Claims
- 1. A composite structure having a nonlinear optical film formed on a substrate, wherein
- said film contains 1 to 80% by volume of particles of at least one metal in a ferroelectric or dielectric matrix,
- the material of which said matrix is made is a composite oxide comprising at least one atom A selected from the group consisting of Ca, Ba, Sr, Pb, K, Na, Li, La and Cd, and at least one atom B selected from the group consisting of Ti, Zr, Ta and Nb, said composite oxide having an atomic ratio A/B ranging from 0.4 to 1.2,
- said particles have a mean particle size of 1 to 100 nm, and
- said matrix has a dielectric constant of at least about 10 at room temperature.
- 2. The structure of claim 1 wherein said matrix material has a dielectric constant of at least about 100 at room temperature.
- 3. The structure of claim 1 wherein said composite oxide has an atomic ratio A/B ranging from 0.8 to 1.2.
- 4. The structure of claim 1 wherein the metal of said particles is selected from the group consisting of Au, Ag, Cu and alloys thereof.
- 5. The structure of claim 1 wherein said matrix includes grains having a mean grain size of 40 to 1,000 nm.
- 6. The structure of claim 1 wherein said particles are located at triple point positions of grains of said matrix.
- 7. The structure of claim 1 wherein said nonlinear optical film has a dielectric constant of at least 10.
- 8. The structure of claim 1 wherein said nonlinear optical film has a third-order nonlinear susceptibility .chi..sup.(3) of at least 10.sup.-7 esu.
- 9. The structure of claim 1 wherein said nonlinear optical film is prepared by forming a film having particles of at least one metal dispersed in a ferroelectric or dielectric matrix and then heat treating the film at a temperature of at least 100.degree. C. for adjusting the resonance absorption wavelength position of said particles.
- 10. The structure of claim 9 wherein the film is formed by a co-sputtering technique.
- 11. The structure of claim 10 wherein the sputtering is done in an operating pressure of 1.5 to 10 Pa.
- 12. The structure of claim 10 wherein the sputtering is done in an argon-oxygen gas atmosphere.
- 13. The structure of claim 9 wherein the heat treatment is carried out at a temperature of 100.degree. to 1,100.degree. C.
- 14. The structure of claim 1 wherein said nonlinear optical film is prepared by forming a film having particles of at least one metal dispersed in a ferroelectric or dielectric matrix, heating at a temperature of at least 100.degree. C. and then quenching the film at a cooling rate of at least 10.sup.3 .degree. C./sec.
Priority Claims (5)
Number |
Date |
Country |
Kind |
4-151588 |
May 1992 |
JPX |
|
4-311232 |
Oct 1992 |
JPX |
|
4-316479 |
Oct 1992 |
JPX |
|
4-322627 |
Nov 1992 |
JPX |
|
5-26268 |
Jan 1993 |
JPX |
|
Parent Case Info
This is a continuation-in-part application of Ser. No. 08/021,464 filed Feb. 23, 1993 (now U.S. Pat. No. 5,401,569).
US Referenced Citations (5)
Number |
Name |
Date |
Kind |
5023139 |
Birnboim et al. |
Jun 1991 |
|
5198269 |
Swartz et al. |
Mar 1993 |
|
5234758 |
Olsen et al. |
Aug 1993 |
|
5253103 |
Boyd et al. |
Oct 1993 |
|
5401569 |
Kineri et al. |
Mar 1995 |
|
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
21464 |
Feb 1993 |
|