The present invention will be hereinafter explained in detail with reference to the drawings on the basis of examples.
A multi-range three-axis acceleration sensor device according to EXAMPLE 1 of the present invention will be hereinafter explained using
As shown in
The structure of the multi-range sensor chip 40a will be explained using
Similarly, in the second three-axis acceleration sensor element 50′, a second element weight 51a′ is supported in a second element frame 52′ by a second element first beam 53a′ and a second element second beam 54a′ of respective two beams. X axis piezo resistors and Z axis piezo resistors are formed on the second element first beam 53a′ along the X axis. Y axis piezo resistors are formed on the second element second beam 54a′ along the Y axis.
The second three-axis acceleration sensor element 50a′ has a small output voltage per unit acceleration compared with the first three-axis acceleration sensor element 50a. In other words, the second three-axis acceleration sensor element 50a′ was set in a wider measurement range with respect to a full scale of an output voltage. For example, it is possible to set a measurement range of the first three-axis acceleration sensor element 50a to ±several G and use the first three-axis acceleration sensor element 50a for fall detection and set a measurement range of the second three-axis acceleration sensor element 50a′ to ±several hundred G and use the second three-axis acceleration sensor element 50a′ for impact detection. Plural chip terminals 41a are formed on the multi-range sensor chip 40a.
A manufacturing method and dimensions of the acceleration sensor elements will be briefly explained. An SOI (Silicon on Insulator) wafer including a silicon oxide layer having the thickness of several μm and a silicon layer having the thickness of 6 μm was used as a silicon plate haying the thickness of about 400 μm. Patterning was performed by a photoresist and boron of 1 to 3×1018 atom/cm3 was driven into the silicon layer to form a piezo resistor. Wiring connected to the piezo resistor was formed using a metal sputter and a dry etching device. The silicon layer and the silicon plate were machined using photolithography and the dry etching device. Beams were formed in the silicon layer and weights were formed over the silicon layer and the silicon plate. The silicon oxide layer functions as an etching stopper when dry etching of silicon is performed. A large number of chips were manufactured on one wafer and separated into single chips by dry etching or dicing.
In the multi-range three-axis acceleration sensor device according to this example, it is possible to collectively form the first three-axis acceleration sensor element 50a and the second three-axis acceleration sensor element 50a′ on one multi-range sensor chip 40a. Shapes of both the sensor elements are created on a mask for silicon dry etching to simultaneously machine and form the sensor elements. In this way, it is possible to from the two sensor elements having different measurement ranges without the addition of processes and it is possible to reduce manufacturing cost. Since the second three-axis acceleration sensor element 50a′ is formed on one of four frame sides forming the frame 52a of the first three-axis acceleration sensor element 50a, it is possible to commonly use frames of the two sensor elements and fit the sensor elements in a small area. Thus, it is possible to reduce a size of the multi-range three-axis acceleration sensor device. Further, since it is possible to adjust directions of the beams of the two sensor elements using mask patterns, it is possible to cause acceleration detection axes of the two sensor elements to highly accurately coincide with each other.
Schematic dimensions of the multi-range sensor chip 40a according to EXAMPLE 1 will be explained. In the first three-axis acceleration sensor element 50a, the length of one beam was set to 400 μm, the width thereof is set to 40 μm, and an external dimension of the weight was set to 900 μm×900 μm. In order to fit the weight and the beams in a small area, the weight was formed in a shape obtained by hollowing connecting portions of the beams. Consequently, the weight was formed in a clover shape as shown in
The output voltage per acceleration 1 G at the input voltage of 3 V was about 2.0 mV on all the X, Y, and Z axes in the first three-axis acceleration sensor element 50a and was about 0.015 mV on the X and Y axes and about 0.01 mV on the Z axis in the second three-axis acceleration sensor element 50a′. When the output voltages were compared, the output voltage in the first three-axis acceleration sensor element 50a was about 200 times as larger as that in the second three-axis acceleration sensor element 50a′. When the output voltages are amplified at the same amplification ratio by an amplifier circuit and output voltages at a full scale are set the same, the measurement range of the first three-axis acceleration sensor element 50a is 1/200 of that of the second three-axis acceleration sensor element 50a′. For example, when the amplification ratio is set to 150 times and the full scale output voltage is set to ±900 mV, the measurement range is ±3 G in the first three-axis acceleration sensor element 50a and is ±600 G in the second three-axis acceleration sensor element 50a′. When accelerations of various intensities ranging from small acceleration equal to or smaller than 1 G to large acceleration of several hundred G were measured by such a multi-range three-axis acceleration sensor device, the accelerations could be measured with satisfactory linearity using the first three-axis acceleration sensor element 50a in the range of ±3 G and using the second three-axis acceleration sensor element 50a′ in the range of ±600 G.
As shown in the example of dimensions described above, in order to set an output voltage per unit acceleration smaller in the second three-axis acceleration sensor element 50a′ than the first three-axis acceleration sensor element 50a, it is desirable to shorten the beams, increase the width of the beams and increase the bending rigidity of the beams. It is also desirable to reduce the external dimension of the weight and reduce the weight of the weights. Consequently, it is desirable that the area in which the weight and the beams are arranged is smaller in the second three-axis acceleration sensor element 50a′. In other words, it is desirable that a space area in the frame decreases, i.e., a distance connecting connection points of the two beams with the frame decreases.
When the sensor elements had the dimension described above, a resonance frequency of the first three-axis acceleration sensor element 50a was about 1.5 kHz and a resonance frequency of the second three-axis acceleration sensor element 50a′ was about 25 kHz. In the case of detection of impact acceleration, when oscillation near a resonance frequency of an acceleration sensor is applied to the acceleration sensor by impact collision of an apparatus mounted with the sensor, it is likely that the oscillation at the resonance frequency is not attenuated and remains to cause deficiency in a detection waveform. Therefore, in the impact detection, it is necessary to set the resonance frequency high. In the second three-axis acceleration sensor element 50a′ that measures the high acceleration range, the bending rigidity of the beams is set high and the weight of the weight is set low and a resonance frequency of the sensor element is high. Thus, the second three-axis acceleration sensor element 50a′ is suitable to be used for the impact detection.
When acceleration far exceeding the measurement range is applied to the first three-axis acceleration sensor element 50a that measures the low acceleration range, excess stress is applied to the beams to break the beams. Therefore, regulating plates were arranged above and below the weight of the sensor element at a certain space apart from each other. In this example, the IC regulating plate 3a as the IC chip on which a detection circuit was formed was arranged above the weight. The inner bottom of the case 1a was used as the regulating plate below the weight. It is possible to set the thickness of the entire sensor smaller than when an independent regulating plate is set separately from the IC regulating plate 3a and the case 1a. The space between the regulating plates and the weight is a space for preventing the weight from colliding with the regulating plates in the measurement range and allowing the weight to collide with the regulating plates before the beams are deformed to be broken. In this example, the space was set to 15 μm. In order to accurately form the space, plastic balls having a substantially fixed outer diameter were mixed in the first adhesives 16a and 16a′ to make it possible to regulate the space with the plastic balls as a spacer. In the second three-axis acceleration sensor element 50a′ having the large measurement range, the beams may not be broken even if assumed maximum acceleration is applied to the sensor element. In that case, the regulating plates do not have to be provided above and below the second three-axis acceleration sensor element 50a′. In other words, the IC regulating plate 3a may be arranged in an area that covers from above the first three-axis acceleration sensor element 50a and does not cover from above the second three-axis acceleration sensor element 50a′.
The multi-range three-axis acceleration sensor device according to EXAMPLE 2 of the present invention will be explained using
As shown in
The structure of the multi-range sensor chip 40b will be explained using
The second diaphragm-type three-axis acceleration sensor element 70b′ has the same structure. However, the second diaphragm-type three-axis acceleration sensor element 70b′ is formed on one frame side of the frame 72b of the first diaphragm-type three-axis acceleration sensor element 70b.
The second diaphragm-type three-axis acceleration sensor element 70b′ has a small output voltage per unit acceleration compared with the first diaphragm-type three-axis acceleration sensor element 70b. In other words, the second diaphragm-type three-axis acceleration sensor element 70b′ is set in a wider measurement range with respect to a full scale of an output voltage. For example, it is possible to set a measurement range of the first diaphragm-type three-axis acceleration sensor element 70b to ±several G and use the first diaphragm-type three-axis acceleration sensor element 70b for fall detection and set a measurement range of the second diaphragm-type three-axis acceleration sensor element 70b′ to ±several hundred G and use the second diaphragm-type three-axis acceleration sensor element 70b′ for impact detection. Plural chip terminals 41b are formed on the multi-range sensor chip 40b.
In the multi-range three-axis acceleration sensor device according to this example, it is possible to collectively form the first diaphragm-type three-axis acceleration sensor element 70b and the second diaphragm-type three-axis acceleration sensor element 70b′ on one multi-range sensor chip 40b. Shapes of both the sensor elements are created on a mask for silicon dry etching to simultaneously machine and form the sensor elements. In this way, it is possible to form the two sensor elements having different measurement ranges without the addition of processes and it is possible to reduce manufacturing cost. Since the second diaphragm-type three-axis acceleration sensor element 70b′ is formed within the frame 72b of the first diaphragm-type three-axis acceleration sensor element 70b, it is possible to commonly use frames of the two sensor elements and fit the sensor elements in a small area. Thus, it is possible to reduce a size of the multi-range three-axis acceleration sensor device. Further, since it is possible to adjust directions of the flexible members of the two sensor elements using mask patterns, it is possible to cause acceleration detection axes of the two sensor elements to highly accurately coincide with each other. The thicknesses of the frames 72b and 72b′ and the weights 71b and 71b′ of the first diaphragm-type three-axis acceleration sensor element 70b and the second diaphragm-type three-axis acceleration sensor element 70b′ were set the same and the thicknesses of the flexible members 73b and 73b′ of diaphragms were made the same.
In order to make an output voltage per unit acceleration smaller in the second diaphragm-type three-axis acceleration sensor element 70b′ than the first diaphragm-type three-axis acceleration sensor element 70b, it is desirable to increase the width of the diaphragm of the second diaphragm-type three-axis acceleration sensor element, i.e., the distance between the weights and the frame and increase the bending rigidity of the diaphragm. It is also desirable to reduce the external dimensions of the weights and reduce the weight of the weights. Consequently, it is desirable that the area in which the weights and the flexible members of the second diaphragm-type three-axis acceleration sensor element 70b′ are arranged is smaller. In other words, it is desirable that a space area in the frame decreases.
In the case of detection of impact acceleration, when oscillation near a resonance frequency of an acceleration sensor is applied to the acceleration sensor by impact collision of an apparatus mounted with the sensor, it is likely that the oscillation at the resonance frequency is not attenuated and remains to cause deficiency in a detection waveform. Therefore, in the impact detection, it is necessary to set the resonance frequency high. In the second diaphragm-type three-axis acceleration sensor element 70b′ that measures the high acceleration range, the bending rigidity of the flexible members is set high and the weight of the weights is set low. Thus, a resonance frequency of the sensor element is high and the second diaphragm-type three-axis acceleration sensor element 70b′ is suitable to be used for the impact detection.
When acceleration far exceeding the measurement range is applied to the first diaphragm-type three-axis acceleration sensor element 70b that measures the low acceleration range, excess stress is applied to the flexible members of the diaphragm shape to break the flexible members. Therefore, regulating plates were arranged above and below the weight of the sensor element at a certain space apart from each other. In this example, the IC regulating plate 3b as the IC chip on which a detection circuit was formed was arranged above the weights. The inner bottom of the case 1b was used as the regulating plate below the weights. It is possible to make the thickness of the entire sensor smaller than when an independent regulating plate is set separately from the IC regulating plate 3b and the case 1b. The space between the regulating plates and the weights is a space for preventing the weights from colliding with the regulating plates in the measurement range and allowing the weights to collide with the regulating plates before the flexible members are deformed to be broken. In order to accurately form the space, plastic balls having a substantially fixed outer diameter were mixed in the first adhesives 16b and 16b′ to make it possible to regulate the space with the plastic balls as a spacer. In the second diaphragm-type three-axis acceleration sensor element 70b′ having the large measurement range, the flexible members may not be broken even if assumed maximum acceleration is applied to the sensor element. In that case, the regulating plates do not have to be provided above and below the second diaphragm-type three-axis acceleration sensor element 70b′. In other words, the IC regulating plate 3b may be arranged in an area that covers from above the first diaphragm-type three-axis acceleration sensor element 70b and does not cover from above the second diaphragm-type three-axis acceleration sensor element 70b′.
The multi-range three-axis acceleration sensor device according to EXAMPLE 3 of the present invention will be hereinafter explained.
The multi-range three-axis acceleration sensor device according to EXAMPLE 4 of the present invention will be hereinafter explained.
EXAMPLE 5 of the present invention is a multi-range three-axis acceleration sensor device that can detect, with an acceleration detection range further added, three-axis acceleration in three different acceleration ranges. The schematic structure of a multi-range sensor chip 40e is shown in a perspective view in
In this example, the first diaphragm-type three-axis acceleration sensor element 70e has a square diaphragm, the second diaphragm-type three-axis acceleration sensor element 70e′ has a polygonal diaphragm, and the third diaphragm-type three-axis acceleration sensor element 70e″ has a circular diaphragm. Shapes of frames 72e, 72e′, and 72e″ and weights 71e, 71e′, and 71e″ are changed to match the shapes of the diaphragms. In this way, it is possible to select not only a square shape but also a polygonal shape and a circular shape. The thicknesses of the frames 72e, 72e′, and 72e″ and the weights 712e, 71e′, and 71e″ from the first to third diaphragm-type three-axis acceleration sensor elements were set the same and the thicknesses of the flexible members 73e, 73e′, and 73e″ thereof were set the same.
EXAMPLE 6 of the present invention is a multi-range three-axis acceleration sensor device that can detect three-axis acceleration in three different acceleration ranges. A schematic structure of a multi-range sensor chip 40f is shown in
A multi-range three-axis acceleration sensor device according to EXAMPLE 7 will be explained.
The two-axis acceleration sensor element is different from the three-axis acceleration sensor element in that the two-axis acceleration sensor element has beams forming a pair. It is possible to detect acceleration on a first axis (an X axis) in the direction in which the beams extend and a second axis (a Z axis) perpendicular to a chip plane with piezo resistors formed on the beams. Since the two two-axis acceleration sensor elements are arranged such that first axes thereof are orthogonal to each other, it is possible to detect three axes, i.e., two axes (X axis and Y axis), which are first axis direction of the two elements, and the Z axis. The detection of the Z axis can be performed by one of the two elements. In this example, the beams 63g of the first two-axis acceleration sensor element 60g was arranged along the X axis and an X axis piezo resistor and a Z axis piezo resistor were provided. The beams 63g′ of the second two-axis acceleration sensor element 60g′ were arranged along the Y axis and a Y axis piezo resistor was provided.
Since the two-axis acceleration sensor element has the pair of beams, bending rigidity of the beams as a whole is smaller that that of the three-axis acceleration sensor element having the two pairs of beams. Thus, it is possible to reduce dimensions of the weights to obtain the same output voltage per unit acceleration. Since the beams extend only in one direction, it is possible to fit the beams in a smaller frame. A total area of the two elements is larger than that of the three-axis acceleration sensor element. However, it is possible to reduce dimensions of the entire multi-range three-axis acceleration sensor device by providing two-axis elements in the second and subsequent acceleration sensor elements and arranging the acceleration sensor elements in the first three-axis acceleration sensor element having largest dimensions. In other words, it is possible to select whether three axes are provided in one first three-axis acceleration sensor element and three axes are provided the second and subsequent three-axis acceleration sensor elements, respectively, or two two-axis acceleration sensor elements are provided.
Schematic dimensions of the multi-range sensor chip according to EXAMPLE 7 will be described. The first three-axis acceleration sensor element 50g has the same size and the same structure as the first three-axis acceleration sensor element 50a in EXAMPLE 1. The first two-axis acceleration sensor element 60g and the second two-axis acceleration sensor element 60g′ had the same dimensions. The length of beams thereof was set to 120 μm, the width thereof was set to 100 μm, and external dimension of weights was set to 150 μm×150 μm. In this case, an output voltage per acceleration 1 G at an input voltage of 3 V was about 2.0 mV on all the X, Y, and Z axes in the first three-axis acceleration sensor element and was about 0.01 mV on all the X, Y, and Z axes in the second three-axis acceleration sensor element. The first and second two-axis acceleration sensor elements could obtain an output voltage per unit acceleration equivalent to that of the second three-axis acceleration sensor element 50a′ in EXAMPLE 1 with the weights having an area smaller than that of the conical shape weighs of the second three-axis acceleration sensor element 50a′. By arranging the first and second two-axis acceleration sensor elements having the dimensions described above as shown in
EXAMPLE 8 is the structure in which, as shown in
In the multi-range three-axis acceleration sensor device according to EXAMPLE 6 shown in
In a multi-range sensor chip 40j according to EXAMPLE 10 shown in
In the multi-range three-axis acceleration sensor device according to these examples, for accelerations of various intensities ranging from 1 G or less to several hundred G, the accelerations could be measured with satisfactory linearity using the three-axis acceleration sensor elements suitable for acceleration intensity.
A multi-range three-axis acceleration sensor device according to EXAMPLE 11 of the present invention will be hereinafter explained. The structure of a multi-range sensor chip 40k according to EXAMPLE 11 is shown in a perspective view in
The beam-type two-axis acceleration sensor elements 60k and 60k′ are different from the beam-type three-axis acceleration sensor element 50k in that the beam-type two-axis acceleration sensor elements 60k and 60k′ have the pairs of beams 63k and 63k′, respectively. It is possible to detect acceleration on a first axis (an X axis) in a longitudinal direction of the beams and acceleration on a second axis (a Z axis) perpendicular to a chip plane with the piezo resistors formed on the beams 63k and 63k′. Since the two two-axis acceleration sensor elements are arranged such that the first axes thereof are orthogonal to each other, it is possible to detect acceleration on three axes in total, i.e., two axes (X axis and Y axis) extending in axis directions in which the beams of the two elements extend, respectively, and the Z axis. The detection of Z axis acceleration may be performed by one of the two elements or may be performed by both the elements. In this example, the beams 63k of the first beam-type two-axis acceleration sensor element 60k were arranged along the X axis and an X axis piezo resistor and a Z axis piezo resistor are formed. The beam 63k′ of the second beam-type two-axis acceleration sensor element 60k′ was arranged along the Y axis and a Y axis piezo resistor was formed.
Since the beam-type two-axis acceleration sensor element has the pair of beams, bending rigidity of the beams as a whole is smaller that that of the beam-type three-axis acceleration sensor element having the two pairs of beams. Thus, it is possible to reduce dimensions of the weights to obtain the same output voltage per unit acceleration. Since the beams extended only in one direction, the beams could be fit within a smaller frame.
In a multi-range three-axis acceleration sensor device according to EXAMPLE 12, wafer level packaging is applied to an outer side of the sensor element forming area of the multi-range sensor chip 40a explained in EXAMPLE 1. The multi-range three-axis acceleration sensor device according to EXAMPLE 12 is shown in cross-sectional views in
Appropriate spaces are provided between the weights 51a and 51a′ of the sensor element and the first cap 3m and the second cap 3m′ to play a role of regulating plates that regulate displacement of the weights and prevent breakage of the beams when excess acceleration is applied. A chip protection film 45a is formed on an upper surface of the multi-range sensor chip 40a. Wiring connecting a chip terminal 41a arranged on the outside of the hermetically sealed package and piezo resistors is drawn out to the outside of the hermetically sealed package through below the chip protection film 45a. The first cap 3m and the second cap 3m′ were formed of silicon wafer and the cavity 32m was machined by anisotropic etching or dry etching of silicon. The bonding of the multi-range sensor chip 40a and the first cap 3m and the second cap 3m′ was performed in a state of wafer. After the bonding, the multi-range sensor chip 40a and the first cap 3m and the second cap 3m′ were integrated into one piece of an individual sensor chip package 100m. Solder of AuSn was used for the bonding. Besides, it is also possible to use soldering and eutectic bonding of various kinds of metal, surface activation bonding, anodic bonding, low-melting glass bonding, and the like. In integrating the multi-range sensor chip 40a and the first cap 3m and the second cap 3m′ into one piece, it is necessary to expose a chip electrode. Thus, in the first cap, a cavity was formed in an upper area of the chip electrode and only the first cap 2m was cut by a first dicing unit A to expose chip electrodes 41a. Thereafter, the multi-range sensor chip 40a and the second cap 3m′ were cut by a second dicing unit B and integrated into one piece.
Since the sensor element is protected in the hermetically sealed package, as a package of the entire sensor, it is possible to adopt an inexpensive plastic package generally used. An example of the structure in which a metal lead frame and resin sealing is shown in
Number | Date | Country | Kind |
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2006-216533 | Aug 2006 | JP | national |
2006-251006 | Sep 2006 | JP | national |