The present invention relates generally to electronic devices, and more specifically, to sensors for electronic devices.
Many devices use sensors to detect one or more characteristics or parameters. For example, many touch-screen electronic devices may include capacitive sensors (and/or alternative sensors) that may detect a user's touching the screen of the device, and register this as an input. Often, some sensors may require one or more components to be mounted on a substrate, such as silicon. This substrate may be opaque and, thus, the sensor substrate may be visible through portions of the electronic device if it is so positioned. For example, capacitive imaging sensors are typically manufactured using complementary metal—oxide—semiconductor (CMOS) process on a silicon substrate. Because the silicon is not transparent to light, the sensor often is positioned on areas of the electronic device that are not used to display visual information, or beneath such areas.
Additionally, the opaque nature of the sensor substrate may prevent other sensors from being stacked beneath the first sensor, which may limit the number of parameters sensed for a particular input and/or limit the amount of data that may be collected. Moreover, the substrate for the sensor may introduce additional thickness to the device that may increase the overall thickness of the device.
Examples of the disclosure may include an electronic device. The electronic device includes a processor and a sensing element in communication with the processor. The sensing element includes a first sensor and a second sensor, where first sensor and the second sensor are vertically aligned. Additionally, at least one of the first sensor and the second sensor is transparent.
Other examples of the disclosure include a method for creating a sensor chip. The method includes creating a first sensor configured to sense a first parameter, the first sensor having a first original thickness, bonding a carrier wafer to a first side of the first sensor, reducing the first original thickness of the first sensor to a first thinned thickness, and bonding a second sensor configured to sense a second parameter to the first sensor, the second sensor having a second original thickness.
Yet other examples of the disclosure include a method for creating a sensing element for a computing device. The method includes creating a transparent sensor chip configured to sense two types of inputs and attaching the transparent sensor chip to a substrate.
The disclosure may take the form of a method for creating a sensor without a traditional, separate substrate to which the sensor is attached. Rather, such a substrate may be omitted and the sensor may be mounted on, and/or incorporated into, a functional element of the device. As an example, the sensor may be mounted on a cover glass for a touch screen or other display of a computing device. Additionally, because the substrate used during formation of the sensor may be omitted or removed after processing, the substrate on which the sensor is actually mounted on during use can be configured to have certain properties or characteristics, such as transparency, a certain thickness, and the like. In other words, the parameters of the substrate used to mount the sensor may not be constrained by the requirements of the manufacturing process of the sensor.
Additionally, the method may include operations for connecting two or more sensors together, thereby forming a sensor stack. This may allow two or more sensors to detect data or parameters through the same stack (e.g., vertical location). For example, a bottom sensor may detect one or more optical properties although an upper or top sensor is positioned atop it. As one specific example, the top sensor may detect changes in capacitance (for example, function as a touch sensor, or a fingerprint sensor) and the bottom sensor may detect optical light wavelengths (e.g., function as an image sensor). Likewise, another embodiment may include one sensor for capacitive fingerprint sensing, and a second sensor operative to sense force. As another example, the top sensor may detect a first type of optical parameter, such as visible light, and a second sensor may detect a second type of optical parameter, such as a infrared light.
The method may include creating or manufacturing a first sensor wafer. The first sensor wafer may be constructed based on the desired properties of the sensor. Once the first sensor wafer is constructed, a second wafer or carrier wafer is bonded to the first sensor wafer. Once bonded together, the wafer stack may be processed and one or both of the wafers may be thinned or otherwise reduced in thickness. For example, the first sensor wafer may be background and/or polished to thin the wafer. Often, the first sensor wafer may be sufficiently thinned to be substantially (if not completely) transparent. In some embodiments, and depending on the material making up the sensor, this may mean that the sensor wafer is equal to or less than 1 micron thick. Continuing with this example, the carrier wafer may not be thinned, such that the wafer stack may be able to be handled, despite the reduction in thickness of the first sensor stack. In another example, both the first sensor wafer and the carrier wafer may be thinned; however, one of the wafers may be thinned further than the other.
In some embodiments, after the first sensor wafer has been thinned, a second sensor wafer may be connected to the first sensor wafer. Once connected, the second sensor wafer may also be thinned. The first and second wafers may be mounted on a permanent substrate or mounting substrate and the carrier wafer may be removed (e.g., using solvents, grinding, etching and the like). In these embodiments, the carrier wafer may function as a processing substrate that provides structural support for the first and/or second wafer stacks during manufacturing, but is removed prior to the sensor stack being implemented in a device or component. This allows the permanent substrate to be selected based on desired characteristics or properties that may be separate from the requirements of the substrate during manufacturing.
In other embodiments, the carrier wafer may remain attached to the sensor stack and may provide certain functions for the sensor stack. For example, the carrier wafer may be an active wafer including logic and/or mixed signal circuitry that may be connected to one or both of the sensor wafers. Additionally, in some embodiments, the carrier wafer may be transparent or partially transparent, which may allow light to be transmitted therethrough.
As generally discussed above, the sensor chip may include a transparent sensor and/or substrate. The sensor may be incorporated into a number of different components of an electronic device. For example, the sensor can be incorporated into a display, camera, and/or input button for the electronic device. As a specific example, the sensor chip may include a very thin crystalline silicon layer positioned above a visual display. The silicon layer may be sufficiently thin to be transparent or substantially transparent. The sensor can be modulated electrically, grounded, allowed to float, or held at a particular potential. As one example, the main area of the sensor can include the sensing array (such as a capacitive imaging array) and any remaining additional circuit elements, such as transistors and the like, may surround the sensing array around the edges, which may allow the sensing array to be at least partially transparent.
In yet other examples, the sensor chip may be completely transparent. For example, the sensor chip may include a sensor layer or wafer where, during manufacturing, excess material is removed and the sensing elements, such as electrodes for detecting changes in capacitance, may form the entire structure of the sensor. In these embodiments, the sensor may be connected to control electronics, such as drive/sense lines in the capacitance sensing example, from an outside area of the sensor or of a display. In these embodiments, a third wafer or substrate, which may be transparent, may be connected to the sensing elements of the sensor, which eliminates the need for any remaining silicon on the edges of the sensing array.
Turning now to the figures, a sensor chip and an illustrative electronic device for incorporating the sensor chip be discussed in more detail.
The display 104 may be operably connected to the electronic device 100 or may be communicatively coupled thereto (e.g., a standalone monitor in communication with a computer). The display 104 may provide a visual output for the electronic device 100 and/or may function to receive user inputs to the electronic device 100. For example, the display 104 may be a multi-touch capacitive sensing screen that may detect one or more user inputs. An example of the display will be discussed in more detail below with respect to
With reference to
The input member 108 (which may be a switch, button, capacitive sensor, or other input mechanism) allows a user to interact with the electronic device 100. For example, the input member 108 may be a button or switch to alter the volume, return to a home screen, or the like. The electronic device 100 may include one or more input members 108 and/or output members, and each member may have a single input or output function or multiple input/output functions. In some embodiments, the input member may include output functionality in addition to the input capabilities. As a specific example, the input member 108 may include one or more mechanisms for providing haptic feedback.
With reference to
The processor or processing element 112 may control one or more functions and/or operations of the electronic device 100. The processing element 112 may be in communication, either directly or indirectly, with substantially all of the components of the electronic device 100. For example, one or more system buses 118 or other communication mechanisms may provide communication between the processing element 112, the camera 110, the display 104, the input member 108, the sensors 120, and so on. The processing element 112 may be any electronic device cable of processing, receiving, and/or transmitting instructions. For example, the processing element 112 may be a microprocessor or a microcomputer. As described herein, the terms “processor” and “processor element” are meant to encompass a single processor or processing unit, multiple processors, or multiple processing units, or other suitably configured computing element.
The memory 126 may include one or more storage or memory components that store electronic data that may be utilized by the electronic device 100. For example, the memory 126 can store electrical data or content e.g., audio files, video files, document files, and so on, corresponding to various applications. The memory 126 may be, for example, non-volatile storage, a magnetic storage medium, optical storage medium, magneto-optical storage medium, read only memory, random access memory, erasable programmable memory, or flash memory.
The network/communication interface 114 may provide connection to one or more connection or networking systems for the electronic device 100 and/or facilitate transmission of data to a user or to other electronic devices. For example, the network/communication interface 114 may transmit data between the electronic device 100 and one or more networks (e.g., WiFi, Ethernet, Bluetooth), cellular networks, and so on. The type of communication network may depend on a variety of different requirements, design parameters, and so on, and as such the network/communication interface 114 may be modified as desired. In embodiments where the electronic device 100 is a phone, the network/communication interface 114 may be used to receive data from a network, or may be used to send and transmit electronic signals via a wireless or wired connection (Internet, WiFi, Bluetooth, and Ethernet being a few examples). In some embodiments, the network/communication interface 114 may support multiple network or communication mechanisms. For example, the network/communication interface 114 may pair with another device over a Bluetooth network to transfer signals to the other device, while simultaneously receiving data from a WiFi or other network.
The input/output interface 118 may receive data from a user or one or more other electronic devices. For example, the input/output interface 118 may determine user inputs to a touch-screen display or element, as well as user inputs to the one or more input members 108. Additionally, the input/output interface 118 may determine or facilitate output to one or more output devices, such as speakers, haptic devices, headphones, and the like.
The power source 116 may be substantially any device capable of providing energy to the electronic device 100. For example, the power source 116 may be a battery, a connection cable that may be configured to connect the electronic device 100 to another power source such as a wall outlet, or the like.
In addition to the sensor chip 120, which will be discussed in more detail below, the electronic device 100 may include one or more other sensors that may be used to provide data to the electronic device. For example, the electronic device 100 may include one or more audio sensors (e.g., microphones), light sensors (e.g., ambient light sensors), gyroscopes, accelerometers, or the like. The sensors may be used to provide data to the processing element 112, which may be used to enhance or vary functions of the electronic device 100.
The sensor chip 120 will now be discussed in further detail.
With reference first to
Although one or both of the sensors 122, 124 may sense one or more optical characteristics, the sensors 122, 124 may be stacked on top of another because one or both of the sensors 122, 124 may be substantially transparent. For example, the first sensor 122 may be a capacitive sensor and may be substantially transparent and the second sensor 124 may be an optical sensor and may sense optical characteristics after light waves have been transmitted through the first sensor 122. Because one or both of the sensors 122, 124 may be transparent (or include transparent elements), the sensor chip 120 may sense two or more characteristics from a single input (e.g., a capacitive characteristics as well as an optical image). One or both of the sensors 122, 124 may include bond pads 146 that provide electrical communication to the sensing array or sensing elements within the sensors 122, 124. The bond pads 146 may be a transparent material such as indium tin oxide (ITO) or an opaque or non-transparent material that may be sufficiently thin to be substantially transparent.
As shown in
With reference to
The substrate 126 may be a transparent material or may be sufficiently thinned or have a sufficiently thin thickness to be essentially transparent. As some examples, the substrate 126 may be glass, sapphire, silicon, thermoplastic material, or the like.
Alternatively or additionally, as shown in
In instances where the sensor chip includes a temporary substrate during manufacturing, after manufacturing the sensor chip 120 can be mounted on a component of the electronic device 100 that may function as a mounting substrate 126. For example, the sensor chip 120 may be mounted to the cover glass of the display 104 or a lens of the camera 110. As another example, the sensor chip 120 may be mounted to an encapsulation glass for an organic light emitting diode (OLED).
The sensor chip 120 may be connected to a variety of different components having different material properties that may function as a support or substrate for the sensor stack. As discussed herein the substrate 126 may refer to any substrate used during or after manufacturing of the sensor chip 120. For example, the substrate 126 may be the carrier substrate used during processing but then later removed, the substrate 126 may be the carrier substrate that also forms a support substrate and/or active wafer after processing, and/or the substrate may represent the secondary or permanent substrate that may be attached to the sensor chip 120 after (or shortly before) the carrier substrate is removed. As such, as used herein the term substrate is meant to encompass both a carrier substrate or carrier wafer during manufacturing, a permanent or mounting substrate used to support the sensor chip in the electronic device, and a substrate that is used both during manufacturing and to support the sensor chip within the electronic device.
In yet other embodiments, the sensor chip 120 may include a single sensor 122 attached to the substrate 126 or a carrier wafer. In these embodiments, both the substrate and the sensor 122 may be transparent. For example, the substrate 126 may be a transparent material and the sensor 122 may have a sufficiently thin thickness to be substantially transparent.
An illustrative method for manufacturing the sensor chip 120 will now be discussed in more detail.
In some embodiments, operation 202 may also include passivation. For example, in instances where the first sensor 122 is created on a silicon wafer, a plasma oxide or other passivation material may be applied to the first sensor 122 to reduce the effects of some environmental factors, e.g., reduce the chances of oxidation. Additionally, the first sensor 122 may also be planarized. For example, the wafer may be subjected to a chemical mechanical polishing or planarization to smooth one or more surfaces of the first sensor 120 through one or more chemical or mechanism forces (e.g., chemical etching and/or free abrasive polishing). However, it should be noted that the first sensor 122 may be prepared in a variety of different manners as desired.
Once the first sensor 122 has been formed, the method 200 may proceed to operation 204. In operation 204, the carrier wafer or substrate 126 may be formed. The substrate 126 can be a silicon wafer or other material that can be processed selectively to create silicon dioxide. Additionally, with reference to
Once the substrate 126 is created, the method 200 may proceed to operation 206. In operation 206 the two wafers may be bonded together.
Once the substrate 126 is bonded to the first sensor 122, the method 200 may proceed to operation 208. In operation 208, the first sensor 122 may be thinned. The first sensor 122 may be thinned in a number of different manners, such as, but not limited to, back grinding, polishing, selective etch process such as EPI.
With reference to
In some embodiments, after operation 208 and the first sensor 122 has been thinned, the method 200 may proceed to operation 210. In operation 210 the first sensor 122 may be patterned. For example, one or more connection apertures or TSVs may be formed through the first sensor 122 such that one or more bond pads 146 (see
It should be noted that in some embodiments, the first sensor 122 may not need to be patterned in order for the bond pads 146 to be accessed and the bond pads 146 can be accessed from the substrate 126. For example, the bond pads 146 may be formed on the surface of the first sensor 122 positioned against the surface of the substrate 126 and one or more TSVs or other connections may be formed through the substrate 126 to connect the bond ads 146 to other components, such as drivers or other circuitry.
With continued reference to
If in operation 212 a second sensor is to be added, the method 200 proceeds to operation 214. With reference to
Once the second sensor 124 is bonded to the first sensor 122, the method 200 may proceed to operation 216. In operation 218, the second sensor 124 may be thinned. Operation 216 may be substantially similar to operation 208 and the second sensor 124 may be thinned using the methods and techniques described above with respect to operation 208. With reference to
After operation 216 or if in operation 212 a second sensor is not desired, the method 200 may proceed to operation 218. In operation 218, the user or a computer determines whether the substrate 126 is going to be removed. In some instances, the substrate 126 may function as a carrier wafer and may be used to support the sensor or sensors 122, 124 during manufacturing, but may be removed once both sensors have been connected together. Alternatively, the substrate 126 may include one or more active elements and remain a portion of the sensor chip 120.
If in operation 220 the substrate 126 is not removed, the method 200 proceeds to operation 222. In operation 222 the substrate 126 may be thinned. The substrate 126 may be thinned in substantially the same manner as the first sensor 122 in operation 208. For example, the substrate 126 may be thinned through grinding, polishing, EPI or the like. However, during operation 210, the substrate 126 may be thinned less than the first sensor 122. For example, the substrate 126 may be thinned to a thickness ranging between 100 to 150 microns and in some implementations about 120 microns. In other embodiments, the substrate 126 may be thinned selectively to reach the passivation oxide layer 134. In other words, the substrate 126 may be thinned such that the thickness of the substrate 126 may be slightly larger or the same as the thickness of the passivation oxide layer 134.
Typically, the substrate 126 may remain thicker than the first sensor 122 after operation 208 in order to provide sufficient thickness for the sensor chip 120 to be handled during the remaining processing. However, in instances where the sensor chip 120 may not need to be further handled or where smaller thicknesses are desired, the substrate 126 may be further reduced in thickness.
In some embodiments, the substrate 126 may be thinned and the first sensor 122 may be thicker or maintain its original thickness. Alternatively, the substrate 126 may be thinner than the first sensor 122. For example, the first sensor 122 or device wafer may remain thicker and the substrate 126 (which may also be an active chip) may be thinned. In these embodiments, operation 208 may be omitted or the first sensor 122 may be slightly thinned during operation 208. In embodiments where the substrate 126 may be an active wafer, the substrate 126 may include a plurality of logic and mixed signal circuitry. Additionally, one or more TSVs may connect the components defined on the substrate 126 to the first sensor 122 and/or second sensor 124. As one specific example, the substrate 126 may be connected to the first sensor 122 through TSVs having a pitch of approximately 6 microns. However, many other pitch values and connection techniques are envisioned.
In operation 218 if the substrate 126 is going to be removed, the method 200 may proceed to operation 222. In operation 222, the sensor chip 120 is bonded to another substrate. For example, the new substrate may be a permanent substrate and may form a portion of another component of the electronic device 100. Once the sensor chip 120 is bonded to a final substrate, the method 200 proceeds to operation 224. In operation 224, the carrier substrate 126 may be removed. The substrate 126 may be removed in a number of different manners, such as, but not limited to, applying one or more solvents, etching, grinding, or the like. In some embodiments, operation 224 may be performed at the die stage of the wafer processing and the substrate 126 may be a polymer material that may be removed using one or more solvents. In embodiments where the substrate 126 is removed from the sensor chip 120 (such as shown in
It should be noted that depending on the thicknesses of the first and second sensor 122, 124 that the carrier substrate 126 may be removed prior to the sensor chip 120 being bonded to a secondary or permanent substrate. In these examples, one of the sensors 122, 124 may have an after thinning thickness T2, T4 that may be sufficiently large to allow handling of the sensor chip 120 such that the sensor chip 120 may be transferred and attached to the mounting substrate. Alternatively, a transportation substrate, such as tape or other removable adhesive, may be applied to transport the sensor chip to the mounting substrate.
Once the carrier substrate has been removed in operation 224 or once the substrate 126 has been thinned, the method 200 may proceed to an end state 226.
Using the method 200, the sensor chip 120 created may be a very thin layer including sensing elements. With reference again to
The mounting substrate 156 is bonded to the sensor chip 120 as described in operation 222 in the method 200 of
As a specific example, the first sensor 122 may be a capacitive touch sensor and the second sensor 124 may be an image sensor.
Because the second sensor 124 is vertically stacked with the first sensor 122, the second sensor 124 may sense data corresponding to the same location in the X-Y plane as the first sensor 122.
With reference to
In the above examples illustrated in
In a second example, the first sensor 122 may be a capacitive or other touch sensing element and the second sensor 124 may be an infrared sensor. As a third example, the first sensor may be a capacitive sensor and the second sensor may be a near field camera. As a fourth example, one of the sensors may be a fingerprint sensor, such as an ultrasonic sensor and the other of the sensors may be a touch sensor or an image sensor. In this example, the sensor chip 120 may be used to detect a fingerprint input, as well as one or more characteristics of the input, such as pulse rate, vein mapping, blood flow, etc., that may be used to enhance the initial sensed input. In some embodiments, the electronic device 100 may use a fingerprint detection as a security feature (e.g., to unlock data or a home screen) or as another type of input and by combining two or more sensors together, the sensor chip 120 may allow the electronic device 100 to gather multiple data points for a single input, that may enhance the processing of the input, as well as increase the security of the fingerprint detection. As a specific example, two users may have similar fingerprints that may be difficult to distinguish without high resolution, but the two users may have much different vein maps through the finger. Thus, by using a fingerprint sensor in combination with an infrared sensor that may detect blood flow or veins, the electronic device 100 can more accurately analyze a fingerprint. The above examples are merely illustrative only and many other sensor combinations and uses are envisioned.
With reference to
As shown in
In this embodiment, a lens 400 of the camera may act as the mounting substrate for the sensor chip 120. The lens 400 may be a substantially transparent or clear material (such as glass, plastic, or the like) that may transmit light wavelengths therethrough. The first sensor 122 and the second sensor 124 may be vertically aligned with the lens 400 such that both sensors 122, 124 may receive light as it is transmitted through the lens 400. In these embodiments, at least the first sensor 122 may be transparent or partially transparent to allow light to reach the second sensor 124 stacked below. Optionally, the sensor chip 120 may be further stacked on a support substrate 402. The support substrate 402 may be active wafer and include electrical components, such as transistors or other gates that may selectively transmit light data from the sensors 122, 124 and/or may activate the sensors 122, 124.
The camera 110 including the sensor chip 120 may be mounted or otherwise connected to the electronic device 100 through the enclosure 106. For example, with reference to
In the embodiment illustrated in
In some embodiments, the sensor chip 120 may be connected to the display 104 of the electronic computing device 100.
With reference to
In the embodiment illustrated in
In the embodiment illustrated in
The sensor chip 120 and the sensors 122, 124 can be configured to detect two separate types of inputs applied to the display 104 and/or enhance resolution of inputs applied to the display 104. As an example, the first sensor 122 may detect capacitance or touch inputs and the second sensor 124 (when included) may detect optical properties.
The foregoing description has broad application. For example, while examples disclosed herein may focus on a certain sensor types, it should be appreciated that the concepts disclosed herein may equally apply to many other types of sensors or data sensing elements. As another example, although the substrate has been discussed as being transparent, in other embodiments, the substrate may not be transparent or may be partially transparent. Similarly, although the process and sensor chip are discussed with respect to a substrate, the sensor chip 120 may be a stack including one or two sensors and the substrates may be removed after manufacturing. Accordingly, the discussion of any embodiment is meant only to be exemplary and is not intended to suggest that the scope of the disclosure, including the claims, is limited to these examples.
This application claims the benefit under 35 U.S.C. §119(e) to U.S. Provisional Patent Application No. 61/856,193, filed on Jul. 19, 2013, entitled “Multi-Sensor Chip,” the contents of which are incorporated by reference as if fully disclosed herein.
Number | Date | Country | |
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61856193 | Jul 2013 | US |