiments, interface layer 522 is formed of a non-magnetic material (e.g., Ag). At block 1203, a 4-state magnet layer 203 (e.g., before being etched to form input and output magnets 203a/b) is deposited over interface layer 522. In some embodiments, 4-state magnet layer 203 is formed of a material with a sufficiently high anisotropy and sufficiently low saturated magnetization to increase injection of spin currents.
At block 1204, interface layer 504 (before being etched to form interface layers 504a/b) is deposited over 4-state magnet layer 203 such that 4-state magnet layer 203 is sandwiched between the interface layers 504 and 522. In some embodiments, interface layers 504 and 522 are formed of non-magnetic material such that the interface layers and magnet layers 203 together have sufficiently matched atomistic crystalline layers.
In some embodiments, the processes of blocks 1201, 1202, 1203, and 1204 are perform in situ (e.g., the fabrication processes do not break vacuum). As such, oxidization between interfaces of the layers 201, 522, 203, and 504 is avoided (e.g., smooth interface surfaces are achieved). Smooth interface surfaces of the layers 201, 522, 203, and 504 allow for higher spin injection efficiency, according to some embodiments.
In some embodiments, 4-state magnet layer 203 is patterned to form First and Second 4-state Magnets 203a and 203b. This process breaks vacuum. For example, a photoresist material is deposited over interface layer 504 and then etched for forming a patterned photoresist layer, where the pattern indicates future locations of First and Second 4-state Magnets 203a/b. At block 1205, interface layer 504 and 4-state magnet layer 203 are selectively etched using the patterned photoresist to form first and second portions 504a/b of interface layer 504. As such, First and Second 4-state Magnets 203a/b are also formed. The photoresist material is then removed. Any suitable photoresist material may be used.
At block 1206, Spin Channel 206 (e.g., metal layer) is deposited over first and second portions 504a/b of interface layer 504. In some embodiments, Spin Channel 206 is patterned into segments 206a/b/c by photoresist deposition and patterning of the photoresist material. At block 1207, portions of Spin Channel 206 are etched to form segments of Spin Channel 206/a/b/c. In some embodiments, the depth of etching of Spin Channel 206 is adjusted as discussed with reference to
In some embodiments, at block 1209 the etched portions are filled with an insulator (e.g., Oxide 205b). In some embodiments, Oxide 205b is etched to form a via hole which is then filled with a metal to form Via 207 such that it couples Spin Channel 206b at one end of Via 207 as illustrated by block 1210. At block 1211, a second metal layer 201b is deposited over Oxide 205b to make contact with the other end of Via 207. In some embodiments, second metal layer 201b is coupled to a Power supply.
4-State Mirror Operators Using Spin Orbit Effect (SOC)
Some embodiments describe a highly efficient transduction method and associated apparatus for converting spin currents to charge currents and then back to spin currents. In some embodiments, Spin Orbit Coupling (e.g., spin Hall effect) is used for transduction from the 4-state magnet state to charge current and vice versa. Spin Orbit Coupling (SOC) is more efficient switching mechanism for switching magnetization. In some embodiments, charge current via a non-magnetic interconnect carries the signal between input and output magnets rather than spin-polarized current. In some embodiments, the sign of the charge current is determined by the direction of magnetization in the input magnet.
In some embodiments, spin-to-charge conversion is achieved via spin orbit interaction in metallic interfaces (i.e., using Inverse Rashba-Edelstein Effect (IREE) and/or Inverse SHE (ISHE), where a spin current injected from an input magnet produces a charge current.
Table 3 summarizes transduction mechanisms for converting spin current to charge current and charge current to spin current for bulk materials and interfaces.
There are many technical effects of the various embodiments. For example, long distance interconnects are provided which can be used to convey the charge which does not attenuate as spin currents do. This charge is later converted to spin again for logic operations by the spin logic. As such, faster switching speed (e.g., five times faster) and lower switching energy (e.g., 1000 times lower) are observed for signal propagation from the input magnet to the output magnet compared to spin transfer based circuits. Other technical effects will be evident by the various embodiments.
In some embodiments, cross-section 1300 of a SOCL (spin orbit coupling logic) device (also referred to as device 1300) comprises interface 522 of non-magnetic material (also referred to as the template), first 4-state magnet 203a, second 4-state magnet 203b, oxide 205a between first and second 4-state Magnets 203a/b, respectively, interfaces 504a/b over first and second 4-state magnets 203a/b, respectively, non-magnetic interconnect 206a/b/c, oxide 205b over non-magnetic interconnect 206a/b/c, Via 1307, and second metal layer 201b (e.g., ground layer), first layer 1301a/b, and second layers 1302a/b.
Here, interface layers 504a and 504b may be collectively referred to as interface layer 504. First and second 4-state magnets 203a/b are also referred to as first and second 4-state magnets. First 4-state magnet 203a is also referred to as the input 4-state magnet while second 4-state magnet 203b is also referred to as the output magnet. These labels are provided for purposes of describing the various embodiments, but do not change the structure of SOCL device 1300.
In some embodiments, first layers 1301a/b comprise layers of materials exhibiting spin orbit coupling (SOC) such as one of spin Hall effect (SHE). In some embodiments, second layers 1302a/b comprise layers of materials exhibiting inverse spin orbit coupling (ISOC) such as one of inverse spin Hall effect (ISHE) or inverse Rashba-Edelstein effect (IREE). In some embodiments, first layers 1301a/b and second layers 1302a/b comprises a stack of layers with materials exhibiting SHE and IREE (or ISHE) effects, respectively. In some embodiments, first layers 1301a/b and second layers 1302a/b comprise a metal layer, such as a layer of Copper (Cu), Silver (Ag), or Gold (Au), which is coupled to first 4-state magnet 203a via first interface layer 504a. In some embodiments, the metal layer is a non-alloy metal layer.
In some embodiments, interface layer 522 acts as the appropriate template for creating the 4-state ferromagnets 203a/b. In some embodiments, interface layer 522 also comprises layer(s) of a surface alloy, e.g. Bismuth (Bi) on Ag coupled to the metal layer. In some embodiments, the surface alloy is a templating metal layer to provide a template for forming the ferromagnet. In some embodiments, the metal of the metal layer which is directly coupled to first and second magnets 203a/b is a noble metal (e.g., Ag, Cu, or Au) doped with other elements from Group 4d and/or 5d of the Periodic Table.
In some embodiments, the surface alloy is one of: Bismuth-Silver (Bi—Ag), Antimony-Bismuth (Sb—Bi), Antimony-Silver (Sb—Ag), Lead-Nickel (Pb—Ni), Bismuth-Gold (Bi—Au), Lead-Silver (Pb—Ag), Lead-Gold (Pb—Au), Beta-Tantalum (β-Ta); Beta-Tungston (β-W); Platinum (Pt); or Bismuth Telluride (Bi2Te3). In some embodiments, one of the metals of the surface alloy is an alloy of heavy metal or of materials with high SOC strength, where the SOC strength is directly proportional to the fourth power of the atomic number of the metal.
Here, the crystals of Ag and Bi of first layer 201 have lattice mismatch (i.e., the distance between neighboring atoms of Ag and Bi is different). In some embodiments, the surface alloy is formed with surface corrugation resulting from the lattice mismatch, (i.e., the positions of Bi atoms are offset by varying distance from a plane parallel to a crystal plane of the underlying metal). In some embodiments, the surface alloy is a structure not symmetric relative to the mirror inversion defined by a crystal plane. This inversion asymmetry and/or material properties lead to spin-orbit coupling in electrons near the surface (also referred to as the Rashba effect).
In some embodiments, the input 4-state nanomagnets 203a are lattice matched to Ag (e.g., a material which is engineered to have a lattice constant close (e.g., within 3%) to that of Ag). In some embodiments, the direction of the spin polarization is determined by the magnetization direction of input 4-state magnet 203a.
In some embodiments, the material(s) used for forming metal layers 201a/b, Via 1307, and non-magnetic interconnect 206a/b/c is/are the same. For example, Copper (Cu) can be used for forming metal layers 201a/b, Via 1307, and non-magnetic interconnect 206a/b/c. In other embodiments, material(s) used for forming metal layers 201a/b, Via 1307, and non-magnetic interconnect 206a/b/c are different. For example, metal layer 201a/b may be formed of Cu while Via 1307 may be formed of Tungsten (W). Any suitable metal or combination of metals can be used for forming metal layers 201a/b, Via 1307, and non-magnetic interconnect 206a/b/c.
In some embodiments, engineered interfaces (e.g., 504a/b and 522) are formed between the magnets (i.e., first and second 4-state magnets 203a and 203b, respectively). In some embodiments, engineered interfaces 504a/b and 522 are formed of non-magnetic material(s) such that the interface layers and the magnets together have sufficiently matched atomistic crystalline layers. For example, the non-magnetic material has a crystal periodicity which is matched through rotation or by mixing of elements.
Here, sufficiently matched atomistic crystalline layers refer to matching of the lattice constant ‘a’ within a threshold level above which atoms exhibit dislocation which is harmful to the device (for instance, the number and character of dislocations lead to a significant (e.g., greater than 10%) probability of spin flip while an electron traverses the interface layer). For example, the threshold level is within 5% (i.e., threshold levels in the range of 0% to 5% of the relative difference of the lattice constants). As the matching improves (i.e., matching gets closer to perfect matching), spin injection efficiency from spin transfer from first 4-state magnet 203a to first ISHE/ISOC layer 1302a increases. Poor matching (e.g., matching worse than 5%) implies dislocation of atoms that is harmful for the device.
In some embodiments, the non-magnetic material for templates 504a/b and 522 is Ag with a crystal lattice constant a=4.05 A which is matched to the material for the 4-state magnets. As such, the magnetic structure stack (e.g., stack of 504a and 203a) allows for interfacial matching of input 4-state magnet 203a with interface layer 504a and for interfacial matching of output 4-state magnet 203b with interface layer 504b. In some embodiments, the stack also allows for templating of the bottom surface of the input and output magnets 203a/b.
In some embodiments, interface layers 504a/b (e.g., Ag) provide electrical contact to magnets 203a/b, respectively. As such, a template is provided with the right crystal orientation to seed the formation of the magnetic material that forms input and output magnets 203a/b). In some embodiments, the directionality of SOC logic may be set by the geometric asymmetry in SOCL device 1300.
One technical effect of the engineered interface layer 504a (e.g., Ag) between input magnet 203a and layers of SOC 1301a and ISOC 1302a is that it provides for higher mechanical barrier to stop or inhibit the inter-diffusion of magnetic species with SOC 1301a and ISOC 1302a. The same is true for output magnet 203b and layers of SOC 1301b and ISOC 1302b. For instance, the engineered interface layer 504b provides for higher mechanical barrier to stop or inhibit the inter-diffusional of magnetic specifies with SOC 1301b and ISOC 1302b. In some embodiments, the engineered interface layer 504a maintains high spin injection at the interface between SOC layer 1301a, ISOC layer 1302a and input 4-state magnet 203a. In some embodiments, the engineered interface layer 504b maintains high spin injection at the interface between SOC layer 1301b, ISOC layer 1302b and output 4-state magnet 203b. As such, engineered interface layer(s) 504a/b improve the performance of spin device 1300, in accordance with some embodiments.
In some embodiments, a layer of oxide 205b is deposited over non-magnetic interconnect 206a/b/c, SOC layers 1301a/b, ISOC layers 1302a/b, and portions of interface layers 504a/b, and then a via hole is etched for Via 1307. In some embodiments, Via 1307 couples ISOC layer 1302a to ground layer 201b which is formed over Oxide layer 205b.
In some embodiments, the fabrication of first and second 4-state magnets 203a/b and the matching layer is via the use of an in situ processing flow. Here, in situ processing flow refers to a fabricating processing flow that does not break vacuum. As such, oxidation on interfaces 522 and 504a/b are avoided resulting in smooth surfaces at interfaces 522 and 504a/b. In some embodiments, the process of fabricating SOCL device 1300 allows for templating of 4-state magnets 203a/b for appropriate crystal structure.
In some embodiments, a drive current Idrive (or charge current) is provided to channel 206a and depending on the voltage on the power interconnect 201a, SOCL device 1300 behaves as a mirror gate. In some embodiments, drive charge current Idrive is converted into spin current Is by SHE/SOC layer 1301a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current Ic, the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, when the spin current Is flows through the 2D (two dimensional) electron gas between Bi and Ag in ISHE/ISOC layer 1302a with high SOC, charge current Ic is generated. In some embodiments, the interface surface alloy of BiAg2/PbAg2 of ISHE/ISOC layer 1302a comprises a high density 2D electron gas with high Rashba SOC. The spin orbit mechanism responsible for spin-to-charge conversion is described by Rashba effect in 2D electron gases. In some embodiments, 2D electron gases are formed between Bi and Ag, and when current flows through the 2D electron gases, it becomes a 2D spin gas because as charge flows, electrons get polarized.
The Hamiltonian energy HR of the SOC electrons in the 2D electron gas corresponding to the Rashba effect is expressed as:
HR=αR(k×{circumflex over (z)})·{grave over (σ)} (3)
where αR is the Rashba coefficient, ‘k’ is the operator of momentum of electrons, {circumflex over (z)} is a unit vector perpendicular to the 2D electron gas, and {grave over (σ)} is the operator of spin of electrons.
The spin polarized electrons with direction of polarization in-plane (in the xy-plane) experience an effective magnetic field dependent on the spin direction which is given as:
where μB is the Bohr magneton.
This results in the generation of a charge current in interconnect 206b proportional to the spin current Is. The spin orbit interaction at the Ag/Bi interface (i.e., the Inverse Rashba-Edelstein Effect (IREE)) produces a charge current Ic in the horizontal direction which is expressed as:
where wm is width of the input 4-state magnet 203a, and λIREE is the TREE constant (with units of length) proportional to αR.
The IREE effect produces spin-to-charge current conversion around 0.1 with existing materials at 10 nm (nanometers) magnet width. For scaled nanomagnets (e.g., 5 nm width) and exploratory SHE materials such as Bi2Se3, the spin-to-charge conversion efficiency can be between 1 and 2.5, in accordance with some embodiments. The net conversion of the drive charge current Id to magnetization dependent charge current is:
where P is the spin polarization.
The charge current Ic then propagates through the non-magnetic interconnect 206a coupled to ISHE/ISOC layer 1302a. In some embodiments, charge current Ic conducts through non-magnetic interconnect 206a without loss to another transducer (e.g., SHE/SOC layer 1301b). In some embodiments, the SHE from SHE/SOC layer 1301b generates a torque on output 4-state magnet 203b which is much more efficient per unit charge than spin-transfer torque (STT). Positive charge currents (e.g., currents flowing in the +y direction) produce a spin injection current with transport direction along the +z direction and spins pointing to the +x direction in SHE/SOC layer 1301b. The injected spin current in-turn produces spin torque to align the free output 4-state magnet 203 (coupled to the SHE material) in the +x or −x directions.
In some embodiments, SHE/SOC layer 1301b is formed of materials that exhibit direct SHE. In some embodiments, SHE/SOC layer 1301b is formed of materials that exhibit SOC. In some embodiments, SHE/SOC layer 1301b is formed of the same material as ISHE/ISOC layer 1302a. In some embodiments, SHE/SOC layer 1301b is formed of a different material than the material for forming ISHE/ISOC layer 1302a. In some embodiments, SHE/SOC layer 1301b comprises of one or more of: β-Ta, β-W, W, Pt, Cu doped with Iridium, Cu doped with Bismuth, or Cu doped with an element(s) of Group 3d, 4d, 5d, 4f, or 5f of the Periodic Table.
In some embodiments, SOCL device 1300 is operable to function as a mirror gate. In some embodiments, the charge current Ic in interconnect 206b is converted by SHE/SOC layer 1301b by SOC or SHE to spin current in second 4-state magnet 203b such that the effective magnetic field on second 4-state magnet 203b aligns its magnetization to be parallel to the magnetization of first 4-state magnet 203a. As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a.
The transient spin dynamics and transport of SOCL device 1300 can be simulated using vector spin circuit models coupled with nanomagnets dynamics. As such, the operation of SOCL device 1300 can be verified using multi-physics simulation which treats the nanomagnets as single magnetic moments and uses spin circuit theory to calculate the scalar voltage and vector spin voltages.
The dynamics of nanomagnets can be described by Landau-Lifshitz-Gilbert (LLG) equations:
Here, Īs1 and Īs2 are the projections perpendicular to magnetizations of the spin polarized currents entering the two free nanomagnets—First and Second 4-state Magnet layers 203a and 203b, respectively. These projections are derived from the spin-circuit analysis. The effective magnetic field Heff originating from the shape and material anisotropy, and the Gilbert damping constant ‘a’ are the properties of the magnets. The spin currents are obtained from a vector transport model for the magnetic stack. Here, m1 and m2 are magnetization vectors of the first and second 4-state magnet layers 203a and 203b, respectively, Ns is the number of spins in each of first and second magnet layers 203a and 203b, respectively. In some embodiments, the spin equivalent circuit comprises a tensor spin conduction matrix governed by the present conduction of the magnet. In one embodiment, a self-consistent stochastic solver is used to account for thermal noise of the magnets.
In some embodiments, the spin current from second 4-state magnet 203b is converted into charge current by ISHE/ISOC layer 1302b just as spin current from first 4-state magnet 203a is converted into charge current by ISHE/ISOC layer 1302a. The charge current from ISHE/ISOC layer 1302b is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments. As such, SOCL device 1300 is operable to couple with other SOCL devices (not shown) through conductors 206a and 206c.
One reason for coupling ISOC layer 1302a and SOC layer 1301a to input 4-state magnet 203a such that ISOC layer 1302a and SOC layer 1301a are separated from one another is to provide one-way flow of current/charge, in accordance with some embodiments. One-way flow of current/charge ensures that there is no current flowing in a backward direction so as switch the previous magnets (not shown) in the current path. In some embodiments, 4-state magnets 203a/b have higher resistance than the resistance of non-magnetic channels (e.g., hundred times more resistance than channel resistance), and that resistance difference provides for one-way current/charge path.
Compared to
Here, top view 1500 shows the conduction paths for the ‘x’ and ‘y’ charge currents which are proportional to the spin currents along the ‘x’ direction and the ‘y’ direction, respectively. These currents originate from ISHE/ISOC layer 1302a and are injected into interconnects 206b and 1401a. The ‘x’ component of the current Ic2=−A({right arrow over (m)}·{circumflex over (x)}) passes through interconnect 1401a and 206d, while the ‘y’ component of the current Ic1=A({right arrow over (m)}·ŷ) passes through interconnect 206b. The currents are effectively added in SHE/SOC layer 1301b, in accordance with some embodiments. In some embodiments, depending on the supply voltage (not shown) on metal layer 201a and the magnetization direction (not shown) of the 4-state input magnet 203a, the directions and magnitudes of currents Ic1 and Ic2 are determined.
Table 4 below shows the magnetization of the input and output magnets for SOCL device when configured as a mirror x gate. In Table 4, the power supply to metal layer 201a is a negative supply −Vdd.
When a negative power supply is applied to 201a (e.g., supply is set to −Vdd), the 4-state SOCL device is configured as a mirror x, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘0’ direction (e.g., +x direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301b by SOC or SHE to spin current in second 4-state magnet 203b such that the effective magnetic field on second 4-state magnet 203b aligns its magnetization to be parallel to the magnetization of first 4-state magnet 203a. In this case, the magnetization of second 4-state magnet 203b is ‘3’ (i.e., opposite to the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302b is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a negative power supply (−Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the ‘0’ direction, then no current flows through interconnect 206b (i.e., the ‘y’ current component is zero, Ia=0) while the ‘x’ current component flows through interconnect 1401a though 206d and 1401b to SHE/SOC layer 1301b, where the ‘x’ current component in interconnect 206d is Ia=−A({right arrow over (m)}·{circumflex over (x)}). This current component Ia is converted into spin current by SHE/SOC layer 1301b, and this spin current causes the magnetization of 4-state second magnet 203b to be aligned in the ‘3’ direction.
When negative power supply is applied to 201a (e.g., supply is set to −Vdd), the 4-state SOCL device 1400 is configured as a mirror x, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘1’ direction (e.g., +y direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301b by SOC or SHE to spin current in second 4-state magnet 203b such that the effective magnetic field on second 4-state magnet 203b aligns its magnetization to be parallel to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203b is ‘1’ (i.e., the same as the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302b is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
When a negative power supply (−Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the ‘1’ direction, then no current flows through interconnect 206d (i.e., the ‘x’ current component is zero, Ic1=0) while the ‘y’ current component flows through interconnect 206b to SHE/SOC layer 1301b, where the ‘y’ current component in interconnect 206b is Ic1=A({right arrow over (m)}·ŷ). This current component Ic1 is converted into spin current by SHE/SOC layer 1301b, and the spin current causes the magnetization of 4-state second magnet 203b to be aligned in the ‘1’ direction.
When a negative power supply is applied to 201a (e.g., supply is set to −Vdd), the 4-state SOCL device 1400 is configured as a mirror x, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘3’ direction (e.g., −x direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301b by SOC or SHE to spin current in second 4-state magnet 203b such that the effective magnetic field on second 4-state magnet 203b aligns its magnetization to be parallel to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203b is ‘0’ (i.e., opposite to the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302b is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a negative power supply (−Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in direction ‘3’, then no current flows through interconnect 206b (i.e., the ‘y’ current component is zero, Ia=0) while the ‘x’ current component flows through interconnect 1401a though 206d and 1401b to SHE/SOC layer 1301b, where the ‘x’ current component in interconnect 206d is Ic1=−A({right arrow over (m)}·{circumflex over (x)}). Note, the direction of Ic1 is opposite of the direction of Ic1 in
When negative power supply is applied to 201a (e.g., supply is set to −Vdd), the 4-state SOCL device is configured as a mirror x, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to direction ‘2’ (e.g., −y direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301b by SOC or SHE to spin current in second 4-state magnet 203b such that the effective magnetic field on second 4-state magnet 203b aligns its magnetization to be parallel to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203b is ‘2’ (i.e., the same as the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302b is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a negative power supply (−Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the ‘2’ direction, then no current flows through interconnect 206b (i.e., the ‘x’ current component is zero, Ia=0) while the ‘y’ current component flows through interconnect 206d to SHE/SOC layer 1301b, where the ‘y’ current component in interconnect 206b is Ic1=A({right arrow over (m)}·ŷ). Note, the direction of Ic1 is opposite of the direction of Ic1 in
In Table 5, the power supply to metal layer 201a is a positive supply +Vdd. Note that the same logical functionality can be achieved by rotating the device by 90 degrees and setting a negative supply −Vdd.
When a positive power supply is applied to 201a (e.g., supply is set to +Vdd), 4-state SOCL device 1400 is configured as a mirror y, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘0’ direction (e.g., +x direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301b by SOC or SHE to spin current in second 4-state magnet 203b such that the effective magnetic field on second 4-state magnet 203b aligns its magnetization to be parallel, but opposite, to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203b is ‘0’ (i.e., the same as the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302b is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
In this case, the magnetization of First Magnet 203a is set to ‘1’ direction (e.g., +y direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301b by SOC or SHE to spin current in second 4-state magnet 203b such that the effective magnetic field on second 4-state magnet 203b aligns its magnetization to be parallel, but opposite, to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203b is ‘2’ (i.e., the parallel but opposite as the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302b is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a positive power supply (+Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the ‘y’ direction, then no current flows through interconnect 206b (i.e., the ‘x’ current component is zero, Ia=0) while the ‘y’ current component flows through interconnect 206b to SHE/SOC layer 1301b, where the ‘y’ current component in interconnect 206b is Ic1=−A({right arrow over (m)}·ŷ). Note, the direction of Ic1 is opposite to the direction of Ic1 of
When a positive power supply is applied to 201a (e.g., supply is set to +Vdd), the 4-state SOCL device is configured as a mirror y, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘2’ direction (e.g., −y direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. In some embodiments, the charge current Ic is converted by ISHE/ISOC layer 1301a by SOC or SHE to spin current in second 4-state magnet 203b such that the effective magnetic field on second 4-state magnet 203b aligns its magnetization to be parallel, but opposite, to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203b is ‘1’ (i.e., the parallel but opposite as the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302b is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a positive power supply (+Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the −y direction, then no current flows through interconnect 206b (i.e., the ‘x’ current component is zero, Ia=0) while the ‘y’ current component flows through interconnect 206b to SHE/SOC layer 1301b, where the ‘y’ current component in interconnect 206b is Ic1=−A({right arrow over (m)}·ŷ). Note, the direction of Ic1 is opposite to the direction of Ic1 of
The current component Ic1 is converted into spin current by ISHE/ISOC layer 1301b, and this spin current causes the magnetization of 4-state second magnet 203b to be aligned in the ‘1’ direction (i.e., +y direction).
When a positive power supply is applied to 201a (e.g., supply is set to +Vdd), 4-state SOCL device 1400 is configured as a mirror y, in accordance with some embodiments.
In this case, the magnetization of First Magnet 203a is set to ‘3’ direction (e.g., −x direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301a by SOC or SHE to spin current in second 4-state magnet 203b such that the effective magnetic field on second 4-state magnet 203b aligns its magnetization to be parallel, but opposite, to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203b is ‘3’ (i.e., the same as the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302b is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a positive power supply (+Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the −x direction, then no current flows through interconnect 206b (i.e., the ‘y’ current component is zero, Ic1=0) while the ‘x’ current component flows through interconnect 206d to SHE/SOC layer 1301b, where the ‘x’ current component in interconnect 206d is Ia=A({right arrow over (m)}·{circumflex over (x)}). Note, the direction of Ia is opposite to the direction of Ic1 of
4-State Quaternary Cyclic, Half Complement and 1.5-Complement Logic Gate Using Spin Orbit Effect (SOC)
For Galois field-4 (GF04) algebra to form a complete logic family, half order and 1.5 order complements are required, where the term “order”, r, (also known as ‘radix’) refers to the number of elements in GF04. These two operations constitute a +90 degree rotation and −90 degree geometric rotations of the state of the digital element (e.g. direction of magnetization), respectively. These logic functions are related (but not equivalent) to the cyclic operations in the space of m=‘0’, ‘1’, ‘2’, ‘3’. Clockwise cyclic+k operations are defined as m′=mod(m+k, r). Counterclockwise cyclic−k operations are defined as m′=mod(m−k, r). It should be emphasized that ‘clockwise’ and ‘counterclockwise’ in this context do not refer to geometrical rotations of magnetization.
Compared to
In some embodiments, SHE/SOC 1301c is coupled to a template layer 504c which in turn is coupled to second 4-state magnet 203c. For example, SHE/SOC 1301c is coupled to one end of template layer 504c. The materials for template layer 504c are selected from the same materials described with reference to template layer 504a, and the materials for second 4-state magnet 203c are selected from the same materials described with reference to second 4-state magnet 203b. In some embodiments, templating layer 522 is coupled to (or adjacent to) second 4-state magnet 203b. In some embodiments, power rail 201a is coupled to templating layer 522. In some embodiments, ISHE/ISOC 1302c is coupled to another end of template layer 504c. In some embodiments, an output interconnect 206c is coupled to ISHE/ISOC 1302c and is used for coupling to another device. Interconnect 206b/d are used for transportation of ‘y’ and ‘x’ charge currents. Cross-sections AA, BB, CC, and DD are shown in
Here, top view 2500 shows the conduction paths for the ‘x’ and ‘y’ charge currents which are proportional to the spin currents along ‘x’ direction and ‘y’ direction, respectively. These currents originate from ISHE/ISOC layer 1302a and are injected into interconnects 206b and 1401a. The ‘x’ component of the current Ic2=A({right arrow over (m)}·{circumflex over (x)}) passes through interconnect 1401a and 206d, while the ‘y’ component of the current Ic1=−A({right arrow over (m)}·ŷ) passes through interconnect 206b, provided that positive supply voltage +Vdd is applied to the layer 201a. The currents are effectively added in SHE/SOC layer 1301c in accordance with some embodiments. In some embodiments, depending on the supply voltage on 201a and the magnetization of the 4-state input magnet 203a, the directions and magnitudes of currents Ic1 and Ic2 are determined.
Table 6a/b below shows the magnetization of the input and output magnets for the quaternary 1.5 complement logic gate and for the SOCL device when configured as a ccw cyclic−1 gate. The logical function of 1.5 complement is obtained by cascading the ccw cyclic−1 gate and the mirror y gate.
When positive power supply is applied to 201a (e.g., supply is set to +Vdd), 4-state SOCL device 2400 is configured as a quaternary ccw cyclic−1 logic gate, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘0’ direction (e.g., +x direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. For example, the current may be directed to second 4-state magnet 203c via interconnects 206b and 1401b, and/or via interconnects 1401a and 206d. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301c by SOC or SHE to spin current in second 4-state magnet 203c such that the effective magnetic field on second 4-state magnet 203c aligns its magnetization to be orthogonal to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203c is ‘1’ (i.e., orthogonal to the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302c is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a positive power supply (+Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the +x direction, then no current flows through interconnect 206b (i.e., the ‘y’ current component is zero, Ic1=0) while the ‘x’ current component flows through interconnect 206d to ISHE/ISOC layer 1302c, where the ‘x’ current component in interconnect 206d is Ia=A({right arrow over (m)}·{circumflex over (x)}). The current component Ia is converted into spin current by SHE/SOC layer 1301c, and this spin current causes the magnetization of 4-state second magnet 203c to be aligned in the ‘1’ direction (i.e., +y direction).
When a positive power supply is applied to 201a (e.g., supply is set to +Vdd), the 4-state SOCL device is configured as a quaternary ccw cyclic−1 logic gate, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘1’ direction (e.g., +y direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. For example, the current may be directed to second 4-state magnet 203c via interconnects 206b and 1401b, and/or via interconnects 1401a and 206d. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301c by SOC or SHE to spin current in second 4-state magnet 203c such that the effective magnetic field on second 4-state magnet 203c aligns its magnetization to be orthogonal to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203c is ‘0’ (i.e., orthogonal to the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302c is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a positive power supply (+Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the +y direction, then no current flows through interconnect 206d (i.e., the ‘x’ current component is zero, Ia=0) while the ‘y’ current component flows through interconnect 206b to ISHE/ISOC layer 1302c, where the ‘y’ current component in interconnect 206b is Ic1=−A({right arrow over (m)}·ŷ). The current component Ic1 is converted into spin current by SHE/SOC layer 1301c, and this spin current causes the magnetization of 4-state second magnet 203c to be aligned in the ‘0’ direction (i.e., +x direction).
When a positive power supply is applied to 201a (e.g., supply is set to +Vdd), the 4-state SOCL device is configured as a quaternary ccw cyclic−1 logic gate, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘3’ direction (e.g., −x direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. For example, the current may be directed to second 4-state magnet 203c via interconnects 206b and 1401b, and/or via interconnects 1401a and 206d. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301c by SOC or SHE to spin current in second 4-state magnet 203c such that the effective magnetic field on second 4-state magnet 203c aligns its magnetization to be orthogonal to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203c is ‘2’ (i.e., orthogonal to the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302c is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a positive power supply (+Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the −x direction, then no current flows through interconnect 206b (i.e., the ‘y’ current component is zero, Ic1=0) while the ‘x’ current component flows through interconnect 206b to SHE/SOC layer 1301c, where the ‘x’ current component in interconnect 206d is Ic2=A({right arrow over (m)}·{circumflex over (x)}). Here, the current component Ia is converted into spin current by SHE/SOC layer 1301c, and this spin current causes the magnetization of 4-state second magnet 203c to be aligned in the ‘2’ direction (i.e., −y direction).
When positive power supply is applied to 201a (e.g., supply is set to +Vdd), the 4-state SOCL device 2400 is configured as a quaternary ccw cyclic−1 logic gate, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘2’ direction (e.g., −y direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. For example, the current may be directed to second 4-state magnet 203c via interconnects 206b and 1401b, and/or via interconnects 1401a and 206d. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301c by SOC or SHE to spin current in second 4-state magnet 203c such that the effective magnetic field on second 4-state magnet 203c aligns its magnetization to be orthogonal to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203c is ‘3’ (i.e., orthogonal to the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302c is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a positive power supply (+Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the −y direction, then no current flows through interconnect 206d (i.e., the ‘x’ current component is zero, Ia=0) while the ‘y’ current component flows through interconnect 206b to ISHE/ISOC layer 1302b, where the ‘y’ current component in interconnect 206d is Ic1=−A({right arrow over (m)}·ŷ). The current component Ic1 is converted into spin current by SHE/SOC layer 1301c, and this spin current causes the magnetization of 4-state second magnet 203c to be aligned in the ‘3’ direction (i.e., −x direction).
Table 7a/b below shows the magnetization of the input and output magnets for the quaternary 1.5 complement logic gate and for the SOCL device when configured as a cw cyclic+2 gate. The logical function of half complement is obtained by cascading the cw cyclic+2 gate and the mirror y gate.
When a negative power supply is applied to 201a (e.g., supply is set to −Vdd), the 4-state SOCL device 2400 is configured as a quaternary cw cyclic+2 logic gate, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘0’ direction (e.g., +x direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In some embodiments, depending on the applied supply voltage and the magnetization of first 4-state magnet 203a, the charge current Ic is provided to interconnect 206b, 1401a, 206d, and/or 1401b. For example, the current may be directed to second 4-state magnet 203c via interconnects 206b and 1401b, and/or via interconnects 1401a and 206d. In some embodiments, the charge current Ic is converted by SHE/SOC layer 1301c by SOC or SHE to spin current in second 4-state magnet 203c such that the effective magnetic field on second 4-state magnet 203c aligns its magnetization to be orthogonal to the magnetization of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203c is ‘2’ (i.e., orthogonal to the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302c is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
As discussed with reference to
When a negative power supply (−Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the +x direction (i.e., direction ‘0’), then no current flows through interconnect 206b (i.e., the ‘y’ current component is zero, Ic1=0) while the ‘x’ current component flows through interconnect 206d to SHE/SOC layer 130′c, where the ‘x’ current component in interconnect 206d is Ia=−A({right arrow over (m)}·{circumflex over (x)}). Here, the negative sign to current Ia indicates the sign of the current relative to Ic2 of
When a negative power supply is applied to 201a (e.g., supply is set to −Vdd), the 4-state SOCL device 2400 is configured as a quaternary cw cyclic+2 logic gate, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘1’ direction (e.g., +y direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203c is ‘3’ (i.e., orthogonal to the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302c is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
When a negative power supply (−Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the +y direction (i.e., direction ‘1’), then no current flows through interconnect 206d (i.e., the ‘x’ current component is zero, Ia=0) while the ‘y’ current component flows through interconnect 206d to SHE/SOC layer 1301c, where the ‘y’ current component in interconnect 206b is Ic1=A({right arrow over (m)}·ŷ). The current component Ic1 is converted into spin current by SHE/SOC layer 1301c, and this spin current causes the magnetization of 4-state second magnet 203c to be aligned in the ‘3’ direction (i.e., −x direction).
When a negative power supply is applied to 201a (e.g., supply is set to −Vdd), the 4-state SOCL device is configured as a quaternary cw cyclic+2 logic gate, in accordance with some embodiments. In this case, the magnetization of First Magnet 203a is set to ‘3’ direction (e.g., −x direction) as shown. In some embodiments, input charge current Ic in interconnect 206a is converted by SHE/SOC layer 1301a by SOC or SHE to spin current Is in first 4-state magnet 203a. The spin current Is is then received by ISHE/ISOC layer 1302a which converts the spin polarized current Is to corresponding charge current the sign of which is determined by the magnetization direction of first 4-state magnet 203a.
In this case, the magnetization of second 4-state magnet 203c is ‘1’ (i.e., orthogonal to the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302c is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
When a negative power supply (−Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the −x direction (i.e., direction ‘3’), then no current flows through interconnect 206b (i.e., the ‘y’ current component is zero, Ic1=0) while the ‘x’ current component flows through interconnect 206d to SHE/SOC layer 1301c, where the ‘x’ current component in interconnect 206d is Ia=−A({right arrow over (m)}·{circumflex over (x)}). The current component Ia is converted into spin current by SHE/SOC layer 1301c, and this spin current causes the magnetization of 4-state second magnet 203c to be aligned in the ‘1’ direction (i.e., −y direction).
In this case, the magnetization of second 4-state magnet 203c is ‘0’ (i.e., orthogonal to the magnetization of the first 4-state magnet 203a). As such, the direction of Ic is determined by the magnetization of input 4-state magnet 203a and the applied voltage on power rail 201a. In some embodiments, the charge current from ISHE/ISOC layer 1302c is provided to interconnect (or channel) 206c and propagated to another device for further processing, in accordance with some embodiments.
When a negative power supply (−Vdd) is applied to power rail 201a, and the magnetization of the 4-state input magnet 203a is aligned in the −y direction (i.e., direction ‘2’), then no current flows through interconnect 206d (i.e., the ‘x’ current component is zero, Ia=0) while the ‘y’ current component flows through interconnect 206b to SHE/SOC layer 1302c, where the ‘y’ current component in interconnect 206d is Ic1=A({right arrow over (m)}·ŷ). Here, the negative sign to current Ic1 indicates the sign of the current relative to Ic1 of
Quaternary Upper Threshold ASL Gate
Upper and lower threshold gates are required to form a complete logic family in GF04 algebra. These gates function as logic comparators setting the value of the output to upper or lower threshold values, in accordance with some embodiments.
In some embodiments, to form a logic family in quaternary logic the following logic gates are formed—min-gate, max-gate, and window literal gate. In some embodiments, the window literal gate further comprises upper threshold gates and lower threshold gates. Quaternary threshold gates are a set of four gates defined for detecting and/or resolving each threshold values (e.g., 0, 1, 2, and 3 for a 4-state magnet based logic gate), in accordance with some embodiments. In some embodiments, the Quaternary threshold gates are formed using an All Spin Logic (ASL) device which is based on ASL device 1100 of
In some embodiments, interconnect 3401 is provided which is coupled to (or positioned adjacent to) via 207 such that interconnect 3401 is orthogonal to interconnect 206b. In some embodiments, interconnect 3401 is formed of the same material as interconnect 206b. In some embodiments, interconnect 3401 is formed of any non-magnetic conducting material. In some embodiments, one end of interconnect 3401 is coupled to via 207 while another end of interconnect 3401 is coupled to interconnect 3406b. In some embodiments, interconnect 3401 and interconnect 3406b are orthogonal to one another such that interconnect 3406b is parallel to interconnect 206b. In some embodiments, interconnect 3406b is formed of the same material as interconnect 206b.
In some embodiments, template layer 3404b is coupled to (or adjacent to) interconnect 3406b. Template layer 3404b is formed of the same material as template material 504a and has the same function as template layer 504a (e.g., to template third magnet 3403c). In some embodiments, third magnet 3403c is coupled to (or adjacent to) template layer 3404b. In some embodiments, third magnet 3403c is a fixed magnet (or pinned magnet).
In some embodiments, the magnetization of third magnet 3403c sets the threshold of quaternary upper threshold logic gate. As such, for each threshold logic gate, a unique magnetization is set for third magnet 3403c, in accordance with some embodiments. In some embodiments, another templating layer 522 is coupled to third magnet 3403c. In some embodiments, supply rail 201b is coupled to templating layer 522 (which is coupled to magnet 3403c). In some embodiments, ground supply is provided to interconnect 201b while power supply (positive or negative) is provided to interconnect 201a.
Table 8 below shows the truth table of the of quaternary upper threshold logic gates (Gate 0, Gate 1, Gate 2, and Gate 3).
ASL device 3900 forms quaternary upper threshold logic Gate 1 of Table 8, according to some embodiments. ASL device 3900 is a top-view of ASL device 3400 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a, output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 3403c is a fixed magnet having a magnetization in the −x direction (or along state ‘3’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is along direction ‘0’ (i.e., +x direction).
ASL device 4000 forms quaternary upper threshold logic Gate 1 of Table 8, according to some embodiments. ASL device 4000 is a top-view of ASL device 3400 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘1’ (i.e., along +y axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 3403c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when input spin current in the −x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is along direction ‘3’ (i.e., −x direction).
In some embodiments, ASL device 4000 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 4000, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, the direction of magnetization of output magnet 3403b is in the direction ‘3’ (i.e., −x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘1’).
ASL device 4100 forms quaternary upper threshold logic Gate 1 of Table 8, according to some embodiments. ASL device 4100 is a top-view of ASL device 3400 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘2’ (i.e., along −y axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 3403c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘3’ (i.e., −x direction).
In some embodiments, ASL device 4100 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 4100, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 3403b is in the direction ‘3’ (i.e., −x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘2’).
ASL device 4200 forms quaternary upper threshold logic Gate 1 of Table 8, according to some embodiments. ASL device 4200 is a top-view of ASL device 3400 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘3’ (i.e., along −x axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 3403c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘3’ (i.e., −x direction).
In some embodiments, ASL device 4200 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 4200, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 3403b is in the direction ‘3’ (i.e., −x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘3’).
Compared to
In some embodiments, tilted magnet 4303 is tilted at 45° (or substantially at 45°) relative to input magnet 203a and output magnet 3403b to differentiate between the logic states (0,1) and (2,3). In some embodiments, tilted magnet 4303 forms an intermediate stage which uses a bi-stable magnet with uniaxial anisotropy or shape anisotropy. In some embodiments, tilted magnet 4303 is a 2-axis free magnet comprising a material selected from a group consisting of: Fe, Ni, Co and their alloys, magnetic insulators, and Heusler alloys of the form X2YZ. In some embodiments, tilted magnet 4303 can have two possible states—one along the +45° (e.g., in the first quadrant of an xy plane) and another along the +45° (e.g., in the third quadrant of an xy plane). In some embodiments, the injected spin current from input magnet 203a switches the intermediate state magnet 4304 to x+y vector direction or −x-y vector direction which is then resolved to +/−x direction by output magnet 3403b.
While the embodiments of
In some embodiments, when interconnect 201a of device 4300 is coupled to a positive power supply and when spin current is injected into input 4-state magnet 203a with magnetization in direction ‘0’, tilted magnet 4303 develops a magnetization along the −45° (as opposed to +45° shown in
In some embodiments, when interconnect 201a of device 4300 is coupled to a positive power supply and when spin current is injected into input 4-state magnet 203a with magnetization in direction ‘1’, tilted magnet 4303 develops a magnetization along the −45° (as opposed to +45° shown in
In some embodiments, when interconnect 201a of device 4300 is coupled to a positive power supply and when spin current is injected into input 4-state magnet 203a with magnetization in direction ‘2’, tilted magnet 4303 develops a magnetization along the +45° (as opposed to −45° shown in
In some embodiments, when interconnect 201a of device 4300 is coupled to a positive power supply and when spin current is injected into input 4-state magnet 203a with magnetization in direction ‘3’, tilted magnet 4303 develops a magnetization along the +45° (as opposed to −45° shown in
ASL device 4900 forms quaternary upper threshold logic Gate 3 of Table 8, according to some embodiments. ASL device 4900 is a top-view of ASL device 4800 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a, output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 4803c is a fixed magnet having a magnetization in the +x direction (or along magnetization state ‘0’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is along direction ‘0’ (i.e., +x direction).
ASL device 5000 forms quaternary upper threshold logic Gate 3 of Table 8, according to some embodiments. ASL device 5000 is a top-view of ASL device 4800 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘1’ (i.e., along +y axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 4803c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 5000 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 5000, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, the direction of magnetization of output magnet 3403b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘1’).
ASL device 5100 forms quaternary upper threshold logic Gate 3 of Table 8, according to some embodiments. ASL device 5100 is a top-view of ASL device 4800 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘2’ (i.e., along −y axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 4803c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 5100 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 5100, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, the direction of magnetization of output magnet 3403b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘2’).
ASL device 5200 forms quaternary upper threshold logic Gate 3 of Table 8, according to some embodiments. ASL device 5200 is a top-view of ASL device 4800 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘3’ (i.e., along −x axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 4803c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘3’ (i.e., −x direction).
In some embodiments, ASL device 5200 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 5200, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, the direction of magnetization of output magnet 3403b is in the direction ‘3’ (i.e., −x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘3’).
ASL device 5300 forms quaternary upper threshold logic Gate 3 of Table 8, according to some embodiments. ASL device 5300 is a top-view of ASL device 4800 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a, output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 4803c is a fixed magnet having a magnetization in the +x direction (or along state ‘0’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is along direction ‘3’ (i.e., −x direction).
ASL device 5400 forms quaternary upper threshold logic Gate 3 of Table 8, according to some embodiments. ASL device 5400 is a top-view of ASL device 4800 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘1’ (i.e., along +y axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 4803c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘3’ (i.e., −x direction).
In some embodiments, ASL device 5400 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 5400, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 3403b is in the direction ‘3’ (i.e., −x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘1’).
ASL device 5500 forms quaternary upper threshold logic Gate 3 of Table 8, according to some embodiments. ASL device 5500 is a top-view of ASL device 4800 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘2’ (i.e., along −y axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 4803c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘3’ (i.e., −x direction).
In some embodiments, ASL device 5500 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 5500, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 3403b is in the direction ‘3’ (i.e., −x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘2’).
ASL device 5600 forms quaternary upper threshold logic Gate 3 of Table 8, according to some embodiments. ASL device 5600 is a top-view of ASL device 4800 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘3’ (i.e., along −x axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 4803c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 5600 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 5600, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 3403b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘3’).
ASL device 5700 forms quaternary upper threshold logic Gate 1 of Table 8, according to some embodiments. ASL device 5700 is a top-view of ASL device 3400 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a, output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 3403c is a fixed magnet having a magnetization in the −x direction (or along state ‘3’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is along direction ‘0’ (i.e., +x direction).
ASL device 5800 forms quaternary upper threshold logic Gate 1 of Table 8, according to some embodiments. ASL device 5800 is a top-view of ASL device 3400 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘1’ (i.e., along +y axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 3403c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 5800 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 5800, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, the direction of magnetization of output magnet 3403b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘1’).
ASL device 5900 forms quaternary upper threshold logic Gate 1 of Table 8, according to some embodiments. ASL device 5900 is a top-view of ASL device 3400 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘2’ (i.e., along −y axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 3403c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 5900 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 5900, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 3403b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘2’).
ASL device 6000 forms quaternary upper threshold logic Gate 1 of Table 8, according to some embodiments. ASL device 6000 is a top-view of ASL device 3400 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘3’ (i.e., along −x axis), output magnet 3403b is a biaxial (2-state or bi-stable magnet), and reference magnet 3403c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when input spin current arrives at input 4-state magnet 203a, the magnetization of output magnet 3403b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 6000 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 6000, output magnet 3403b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, the direction of magnetization of output magnet 3403b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘3’).
Quaternary Lower Threshold Gate
Table 9 below shows the truth table of quaternary lower threshold logic gates (i.e., Gate 0, Gate 1, Gate 2, and Gate 3).
In some embodiments, power supply interconnect 201a is split into interconnect 201a and interconnect 201c. In some embodiments, interconnect 201a is coupled to template layer 522a. In some embodiments, template layer 522a is coupled to 4-state free magnet 203a. Template layer 522a is formed of the same material as template material 522 and has the same function as template layer 522 (e.g., to template first magnet 203a). In some embodiments, interconnect 201a is coupled to a positive power supply +Vdd.
In some embodiments, interconnect 201c is coupled to template layer 522c. In some embodiments, template layer 522c is coupled to 2-axis free magnet 6103b. Template layer 522c is formed of the same material as template material 522 and has the same function as template layer 522 (e.g., to template 2-axis free magnet 6103b). In some embodiments, interconnect 201c is coupled to a negative power supply −Vdd.
In some embodiments, interconnect 3401 is provided which is coupled to (or positioned adjacent to) via 207 such that interconnect 3401 is orthogonal to interconnect 206b.
In some embodiments, interconnect 3401 is formed of the same material as interconnect 206b. In some embodiments, interconnect 3401 is formed of any non-magnetic conducting material. In some embodiments, one end of interconnect 3401 is coupled to via 207 while another end of interconnect 3401 is coupled to interconnect 3406b. In some embodiments, interconnect 3401 and interconnect 3406b are orthogonal to one another such that interconnect 3406b is parallel to interconnect 206b. In some embodiments, interconnect 3406b is formed of the same material as interconnect 206b.
In some embodiments, a template layer 3404b is coupled to (or adjacent to) interconnect 3406b. Template layer 3404b is formed of the same material as template material 504a and has the same function as template layer 504a (e.g., to template third magnet 6103c). In some embodiments, third magnet 6103c is coupled to (or adjacent to) template layer 3404b. In some embodiments, third magnet 6103c is a fixed magnet (or pinned magnet).
In some embodiments, the magnetization of third magnet 6103c sets the threshold of quaternary lower threshold logic gate 6100. As such, for some threshold logic gates, a unique magnetization is set for third magnet 6103c, in accordance with some embodiments. In some embodiments, another templating layer 522b is coupled to third magnet 6103c. In some embodiments, supply rail 201b is coupled to templating layer 522b (which is coupled to magnet 6103c). In some embodiments, negative supply is provided on interconnect 201b. In some embodiments, the ground is located under the nanomagnets. For each quaternary lower threshold logic Gate 0 of Table 9, the magnetization of third magnet 6103c is fixed in the +x direction (i.e., magnetization state ‘0’), in accordance with some embodiments.
ASL device 6200 forms quaternary lower threshold logic Gate 0 of Table 9, according to some embodiments. ASL device 6200 is a top-view of ASL device 6100 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a, output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 6103c is a fixed magnet having a magnetization in the +x direction (or along state ‘0’). Here, the power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is −Vdd (negative power supply), and power supply on interconnect 201c is −Vdd (negative power supply).
In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when the input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘3’ (i.e., −x direction).
ASL device 6300 forms quaternary upper threshold logic Gate 0 of Table 9, according to some embodiments. ASL device 6300 is a top-view of ASL device 6100 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘1’ (i.e., along the +y axis), output magnet 6103b is a biaxial (e.g., 2-state or bi-stable magnet), and reference magnet 6103c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when the input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 6300 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 6300, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 6103b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘1’).
Here, the power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is +Vdd (positive power supply), and power supply on interconnect 201c is −Vdd (negative power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘0’ (i.e., +x direction).
ASL device 6400 forms quaternary upper threshold logic Gate 0 of Table 9, according to some embodiments. ASL device 6400 is a top-view of ASL device 6100 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘2’ (i.e., along the −y axis), output magnet 6103b is a biaxial (e.g., 2-state or bi-stable magnet), and reference magnet 6103c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 6400 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 6400, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 6103b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘2’).
Here, the power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is −Vdd (negative power supply), and power supply on interconnect 201c is −Vdd (negative power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘0’ (i.e., +x direction).
ASL device 6500 forms quaternary upper threshold logic Gate 0 of Table 9, according to some embodiments. ASL device 6500 is a top-view of ASL device 6100 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘3’ (i.e., along the −x axis), output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 6103c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when the input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 6500 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 6500, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 6103b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘3’).
Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is −Vdd (negative power supply), and power supply on interconnect 201c is −Vdd (negative power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘0’ (i.e., +x direction).
In some embodiments instead of applying negative power supply −Vdd to interconnect 201b, positive power supply +Vdd is applied to interconnect 201b. In some embodiments, third magnet 6103c is replaced with third magnet 6123c, where third magnet 6123c is a fixed magnet with magnetization in the −x axis (i.e., direction ‘3’). Functionally, ASL device 6100 is same as ASL device 6120.
ASL device 6220 forms quaternary lower threshold logic Gate 0 of Table 9, according to some embodiments. ASL device 6220 is a top-view of ASL device 6120 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a, output magnet 6103b is a biaxial (e.g., 2-state or bi-stable magnet), and reference magnet 6123c is a fixed magnet having a magnetization in the −x direction (or along state ‘3’). Here, the power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is +Vdd (positive power supply), and power supply on interconnect 201c is −Vdd (negative power supply).
In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘3’ (i.e., −x direction).
ASL device 6320 forms quaternary upper threshold logic Gate 0 of Table 9, according to some embodiments. ASL device 6320 is a top-view of ASL device 6120 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘1’ (i.e., along +y axis), output magnet 6103b is a biaxial (e.g., 2-state or bi-stable magnet), and reference magnet 6123c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when the input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 6320 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 6320, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 6103b is in the direction ‘0’ (i.e., the +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘1’).
Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is +Vdd (positive power supply), and power supply on interconnect 201c is −Vdd (negative power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘0’ (i.e., +x direction).
ASL device 6420 forms quaternary upper threshold logic Gate 0 of Table 9, according to some embodiments. ASL device 6420 is a top-view of ASL device 6120 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘2’ (i.e., along −y axis), output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 6123c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when the input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 6420 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 6420, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, the direction of magnetization of output magnet 6103b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘2’).
Here, the power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is +Vdd (positive power supply), and power supply on interconnect 201c is −Vdd (negative power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘0’ (i.e., +x direction).
ASL device 6520 forms quaternary upper threshold logic Gate 0 of Table 9, according to some embodiments. ASL device 6520 is a top-view of ASL device 6120 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘3’ (i.e., along −x axis), output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 6103c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when the input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 6520 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 6520, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 6103b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘3’).
Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is +Vdd (positive power supply), and power supply on interconnect 201c is −Vdd (negative power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘0’ (i.e., +x direction).
While the embodiments of
ASL device 7200 forms quaternary lower threshold logic Gate 3 of Table 9, according to some embodiments. ASL device 7200 is a top-view of ASL device 7100 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a, output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 7103c is a fixed magnet having a magnetization in the −x direction (or along state ‘3’). Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is −Vdd (negative power supply), and power supply on interconnect 201c is +Vdd (positive power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when the input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘3’ (i.e., −x direction).
ASL device 7300 forms quaternary upper threshold logic Gate 3 of Table 9, according to some embodiments. ASL device 7300 is a top-view of ASL device 7100 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘1’ (i.e., along +y axis), output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 7103c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘3’ (i.e., −x direction).
In some embodiments, ASL device 7300 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 7300, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, the direction of magnetization of output magnet 6103b is in the direction ‘3’ (i.e., −x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘1’).
Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is −Vdd (negative power supply), and power supply on interconnect 201c is +Vdd (positive power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘3’ (i.e., −x direction).
ASL device 7400 forms quaternary upper threshold logic Gate 3 of Table 9, according to some embodiments. ASL device 7400 is a top-view of ASL device 7100 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘2’ (i.e., along −y axis), output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 7103c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘3’ (i.e., −x direction).
In some embodiments, ASL device 7400 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 7400, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 6103b is in the direction ‘3’ (i.e., −x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘2’).
Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is −Vdd (negative power supply), and power supply on interconnect 201c is +Vdd (positive power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘3’ (i.e., −x direction).
ASL device 7500 forms quaternary upper threshold logic Gate 3 of Table 9, according to some embodiments. ASL device 7500 is a top-view of ASL device 7100 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘3’ (i.e., along −x axis), output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 7103c is a fixed magnet having a magnetization in the −x direction (or along direction ‘3’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 7500 uses a fixed magnetic spin current input in the −x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 7500, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, the direction of magnetization of output magnet 6103b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘3’).
Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is −Vdd (negative power supply), and power supply on interconnect 201c is +Vdd (positive power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘0’ (i.e., +x direction).
ASL device 7220 forms quaternary lower threshold logic Gate 3 of Table 9, according to some embodiments. ASL device 7220 is a top-view of ASL device 7120 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a, output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 7123c is a fixed magnet having a magnetization in the +x direction (or along magnetization state ‘0’). Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is +Vdd (positive power supply), and power supply on interconnect 201c is +Vdd (positive power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘3’ (i.e., −x direction).
ASL device 7320 forms quaternary upper threshold logic Gate 3 of Table 9, according to some embodiments. ASL device 7320 is a top-view of ASL device 7120 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘1’ (i.e., along +y axis), output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 7123c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘3’ (i.e., −x direction).
In some embodiments, ASL device 7320 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 7320, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 6103b is in the direction ‘3’ (i.e., −x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘1’).
Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is +Vdd (positive power supply), and power supply on interconnect 201c is +Vdd (positive power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when the input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘3’ (i.e., −x direction).
ASL device 7420 forms quaternary upper threshold logic Gate 3 of Table 9, according to some embodiments. ASL device 7420 is a top-view of ASL device 7120 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘2’ (i.e., along −y axis), output magnet 6103b is a biaxial (e.g., 2-state or bi-stable magnet), and reference magnet 7123c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘3’ (i.e., −x direction).
In some embodiments, ASL device 7420 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 7420, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, the direction of magnetization of output magnet 6103b is in the direction ‘3’ (i.e., −x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘2’).
Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is +Vdd (positive power supply), and power supply on interconnect 201c is +Vdd (positive power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘3’ (i.e., −x direction).
ASL device 7520 forms quaternary upper threshold logic Gate 3 of Table 9, according to some embodiments. ASL device 7520 is a top-view of ASL device 7120 along the dotted line AA′. Here, the input magnet is 4-state magnet 203a with magnetization along direction ‘3’ (i.e., along −x axis), output magnet 6103b is a biaxial (2-state or bi-stable magnet), and reference magnet 7123c is a fixed magnet having a magnetization in the +x direction (or along direction ‘0’). In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is always along direction ‘0’ (i.e., +x direction).
In some embodiments, ASL device 7520 uses a fixed magnetic spin current input in the +x direction. This breaks the symmetry to enable the logic gate to generate the output. For ASL device 7520, output magnet 6103b is a bi-stable magnet with shape or crystalline anisotropy pointing only in one direction. In this case, direction of magnetization of output magnet 6103b is in the direction ‘0’ (i.e., +x direction) regardless of the input spin current direction received by input magnet 203a (which is magnetized in direction ‘3’).
Here, power supply on interconnect 201a is +Vdd (positive power supply), power supply on interconnect 201b is +Vdd (positive power supply), and power supply on interconnect 201c is +Vdd (positive power supply). In some embodiments, the positive power supply on interconnect 201a reverses the effective magnetization direction of input magnet 203a relative to the input spin current. In some embodiments, when input spin current in the +x direction arrives at input 4-state magnet 203a, the magnetization of output magnet 6103b is along direction ‘0’ (i.e., +x direction).
Quaternary Window Literal Gate (16 Logic Gates)
In some embodiments, a full set of quaternary window literal gates are provided which are implemented using the minimum quaternary gates or maximum quaternary gates. In some embodiments, the gates for window literal operation are implemented as lower threshold quaternary gates or upper threshold quaternary gates.
Table 10 illustrates a logic table of a 4-valued logic based window literal gate.
aXb
0X0
0X1
0X2
0X3
1X1
1X2
1X3
2X2
2X3
3X3
In some embodiments, majority gate 8100 of
In some embodiments, first input magnet 8101a is the output magnet of Gate 1 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary lower threshold gate is in the ‘0’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of Gate 1 of the quaternary lower threshold gate forms the first input magnet 8101a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 8101b is the output magnet of Gate 1 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary upper threshold gate is in the ‘0’ direction, its output magnet has magnetization in the ‘0’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 8101b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 8101c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 8102a, second interconnect 8102b, and third interconnect 8102c) and combine at interconnect 8102d to produce a spin current having a direction according to the majority of the spin currents from interconnects 8102a, 8102b, and 8102c. This resultant spin current in interconnect 8102d determines the magnetization of output magnet 8103, in accordance with some embodiments.
In some embodiments, 1X1 window literal gate logic is formed by a majority function of the output of lower threshold Gate 1, the output of upper threshold Gate 1, and fixed magnet with ‘0’ direction. Majority gate 8100 illustrates the gate when first input magnet 8101a has magnetization in direction ‘3’, second input magnet 8101b has magnetization in direction ‘0’, and third input magnet 8101c has magnetization in direction ‘0’ to generate a magnetization in direction ‘0’ for output magnet 8103.
In some embodiments, majority gate 8200 of
In some embodiments, first input magnet 8201a is the output magnet of Gate 1 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary lower threshold gate is in the ‘1’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of Gate 1 of the quaternary lower threshold gate forms the first input magnet 8201a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 8201b is the output magnet of Gate 1 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary upper threshold gate is in the ‘1’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 8201b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 8201c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 8202a, second interconnect 8202b, and third interconnect 8202c) and combine at interconnect 8202d to produce a spin current have a direction according to the majority of the spin currents from interconnects 8202a, 8202b, and 8202c. This resultant spin current in interconnect 8202d determines the magnetization of output magnet 8203, in accordance with some embodiments.
In some embodiments, 1X1 window literal gate logic is formed by a majority function of the output of lower threshold Gate 1, the output of upper threshold Gate 1, and fixed magnet with ‘0’ direction. Majority gate 8200 illustrates the gate when first input magnet 8201a has magnetization in direction ‘3’, second input magnet 8201b has magnetization in direction ‘3’, and third input magnet 8201c has magnetization in direction ‘0’ to generate a magnetization in direction ‘3’ for output magnet 8203.
In some embodiments, majority gate 8300 of
In some embodiments, first input magnet 8301a is the output magnet of Gate 1 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary lower threshold gate is in the ‘2’ direction, its output magnet has magnetization in the ‘0’ direction. This output magnet of Gate 1 of the quaternary lower threshold gate forms the first input magnet 8301a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 8301b is the output magnet of Gate 1 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary upper threshold gate is in the ‘2’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 8301b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 8301c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 8302a, second interconnect 8302b, and third interconnect 8302c) and combine at interconnect 8302d to produce a spin current having a direction according to the majority of the spin currents from interconnects 8302a, 8302b, and 8302c. This resultant spin current in interconnect 8302d determines the magnetization of output magnet 8303, in accordance with some embodiments.
In some embodiments, 1X1 window literal gate logic is formed by a majority function of the output of lower threshold Gate 1, the output of upper threshold Gate 1, and fixed magnet with ‘0’ direction. Majority gate 8300 illustrates the gate when first input magnet 8301a has magnetization in direction ‘0’, second input magnet 8301b has magnetization in direction ‘3’, and third input magnet 8301c has magnetization in direction ‘0’ to generate a magnetization in direction ‘0’ for output magnet 8303.
In some embodiments, majority gate 8400 of
In some embodiments, first input magnet 8401a is the output magnet of Gate 1 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary lower threshold gate is in the ‘3’ direction, its output magnet has magnetization in the ‘0’ direction. This output magnet of Gate 1 of the quaternary lower threshold gate forms the first input magnet 8401a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 8401b is the output magnet of Gate 1 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary upper threshold gate is in the ‘3’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 8401b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 8401c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 8402a, second interconnect 8402b, and third interconnect 8402c) and combine at interconnect 8402d to produce a spin current having a direction according to the majority of the spin currents from interconnects 8402a, 8402b, and 8402c. This resultant spin current in interconnect 8402d determines the magnetization of output magnet 8403, in accordance with some embodiments.
In some embodiments, 1X1 window literal gate logic is formed by a majority function of the output of lower threshold Gate 1, the output of upper threshold Gate 1, and fixed magnet with ‘0’ direction. Majority gate 8400 illustrates the gate when first input magnet 8401a has magnetization in direction ‘0’, second input magnet 8401b has magnetization in direction ‘3’, and third input magnet 8401c has magnetization in direction ‘0’ to generate a magnetization in direction ‘0’ for output magnet 8403.
In some embodiments, majority gate 8500 of
In some embodiments, first input magnet 8501a is the output magnet of Gate 2 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary lower threshold gate is in the ‘0’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of Gate 2 of the quaternary lower threshold gate forms the first input magnet 8501a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 8501b is the output magnet of Gate 1 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary upper threshold gate is in the ‘0’ direction, its output magnet has magnetization in the ‘0’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 8501b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 8501c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 8502a, second interconnect 8502b, and third interconnect 8502c) and combine at interconnect 8502d to produce a spin current having a direction according to the majority of the spin currents from interconnects 8502a, 8502b, and 8502c. This resultant spin current in interconnect 8502d determines the magnetization of output magnet 8503, in accordance with some embodiments.
In some embodiments, 1X2 window literal gate logic is formed by a majority function of the output of lower threshold Gate 2, the output of upper threshold Gate 1, and fixed magnet with ‘0’ direction. Majority gate 8500 illustrates the gate when first input magnet 8501a has magnetization in direction ‘3’, second input magnet 8501b has magnetization in direction ‘0’, and third input magnet 8501c has magnetization in direction ‘0’ to generate a magnetization in direction ‘0’ for output magnet 8503.
In some embodiments, majority gate 8600 of
In some embodiments, first input magnet 8601a is the output magnet of Gate 2 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary lower threshold gate is in the ‘1’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of Gate 2 of the quaternary lower threshold gate forms the first input magnet 8601a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 8601b is the output magnet of Gate 1 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary upper threshold gate is in the ‘1’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 8601b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 8601c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 8602a, second interconnect 8602b, and third interconnect 8602c) and combine at interconnect 8602d to produce a spin current having a direction according to the majority of the spin currents from interconnects 8602a, 8602b, and 8602c. This resultant spin current in interconnect 8602d determines the magnetization of output magnet 8603, in accordance with some embodiments.
In some embodiments, 1X2 window literal gate logic is formed by a majority function of the output of lower threshold Gate 2, the output of upper threshold Gate 1, and fixed magnet with ‘0’ direction. Majority gate 8600 illustrates the gate when first input magnet 8601a has magnetization in direction ‘3’, second input magnet 8601b has magnetization in direction ‘3’, and third input magnet 8601c has magnetization in direction ‘0’ to generate a magnetization in direction ‘0’ for output magnet 8603.
In some embodiments, majority gate 8700 of
In some embodiments, first input magnet 8701a is the output magnet of Gate 1 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary lower threshold gate is in the ‘2’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of Gate 2 of the quaternary lower threshold gate forms the first input magnet 8701a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 8701b is the output magnet of Gate 1 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary upper threshold gate is in the ‘2’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 8701b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 8701c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 8702a, second interconnect 8702b, and third interconnect 8702c) and combine at interconnect 8702d to produce a spin current having a direction according to the majority of the spin currents from interconnects 8702a, 8702b, and 8702c. This resultant spin current in interconnect 8702d determines the magnetization of output magnet 8703, in accordance with some embodiments.
In some embodiments, 1X2 window literal gate logic is formed by a majority function of the output of lower threshold Gate 2, the output of upper threshold Gate 1, and fixed magnet with ‘0’ direction. Majority gate 8700 illustrates the gate when first input magnet 8701a has magnetization in direction ‘3’, second input magnet 8701b has magnetization in direction ‘3’, and third input magnet 8701c has magnetization in direction ‘0’ to generate a magnetization in direction ‘3’ for output magnet 8703.
In some embodiments, majority gate 8800 of
In some embodiments, first input magnet 8801a is the output magnet of Gate 2 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary lower threshold gate is in the ‘3’ direction, its output magnet has magnetization in the ‘0’ direction. This output magnet of Gate 2 of the quaternary lower threshold gate forms the first input magnet 8801a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 8801b is the output magnet of Gate 1 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 1 of the quaternary upper threshold gate is in the ‘3’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 8801b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 8801c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 8802a, second interconnect 8802b, and third interconnect 8802c) and combine at interconnect 8802d to produce a spin current having a direction according to the majority of the spin currents from interconnects 8802a, 8802b, and 8802c. This resultant spin current in interconnect 8802d determines the magnetization of output magnet 8803, in accordance with some embodiments.
In some embodiments, 1X2 window literal gate logic is formed by a majority function of the output of lower threshold Gate 2, the output of upper threshold Gate 1, and fixed magnet with ‘0’ direction. Majority gate 8800 illustrates the gate when first input magnet 8801a has magnetization in direction ‘0’, second input magnet 8801b has magnetization in direction ‘3’, and third input magnet 8801c has magnetization in direction ‘0’ to generate a magnetization in direction ‘3’ for output magnet 8803.
In some embodiments, majority gate 8900 of
In some embodiments, first input magnet 8901a is the output magnet of Gate 2 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary lower threshold gate is in the ‘0’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of Gate 2 of the quaternary lower threshold gate forms the first input magnet 8901a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 8901b is the output magnet of Gate 2 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary upper threshold gate is in the ‘0’ direction, its output magnet has magnetization in the ‘0’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 8901b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 8901c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 8902a, second interconnect 8902b, and third interconnect 8902c) and combine at interconnect 8902d to produce a spin current having a direction according to the majority of the spin currents from interconnects 8902a, 8902b, and 8902c. This resultant spin current in interconnect 8902d determines the magnetization of output magnet 8903, in accordance with some embodiments.
In some embodiments, 2X2 window literal gate logic is formed by a majority function of the output of lower threshold Gate 2, the output of upper threshold Gate 2, and fixed magnet with ‘0’ direction. Majority gate 8900 illustrates the gate when first input magnet 8901a has magnetization in direction ‘3’, second input magnet 8901b has magnetization in direction ‘0’, and third input magnet 8901c has magnetization in direction ‘0’ to generate a magnetization in direction ‘0’ for output magnet 8903.
In some embodiments, majority gate 9000 of
In some embodiments, first input magnet 9001a is the output magnet of Gate 2 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary lower threshold gate is in the ‘1’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of Gate 2 of the quaternary lower threshold gate forms the first input magnet 9001a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 9001b is the output magnet of Gate 2 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary upper threshold gate is in the ‘1’ direction, its output magnet has magnetization in the ‘0’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 9001b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 9001c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 9002a, second interconnect 9002b, and third interconnect 9002c) and combine at interconnect 9002d to produce a spin current having a direction according to the majority of the spin currents from interconnects 9002a, 9002b, and 9002c. This resultant spin current in interconnect 9002d determines the magnetization of output magnet 9003, in accordance with some embodiments.
In some embodiments, 2X2 window literal gate logic is formed by a majority function of the output of lower threshold Gate 2, the output of upper threshold Gate 2, and fixed magnet with ‘0’ direction. Majority gate 9000 illustrates the gate when first input magnet 9001a has magnetization in direction ‘3’, second input magnet 9001b has magnetization in direction ‘0’, and third input magnet 9001c has magnetization in direction ‘0’ to generate a magnetization in direction ‘0’ for output magnet 9003.
In some embodiments, majority gate 9100 of
In some embodiments, first input magnet 9101a is the output magnet of Gate 2 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary lower threshold gate is in the ‘2’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of Gate 2 of the quaternary lower threshold gate forms the first input magnet 9101a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 9101b is the output magnet of Gate 2 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary upper threshold gate is in the ‘2’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 9101b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 9101c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 9102a, second interconnect 9102b, and third interconnect 9102c) and combine at interconnect 9102d to produce a spin current having a direction according to the majority of the spin currents from interconnects 9102a, 9102b, and 9102c. This resultant spin current in interconnect 9102d determines the magnetization of output magnet 9103, in accordance with some embodiments.
In some embodiments, 2X2 window literal gate logic is formed by a majority function of the output of lower threshold Gate 2, the output of upper threshold Gate 2, and fixed magnet with ‘0’ direction. Majority gate 9100 illustrates the gate when first input magnet 9101a has magnetization in direction ‘3’, second input magnet 9101b has magnetization in direction ‘3’, and third input magnet 9101c has magnetization in direction ‘0’ to generate a magnetization in direction ‘3’ for output magnet 9103.
In some embodiments, majority gate 9200 of
In some embodiments, first input magnet 9201a is the output magnet of Gate 2 of the quaternary lower threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary lower threshold gate is in the ‘3’ direction, its output magnet has magnetization in the ‘0’ direction. This output magnet of Gate 2 of the quaternary lower threshold gate forms the first input magnet 9201a (Input 1), in accordance with some embodiments. In some embodiments, second input magnet 9201b is the output magnet of Gate 2 of the quaternary upper threshold gate. In some embodiments, when the input magnetization of Gate 2 of the quaternary upper threshold gate is in the ‘3’ direction, its output magnet has magnetization in the ‘3’ direction. This output magnet of quaternary upper threshold gate forms the second input magnet 9201b (Input 2), in accordance with some embodiments. In some embodiments, third input magnet 9201c is a fixed magnet that has magnetization in the ‘0’ direction.
In some embodiments, spin currents from the input magnets (Input 1, Input 2, and Input 3) conduct through their respective interconnects (e.g., first interconnect 9202a, second interconnect 9202b, and third interconnect 9202c) and combine at interconnect 9202d to produce a spin current having a direction according to the majority of the spin currents from interconnects 9202a, 9202b, and 9202c. This resultant spin current in interconnect 9202d determines the magnetization of output magnet 9203, in accordance with some embodiments.
In some embodiments, 2X2 window literal gate logic is formed by a majority function of the output of lower threshold Gate 2, the output of upper threshold Gate 2, and fixed magnet with ‘0’ direction. Majority gate 9200 illustrates the gate when first input magnet 9201a has magnetization in direction ‘0’, second input magnet 9201b has magnetization in direction ‘3’, and third input magnet 9201c has magnetization in direction ‘0’ to generate a magnetization in direction ‘0’ for output magnet 9203.
Quaternary Max Gate—Mode a, Mode B
In some embodiments, max gate 9300 comprises two fixed magnetic injectors 9304 and 9305 (either using fixed magnets or charge to spin conversion using spin hall effect) injecting spin during two complementary operation conditions. The materials for the fixed magnets can be according to the fixed magnets described with reference to various embodiments. In some embodiments, max gate 9300 comprises input spin interconnects 9306a and 9306e and output charge interconnect 93061. In some embodiments, max gate 9300 comprises 4-state input free magnets 9322a and 9303b coupled to the input spin interconnects.
In some embodiments, the 4-state input free magnets 9322a and 9303b are templated as discussed with reference to other embodiments. Here, the associated template layers for the 4-state input free magnets are 9322a, 9322b, 9322c, and 9322d coupled to their respective magnets. In some embodiments, the output interconnect 93061 is coupled to an output magnet 9303c. In some embodiments, the output magnet 9303c is a 4-state free magnet. In some embodiments, the 4-state free output magnet 9303c is templated as discussed with reference to other embodiments. Here, the associated template layers are 9322e and 9322f. The template layers 9322a, 9322b, 9322c, 9322d, 9322e, 9322f are formed according to the template layers described with reference to various embodiments.
In some embodiments, template layer 9322a is formed over metal interconnect 9301a. In some embodiments, metal interconnect 9301a is coupled to a power supply (e.g., negative power supply −Vdd). In some embodiments, template layer 9322b is formed over metal interconnect 9301b. In some embodiments, metal interconnect 9301b is coupled to a power supply (e.g., negative power supply −Vdd). In some embodiments, template layer 9322e is formed over metal interconnect 9301c. In some embodiments, metal interconnect 9301c is coupled to a power supply (e.g., negative power supply −Vdd).
In some embodiments, SHE/SOC layer is deposited on the magnets (or on their template layers) for generating Rashba effect based charge currents. In some embodiments, SHE/SOC layer 9308a is deposited on template layer 9322b coupled to 4-state input free magnet 9303a. In some embodiments, SHE/SOC layer 9308b is deposited on template layer 9322d coupled to 4-state input free magnet 9303b. SHE/SOC layers 9308a and 9308b are formed using the SHE materials described with reference to various embodiments. In some embodiments, output interconnect 93061 is coupled to a layer of ISHE/ISOC 9310. In some embodiments, layer of ISHE/ISOC 9310 is coupled to the output 4-state free magnet 9303c via template layer 9322f.
In some embodiments, a ground supply is provided to SHE/SOC layers 9308a and 9308b. In some embodiments, via 9307a is formed over SHE/SOC layer 9308a, and then interconnect 9309a is coupled to one end of via 9307a. In some embodiments, via 9307b is formed over SHE/SOC layer 9308b, and then interconnect 9309b is coupled to one end of via 9307b. In some embodiments, ground supply is provided to ISHE/SOC layer 9310. In some embodiments, via 9307c is formed over ISHE/ISOC layer 9310, and then interconnect 9309c is coupled to one end of via 9307c. In some embodiments, interconnect 9301c is coupled to ground.
In some embodiments, there is a gap between input spin interconnects and the SHE/SOC layers. This gap may be filed with oxide (e.g., SiO2), in accordance with some embodiments. For example, there is a gap between interconnect 9306 and SHE/SOC layer 9308a, and a gap between interconnect 9306 and SHE/SOC layer 9308b. In some embodiments, four main conduction paths are provided in max gate 9300.
In some embodiments, the first conduction path comprises interconnects 9306c, 9306g, and 9306i. In some embodiments, one end of interconnect 9306c is coupled to fixed magnet 9304 via template layer 9322g. In some embodiments, the other end of interconnect 9306c is coupled to SHE/SOC layer 9308a. In some embodiments, one end of interconnect 9306g is coupled to SHE/SOC layer 9308a and another end of interconnect 9306g is coupled to SHE/SOC layer 9308b. In some embodiments, one end of interconnect 9306i is coupled to SHE/SOC layer 9308b and another end of interconnect 9306g is coupled to SHE/SOC layer 9308c. In some embodiments, interconnect 9306k is coupled to SHE/SOC layer 9308c. In some embodiments, interconnect 9306k extends orthogonal to interconnect 9306i.
In some embodiments, the second conduction path comprises interconnect 9306b (a charge interconnect) which couples to SHE/SOC layer 9308a at one end and SHE/SOC layer 9308d at another end. In some embodiments, interconnect 9306b extends orthogonal to interconnect 9306c. In some embodiments, the third conduction path comprises interconnect 9306f (a charge interconnect) which couples to SHE/SOC layer 9308b at one end and SHE/SOC layer 9308e at another end. In some embodiments, interconnect 9306f extends orthogonal to interconnect 9306g.
In some embodiments, the fourth conduction path comprises interconnects 9306d, 9306h, and 9306j. In some embodiments, one end of interconnect 9306d is coupled to fixed magnet 9305 via template layer 9322h. In some embodiments, the other end of interconnect 9306d is coupled to SHE/SOC layer 9308d. In some embodiments, one end of interconnect 9306h is coupled to SHE/SOC layer 9308d and another end of interconnect 9306h is coupled to SHE/SOC layer 9308e. In some embodiments, one end of interconnect 9306j is coupled to SHE/SOC layer 9308e and another end of interconnect 9306j is coupled to SHE/SOC layer 9308f. In some embodiments, SHE/SOC layer 9308f couples to output free magnet 9303c via template layer 9310. In some embodiments, there is a gap between SHE/SOC layer 9308f and SHE/SOC layer 9310. In some embodiments, interconnects of the fourth conduction are spin interconnects.
The spin input currents on interconnects 9306a and 9306e of max gate 9300 are first transduced to charge via spin orbit effect stacks 9308a and 9308b, respectively. In some embodiments, vertical wire/interconnect 9306c/g/i of the first conduction path carries the spin to charge transduced information from magnetic inputs 1 and 2 along the directions ‘0’ or ‘3’ (+x or −x directions, respectively). This current is labeled as Ic2 which is the current component in the x-direction, where:
Ic2=A({right arrow over (m)}·{circumflex over (x)})
In some embodiments, horizontal wires 9806b and 9306f of second and third conduction paths, respectively, carry the spin to charge transduced information from magnetic inputs 2 and 1, respectively, along the directions ‘1’ and ‘2’. For example, the current in interconnect 9306b is Ic1 which is the current in the y-direction, where:
Ic1=A({right arrow over (m)}·ŷ)
In some embodiments, wire or interconnect 9306k carries the spin current injected into wire 9306k from vertical wire 9306c/g/i due to the SOC layer 9308c. In some embodiments, vertical wires 9306d/h/j carries the spin current injected into vertical wires 9306d/h/j from horizontal wires 9306f and 9306b due to the SOC layer 9308b SOC layers 9308a, respectively.
Table 11 is the truth table of the max gate 9300.
Table 11 illustrates spin directions of input 1 (i.e., spins in interconnect 9306e) and input 2 (i.e., spins in interconnect 9306a), and corresponding magnetization direction of output magnet 9303c.
There are two operation modes—mode-1 and mode-2—of the max gate characterized by the inputs, according to some embodiments. In some embodiments, in mode-1, both inputs (i.e., input 1 and input 2) have spin directions that are both ‘1’ or ‘2’. Mode 1 is illustrated as a shared central region in Table 11.
In some embodiments, in mode-2, both inputs (i.e., input 1 and input 2) have spin directions that are not both ‘1’ or ‘2’ (e.g., the input spins are either of directions ‘0’ and ‘3’). In some embodiments, fixed magnets 9304 and 9305 (or their equivalent SOC realization) operate in their particular operation modes. In some embodiments, fixed magnet 9304 is pinned along direction ‘3’ (i.e., along −x direction) and injects charge or biases during operation mode 2. In some embodiments, fixed magnet 9305 is pinned along direction ‘2’ (i.e., along −y direction) and injects spin or biases during operation mode ‘1’.
In some embodiments, during mode-1, ferromagnet 9304 is off (i.e., supply is not applied to that magnet) and the signal on wire 9306c/g/i is close to zero since wire 9306g transduces the information from ‘0’ and ‘3’ states of the magnets. In some embodiments, wire 9306f and 9306b carry the charge currents proportional to the magnetization in the y-directions. Hence spin currents are injected into interconnects 9306d/h/j in logic ‘1’ or ‘2’ directions. The presence of the spin injection from ferromagnet 9305 produces an output of ‘2’ unless both spin currents from wire 9306f and 9306b are ‘1’.
In some embodiments, during mode-2, ferromagnet 9305 is off and the signal of wires 9306c/g/i is simply determined by wire 9306f and wire 9306b. When at least one of the inputs is ‘3’, wire 9306c/g/i produces a net positive current due to the presence of current from ferromagnet 9304. This leads to the output being ‘3’ whenever any one of the inputs is ‘3’. In some embodiments, when both the inputs are ‘0’, the output is zero since the wire 9306c/g/i is dominated by the inputs.
A special case of mode-2 is the case where one of the inputs is ‘0’ or ‘3’ and one of the inputs is ‘1’ or ‘2’. In this case, the effect of the input ‘0’ is nullified by fixed magnet 9304. The spin current injected by the magnets 9308a/b in state ‘1’ or ‘2’ dominates the final current leading to a switching as identified in the truth table. This completes all the entries of the max gate.
In some embodiments, the minimum gate for quaternary logic is identical in structure except for changes in the biases and operating modes.
3-Input Quaternary Logic Gate
In some embodiments, 3-input quaternary gate comprises a first 4-state free input magnet 107101a (also referred to as Input 1 (A)), second 4-state free input magnet 107101b (also referred to as Input 2 (B)), third 2-state fixed input magnet 107101c, metal interconnect 107102a, 107102d, 107102c, and 2-state free output magnet 107103 which is titled at an angle Θ relative to the other magnets. The 3-input quaternary gate of
In some embodiments, reference or fixed magnet 107101c is fixed to either +x direction (i.e., magnetization direction ‘0’) or −x direction (i.e., magnetization direction ‘3’). Relative to the strength of magnetization of input magnets 107101a and 107101b, reference or fixed magnet 107101c has weaker magnetization which assists in resolving the majority gate function so that the output magnet 107103 deterministically resolves its magnetization in either direction ‘0’ or direction ‘3’. Material wise, magnets 107101a/b comprise materials as discussed with reference to 4-state magnets, magnet 107101c comprises materials as discussed with reference to a fixed in-plane 2-state magnets, and output magnet 107103 comprises materials discussed with reference to free in-plane 2-state magnets.
The top first row of truth table 10080 lists the four possible magnetizations for first input magnet 107101a (e.g., Input 1 (A)). The left most column of truth table 10080 lists the four possible magnetizations for second input magnet 107101b (e.g., Input 2 (B)). The input magnetization conditions are shown in the shaded boxes. The other remaining boxes illustrate the output magnetization of magnet 107103 in the top left corner of each box according to the magnetizations of the first and second input magnets 107101a/b. A person skilled in the art would appreciate that the truth table of
The top first row of truth table 10125 lists the four possible magnetizations for first input magnet 107101a (e.g., Input 1 (A)). The left most column of truth table 10125 lists the four possible magnetizations for second input magnet 107101b (e.g., Input 2 (B)). The input magnetization conditions are shown in the shaded boxes. The other remaining boxes illustrate the output magnetization of magnet 107103 in the top left corner of each box according to the magnetizations of the first and second input magnets 107101a/b. A person skilled in the art would appreciate that the truth table of
3-Input Quaternary Lower and Upper Threshold Gate
3-Input Quaternary Lower Threshold Gate
The top first row of truth table 10143 lists the four possible magnetizations for first input magnet 107101a (e.g., Input 1 (A)). The left most column of truth table 10143 lists the four possible magnetizations for second input magnet 107101b (e.g., Input 2 (B)). The input magnetization conditions are shown in the shaded boxes. The other remaining boxes illustrate the output magnetization of magnet 107103 in the top left corner of each box according to the magnetizations of the first and second input magnets 107101a/b. A person skilled in the art would appreciate that the truth table of
Referring back to
3-Input Quaternary Upper Threshold Gate
The top first row of truth table 10160 lists the four possible magnetizations for first input magnet 107101a (e.g., Input 1 (A)). The left most column of truth table 10143 lists the four possible magnetizations for second input magnet 107101b (e.g., Input 2 (B)). The input magnetization conditions are shown in the shaded boxes. The other remaining boxes illustrate the output magnetization of magnet 107103 in the top left corner of each box according to the magnetizations of the first and second input magnets 107101a/b. A person skilled in the art would appreciate that the truth table of
Referring back to
System Diagram Description (e.g., Smart Device)
For purposes of the embodiments, the transistors in various circuits and logic blocks described here are metal oxide semiconductor (MOS) transistors, which include drain, source, gate, and bulk terminals. The transistors also include Tri-Gate and FinFET transistors, Gate All Around Cylindrical Transistors, Tunneling FET (TFET), Square Wire, or Rectangular Ribbon Transistors or other devices implementing transistor functionality like carbon nanotubes or spintronic devices. MOSFET symmetrical source and drain terminals i.e., are identical terminals and are interchangeably used here. A TFET device, on the other hand, has asymmetric Source and Drain terminals. Those skilled in the art will appreciate that other transistors, for example, Bi-polar junction transistors—BJT PNP/NPN, BiCMOS, CMOS, eFET, etc., may be used without departing from the scope of the disclosure.
In some embodiments, computing device 10177 includes first processor 10177 with a spin logic device using one or more 4-state magnets, according to some embodiments discussed. Other blocks of the computing device 10177 may also include a spin logic device using one or more 4-state magnets, according to some embodiments. The various embodiments of the present disclosure may also comprise a network interface within 10177 such as a wireless interface so that a system embodiment may be incorporated into a wireless device, for example, cell phone or personal digital assistant.
In some embodiments, processor 10710 (and/or processor 10790) can include one or more physical devices, such as microprocessors, application processors, microcontrollers, programmable logic devices, or other processing means. The processing operations performed by processor 10710 include the execution of an operating platform or operating system on which applications and/or device functions are executed. The processing operations include operations related to I/O (input/output) with a human user or with other devices, operations related to power management, and/or operations related to connecting the computing device 10700 to another device. The processing operations may also include operations related to audio I/O and/or display I/O.
In some embodiments, computing device 10700 includes audio subsystem 10720, which represents hardware (e.g., audio hardware and audio circuits) and software (e.g., drivers, codecs) components associated with providing audio functions to the computing device. Audio functions can include speaker and/or headphone output, as well as microphone input. Devices for such functions can be integrated into computing device 10177, or connected to the computing device 10177. In one embodiment, a user interacts with the computing device 10177 by providing audio commands that are received and processed by processor 10710.
In some embodiments, computing device 10177 comprises display subsystem 10730. Display subsystem 10730 represents hardware (e.g., display devices) and software (e.g., drivers) components that provide a visual and/or tactile display for a user to interact with the computing device 10177. Display subsystem 10730 includes display interface 10732, which includes the particular screen or hardware device used to provide a display to a user. In one embodiment, display interface 10732 includes logic separate from processor 10710 to perform at least some processing related to the display. In one embodiment, display subsystem 10730 includes a touch screen (or touch pad) device that provides both output and input to a user.
In some embodiments, computing device 10177 comprises I/O controller 10740. I/O controller 10740 represents hardware devices and software components related to interaction with a user. I/O controller 10740 is operable to manage hardware that is part of audio subsystem 10720 and/or display subsystem 10730. Additionally, I/O controller 10740 illustrates a connection point for additional devices that connect to computing device 10177 through which a user might interact with the system. For example, devices that can be attached to the computing device 10700 might include microphone devices, speaker or stereo systems, video systems or other display devices, keyboard or keypad devices, or other I/O devices for use with specific applications such as card readers or other devices.
As mentioned above, I/O controller 10740 can interact with audio subsystem 10720 and/or display subsystem 10730. For example, input through a microphone or other audio device can provide input or commands for one or more applications or functions of the computing device 10177. Additionally, audio output can be provided instead of, or in addition to display output. In another example, if display subsystem 10730 includes a touch screen, the display device also acts as an input device, which can be at least partially managed by I/O controller 10740. There can also be additional buttons or switches on the computing device 10700 to provide I/O functions managed by I/O controller 10740.
In some embodiments, I/O controller 10740 manages devices such as accelerometers, cameras, light sensors or other environmental sensors, or other hardware that can be included in the computing device 10177. The input can be part of direct user interaction, as well as providing environmental input to the system to influence its operations (such as filtering for noise, adjusting displays for brightness detection, applying a flash for a camera, or other features).
In some embodiments, computing device 10177 includes power management 10750 that manages battery power usage, charging of the battery, and features related to power saving operation. Memory subsystem 10760 includes memory devices for storing information in computing device 10177. Memory can include nonvolatile (state does not change if power to the memory device is interrupted) and/or volatile (state is indeterminate if power to the memory device is interrupted) memory devices. Memory subsystem 10760 can store application data, user data, music, photos, documents, or other data, as well as system data (whether long-term or temporary) related to the execution of the applications and functions of the computing device 10700.
Elements of embodiments are also provided as a machine-readable medium (e.g., memory 10760) for storing the computer-executable instructions (e.g., instructions to implement any other processes discussed herein). The machine-readable medium (e.g., memory 10760) may include, but is not limited to, flash memory, optical disks, CD-ROMs, DVD ROMs, RAMs, EPROMs, EEPROMs, magnetic or optical cards, phase change memory (PCM), or other types of machine-readable media suitable for storing electronic or computer-executable instructions. For example, embodiments of the disclosure may be downloaded as a computer program (e.g., BIOS) which may be transferred from a remote computer (e.g., a server) to a requesting computer (e.g., a client) by way of data signals via a communication link (e.g., a modem or network connection).
In some embodiments, computing device 10177 comprises connectivity 10770. Connectivity 10770 includes hardware devices (e.g., wireless and/or wired connectors and communication hardware) and software components (e.g., drivers, protocol stacks) to enable the computing device 10177 to communicate with external devices. The computing device 10177 could be separate devices, such as other computing devices, wireless access points or base stations, as well as peripherals such as headsets, printers, or other devices.
Connectivity 10770 can include multiple different types of connectivity. To generalize, the computing device 10177 is illustrated with cellular connectivity 10772 and wireless connectivity 10774. Cellular connectivity 10772 refers generally to cellular network connectivity provided by wireless carriers, such as provided via GSM (global system for mobile communications) or variations or derivatives, CDMA (code division multiple access) or variations or derivatives, TDM (time division multiplexing) or variations or derivatives, or other cellular service standards. Wireless connectivity (or wireless interface) 10774 refers to wireless connectivity that is not cellular, and can include personal area networks (such as Bluetooth, Near Field, etc.), local area networks (such as Wi-Fi), and/or wide area networks (such as WiMax), or other wireless communication.
In some embodiments, computing device 10177 comprises peripheral connections 10780. Peripheral connections 10780 include hardware interfaces and connectors, as well as software components (e.g., drivers, protocol stacks) to make peripheral connections. It will be understood that the computing device 10177 could both be a peripheral device (“to” 10782) to other computing devices, as well as have peripheral devices (“from” 10784) connected to it. The computing device 10177 commonly has a “docking” connector to connect to other computing devices for purposes such as managing (e.g., downloading and/or uploading, changing, synchronizing) content on computing device 10177. Additionally, a docking connector can allow computing device 10177 to connect to certain peripherals that allow the computing device 10177 to control content output, for example, to audiovisual or other systems.
In addition to a proprietary docking connector or other proprietary connection hardware, the computing device 10177 can make peripheral connections 10780 via common or standards-based connectors. Common types can include a Universal Serial Bus (USB) connector (which can include any of a number of different hardware interfaces), DisplayPort including MiniDisplayPort (MDP), High Definition Multimedia Interface (HDMI), Firewire, or other types.
Reference in the specification to “an embodiment,” “one embodiment,” “some embodiments,” or “other embodiments” means that a particular feature, structure, or characteristic described in connection with the embodiments is included in at least some embodiments, but not necessarily all embodiments. The various appearances of “an embodiment,” “one embodiment,” or “some embodiments” are not necessarily all referring to the same embodiments. If the specification states a component, feature, structure, or characteristic “may,” “might,” or “could” be included, that particular component, feature, structure, or characteristic is not required to be included. If the specification or claim refers to “a” or “an” element, that does not mean there is only one of the elements. If the specification or claims refer to “an additional” element, that does not preclude there being more than one of the additional element.
Furthermore, the particular features, structures, functions, or characteristics may be combined in any suitable manner in one or more embodiments. For example, a first embodiment may be combined with a second embodiment anywhere the particular features, structures, functions, or characteristics associated with the two embodiments are not mutually exclusive.
While the disclosure has been described in conjunction with specific embodiments thereof, many alternatives, modifications and variations of such embodiments will be apparent to those of ordinary skill in the art in light of the foregoing description. The embodiments of the disclosure are intended to embrace all such alternatives, modifications, and variations as to fall within the broad scope of the appended claims.
In addition, well known power/ground connections to integrated circuit (IC) chips and other components may or may not be shown within the presented figures, for simplicity of illustration and discussion, and so as not to obscure the disclosure. Further, arrangements may be shown in block diagram form in order to avoid obscuring the disclosure, and also in view of the fact that specifics with respect to implementation of such block diagram arrangements are highly dependent upon the platform within which the present disclosure is to be implemented (i.e., such specifics should be well within purview of one skilled in the art). Where specific details (e.g., circuits) are set forth in order to describe example embodiments of the disclosure, it should be apparent to one skilled in the art that the disclosure can be practiced without, or with variation of, these specific details. The description is thus to be regarded as illustrative instead of limiting.
The following examples pertain to further embodiments. Specifics in the examples may be used anywhere in one or more embodiments. All optional features of the apparatus described herein may also be implemented with respect to a method or process.
Example 1 is an apparatus which comprises: a 4-state input magnet; a first spin channel region adjacent to the 4-state input magnet; a 4-state output magnet; a second spin channel region adjacent to the 4-state input and output magnets; and a third spin channel region adjacent to the 4-state output magnet.
Example 2 includes all features of example 1, wherein the 4-state input and output magnets comprise a material which includes one of: Fe, Ni, Co and their alloys, magnetic insulators, or Heusler alloys of the form X2YZ.
Example 3 includes all features of example 2, wherein the magnetic insulators comprise a material which includes one of: Fe, O, Y, Al, magnetite Fe3O4 or Y3Al5O12.
Example 4 includes all features of example 2, wherein the Heusler alloys comprises one of: Co, Fe, Si, Mn, Ga, Co2FeSi or Mn2Ga.
Example 5 includes features of any one of examples 1 to 4, wherein the first, second, and third spin channel regions comprise a material which includes one of: Cu, Ag, Al, or 2D conducting materials.
Example 6 includes all features of example 5, wherein the 2D conducting materials is graphene.
Example 7 includes features of any one of examples 1 to 4, wherein the apparatus of example 7 comprises a first oxide region separating at least a portion of the first spin channel region from the second spin channel region.
Example 8 includes features of example 7, wherein the apparatus of example 8 comprises a second oxide region separating at least a portion the second spin channel region from the third spin channel region.
Example 9 includes features of example 8, wherein a portion of the first spin channel region is adjacent to a portion of the second spin channel region, and wherein a portion of the second spin channel region is adjacent to a portion of the third spin channel region.
Example 10 includes features of example 9, wherein the apparatus of example 10 comprises a third oxide region separating the 4-state input magnet from the 4-state output magnet.
Example 11 includes features according to any one of examples 1 to 4, wherein the apparatus of example 11 comprises: a non-magnetic metal adjacent to the 4-state input magnet from the 4-state output magnet.
Example 12 includes features of example 11, wherein the non-magnetic metal is coupled to a positive supply to configure the apparatus as a buffer.
Example 13 includes features of example 11, wherein the non-magnetic metal is coupled to a negative supply to configure the apparatus as an inverter.
Example 14 includes features according to any one of examples 1 to 4, wherein the apparatus of example 14 comprises: a via adjacent to the second spin channel region; and a non-magnetic metal adjacent to via.
Example 15 includes features according to any one of examples 1 to 4, wherein the 4-state input and output magnets have cubic magnetic crystalline anisotropy.
Example 16 includes features according to any one of examples 1 to 4, wherein the 4-state input magnet overlaps the second spin channel region more than 4-state output magnet overlaps the second spin channel region.
Example 17 is an apparatus which comprises: a 4-state input magnet; a first filter layer adjacent to the 4-state input magnet; a first spin channel region adjacent to the first filter layer; a 4-state output magnet; a second filter layer adjacent to the 4-state output magnet; a second spin channel region adjacent to the first and second filter layers; and a third spin channel region adjacent to the second filter layer.
Example 18 includes all features of example 17, wherein the 4-state input and output magnets comprises a material which includes one of: Fe, Ni, Co and their alloys, magnetic insulators, or Heusler alloys of the form X2YZ.
Example 19 includes all features of example 18, wherein the magnetic insulators comprises a material which includes one of: Fe, O, Y, Al, magnetite Fe3O4 or Y3Al5O12.
Example 20 includes all features of example 18, wherein the Heusler alloys includes one of: Co, Fe, Si, Mn, Ga, Co2FeSi or Mn2Ga.
Example 21 includes features according to any one of examples 17 to 20, wherein the first, second, and third spin channel regions comprise a material which includes one of: Cu, Ag, Al, or 2D conducting materials.
Example 22 includes features of example 21, wherein the 2D conducting materials include graphene.
Example 23 includes features according to any one of examples 17 to 20, wherein the first and second filter layers comprise a material which includes one of: Mg, O, Al, O, B, N, Zn, Si, Ni, Fe, MgO, Al2O3, BN, MgAl2O4, ZnAl2O4, SiMg2O4, and SiZn2O4, or NiFeO.
Example 24 includes features according to any one of examples 17 to 20, wherein the 4-state input magnet and the first filter layer overlap the second spin channel region more than 4-state output magnet and second filter layer overlap the second spin channel region.
Example 25 is a system which comprises a memory; a processor coupled to the memory, the processor including an apparatus according to any one of apparatus examples 1 to 16 or apparatus examples 17 to 24; and a wireless interface for allowing the processor to communicate with another device.
Example 26 is an apparatus which comprises: input and output magnets, each configured to have four stable magnetic states including zero state, first state, second state, and third state, wherein the zero state is to point in a +x-direction, wherein the first state is to point in a +y-direction, wherein the second state is to point in a −y-direction, and wherein the third state is to point in a −x-direction.
Example 27 includes all features of example 26, wherein a thermal barrier between the zero, first, second, and third, is greater than or equal to 10 kT.
Example 28 includes features according to any one of examples 26 to 27, wherein the example 28 comprises: a first spin channel region adjacent to the input magnet; a second spin channel region adjacent to the input and output magnets; and a third spin channel region adjacent to the output magnet.
Example 29 includes features according to any one of apparatus examples 26 to 28, wherein the input and output magnets comprises a material which includes one of: Fe, Ni, Co and their alloys, magnetic insulators, or Heusler alloys of the form X2YZ.
Example 30 includes features of example 29, wherein the magnetic insulators comprises a material which includes one of: Fe, O, Y, Al, magnetite Fe3O4 or Y3Al5O12.
Example 31 includes features of example 30, wherein the Heusler alloys includes one of: Co, Fe, Si, Mn, Ga, Co2FeSi or Mn3Ga.
Example 32 includes features of example 28, wherein the first, second, and third spin channel regions comprises a material which includes one of: Cu, Ag, Al, or 2D conducting materials.
Example 33 includes features of example 32, wherein the 2D conducting materials include one of: Mo, S, W, S, Se, graphene, MoS2, MoSe, WS, or WSe.
Example 34 includes features of example 32, wherein the apparatus of example 34 comprises: a first oxide region separating at least a portion of the first spin channel region from the second spin channel region; and a second oxide region separating at least a portion the second spin channel region from the third spin channel region.
Example 35 includes features of example 34, wherein a portion of the first spin channel region is adjacent to a portion of the second spin channel region, and wherein a portion of the second spin channel region is adjacent to a portion of the third spin channel region.
Example 36 includes features of example 35, wherein the apparatus of example 36 comprises a third oxide region separating the input magnet from the output magnet.
Example 37 includes features of example 32, wherein the apparatus of example 37 comprises a non-magnetic metal adjacent to the input magnet and the output magnet.
Example 38 includes features of example 37, wherein the non-magnetic metal is coupled to a positive supply to configure the apparatus as a buffer.
Example 39 includes features of example 38, wherein the non-magnetic metal is coupled to a negative supply to configure the apparatus as an inverter.
Example 40 is a system which comprises: a memory; a processor coupled to the memory, the processor including an apparatus according to any one of apparatus examples 26 to 39; and a wireless interface for allowing the processor to communicate with another device.
Example 41 is a method which comprises: forming a 4-state input magnet; forming a first spin channel region adjacent to the 4-state input magnet; forming a 4-state output magnet; forming a second spin channel region adjacent to the 4-state input and output magnets; and forming a third spin channel region adjacent to the 4-state output magnet.
Example 42 includes features of example 41, wherein the 4-state input and output magnets comprise a material which includes one of: Fe, Ni, Co and their alloys, magnetic insulators, or Heusler alloys of the form X2YZ.
Example 43 includes features of example 42, wherein the magnetic insulators comprise a material which includes one of: Fe, O, Y, Al, magnetite Fe3O4 or Y3Al5O12.
Example 44 includes features of example 42, wherein the Heusler alloys comprises one of: Co, Fe, Si, Mn, Ga, Co2FeSi or Mn2Ga.
Example 45 is according to any one of method examples 41 to 44, wherein the first, second, and third spin channel regions comprise a material which includes one of: Cu, Ag, Al, or 2D conducting materials.
Example 46 includes all features of example 45, wherein the 2D conducting materials is graphene.
Example 47 is according to any one of method examples 41 to 44, wherein the method of example 47 comprises forming a first oxide region separating at least a portion of the first spin channel region from the second spin channel region.
Example 48 includes feature of example 47, wherein the method of example 48 comprises forming a second oxide region separating at least a portion the second spin channel region from the third spin channel region.
Example 49 includes features of example 48, wherein the method of example 48 comprises: positioning a portion of the first spin channel region adjacent to a portion of the second spin channel region; and positioning a portion of the second spin channel region is adjacent to a portion of the third spin channel region.
Example 50 includes features of example 49, wherein the method of example 49 comprises forming a third oxide region separating the 4-state input magnet from the 4-state output magnet.
Example 51 includes features of example 47, wherein the method of example 47 comprises forming a non-magnetic metal adjacent to the 4-state input magnet from the 4-state output magnet.
Example 52 includes features of example 51, wherein the method of example 52 comprises coupling the non-magnetic metal to a positive supply to operate as a buffer.
Example 53 includes features of example 51, wherein the method of example 51 comprises: coupling the non-magnetic metal to a negative supply to operate as an inverter.
Example 54 includes features of example 47, wherein the method of example 54 comprises: forming a via adjacent to the second spin channel region; and forming a non-magnetic metal adjacent to via.
Example 55 is according to any one of method claims 41 to 44, wherein the 4-state input and output magnets have cubic magnetic crystalline anisotropy.
Example 56 is according to any one of method claims 41 to 44, wherein the method of example 56 comprises overlapping the 4-state input magnet the second spin channel region more than 4-state output magnet overlaps the second spin channel region.
Example 57 is a method which comprises: forming a 4-state input magnet; forming a first filter layer adjacent to the 4-state input magnet; forming a first spin channel region adjacent to the first filter layer; forming a 4-state output magnet; forming a second filter layer adjacent to the 4-state output magnet; forming a second spin channel region adjacent to the first and second filter layers; and forming a third spin channel region adjacent to the second filter layer.
Example 58 includes all features of example 57, wherein the 4-state input and output magnets comprises a material which includes one of: Fe, Ni, Co and their alloys, magnetic insulators, or Heusler alloys of the form X2YZ.
Example 59 includes all features of example 58, wherein the magnetic insulators comprises a material which includes one of: Fe, O, Y, Al, magnetite Fe3O4 or Y3Al5O12.
Example 60 includes features of example 58, wherein the Heusler alloys includes one of: Co, Fe, Si, Mn, Ga, Co2FeSi or Mn2Ga.
Example 61 is according to any one of method examples 57 to 60, wherein the first, second, and third spin channel regions comprise a material which includes one of: Cu, Ag, Al, or 2D conducting materials.
Example 62 includes features of example 61, wherein the 2D conducting materials include graphene.
Example 63 includes features of example 57, wherein the first and second filter layers comprise a material which includes one of: Mg, O, Al, O, B, N, Zn, Si, Ni, Fe, MgO, Al2O3, BN, MgAl2O4, ZnAl2O4, SiMg2O4, and SiZn2O4, and NiFeO.
Example 64 includes all features of example 57, wherein the method of example 57 comprises overlapping the 4-state input magnet and the first filter layer to the second spin channel region more than 4-state output magnet and second filter layer are overlap the second spin channel region.
An abstract is provided that will allow the reader to ascertain the nature and gist of the technical disclosure. The abstract is submitted with the understanding that it will not be used to limit the scope or meaning of the claims. The following claims are hereby incorporated into the detailed description, with each claim standing on its own as a separate embodiment.
This application is a Continuation of, and claims priority to, U.S. patent application Ser. No. 15/779,074, filed on May 24, 2018 and titled “MULTI-LEVEL SPIN LOGIC,” which is a National Stage Entry of, and claims priority to, International Application No. PCT/US2016/068596, filed on Dec. 23, 2016 and titled “MULTI-LEVEL SPIN LOGIC,” which claims priority to U.S. Provisional Application No. 62/380,327 titled “MULTI-LEVEL SPIN LOGIC” and filed Aug. 26, 2016, which is incorporated by reference in its entirety. This application also claims priority to International Application No. PCT/US2015/000613 titled “MULTI-LEVEL SPIN BUFFER AND INVERTER” filed Dec. 24, 2015, which is also incorporated by reference in its entirety for all purposes.
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Number | Date | Country | |
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20210143819 A1 | May 2021 | US |
Number | Date | Country | |
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62380327 | Aug 2016 | US |
Number | Date | Country | |
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Parent | 15779074 | US | |
Child | 17152552 | US | |
Parent | PCT/US2015/000513 | Dec 2015 | US |
Child | 15779074 | US |