MULTILAYER WIRE-GRID POLARIZER WITH OFF-SET WIRE-GRID DIELECTRIC GRID

Abstract

A wire-grid polarizer includes a stack of thin film layers disposed over a substrate including a wire grid layer and a plurality of thin film layers disposed between the wire grid layer and the substrate. The wire-grid layer includes an array of elongated metal elements, comprising lengths longer than a wavelength of visible light, a period less than 200 nanometers, a height less than 400 nanometers; and a material selected from the group consisting of aluminum, silver, gold, copper, or combinations thereof. The plurality of thin film layers disposed between the wire grid layer and the substrate include at least one dielectric grid layer and at least one thin film layer comprising silicon. The dielectric grid layer and the wire-grid are substantially parallel with one another, have substantially equal periods, and have substantially equal widths.

Description

BACKGROUND

The present invention relates generally to wire-grid polarizers for the visible and near visible spectrum.

A wire grid polarizer (WGP) is an array of parallel wires disposed on the surface of a substrate, such as glass. Usually wire-grid polarizers are a single, periodic array of wires on the substrate. The grid acts as a diffraction grating when the period of the wires is greater than about half of the wavelength of light. The grid acts as a polarizer when the period of the wires is less than about half the wavelength of light.

While it is desirable for a WGP to transmit all of the light of one polarization and reflect all of the other polarization, no polarizer is perfect. Real WGPs will transmit some of the light of both polarizations and will reflect some of the light of both polarizations. When light is incident on the surface of a transparent material, such as a sheet of glass, a small amount of the light is reflected. For example, at normal incidence, about 4% of the incident light is reflected from each surface of the glass.

It has been suggested to dispose a film under a WGP, or between the wires and the substrate, to move the first diffraction order to shorter wavelengths in order to improve performance in part of the visible spectrum, such as blue light. See U.S. Pat. No. 6,122,103. The film has an index of refraction less than that of the substrate. It has also been suggested to etch into either the substrate or underlying layer to further reduce the effective refractive index under the wire grid. See U.S. Pat. No. 6,122,103. It has been further suggested to form each wire as a composite with alternating metal and dielectric layers. See U.S. Pat. No. U.S. Pat. No. 6,532,111.

SUMMARY

It has been recognized that it would be advantageous to develop a wire-grid polarizer with improved performance, or a wire-grid polarizer with increased transmission of a desired polarization state, such as p, and decreased transmission (or increased reflection) of another polarization state, such as s. In addition, it has been recognized that a wire-grid polarizer can act as a metal for reflecting one polarization state and act as a thin film of lossy dielectric for the other polarization state. Thus, it has been recognized that form birefringence and effective index of refraction can be applied to a wire-grid polarizer. In addition, it has been recognized that a wire-grid polarizer can be treated as a thin film layer, and incorporated into an optical stack.

Briefly, and in general terms, the invention is directed to multilayer wire-grid polarizers for polarizing light. In accordance with one aspect of the invention, the polarizer includes a stack of thin film layers disposed over a substrate including: a wire grid layer and a plurality of thin film layers disposed between the wire grid layer and the substrate. The wire-grid layer includes an array of elongated metal elements, wherein the elements comprise: lengths longer than a wavelength of visible light; a period less than 200 nanometers; a height less than 400 nanometers; a material selected from the group consisting of aluminum, silver, gold, copper, or combinations thereof. The plurality of thin film layers disposed between the wire grid layer and the substrate include: at least one dielectric grid layer; and at least one thin film layer comprising silicon. The dielectric grid layer and the wire-grid are substantially parallel with one another, have substantially equal periods, and have substantially equal widths.

In accordance with another aspect of the present invention, the polarizer includes a stack of thin film layers disposed over a substrate including a wire grid layer and a dielectric thin film layer. The wire-grid layer includes an array of elongated metal elements, wherein the elements comprise: lengths longer than a wavelength of visible light; a period less than 200 nanometers; a height less than 400 nanometers; and a material selected from the group consisting of aluminum, silver, gold, copper, or combinations thereof. The dielectric thin film layer is disposed between the wire grid layer and the substrate. The dielectric thin film layer comprises: a material having a refractive index greater than a refractive index of the substrate; and a material selected from the group consisting of aluminum oxide; antimony trioxide; antimony sulphide; beryllium oxide; bismuth oxide; bismuth triflouride; cadmium sulphide; cadmium telluride; calcium fluoride; ceric oxide; chiolite; cryolite; germanium; hafnium dioxide; lanthanum fluoride; lanthanum oxide; lead chloride; lead fluoride; lead telluride; lithium fluoride; magnesium fluoride; magnesium oxide; neogymium fluoride;

neodymium oxide; praseodymium oxide; scandium oxide; silicon; silicon oxide; disilicon trioxide; silicon dioxide; sodium fluoride; tantalum pentoxide; tellurium; titanium dioxide; thallous chloride; yttrium oxide; zinc selenide; zinc sulphide; zirconium dioxide; and combinations thereof.

In accordance with another aspect of the present invention, the polarizer includes a stack of thin film layers disposed over a substrate including a wire grid layer and a dielectric thin film layer. The wire-grid layer includes an array of elongated metal elements, wherein the elements comprise: lengths longer than a wavelength of visible light; a period less than 200 nanometers; a height less than 400 nanometers; and a material selected from the group consisting of aluminum, silver, gold, copper, and combinations thereof. The dielectric thin film layer has a refractive index greater than a refractive index of the substrate.

BRIEF DESCRIPTION OF THE DRAWINGS

Additional features and advantages of the invention will be apparent from the detailed description which follows, taken in conjunction with the accompanying drawings, which together illustrate, by way of example, features of the invention; and, wherein:

FIGS. 1 and 2 are cross-sectional side schematic views of multilayer wire grid polarizers in accordance with embodiments of the present invention (the figures are not to scale and features are shown greatly exaggerated for clarity);

FIG. 3 is a cross-sectional side schematic view of a multilayer wire grid polarizer in accordance with an exemplary embodiment of the present invention (the figure is not to scale and features are shown greatly exaggerated for clarity);

FIG. 4 a is a graph of p-polarization reflection versus wavelength for the multilayer wire grid polarizer of FIG. 3 compared to other polarizers;

FIG. 4 b is a graph of s-polarization transmittance versus wavelength for the multilayer wire grid polarizer of FIG. 3 compared to other polarizers;

FIG. 4 c is a graph of p-polarization transmittance versus wavelength for the multilayer wire grid polarizer of FIG. 3 compared to other polarizers;

FIG. 5 is a cross-sectional side schematic view of a multilayer wire grid polarizer in accordance with an exemplary embodiment of the present invention (the figure is not to scale and features are shown greatly exaggerated for clarity);

FIG. 6 a is a graph of s-polarization reflection versus wavelength for the multilayer wire grid polarizer of FIG. 5 compared to another polarizer;

FIG. 6 b is a graph of p-polarization transmittance versus wavelength for the multilayer wire grid polarizer of FIG. 5 compared to another polarizer;

FIG. 7 is a cross-sectional side schematic view of a multilayer wire grid polarizer in accordance with an exemplary embodiment of the present invention (the figure is not to scale and features are shown greatly exaggerated for clarity);

FIG. 8 is a cross-sectional side schematic view of a multilayer wire grid polarizer in accordance with an exemplary embodiment of the present invention (the figure is not to scale and features are shown greatly exaggerated for clarity);

FIG. 9 is a graph of p-polarization reflection versus wavelength for the multilayer wire grid polarizers of FIGS. 7 and 8 compared to another polarizer;

FIGS. 10 a and b are cross-sectional side schematic views of multilayer wire grid polarizers in accordance with exemplary embodiments of the present invention (the figures are not to scale and features are shown greatly exaggerated for clarity);

FIG. 11 is a graph of s-polarization reflection versus wavelength for the multilayer wire grid polarizers of FIGS. 10a and b compared to another polarizer;

FIG. 12 is a cross-sectional side schematic view of another multilayer wire grid polarizer in accordance with exemplary embodiments of the present invention (the figure is not to scale and features are shown greatly exaggerated for clarity);

FIG. 13 is a graph of s-polarization transmittance versus wavelength for the multilayer wire grid polarizer of FIG. 112 compared to another polarizer;

FIG. 14 is a side cross-sectional view of a wire grid layer with a dielectric material in spaces between metal elements of the wire grid layer in accordance with an exemplary embodiment of the present invention; and

FIG. 15 is a side cross-sectional view of a dielectric grid layer with two dielectric grids with elements of two different materials in accordance with an exemplary embodiment of the present invention.

Reference will now be made to the exemplary embodiments illustrated, and specific language will be used herein to describe the same. It will nevertheless be understood that no limitation of the scope of the invention is thereby intended.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENT(S)

It has been recognized that, for one polarization of light, a wire-grid polarizer substantially acts as a metal that reflects the light (or one polarization thereof), while for the other polarization of the light, the wire-grid polarizer substantially acts as a thin film of lossy dielectric that transmits the light (or another polarization thereof). Thus, it has been recognized that two concepts, namely form birefringence and effective index of refraction, can be applied to improve the performance of the polarizer.

A wire-grid polarizer is not typically considered an example of form birefringence. Generally, birefringence means that a material has a different index of refraction for different polarizations. Birefringence is very common in crystalline materials, such as quartz, and in stretched polymers. Form birefringence refers to birefringence caused by the shape of a material.

When a material has variations in material properties, such as density, with the scale of the variation being smaller than the wavelength of light, the index of refraction is different from the index of uniform bulk material. There is an effective refractive index, which is the index that a uniform thin film would have that causes the same affect on light. The theoretical treatment of this effect is called effective medium theory. This phenomenon is used with dielectric materials to make such things as moth-eye antireflection coatings.

In addition, a wire-grid polarizer is not typically considered a thin film. In optics, both form birefringence and effective index are typically considered only for dielectric materials. It has been recognized, however, that treating a wire-grid polarizer as an equivalent birefringent thin film with effective indices of refraction allows one to consider it as an element in a thin film stack, and to use thin film design techniques with particular performance goals.

The present invention utilizes thin films in combination with a metallic wire grid polarizer to improve performance of the polarizer. Generally this may include films under and on top of the wire grid. Any one of these films may be uniform or a dielectric grid. The wire grid may be a composite grid, or have composite wires. Combining the wire grid with multiple layers of different material, and thus different refractive indices, can reduce reflection of the polarization that is desired to be transmitted. For example, a wire grid can be configured to reflect s polarized light, and transmit p polarized light. As discussed above, while it is desirable to transmit all the p polarized light and reflect all the s polarized light, a typical wire grid will transmit some of both polarizations and reflect some of both polarizations. It has been found, however, that treating the wire grid as a birefringent thin film, and combining the wire grid with multiple thin films, reduces reflection of p polarized light.

As illustrated in FIGS. 1 and 2, multilayer wire-grid polarizer devices, indicated generally at 10a and 10b, respectively, are shown as exemplary implementations in accordance with the invention for polarizing light 12, or substantially separating one polarization state from an orthogonal polarization state, and doing so in an improved manner, with less reflection and/or transmission of unwanted polarizations. Such devices are believed to have substantial utility in visible light applications, or for use with visible light in the range of approximately 400-700 nm (nanometers), or 0.4-0.7 μm (micrometers or microns). Such visible light applications can include projection display devices such as projectors. The multilayer wire-grid polarizer devices described herein can be utilized in various different capacities, such as polarizers, beam splitters, analyzers, etc. It is also believed that the devices herein have utility in near-visible applications, such as ultraviolet and/or infrared applications, or for use with light in the range of approximately 250-400 nm or 700-10,000 nm. Thus, the term “light” is used broadly herein to refer to visible light, ultraviolet light and infrared light, or electromagnetic waves in the range of 250-10,000 nm.

The polarizers 10a and 10b include a substrate 14 carrying or supporting a plurality or stack of thin film layers 18, including a wire grid or a wire grid layer 22. The substrate 14 can be transparent to the light being treated. For example, the substrate can be glass (Bk7). Other substrates can be quartz or plastic. In addition, the substrate 14 can have a substantial thickness t_s with respect to the remaining thin film layers. Furthermore, the substrate can have a refractive index (or index of refraction) n_s. For example, a glass substrate (Bk7) has a refractive index n_s of 1.52 (at 550 nm). (It will be appreciated that the refractive index varies slightly with wavelength.)

The wire grid or wire grid layer 22 includes a wire-grid array of elongated metal elements 26. The elements 26 have lengths longer than a wavelength of the light, and are located in a generally parallel arrangement with a period P less than half the wavelength of the light. Thus, for use with visible light, the elements 26 have a length larger than the wavelength of visible light, or greater than 700 nm (0.7 μm). The length, however, can be much longer. The elements 26 can have a center-to-center spacing, pitch or period P less than half the wavelength of visible light, or less than 200 nm (0.2 μm). The elements 26 can also have a width w in the range of 10 to 90% of the pitch or period. The elements 26 can also have a thickness or a height t less than the wavelength of the light, or less than 400 nm (0.4 82 m) for visible light applications. In one aspect, the thickness can be less than 0.2 μm for visible light applications.

The elements 26, or the array, generally interact with the visible light to generally 1) transmit a transmitted beam 30 having a substantially uniform and constant linear polarization state (such as p polarization), and 2) reflect a reflected beam 34 also have a substantially uniform and constant linear polarization state (such as s polarization). The elements generally transmit light with a first polarization state (p polarization), oriented locally orthogonal or transverse to the elements, and reflect light with a second polarization state (s polarization), oriented parallel to the elements. It will be appreciated that the wire-grid polarizer will separate the polarization states of the light with a certain degree of efficiency, or some of both polarization states may be transmitted and/or reflected. It will also be appreciated that a portion of the elements can be configured to transmit or reflect a different polarization state.

The elements 26 or array can be formed on or over the substrate by photo-lithography. The elements 26 can be conductive, and can be formed of aluminum, silver, gold or copper.

The plurality of thin film layers 18 can include layers under and/or over the wire grid layer 22. Thus, one or more layers 18a-c can be disposed between the substrate 14 and the wire grid layer 22. In addition, one or more layers can be disposed over the wire grid layer 22. The layers 18 can be formed of different materials, or materials different than the substrate 14, and even from each other. Thus, the layers 18 can have refractive indices n different than the refractive index n_s of the substrate 14. Furthermore, it has been found that at least one of the layers 18a-c having a refractive index n_1-3 greater than the refractive index n_s of the substrate 14 decreases reflection of the p polarized light. Thus, in accordance with one aspect of the invention, the polarizer 10a or 10b has at least one thin film layer 18a disposed between the substrate 14 and the wire grid layer 22, and the thin film layer 18a has a refractive index n₁ greater than the refractive index n_s of the substrate 14. In accordance with another aspect of the invention, the polarizer 10a or 10b can have at least two thin film layers 18a and b, or at least three thin film layers 18a-c.

The thin film layers 18a-c can extend continuously across the substrate 14, and can be consistent or constant layers, indicated by 18a and 18c. The layers 18a-c can be formed of dielectric material. For example, the layers can be formed of: aluminum oxide; antimony trioxide; antimony sulphide; beryllium oxide; bismuth oxide; bismuth triflouride; cadmium sulphide; cadmium telluride; calcium fluoride; ceric oxide; chiolite; cryolite; germanium; hafnium dioxide; lanthanum fluoride; lanthanum oxide; lead chloride; lead fluoride; lead telluride; lithium fluoride; magnesium fluoride; magnesium oxide; neogymium fluoride; neodymium oxide; praseodymium oxide; scandium oxide; silicon; silicon oxide; disilicon trioxide; silicon dioxide; sodium fluoride; tantalum pentoxide; tellurium; titanium dioxide; thallous chloride; yttrium oxide; zinc selenide; zinc sulphide; and zirconium dioxide. The film layers can be deposited on the substrate. In the case of metal oxides, they can be deposited by starting with an oxide evaporant material (with additional oxygen backfill as needed). The material, however, can also be deposited by evaporating a base metal, then oxidizing the deposited material with O2 in the background.

The thicknesses t_1-3 and materials (or refractive indices n_1-3) of the thin film layers 18a-c can be manipulated to reduce reflection of p polarized light, as described in greater detail below.

One or more of the thin film layers 18a-c can include a dielectric grid including an array of non-metal elements 38. The non-metal and metal elements 38 and 26 of the arrays can be oriented substantially parallel with one another. In addition, the arrays can have substantially equal periods and/or widths. In one aspect, the non-metal elements 38 of the dielectric grid and the metal elements 26 are aligned, or the non-metal elements 38 are aligned with the metal elements 26 of the wire grid layer, as shown in FIG. 1. In another aspect, the non-metal elements 38 of the dielectric grid and the metal elements 26 are off-set, or the non-metal elements 38 are off-set with respect to the metal elements 26 of the wire grid layer, as shown in FIG. 2.

As stated above, the plurality of thin film layers 18 can include one or more other thin film layers disposed over the wire-grid layer 22. The other thin film layer can include a dielectric material, and can be continuous or constant. In addition, the other thin film layer 42 can include a dielectric grid including an array of non-metal elements 46. The non-metal and metal elements 46 and 26 of the arrays can be oriented substantially parallel with one another, and can have substantially equal periods. In one aspect, the non-metal elements 46 and metal elements 26 are aligned, or the non-metal elements 46 of the dielectric grid are aligned above or over the metal elements 26 of the wire grid layer 22, as shown in FIG. 1. In another aspect, the non-metal elements 46 and metal elements 26 are off-set, or the non-metal elements 46 of the dielectric grid are off-set above the metal elements 26 of the wire grid layer 22.

As discussed above, the number, thicknesses t, and materials (or refractive indices) of the thin film layers 18 can be varied to reduce reflection of p polarized light (increase transmission of p polarized light) and/or reduce transmission of s polarized light (increase reflection of s polarized light). Some of the layers 18a and c can be uniform in structure and material, while other layers can include grids, such as metal elements 26 of the wire grid layer 22 or non-metal elements 38 and 46 of a dielectric grid. Examples of specific configurations are discussed below.

Referring to FIG. 3, an example of a multilayer wire-grid polarizer 10c is shown. The polarizer includes three uniform thin film layers 50a-c on a glass (Bk7) substrate 14 and between the substrate and the wire grid or wire grid layer 22. The substrate 14 has a refractive index n_s of 1.52. The first thin film layer 50a is a uniform material of magnesium oxide (MgO) having a thickness t₁ of 65 nm. Thus, the first layer 50a has a refractive index n₁ of 1.74 (for a wavelength of 550 nm) greater than the refractive index n_s of the substrate 14. The second thin film layer 50b is a uniform material of ZrO₂ having a thickness t₂ of 130 nm, and a refractive index of 2.0. Thus, the second layer 50b also has a refractive index n₂ greater than the refractive index n_s of the substrate 14. The third thin film layer 50c is a uniform material of magnesium fluoride (MgF2) having a thickness t₃ of 70 nm. Thus, the third layer 50c has a refractive index n₃ of 1.38 (for a wavelength of 550 nm).

The wire grid layer 22 or wire grid is disposed on top of the third layer 50c. The wire grid includes elements made of aluminum. The elements can have a period P of 144 nm, a width w of 39.5% of the period, or 57 nm, and a thickness t_wg or height of 155 nm.

Referring to FIGS. 4a-c, the performance of the polarizer 10c of FIG. 3 is compared to a similar polarizer with no thin film layers between the wire grid and substrate, and a similar polarizer with a 30 nm layer of magnesium fluoride (MgF₂) between the wire grid and substrate (and thus has a thin film layer with a lower refractive index than the substrate). Light 12 is incident on the polarizer 10c at an incidence angle of 45 deg. In this case, the p polarization 30 is primarily transmitted, and the s polarization 34 is primarily reflected. Referring to FIG. 4a, the transmittance of the p polarization through the polarizer 10c is greater than the other two polarizers (or the reflectance of p polarization from the polarizer is less), as shown by curve at 54. While it can be seen that the polarizer with a thin layer of lower refractive index performs better than the plain polarizer, the polarizer 10c with the three thin film layers 50a-c performs even better. Referring to FIG. 4b, transmittance (leakage) of s polarization light is less with the polarizer 10c than with either of the other polarizers (or the transmittance of s polarization through the polarizer is less), as shown by curve 56. Referring to FIG. 4c, the reflection of the p polarization is generally less with the polarizer 10c than with the other polarizers (or the transmittance of p polarization is greater), as shown by curve 58. The net result is that there is more transmitted p polarization, and improved contrast in both transmission and reflection, which means the purity of the transmitted and reflected polarizations is greater with the multiplayer polarizer 10c.

Referring to FIG. 5, another example of a multilayer wire-grid polarizer 10d is shown. The polarizer 10d includes two dielectric layers or two dielectric grids 60a and 60b disposed directly on top of a wire grid layer 22 or wire grid with elements of aluminum. The wire grid or wire grid layer 22 is disposed on a glass (Bk7) substrate 14. The thickness or height t_wg of the elements 26 of the wire grid is 160 nm. The first dielectric grid 60a is disposed on the wire grid and has a thickness t₁ is 100 nm, and formed of silicon oxide (SiO2), with an index of refraction n₁ of 1.45. The second dielectric grid 60b also has a thickness t₂ of 100 nm, and is formed of a material with an index of refraction n₂ of 2.5. The period P of the grids is 144 nm. The width of the elements is 45% of the period P, or 57 nm. Light 12 is incident at 45 degrees.

Referring to FIGS. 6a and b, the performance of the polarizer 10d of FIG. 5 is compared to a similar polarizer without dielectric grids on top. Because the period P of the grids is less than the wavelength of visible light, they all essentially behave as thin films. In FIG. 6a it is seen that the reflected s polarization is substantially greater with the polarizer 10d, as shown by curve at 62. In FIG. 6b it is seen that the transmitted p polarization is also greater with the polarizer 10d, as shown by curve at 64.

Referring to FIG. 7, another example of a multilayer wire-grid polarizer 10e is shown. The polarizer 10e includes three uniform thin film layers 70a-c between a wire grid or wire grid layer 22 and a glass (Bk7) substrate 14. The first layer 70a is disposed on the substrate 14, has a thickness t₁ of 33 nm thick, and has a refractive index n₁ of 1.8. The second layer 70b is a material of magnesium fluoride (MgF₂) with a refractive index n₂ of 1.38, and a thickness t₂ of 30 nm. The third layer 70c has a thickness t₃ of 20 nm, and has a refractive index n₃ of 1.8. Thus, the first and third layers 70a and c have refractive indices n₁ and n₃ greater than the refractive index n_s of the substrate 14. The wire grid or wire grid layer 22 includes elements of aluminum with a period P of 144 nm. The element height t_wg is 160 nm, and the element width w is 45% of the period, or 57 nm. Light 12 is normally incident (0 deg.).

Referring to FIG. 8, another example of a multilayer wire-grid polarizer 10f is shown. The polarizer 10e includes three thin film layers 80a-c, similar to those described above for FIG. 7, except that the first layer 80a has a thickness t₁ of 28 nm; the second layer 80b has a thickness t₂ of 25 nm; and the third layer 80c has a thickness t₃ of 17 nm. In addition, the polarizer 10f includes a thin film layer 84 above the wire grid layer 22. The thin film layer 84 includes a dielectric grid with non-metal elements disposed on the metal elements of the wire grid. The wire grid or wire grid layer 22 is similar to the wire grid described above for FIG. 7. The elements of the dielectric layer 84 have a thicknesses t₄ of 100 nm. The elements of the dielectric layer 84 are formed of silicon dioxide (SiO₂).

Referring to FIG. 9, the performance of the polarizers 10e and f is compared with a similar wire grid polarizer without the thin film layers. Both polarizers 10e and f reflect less p polarization (pass more p polarization), as shown by curves at 86 and 88. The polarizer 10f with thin film layers under the wire grid layer and dielectric grids above the wire grid shows significant improvement, as shown by curve at 88.

Referring to FIGS. 10a and b, examples of multilayer wire-grid polarizers 10g and h are shown. Both polarizers 10g and h include a wire grid or wire grid layer 22 disposed on a substrate 14. The wire grid can include elements of aluminum and the substrate can be glass (Bk7). The period P of the wire grid is 144nm, and the elements have a thickness t_wg of 150 nm. The width w of the elements is 45% of the period, or 65 nm. In addition, the elements 26 define spaces 92 therebetween that include a material with a refractive index n₁ of 1.17. A second uniform layer 96 is disposed on top of the elements 26 and spaces 92, or the wire grid layer 22, that has a thickness t₂ of 100 nm and a refractive index n₂ of 1.17. A third thin film layer 100 is disposed over the second layer 96. The third layer 100 has uniform layer of silicon dioxide (SiO₂) and a thickness t₃ of 60 nm. Thus, the third layer 100 has an index of refraction n₃ of 1.45. A fourth layer 104 is disposed on the third layer 100, and includes a dielectric grid with non-metal elements. The elements of the dielectric grid have a thickness t₄ of 50 nm. The elements of the dielectric grid are formed of silicon dioxide (SiO2) and have a refractive index n₄ of 2.0. The width w of the elements of the dielectric layer is 50% of the period. The elements of the dielectric layer are disposed substantially directly above the elements of the wire grid, as shown in FIG. 10a. Alternatively, the elements of the dielectric layer can be off-set with respect to the elements of the wire grid, or are shifted one half period so that they are substantially above the spaces between the elements of the wire grid, as shown in FIG. 10b. The light 12 is incident at 45 degrees.

Referring to FIG. 11, the performance of the polarizers 10g and h are compared with a similar polarizer with only a wire grid on a glass substrate. The polarizers 10g and h have improved reflectance of s polarization, as shown by curves at 104 (which overlap each other). In addition, it appears that the alignment of the dielectric grid to the wire grid is not relevant when the conditions for effective medium theory apply. These examples also show that uniform layers and dielectric layers may be combined and used to advantage. In addition, these examples demonstrate the principle of the effective medium theory.

Referring to FIG. 12, another example of a multilayer wire-grid polarizer 10i is shown. The polarizer 10i is similar to the polarizer 10c of FIG. 3, but includes a wire grid or wire grid layer 112 with composite elements. The composite elements can include alternating layers of metal and non-metal layers. Examples of such composite elements are found in U.S. Pat. No. 6,532,111, which is herein incorporated by reference. For example, each element can include of alternating layers of aluminum and magnesium fluoride.

Referring to FIG. 13, the performance of the polarizer 10i is compared to a similar polarizer with composite elements, but without the thin film layers between the substrate and the wire grid layer. The polarizer 10i has less leakage or transmittance of s polarization, as shown by curve at 116.

Referring to FIG. 14, a wire grid layer 22 similar to those described above but with a dielectric material 120 in spaces between metal elements of the wire grid layer. Such a wire grid or wire grid layer can be substituted for any of those described above.

Referring to FIG. 15 a dielectric grid layer is shown with two dielectric grids 124 and 128 with elements of two different materials having two different indices of refraction n₁ and n₂ respectively. Thus, the dielectric layer or grid has alternating elements of different material, or elements of one grid disposed in the spaces of another grid. Such a dielectric grid or layer can be substituted for any of those described above.

The examples presented here are but a few of the many possibilities that may be realized from this invention. In general, a combination for uniform layers and dielectric grids may be combined for specific applications such as optimizing transmittance or reflectance over a given range of angles of incident of a given band of light. Optimization may be made for transmittance or reflectance or for both together. Optimization may be made for incidence from the air side on the polarizer or from the substrate side or both.

Various aspects of wire-grid polarizers, optical trains and/or projection/display systems are shown in U.S. Pat. Nos. 5,986,730; 6,081,376; 6,122,103; 6,208,463; 6,243,199; 6,288,840; 6,348,995; 6,108,131; 6,452,724; 6,710,921; 6,234,634; 6,447,120; and 6,666,556, which are herein incorporated by reference.

Although the wire-grid polarizers have been illustrated as facing the light source, or with the elongated elements facing towards the light source, it is understood that this is for illustrational purposes only. Those skilled in the art will appreciate that the wire-grid polarizers can be oriented to face towards imaging bearing beams, such as from a liquid crystal array, for the simple purpose of avoiding passing the image bearing beam through the substrate, and thus avoiding ghost images or multiple reflections associated with light passing through mediums, such as the substrate. Such configurations may result in the wire-grid polarizer facing away from the light source.

While the forgoing examples are illustrative of the principles of the present invention in one or more particular applications, it will be apparent to those of ordinary skill in the art that numerous modifications in form, usage and details of implementation can be made without the exercise of inventive faculty, and without departing from the principles and concepts of the invention. Accordingly, it is not intended that the invention be limited, except as by the claims set forth below.

Claims

1. A wire-grid polarizer device for polarizing light, comprising: a) a stack of thin film layers disposed over a substrate including:b) a wire grid layer and a plurality of thin film layers disposed between the wire grid layer and the substrate;c) the wire-grid layer including an array of elongated metal elements, wherein the elements comprise: i. lengths longer than a wavelength of visible light;ii. a period less than 200 nanometers;iii. a height less than 400 nanometers; andiv. a material selected from the group consisting of aluminum, silver, gold, copper, or combinations thereof;d) the plurality of thin film layers disposed between the wire grid layer and the substrate including: i. at least one dielectric grid layer; andii. at least one thin film layer comprising silicon; ande) the dielectric grid layer and the wire-grid are substantially parallel with one another, have substantially equal periods, and have substantially equal widths.

2. The device of claim 1, wherein at least one of the plurality of thin film layers disposed between the wire grid layer and the substrate has a thickness and material selected for decreasing reflection of p polarized light.

3. The device of claim 1, wherein the substrate comprises glass or quartz.

4. The device of claim 1, wherein the dielectric grid comprises at least two contiguous dielectric grids and at least one of the dielectric grids comprises a material selected from the group consisting of aluminum oxide; antimony trioxide; antimony sulphide; beryllium oxide; bismuth oxide; bismuth triflouride; cadmium sulphide; cadmium telluride; calcium fluoride; ceric oxide; chiolite; cryolite; germanium; hafnium dioxide; lanthanum fluoride; lanthanum oxide; lead chloride; lead fluoride; lead telluride; lithium fluoride; magnesium fluoride; magnesium oxide; neogymium fluoride; neodymium oxide; praseodymium oxide; scandium oxide; silicon; silicon oxide; disilicon trioxide; silicon dioxide; sodium fluoride; tantalum pentoxide; tellurium; titanium dioxide; thallous chloride; yttrium oxide; zinc selenide; zinc sulphide; zirconium dioxide; and combinations thereof.

5. The device of claim 1, wherein the metal elements have a height less than 200 nanometers.

6. The device of claim 1, further comprising at least one thin film disposed on top of the wire grid.

7. The device of claim 1, further comprising at least two thin films disposed on top of the wire grid and wherein at least one of the at least two thin films disposed on top of the wire grid has a thickness and material selected for decreasing reflection of p polarized light.

8. A wire-grid polarizer device for polarizing light, comprising: a) a stack of thin film layers disposed over a substrate including a wire grid layer and a dielectric thin film layer;b) the wire-grid layer including an array of elongated metal elements, wherein the elements comprise: i. lengths longer than a wavelength of visible light;ii. a period less than 200 nanometers;iii. a height less than 400 nanometers; andiv. a material selected from the group consisting of aluminum, silver, gold, copper, or combinations thereof;c) the dielectric thin film layer disposed between the wire grid layer and the substrate; andd) the dielectric thin film layer comprising: i. a material having a refractive index greater than a refractive index of the substrate; andii, a material selected from the group consisting of aluminum oxide; antimony trioxide; antimony sulphide; beryllium oxide; bismuth oxide; bismuth triflouride; cadmium sulphide; cadmium telluride; calcium fluoride; ceric oxide; chiolite; cryolite; germanium; hafnium dioxide; lanthanum fluoride; lanthanum oxide; lead chloride; lead fluoride; lead telluride; lithium fluoride; magnesium fluoride; magnesium oxide; neogymium fluoride; neodymium oxide; praseodymium oxide; scandium oxide; silicon; silicon oxide; disilicon trioxide; silicon dioxide; sodium fluoride; tantalum pentoxide; tellurium; titanium dioxide; thallous chloride; yttrium oxide; zinc selenide; zinc sulphide; zirconium dioxide; and combinations thereof.

9. The device of claim 8, further comprising at least one thin film disposed on top of the wire grid.

10. The device of claim 8, further comprising at least two thin films disposed on top of the wire grid and wherein at least one of the at least two thin films disposed on top of the wire grid has a thickness and material selected for decreasing reflection of p polarized light.

11. The device of claim 8, wherein: a) the dielectric thin film layer comprises at least two contiguous dielectric grids;b) at least one of the at least two contiguous dielectric grids comprises silicon; andc) the dielectric grids and the wire-grid are substantially parallel with one another and have substantially equal periods.

12. The device of claim 11, wherein the dielectric grids and the wire-grid have substantially equal widths.

13. The device of claim 8, wherein the dielectric thin film layer has a thickness and material selected for decreasing reflection of p polarized light.

14. The device of claim 8, wherein the metal elements have a height less than 200 nanometers.

15. A wire-grid polarizer device for polarizing light, comprising: a) a stack of thin film layers disposed over a substrate including a wire grid layer and a dielectric thin film layer;b) the wire-grid layer including an array of elongated metal elements, wherein the elements comprise: i. lengths longer than a wavelength of visible light;ii. a period less than 200 nanometers;iii. a height less than 400 nanometers; andiv. a material selected from the group consisting of aluminum, silver, gold, copper, and combinations thereof; andc) the dielectric thin film layer having a refractive index greater than a refractive index of the substrate.

16. The device of claim 15, wherein the dielectric thin film layer has a thickness and material selected for decreasing reflection of p polarized light.

17. The device of claim 15, wherein the dielectric thin film layer comprises silicon.

18. The device of claim 15, wherein the dielectric thin film layer comprises at least two contiguous dielectric thin film layers and wherein at least one of the dielectric thin film layers is a dielectric grid and at least one of the dielectric thin film layers is continuous.

19. The device of claim 15, wherein the metal elements have a height less than 200 nanometers.

20. The device of claim 15, wherein the substrate comprises glass or quartz.