Claims
- 1. Process for the production of N-substituted imido-dicarboxylic acid diaryl ester compound of the formula ##STR17## which comprises reacting a carbamic acid aryl ester of the formula:
- R.sup.1 --NH--CO--OR.sup.2 (II)
- with a carbonic acid aryl ester halide of the formula
- X--CO--OR.sup.3 (III)
- wherein
- R.sup.1 is an optionally substituted aliphatic, cycloaliphatic, araliphatic, aromatic or heterocyclic radical; and
- R.sup.2 and R.sup.3 can be identical or different and represent an optionally substituted aryl radical; and
- X is a halogen; in the absence of an acid-binding agent, at temperatures ranging from about 170.degree. C. to about 250.degree. C.
- 2. Process of claim 1 wherein R.sup.1 is straight or branched alkyl of 1 to 10 carbon atoms.
- 3. Process of claim 1 wherein R.sup.1 is substituted alkyl of 1 to 10 carbon atoms wherein the substituents are selected from lower alkoxy, lower alkylmercapto, halogen, cyano or nitro.
- 4. Process of claim 1 wherein R.sup.1 is alkenyl of 3 to 8 carbon atoms.
- 5. Process of claim 1 wherein R.sup.1 is alkynyl of 3 to 8 carbon atoms.
- 6. Process of claim 1 wherein R.sup.1 is a cycloaliphatic radical of 5 to 8 carbon atoms.
- 7. Process of claim 1 wherein R.sup.1 is a lower alkyl substituted cycloaliphatic radical of 5 to 8 carbon atoms.
- 8. Process of claim 1 wherein R.sup.1 is an araliphatic radical of 7 to 12 carbon atoms.
- 9. Process of claim 1 wherein R.sup.1 is a substituted araliphatic radical of 7 to 12 carbon atoms wherein the aromatic ring system is substituted by at least one of halogen, nitro, trifluoromethyl, cyano, lower alkyl and lower alkoxy.
- 10. Process of claim 1 wherein R.sup.1 is an aromatic radical of from 6 to 12 carbon atoms.
- 11. Process of claim 1 wherein R.sup.1 is a substituted aromatic radical of from 6 to 12 carbon atoms wherein the substituents are selected from halogen, nitro, trifluoromethyl, cyano, lower alkyl and lower alkoxy.
- 12. Process as claimed in claim 1 wherein the reaction is carried out in the presence of a diluent.
- 13. Process as claimed in claim 1 wherein
- R.sup.1 is a straight-chain or branched alkyl radical which has 1 to 10 carbon atoms and is optionally substituted by lower alkoxy, lower alkylmercapto, halogen, cyano or nitro; an alkenyl radical with 3 to 8 carbon atoms; an alkynyl radical with 3 to 8 carbon atoms; a cycloaliphatic radical which has 5 to 8 carbon atoms and is optionally substituted by lower alkyl; an araliphatic radical with 7 to 12 carbon atoms, the aromatic ring system being optionally substituted by halogen, nitro, trifluoromethyl, cyano, lower alkyl and/or lower alkoxy; an aromatic radical which has 6 to 12 carbon atoms and is optionally substituted by halogen, nitro, trifluoromethyl, cyano, lower alkyl and/or lower alkoxy; or a heterocyclic radical with 5 or 6 ring atoms and 1 to 3 hetero ring atoms; and
- R.sup.2 and R.sup.3 independently represent a phenyl or naphthyl radical which is optionally substituted by chlorine, methyl and/or methoxy.
Priority Claims (1)
Number |
Date |
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Kind |
3006226 |
Feb 1980 |
DEX |
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Parent Case Info
This is a continuation application of U.S. Ser. No. 350,057 pending filed Feb. 18, 1982, which in turn is a divisional of Ser. No. 233,248 filed Feb. 10, 1981, now abandoned.
Non-Patent Literature Citations (2)
Entry |
Tompkins et al., Journal of the American Chemical Society, vol. 69, (1947), pp. 2616-2618. |
Houben-Weyl, Methoden der Organischen Chemie, vol. VIII, part III (1952), p. 203. |
Divisions (1)
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233248 |
Feb 1981 |
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Continuations (1)
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350057 |
Feb 1982 |
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