Multilayer plastic substrates

Information

  • Patent Grant
  • 6962671
  • Patent Number
    6,962,671
  • Date Filed
    Thursday, May 22, 2003
    21 years ago
  • Date Issued
    Tuesday, November 8, 2005
    19 years ago
Abstract
A multilayer plastic substrate. The substrate comprises a plurality of thin film layers of at least one polymer, the plurality of thin film layers being adjacent to one another and having sufficient strength to be self-supporting, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 80%.
Description
BACKGROUND OF THE INVENTION

The present invention relates generally to plastic substrates which may be useful in products including, but not limited to, visual display devices, and more particularly to multilayer plastic substrates having improved light transmittance.


As used herein, the term “(meth)acrylic” is defined as “acrylic or methacrylic.” Also, (meth)acrylate is defined as “acrylate or methacrylate.”


As used herein, the term “average visible light transmittance” means the average light transmittance over the visible range from 400 to 800 nm.


As used herein, the term “peak visible light transmittance” means the peak light transmittance over the visible range from 400 to 800 nm.


As used herein, the term “polymer precursor” includes monomers, oligomers, and resins, and combinations thereof. As used herein, the term “monomer” is defined as a molecule of simple structure and low molecular weight that is capable of combining with a number of like or unlike molecules to form a polymer. Examples include, but are not limited to, simple acrylate molecules, for example, hexanedioldiacrylate, or tetraethyleneglycoldiacrylate, styrene, methyl styrene, and combinations thereof. The molecular weight of monomers is generally less than 1000, while for fluorinated monomers, it is generally less than 2000. Monomers may be combined to form oligomers and resins but do not combine to form other monomers.


As used herein, the term “oligomer” is defined as a compound molecule of at least two monomers that maybe cured by radiation, such as ultraviolet, electron beam, or x-ray, glow discharge ionization, and spontaneous thermally induced curing. Oligomers include low molecular weight resins. Low molecular weight is defined herein as about 1000 to about 20,000 exclusive of fluorinated monomers. Oligomers are usually liquid or easily liquifiable. Oligomers do not combine to form monomers.


As used herein, the term “resin” is defined as a compound having a higher molecular weight (generally greater than 20,000) which is generally solid with no definite melting point. Examples include, but are not limited to, polystyrene resins, epoxy polyamine resins, phenolic resins, and acrylic resins (for example, polymethylmethacrylate), and combinations thereof.


There is a need for versatile visual display devices for electronic products of many different types. Although many current displays use glass substrates, manufacturers have attempted to produce commercial products, primarily liquid crystal display devices, using unbreakable plastic substrates. These attempts have not been completely successful to date because of the quality, temperature, and permeation limitations of polymeric materials. Flexible plastic substrates, such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polyether sulfone (PES), have been used in thicknesses from about 0.004 inches to 0.007 inches. However, the surface quality of these substrates is often poor, with the surface having large numbers of scratches, digs, pits, and other defects.


In addition, many polymers exhibit poor oxygen and water vapor permeation resistance, often several orders of magnitude below what is required for product performance. For example, the oxygen transmission rates for materials such polyethylene terephthalate (PET) are as high as 1550 cc/m2/day/micron of thickness (or 8.7 cc/m2/day for 7 mil thickness PET), and the water vapor transmission rates are also in this range. Certain display applications, such as those using organic light emitting devices (OLEDs), require encapsulation that has a maximum oxygen transmission rate of 10−4 to 10−2 cc/m2/day, and a maximum water vapor transmission rate of 10−5 to 10−6 g/m2/day.


Barrier coatings have been applied to plastic substrates to decrease their gas and liquid permeability. Barrier coatings typically consist of single layer thin film inorganic materials, such as Al, SiOx, AlOx, and Si3N4 vacuum deposited on polymeric substrates. A single layer coating on PET reduces oxygen permeability to levels of about 0.1 to 1.0 cc/m2/day, and water vapor permeability to about 0.1 to 1.0 g/m2/day. However, those levels are still insufficient for many display devices.


Additionally, many processes used in the manufacture of displays require relatively high temperatures that most polymer substrates cannot tolerate. For example, the recrystallization of amorphous Si to poly-Si in thin film transistors requires substrate temperatures of at least 160°–250° C., even with pulsed excimer laser anneals. The conductivity of a transparent electrode, which is typically made of indium tin oxide (ITO), is greatly improved if deposition occurs above 220° C. Polyimide curing generally requires temperatures of 250° C. In addition, many of the photolithographic process steps for patterning electrodes are operated in excess of 120° C. to enhance processing speeds in the fabrication. These processes are used extensively in the manufacture of display devices, and they have been optimized on glass and silicon substrates. The high temperatures needed for such processes can deform and damage a plastic substrate, and subsequently destroy the display. If displays are to be manufactured on flexible plastic materials, the plastic must be able to withstand the necessary processing conditions, including high temperatures over 100° C., harsh chemicals, and mechanical damage.


Thus, there is a need for an improved plastic substrate for visual display devices, and for a method of making such a substrate.


SUMMARY OF THE INVENTION

The present invention meets this need by providing a multilayer plastic substrate. The substrate consists essentially of a plurality of thin film layers of at least one polymer, the plurality of thin film layers being adjacent to one another and having sufficient strength to be self-supporting, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 80%. The average visible light transmittance is typically greater than about 85%, and it can be greater than about 90%. The peak visible transmittance is typically greater than about 85% and it can be greater than about 90%.


There are typically at least about 50 thin film layers. The number of layers depends on the thickness of the thin film layers and the desired overall thickness of the multilayer plastic substrate. The multilayer plastic substrate is typically at least about 0.001 inches thick, and generally at least about 0.004 inches thick. Each thin film layer is typically less than about 50 μm thick.


Polymers include, but are not limited to (meth)acrylate-containing polymers, styrene containing polymers, methyl styrene containing polymers, and fluorinated polymers, and combinations thereof. The glass transition temperature of the at least one polymer is generally greater than about 150° C., and it may be greater than about 200° C.


The surface roughness of the multilayer plastic substrate is generally less than about 10 nm, and it may be less than about 5 nm, or less than about 2 nm.


The multilayer plastic substrate can have a refractive index of greater than about 1.4 or greater than about 1.5.


The multilayer plastic substrate can include additional layers, including, but not limited to, scratch resistant layers, antireflective coatings, antifingerprint coatings, antistatic coatings, conductive coatings, transparent conductive coatings, and barrier coatings, to provide functionality to the substrate if desired.


Another aspect of the invention involves a method of making the multilayer plastic substrate. The method includes providing a support, depositing a plurality of thin film layers of at least one polymer on the support so that the plurality of thin film layers have sufficient strength to be self-supporting to form the multilayer substrate, and removing the support from the multilayer substrate, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 80%.


The thin film layers can be deposited in a vacuum. One example of a vacuum deposition process is flash evaporation. In this method, depositing the plurality of thin film layers includes flash evaporating a polymer precursor, condensing the polymer precursor as a liquid film, and cross-linking the polymer precursor to form the polymer. The polymer precursor can be cross-linked by any suitable method, including, but not limited to, radiation curing, such as ultraviolet, electron beam, or x-ray, glow discharge ionization, and spontaneous thermally induced curing.


Alternatively, the plurality of thin film layers can be deposited by extruding or casting a layer of polymer precursor, and cross-linking the polymer precursor to form the polymer using any suitable cross-linking method.


Accordingly, it is an object of the present invention to provide an improved, multilayer plastic substrate and to provide a method of making such a substrate.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 is a cross-section of one embodiment of the substrate of the present invention.





DESCRIPTION OF THE INVENTION


FIG. 1 shows one embodiment of a multilayer plastic substrate of the present invention. The multilayer plastic substrate 100 is formed on a support 110. After the multilayer plastic substrate is formed, the support 110 is removed.


The multilayer plastic substrate of the present invention consists essentially of a plurality of thin film layers 120 of at least one polymer adjacent to one another. By adjacent, we mean next to, but not necessarily directly next to. In most of the multilayer plastic substrate, the polymer thin film layers will be directly next to one another. However, there can be additional layers intervening between some adjacent layers in order to provide additional functionality to the multilayer plastic substrate, as shown in FIG. 1 and described below.


The plurality of thin film layers have sufficient strength to be self-supporting after they are formed. The exact number of thin film layers is not critical. It depends on the thickness of each of the individual thin film layers and the desired overall thickness of the multilayer plastic substrate. There must be enough thin film layers so that the plurality of thin film layers have sufficient strength to be self-supporting. As used herein, the term self-supporting means the substrate can be handled and processed without the need for an underlying support once the plurality of thin film layers have been deposited. There are typically at least about 50 thin film layers, more typically at least about 100 thin film layers. There are generally in the range of about 500 thin film layers to about 1000 thin film layers or more. Each thin film layer is typically between about 0.05 to about 2 μm thick, generally between about 0.2 to about 0.3 μm. If the thin film layers are extruded, they are usually thicker, typically up to about 50 μm thick, in that case. The multilayer plastic substrate is typically at least about 0.001 inches thick, and generally at least about 0.004 inches thick. A 0.007 inch thick substrate would require about 90 to 350 passes of the web past the polymer precursor sources. The multilayer plastic substrate can be flexible or rigid.


The average visible light transmittance of the multilayer plastic substrate is greater than about 80%, generally greater than 85%, and it may be greater than 90%. The peak visible light transmittance is generally greater than 85%, and it may be greater than 90%.


The at least one polymer can be any suitable polymer, including, but not limited to, polymers made from styrene polymer precursors, polymers made from methyl styrene polymer precursors, polymers made from (meth)acrylate polymer precursors, for example, polymers made from hexanedioldiacrylate or tetraethyleneglycoldiacrylate polymer precursors, and fluorinated polymers, and combinations thereof. Polymers made from (meth)acrylate polymer precursors work well.


The multilayer plastic substrate can be flexible or rigid. Multilayer plastic substrates made from polymers including, but not limited to, (meth)acrylate polymer precursors will be flexible. One advantage of multilayer laminated materials is that they typically have greater strength and flexibility than comparable single layer substrates. A multilayer plastic substrate of the present invention generally has hundreds of cross-linked layers that provide mechanical strength and sufficient rigidity to support the circuitry and devices on the display.


A multilayer plastic substrate made from (meth)acrylate polymer precursors will have excellent transmission at visible wavelengths. Because polymers made from (meth)acrylate polymer precursors have very low optical absorption, a multilayer plastic substrate made entirely from such polymers will have high optical transparency, typically an average visible light transmittance of greater than about 90%. Multilayer substrates made entirely from fluorinated polymers will also have an average visible light transmittance of greater than 90%. Substrates made from styrene and methyl styrene polymers would have an average visible light transmittance of about 89%.


The birefringence present in many flexible substrates can be reduced or eliminated with the present invention because the multilayer plastic substrate is not mechanically stressed during deposition.


Fully cured layers of polymers made from (meth)acrylate polymer precursors generally have a refractive index of greater than about 1.5, while fully cured fluorinated polymers generally have a refractive index of greater than about 1.4. Styrene containing polymers would have a refractive index of about 1.6.


Many optical applications, such as mirrors and reflectors, and display applications, such as organic light emitting devices, require substrates with a surface roughness of less than 2 nm. Surface roughness is the root mean square of peak-to-valley measurement over a specified distance, usually 1 nm. It can be measured using an atomic force microscope or back reflection distribution function. Many substrates do not have the necessary surface smoothness. For example, the surface roughness of PET is about 20–50 nm with 100 nm spikes. In contrast, flash evaporated polymer coatings have a very low surface roughness, generally less than about 10 nm, and it may be less than 5 nm, or less than about 2 nm. Surface roughness on the order of 1 nm has been demonstrated. The surface of the multilayer plastic substrate is specular because of the exceptional smoothness of the polymer layers.


Because the polymer material is highly cross-linked, the multilayer plastic substrate can have a high glass transition temperature and excellent chemical resistance. The glass transition temperature of the at least one polymer is generally greater than about 150° C., and may be greater than about 200° C.


Polymers including, but not limited to, (meth)acrylates, polycarbonates, polysulfones, polyethersulfones, polymides, polyamides, and polyether naphthenates have demonstrated excellent resistance to solvents. This provides protection from processing chemicals, ultraviolet light exposure, and photoresists during lithography processes used to manufacture flat panel displays and their devices.


The thin film layers that form the multilayer substrate can be deposited by any suitable method, including vacuum flash evaporation, extrusion, or casting. With vacuum flash evaporation, deposition can be performed using a rotating drum or strap configuration. The polymer precursor is degassed and metered into a hot tube where it flash evaporates and exits through a nozzle as a polymer precursor gas.


The flash evaporating may be performed by supplying a continuous liquid flow of the polymer precursor into a vacuum environment at a temperature below both the decomposition temperature and the polymerization temperature of the polymer precursor, continuously atomizing the polymer precursor into a continuous flow of droplets, and continuously vaporizing the droplets by continuously contacting the droplets on a heated surface having a temperature at or above a boiling point of the liquid polymer precursor, but below a pyrolysis temperature, forming the evaporate. The droplets typically range in size from about 1 micrometer to about 50 micrometers, but they could be smaller or larger.


Alternatively, the flash evaporating may be performed by supplying a continuous liquid flow of the polymer precursor into a vacuum environment at a temperature below both the decomposition temperature and the polymerization temperature of the polymer precursor, and continuously directly vaporizing the liquid flow of the polymer precursor by continuously contacting the liquid polymer precursor on a heated surface having a temperature at or above the boiling point of the liquid polymer precursor, but below the pyrolysis temperature, forming the evaporate. This may be done using the vaporizer disclosed in U.S. Pat. Nos. 5,402,314, 5,536,323, and 5,711,816, which are incorporated herein by reference.


The polymer precursor then condenses on the support as a liquid film which is subsequently cross-linked to form a polymer by any suitable method, including, but not limited to, radiation, such as ultraviolet, electron beam, or x-ray, glow discharge ionization, and spontaneous thermally induced curing. This process is capable of depositing thousands of polymer layers at web speeds up to 100 m/min.


Alternatively, after degassing, the polymer precursor can be deposited by extruding, spraying, or casting layers of polymer precursor on the support. The polymer precursor is then cross-linked using any suitable method, such as those described above.


The functionality of the multilayer plastic substrate can be increased by the incorporation of functional layers 130, 140, and 150 during the deposition process. These functional layers 130, 140, and 150 can be deposited at any time during the deposition process. They can be deposited below, 130, in between, 140, or on top of, 150, the plurality of thin film layers 120 of the multilayer plastic substrate, as shown in FIG. 1. As used herein, depositing a coating adjacent to the multilayer plastic substrate includes: depositing the coating on the top layer of the multilayer plastic coating; depositing the coating on the multilayer plastic substrate and then depositing additional layers of the multilayer plastic substrate over the coating so that the coating is between the layers of the multilayer plastic substrate; and depositing the coating first and then depositing the layers of the multilayer plastic substrate, and combinations thereof. Functional layers 130, 140, and 150 include, but are not limited to, scratch resistant coatings, antireflective coatings, antifingerprint coatings, antistatic coatings, conductive coatings, transparent conductive coatings, and barrier coatings, and other functional layers. Depositing these additional layers allows the multilayer plastic substrate to be specifically tailored to different applications. Little or no surface modification is necessary for deposition of other layers because of the very smooth surface of the multilayer plastic substrate. Interfaces can be graded to bond all integrated functional layers firmly during the same coating run and pumpdown.


For some applications, it may be important that the presence of functional layers not reduce the average visible light transmittance below 80%, for others, not below 85%, and still others, not below 90%. In others, it may be important that the peak visible light transmittance not drop below 85%, and for others, not below 90%. In others, it may be important that the functional layers not increase the surface roughness to greater than about 10 nm, for others, not greater than about 5 nm, and for others, not greater than 2 nm.


One type of functional layer that can be included is a barrier coating. One example of a barrier coating is described in application Ser. No. 09/427,138, filed Oct. 25, 1999, entitled “Environmental Barrier Material for Organic Light Emitting Device and Method of Making,” which is incorporated herein by reference. The barrier coating can be a barrier stack having one or more barrier layers and one or more polymer layers. There could be one polymer layer and one barrier layer, there could be one or more polymer layers on one side of one or more barrier layers, or there could be one or more polymer layers on both sides of one or more barrier layers. The important feature is that the barrier stack have at least one polymer layer and at least one barrier layer. The barrier layers and polymer layers in the barrier stack can be made of the same material or of a different material. The barrier layers are typically in the range of about 100–400 Å thick, and the polymer layers are typically in the range of about 1000–10,000 Å thick.


The number of barrier stacks is not limited. The number of barrier stacks needed depends on the material used for the polymer of the substrate and the level of permeation resistance needed for the particular application. One or two barrier stacks should provide sufficient barrier properties for some applications. The most stringent applications may require five or more barrier stacks.


The barrier layers should be transparent. Transparent barrier materials include, but are not limited to, metal oxides, metal nitrides, metal carbides, metal oxynitrides, metal oxyborides, and combinations thereof. The metal oxides include, but are not limited to, silicon oxide, aluminum oxide, titanium oxide, indium oxide, tin oxide, indium tin oxide, tantalum oxide, zirconium oxide, niobium oxide, and combinations thereof. The metal carbides include, but are not limited to, boron carbide, tungsten carbide, silicon carbide, and combinations thereof. The metal nitrides include, but are not limited to, aluminum nitride, silicon nitride, boron nitride, and combinations thereof. The metal oxynitrides include, but are not limited to, aluminum oxynitride, silicon oxynitride, boron oxynitride, and combinations thereof. The metal oxyborides include, but are not limited to, zirconium oxyboride, titanium oxyboride, and combinations thereof.


The polymer layers of the barrier stacks can be made from (meth)acrylate polymer precursors. The polymer layers in the barrier stacks can be the same or different.


The barrier stacks can be made by vacuum deposition. The barrier layer can be vacuum deposited onto, or into, the multilayer plastic substrate, or another functional layer. The polymer layer is then deposited on the barrier layer, preferably by flash evaporating (meth)acrylate polymer precursors, condensing on the barrier layer, and polymerizing in situ in a vacuum chamber. U.S. Pat. Nos. 5,440,446 and 5,725,909, which are incorporated herein by reference, describe methods of depositing thin film, barrier stacks.


Vacuum deposition includes flash evaporation of (meth)acrylate polymer precursors with in situ polymerization under vacuum, plasma deposition and polymerization of (meth)acrylate polymer precursors, as well as vacuum deposition of the barrier layers by sputtering, chemical vapor deposition, plasma enhanced chemical vapor deposition, evaporation, sublimation, electron cyclotron resonance-plasma enhanced vapor deposition (ECR-PECVD), and combinations thereof.


In order to protect the integrity of the barrier layer, the formation of defects and/or microcracks in the deposited layer subsequent to deposition and prior to downstream processing should be avoided. The multilayer plastic substrate is preferably manufactured so that the barrier layers are not directly contacted by any equipment, such as rollers in a web coating system, to avoid defects that may be caused by abrasion over a roll or roller. This can be accomplished by designing the deposition system such that the barrier layers are always covered by polymer layers prior to contacting or touching any handling equipment.


While certain representative embodiments and details have been shown for purposes of illustrating the invention, it will be apparent to those skilled in the art that various changes in the compositions and methods disclosed herein may be made without departing from the scope of the invention, which is defined in the appended claims.

Claims
  • 1. A method of making a multilayer plastic substrate, comprising: providing a support;depositing at least about 50 thin film layers of at least one polymer on the support so that the at least about 50 thin film layers have sufficient strength to be self-supporting to form the multilayer substrate; andremoving the support from the multilayer substrate,wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 80%, and wherein the multilayer plastic substrate has a surface roughness of less than about 10 nm.
  • 2. The method claim 1, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 85%.
  • 3. The method of claim 1, wherein the multilayer plastic substrate has an average visible light transmittance of greater than about 90%.
  • 4. The method of claim 1, wherein the multilayer plastic substrate has a peak visible light transmittance of greater than about 85%.
  • 5. The method of claim 1, wherein the multilayer plastic substrate has a peak visible light transmittance of greater than about 90%.
  • 6. The method of claim 1, wherein the thin film layers are deposited in a vacuum.
  • 7. The method of claim 6, wherein the thin film layers are deposited in the vacuum by flash evaporation.
  • 8. The method of claim 7, wherein depositing at least about 50 thin film layers of at least one polymer on the support so that the at least about 50 thin film layers have sufficient strength to be self-supporting to form the multilayer substrate comprises: flash evaporating a polymer precursor;condensing the polymer precursor on the support as a liquid film; andcross-linking the polymer precursor to form the polymer.
  • 9. The method of claim 8, wherein the polymer precursor is cross-linked by curing the polymer precursor using a process selected from ultraviolet radiation curing, electron beam radiation curing, x-ray radiation curing, glow discharge ionization, and spontaneous thermally induced curing.
  • 10. The method claim 1, wherein depositing at least about 50 thin film layers of at least one polymer on the support so that the at least about 50 thin film layers have sufficient strength to be self-supporting to form the multilayer substrate comprises: extruding a layer of polymer precursor on the support; andcrosslinking the polymer precursor to form the polymer.
  • 11. The method of claim 10, wherein the polymer precursor is cross-linked by curing the polymer precursor using a process selected from ultraviolet radiation curing, electron beam radiation curing, x-ray radiation curing, glow discharge ionization, and spontaneous thermally induced curing.
  • 12. The method of claim 1 , wherein depositing at least about 50 thin film layers of at least one polymer on the support so that the at least about 50 thin film layers have sufficient strength to be self-supporting to form the multilayer substrate comprises: casting a layer of polymer precursor on the support; andcross-linking the polymer precursor to form the polymer.
  • 13. The method of claim 12, wherein the polymer precursor is cross-linked by curing the polymer precursor using a process selected from ultraviolet radiation curing, electron beam radiation curing, x-ray radiation curing, glow discharge ionization, and spontaneous thermally induced curing.
  • 14. The method of claim 1, wherein depositing at least about 50 thin film layers of at least one polymer on the support so that the at least about 50 thin film layers have sufficient strength to be self-supporting to form the multilayer substrate comprises: spraying a layer of polymer precursor on the support; andcross-linking the polymer precursor to form the polymer.
  • 15. The method of claim 14, wherein the polymer precursor is cross-linked by curing the polymer precursor using a process selected from ultraviolet radiation curing, electron beam radiation curing, x-ray radiation curing, glow discharge ionization, and spontaneous thermally induced curing.
  • 16. The method of claim 1, wherein the multilayer plastic substrate comprises at least about 100 thin film layers.
  • 17. The method of claim 16, wherein the multilayer plastic substrate comprises at least about 500 thin film layers.
  • 18. The method of claim 17, wherein the multilayer plastic substrate comprises at least about 1000 thin film layers.
  • 19. The method of claim 1, wherein the multilayer plastic substrate is at least about 0.001 inches thick.
  • 20. The method of claim 1, wherein the multilayer plastic substrate is at least about 0.004 inches thick.
  • 21. The method of claim 1, wherein each thin film layer is less than about 50 μm thick.
  • 22. The method of claim 1, wherein each thin film layer is less than about 5 μm thick.
  • 23. The method of claim 1, wherein each thin film layer is in the range of about 0.005 to about 2 μm thick.
  • 24. The method of claim 1, wherein each thin film layer is in the range of about 0.2 to about 0.3 μm thick.
  • 25. The method of claim 1, wherein the at least one polymer is selected from (meth)acrylates, polystyrenes, methyl styrene-containing polymers, fluorinated polymers, polycarbonates, polysulfones, polyethersulfones, polyimides, polyamides, and polyether naphthenates, and combinations thereof.
  • 26. The method of claim 1, wherein the glass transition temperature of the at least one polymer is greater than about 150° C.
  • 27. The method of claim 1, wherein the glass transition temperature of the at least one polymer is greater than about 200° C.
  • 28. The method of claim 1, wherein the multilayer plastic substrate has a surface roughness of less than about 2 nm.
  • 29. The method of claim 1, wherein the multilayer plastic substrate has a refractive index of greater than about 1.5.
  • 30. The method of claim 1, wherein the multilayer plastic substrate has a refractive index of greater than about 1.4.
  • 31. The method of claim 1, wherein the multilayer plastic substrate is flexible.
  • 32. The method of claim 1, wherein the multilayer plastic substrate is rigid.
  • 33. The method of claim 1, further comprising depositing at least one barrier stack adjacent to the multilayer plastic substrate.
  • 34. The method of claim 33, where the at least one barrier stack comprises at least one barrier layer and at least one polymer layer.
  • 35. The method of claim 34, wherein at least one of the at least one barrier layers comprises a material selected from metal oxides, metal nitrides, metal carbides, metal oxynitrides, metal oxyborides, and combinations thereof.
  • 36. The method of claim 35, wherein the metal oxides are selected from silicon oxide, aluminum oxide, titanium oxide, indium oxide, tin oxide, indium tin oxide, tantalum oxide, zirconium oxide, niobium oxide, and combinations thereof.
  • 37. The method of claim 35, wherein the metal nitrides are selected from aluminum nitride, silicon nitride, boron nitride, and combinations thereof.
  • 38. The method of claim 35, wherein the metal oxynitrides are selected from aluminum oxynitride, silicon oxynitride, boron oxynitride, and combinations thereof.
  • 39. The method of claim 1, further comprising depositing a scratch resistant layer adjacent to the multilayer plastic substrate.
  • 40. The method of claim 1, further comprising depositing an antireflective coating adjacent to the multilayer plastic substrate.
  • 41. The method of claim 1, further comprising depositing an antifingerprint coating adjacent to the multilayer plastic substrate.
  • 42. The method of claim 1, further comprising depositing an antistatic coating adjacent to the multilayer plastic substrate.
  • 43. The method of claim 1, further comprising depositing a conductive coating adjacent to the multilayer plastic substrate.
  • 44. The method of claim 43, wherein the conductive coating is an indium tin oxide coating.
  • 45. The method of claim 8, wherein flash evaporating comprises: supplying a continuous liquid flow of the polymer precursor into a vacuum environment at a temperature below both the decomposition temperature and the polymerization temperature of the polymer precursor;continuously atomizing the polymer precursor into a continuous flow of droplets; andcontinuously vaporizing the droplets by continuously contacting the droplets on a heated surface having a temperature at or above a boiling point of the polymer precursor, but below a pyrolysis temperature, forming an evaporate.
  • 46. The method of claim 45 wherein the droplets range in size from about 1 micrometer to about 50 micrometers.
  • 47. The method of claim 8 wherein flash evaporating comprises: supplying a continuous liquid flow of the polymer precursor into a vacuum environment at a temperature below both the decomposition temperature and the polymerization temperature of the polymer precursor; andcontinuously directly vaporizing the liquid flow of the polymer precursor by continuously contacting the polymer precursor on a heated surface having a temperature at or above a boiling point of the polymer precursor, but below a pyrolysis temperature, forming the evaporate.
  • 48. The method of claim 1, wherein the multilayer plastic substrate has a surface roughness of less than about 5 nm.
CROSS REFERENCE TO RELATED APPLICATIONS

The present application is a division of U.S. patent application Ser. No. 09/835,768, filed Apr. 16, 2001, now U.S. Pat. No. 6,623,861, which is a continuation-in-part of U.S. patent application Ser. No. 09/427,138 filed Oct. 25, 1999, entitled “Environmental Barrier Material For Organic Light Emitting Device and Method Of Making,” now U.S. Pat. No. 6,522,067, issued Feb. 18, 2003. U.S. Pat. No. 6,623,861 is undergoing reissue as U.S. patent application Ser. No. 10/889,640, filed Jul. 12, 2004.

US Referenced Citations (143)
Number Name Date Kind
3475307 Knox et al. Oct 1969 A
3607365 Lindlof Sep 1971 A
4061835 Poppe et al. Dec 1977 A
4098965 Kinsman Jul 1978 A
4266223 Frame May 1981 A
4283482 Hattori et al. Aug 1981 A
4521458 Nelson Jun 1985 A
4555274 Kitajima et al. Nov 1985 A
4557978 Mason Dec 1985 A
4581337 Frey et al. Apr 1986 A
4624867 Iijima et al. Nov 1986 A
4695618 Mowrer Sep 1987 A
4722515 Ham Feb 1988 A
4768666 Kessler Sep 1988 A
4842893 Yializis et al. Jun 1989 A
4855186 Grolig et al. Aug 1989 A
4954371 Yializis Sep 1990 A
5032461 Shaw et al. Jul 1991 A
5036249 Pike-Biegunski et al. Jul 1991 A
5059861 Littman et al. Oct 1991 A
5124204 Yamashita et al. Jun 1992 A
5189405 Yamashita et al. Feb 1993 A
5203898 Carpenter et al. Apr 1993 A
5204314 Kirlin et al. Apr 1993 A
5237439 Misono et al. Aug 1993 A
5260095 Affinito Nov 1993 A
5354497 Fukuchi et al. Oct 1994 A
5393067 Paulsen et al. Feb 1995 A
5393607 Kawasaki et al. Feb 1995 A
5395644 Affinito Mar 1995 A
5402314 Amago et al. Mar 1995 A
5427638 Goetz et al. Jun 1995 A
5440446 Shaw et al. Aug 1995 A
5451449 Shetty et al. Sep 1995 A
5461545 Leroy et al. Oct 1995 A
5536323 Kirlin et al. Jul 1996 A
5547508 Affinito Aug 1996 A
5554220 Forrest et al. Sep 1996 A
5576101 Saitoh et al. Nov 1996 A
5607789 Treger et al. Mar 1997 A
5620524 Fan et al. Apr 1997 A
5629389 Roitman et al. May 1997 A
5652192 Matson et al. Jul 1997 A
5654084 Egert Aug 1997 A
5660961 Yu Aug 1997 A
5665280 Tropsha Sep 1997 A
5681615 Affinito et al. Oct 1997 A
5681666 Treger et al. Oct 1997 A
5684084 Lewin et al. Nov 1997 A
5686360 Harvey, III et al. Nov 1997 A
5693956 Shi et al. Dec 1997 A
5711816 Kirlin et al. Jan 1998 A
5725909 Shaw et al. Mar 1998 A
5731661 So et al. Mar 1998 A
5736207 Walther et al. Apr 1998 A
5747182 Friend et al. May 1998 A
5757126 Harvey, III et al. May 1998 A
5759329 Krause et al. Jun 1998 A
5771562 Harvey, III et al. Jun 1998 A
5782355 Katagiri et al. Jul 1998 A
5792550 Phillips et al. Aug 1998 A
5811177 Shi et al. Sep 1998 A
5811183 Shaw et al. Sep 1998 A
5821692 Rogers et al. Oct 1998 A
5844363 Gu et al. Dec 1998 A
5872355 Hueschen Feb 1999 A
5891554 Hosokawa et al. Apr 1999 A
5902641 Affinito et al. May 1999 A
5902688 Antoniadis et al. May 1999 A
5904958 Dick et al. May 1999 A
5912069 Yializis et al. Jun 1999 A
5919328 Tropsha et al. Jul 1999 A
5922161 Wu et al. Jul 1999 A
5945174 Shaw et al. Aug 1999 A
5948552 Antoniadis et al. Sep 1999 A
5952778 Haskal et al. Sep 1999 A
5955161 Tropsha Sep 1999 A
5965907 Huang et al. Oct 1999 A
5968620 Harvey et al. Oct 1999 A
5994174 Carey et al. Nov 1999 A
5996498 Lewis Dec 1999 A
6013337 Knors Jan 2000 A
6040017 Mikhael et al. Mar 2000 A
6045864 Lyons et al. Apr 2000 A
6066826 Yializis May 2000 A
6083313 Venkatraman et al. Jul 2000 A
6083628 Yializis Jul 2000 A
6084702 Byker et al. Jul 2000 A
6087007 Fujii et al. Jul 2000 A
6092269 Yializis et al. Jul 2000 A
6106627 Yializis Aug 2000 A
6117266 Horzel et al. Sep 2000 A
6118218 Yializis et al. Sep 2000 A
6146225 Sheats Nov 2000 A
6146462 Yializis et al. Nov 2000 A
6150187 Zyung et al. Nov 2000 A
6165566 Tropsha Dec 2000 A
6178082 Farooq et al. Jan 2001 B1
6195142 Gyotoku et al. Feb 2001 B1
6198217 Suzuki et al. Mar 2001 B1
6198220 Jones et al. Mar 2001 B1
6207238 Affinito Mar 2001 B1
6207239 Affinito Mar 2001 B1
6214422 Yializis Apr 2001 B1
6217947 Affinito Apr 2001 B1
6224948 Affinito May 2001 B1
6228434 Affinito May 2001 B1
6228436 Affinito May 2001 B1
6231939 Shaw et al. May 2001 B1
6268695 Affinito Jul 2001 B1
6274204 Affinito Aug 2001 B1
6322860 Stein et al. Nov 2001 B1
6333065 Arai et al. Dec 2001 B1
6348237 Kohler et al. Feb 2002 B2
6350034 Fleming et al. Feb 2002 B1
6358570 Affinito Mar 2002 B1
6413645 Graff et al. Jul 2002 B1
6460369 Hosokawa Oct 2002 B2
6468595 Mikhael et al. Oct 2002 B1
6497598 Affinito Dec 2002 B2
6497924 Affinito et al. Dec 2002 B2
6509065 Affinito Jan 2003 B2
6512561 Terashita et al. Jan 2003 B1
6522067 Graff et al. Feb 2003 B1
6537688 Silvernail et al. Mar 2003 B2
6544600 Affinito et al. Apr 2003 B2
6569515 Hebrink et al. May 2003 B2
6573652 Graff et al. Jun 2003 B1
6576351 Silvernail Jun 2003 B2
6597111 Silvernail et al. Jul 2003 B2
6613395 Affinito et al. Sep 2003 B2
6614057 Silvernail et al. Sep 2003 B2
6624568 Silvernail Sep 2003 B2
6627267 Affinito Sep 2003 B2
6656537 Affinito et al. Dec 2003 B2
6664137 Weaver Dec 2003 B2
6811829 Affinito et al. Nov 2004 B2
6835950 Brown et al. Dec 2004 B2
20020125822 Grall et al. Sep 2002 A1
20030028590 Silvernail et al. Feb 2003 A1
20030065652 Weaver Apr 2003 A1
20030127973 Weaver et al. Jul 2003 A1
20030235648 Affinito et al. Dec 2003 A1
Foreign Referenced Citations (41)
Number Date Country
704 297 Feb 1968 BE
19603746 Apr 1997 DE
0 299 753 Jan 1989 EP
0 340 935 Nov 1989 EP
0 390 540 Oct 1990 EP
0 547 550 Jun 1993 EP
0 590 467 Apr 1994 EP
0 722 787 Jul 1996 EP
0 777 260 Apr 1997 EP
0 777 281 Apr 1997 EP
0 787 826 Aug 1997 EP
0 916 394 May 1999 EP
0 931 850 Jul 1999 EP
0 977 469 Feb 2000 EP
1 130 420 Sep 2001 EP
1 278 244 Jan 2005 EP
63136316 Jun 1988 JP
64-18441 Jan 1989 JP
2-183230 Jul 1990 JP
06158306 Jun 1994 JP
10312863 Nov 1996 JP
08325713 Dec 1996 JP
09059763 Mar 1997 JP
WO 87 07848 Dec 1987 WO
WO 95 10117 Apr 1995 WO
WO 9623217 Aug 1996 WO
WO 97 04885 Feb 1997 WO
WO 97 22631 Jun 1997 WO
WO 98 10116 Mar 1998 WO
WO 98 18852 May 1998 WO
WO 99 16557 Apr 1999 WO
WO 99 16931 Apr 1999 WO
WO 0026973 May 2000 WO
WO 0035603 Jun 2000 WO
WO 0035804 Jun 2000 WO
WO 0036665 Aug 2000 WO
WO 01 68360 Sep 2001 WO
WO 0169006 Nov 2001 WO
WO 0181849 Nov 2001 WO
WO 0182336 Nov 2001 WO
WO 0182389 Nov 2001 WO
Related Publications (2)
Number Date Country
20030215575 A1 Nov 2003 US
20050158476 A9 Jul 2005 US
Divisions (1)
Number Date Country
Parent 09835768 Apr 2001 US
Child 10443410 US
Continuation in Parts (1)
Number Date Country
Parent 09427138 Oct 1999 US
Child 09835768 US