Claims
- 1. A compound selected from the group consisting of a polyfunctional nitrile imine having the formula selected from the group consisting of
- R--C.tbd.N.sup..sym. --N.sup..crclbar. --R').sub.x and R--N.sup..crclbar. --N.sup..sym. .tbd.C--R").sub.x
- wherein R is a radical selected from the group consisting of alkylene radicals selected from methylene, dimethylene, trimethylene, tetramethylene, pentamethylene, hexamethylene, octamethylene, dodecamethylene, and octadecamethylene radicals; cycloalkylene radicals selected from cyclobutylene, cyclopentylene, cyclohexylene, and cyclooctylene; arylene radicals selected from o-phenylene, m-phenylene, p-phenylene, biphenylene, and naphthylene; arylene-dialkylene radicals selected from o-xylylene, m-xylylene, p-xylylene, o-phenylene-diethylene, m-phenylene-diethylene and p-phenylene-diethylene; alkylene-diarylene radicals selected from methylene bis(o-phenyl), methylene bis(m-phenyl), methylene bis(p-phenyl), dimethylene bis(o-phenyl), dimethylene bis(m-phenyl) and dimethylene bis(p-phenyl); and cycloalkylene-dialkylene radicals selected from 1,2-cyclohexane-dimethylene, 1,3-cyclohexane-dimethylene, 1,4-cyclohexane-dimethylene, 1,2-dyclopentane-dimethylene and 1,3-cyclopentane-dimethylene; R' is a radical selected from the group consisting of hydrogen, C.sub.1 -C.sub.20 alkyl radicals, C.sub.5 -C.sub.12 cycloalkyl radicals, aryl radicals having 1 to 3 rings, alkaryl radicals having C.sub.1 -C.sub.20 alkyl groups and 1 to 3 rings and aralkyl radicals having 1 to 3 rings and C.sub.1 -C.sub.20 alkyl groups; R" is a radical selected from the group consisting of C.sub.1 -C.sub.20 alkyl radicals, C.sub.5 -C.sub.12 cycloalkyl radicals, aryl radicals having 1 to 3 rings, alkaryl radicals having C.sub.1 -C.sub.20 alkyl groups and 1 to 3 rings and aralkyl radicals having 1 to 3 rings and C.sub.1 -C.sub.20 alkyl groups; and x is an integer from 2 to 10.
- 2. The compound of claim 1 wherein the polyfunctional nitrile imine has the formula
- R--C.tbd.N.sup..sym. --N.sup..crclbar. --R').sub.x
- 3. The compound of claim 2 wherein R is an arylene radical and R' is an aryl radical.
Parent Case Info
This application is a continuation of U.S. Application Ser. No. 453,664 filed Mar. 21, 1974, now abandoned, which is a division of U.S. Application Ser. No. 131,824, filed Apr. 6, 1971, now U.S. Pat. No. 3,832,399, which is in turn a continuation-in-part of U.S. Application Ser. No. 720,430, filed Feb. 2, 1968 and now abandoned, which is in turn a division of U.S. Application Ser. No. 447,887, filed Apr. 13, 1965, now U.S. Pat. No. 3,418,285.
US Referenced Citations (6)
Non-Patent Literature Citations (1)
Entry |
Huisgen, Angewandte Chemie, International Edition in English, vol. 2 (1963), pp. 3, 16-21. |
Divisions (2)
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Number |
Date |
Country |
Parent |
131824 |
Apr 1971 |
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Parent |
447887 |
Apr 1965 |
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Continuations (1)
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Number |
Date |
Country |
Parent |
453664 |
Mar 1974 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
720430 |
Feb 1968 |
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