Claims
- 1. A storage medium, wherein the storage medium comprises a ferromagnetic semiconductor, comprising:
at least one Group III element; at least one Group V element; and a dopant, wherein the storage medium comprises an original coercivity and an expected photo-modified coercivity, and wherein the expected photo-modified coercivity is lower than the original coercivity.
- 2. The storage medium of claim 1, wherein the dopant comprises Mn or Cr.
- 3. The storage medium of claim 1, wherein the dopant comprises Mn.
- 4. The storage medium of claim 1, wherein the Group III and Group V elements comprise those elements having a curie temperature above room temperature.
- 5. The storage medium of claim 1, wherein the storage medium comprises Ga1-xMnxAs, Ga1-xMnxN (In0.53Ga0.47)1-xMnxAs, or In1-xMnxAs.
- 6. The storage medium of claim 1, wherein the storage medium comprises Ga1-xMnxN.
- 7. The storage medium of claim 1, wherein the Group V elements comprise about 50 molar % of the semiconductor material, and wherein a combination of the Group III elements and the dopant comprise about 50 molar % of the semiconductor material.
- 8. The storage medium of claim 7, wherein the dopant comprises 10 molar % or less of the Group III elements.
- 9. The storage medium of claim 1, wherein the semiconductor material is prepared in an external magnetic field that has a strength lower than that of the original coercivity but higher than that of the expected photo-modified coercivity.
- 10. A method for nonthermally recording information on a ferromagnetic semiconductor material, comprising:
(A) providing a ferromagnetic III-V semiconductor material, wherein the semiconductor material comprises at least one Group III element, at least one Group V element, and a dopant; and (B) exposing the ferromagnetic semiconductor material to laser pulses to produce transient carriers.
- 11. The method of claim 10, wherein the ferromagnetic semiconductor material comprises an original coercivity and an expected photo-modified coercivity, and wherein the expected photo-modified coercivity is lower than the original coercivity.
- 12. The method of claim 10, further comprising cooling the semiconductor material to a temperature below its curie temperature prior to step (B).
- 13. The method of claim 10, wherein step (B) further comprises cooling the ferromagnetic semiconductor material to a temperature below its curie temperature.
- 14. The method of claim 10, wherein the dopant comprises Mn or Cr.
- 15. The method of claim 10, wherein the dopant comprises Mn.
- 16. The method of claim 10, wherein the Group III and Group V elements comprise those elements having a curie temperature above room temperature.
- 17. The method of claim 10, wherein the semiconductor material comprises Ga1-xMnxAs, Ga1-xMnxN, (In0.53Ga0.47)1-xMnxAs, or In1-xMnxAs.
- 18. The method of claim 10, wherein the semiconductor material comprises Ga1-xMnxN.
- 19. The method of claim 10, wherein the Group V elements comprise about 50 molar % of the ferromagnetic semiconductor material, and wherein a combination of the Group III elements and the dopant comprise about 50 molar % of the ferromagnetic semiconductor material.
- 20. The method of claim 19, wherein the dopant comprises 10 molar % or less of the Group III elements.
- 21. The method of claim 10, wherein step (B) further comprises exposing the ferromagnetic semiconductor material in an external magnetic field.
- 22. The method of claim 21, wherein the ferromagnetic semiconductor material comprises an original coercivity and an expected photo-modified coercivity, and wherein the external magnetic field has a strength lower than that of the original coercivity but higher than that of the expected photo-modified coercivity.
- 23. The method of claim 21, wherein the ferromagnetic semiconductor material has an original magnetization direction, and wherein the external magnetic field has a magnetization direction opposite to the original magnetization direction.
- 24. The method of claim 10, wherein the laser pulses are less than about 2 picoseconds in duration.
- 25. The method of claim 10, wherein the laser pulses have a predetermined wavelength and a predetermined pulse pattern.
- 26. The method of claim 10, wherein the laser pulses comprise a wavelength between about 0.3 micrometers and about 5 micrometers.
- 27. The method of claim 10, wherein the laser pulses have a photon energy the same or larger than the band gap of the ferromagnetic semiconductor material.
- 28. The method of claim 10, wherein the transient carriers interact with the dopant elements.
- 29. The method of claim 28, wherein the ferromagnetic semiconductor material comprises an original coercivity and an expected photo-modified coercivity that is lower than the original coercivity, and wherein the interaction reduces the coercivity of the ferromagnetic semiconductor material to that of the expected photo-modified coercivity.
- 30. The method of claim 10, further comprising
(C) exposing the ferromagnetic semiconductor material to a second set of laser pulses wherein the second set of laser pulses have the same pulse pattern as the laser pulses of step (B).
- 31. The method of claim 30, wherein the second set of laser pulses comprises a predetermined wavelength.
- 32. The method of claim 30, wherein the second set of laser pulses provide information on the ferromagnetic semiconductor material.
- 33. The method of claim 10, wherein the ferromagnetic semiconductor material comprises a hysteresis loop, and wherein step (B) produces a transient decrease in the coercivity in the hysteresis loop.
- 34. The method of claim 10, wherein step (B) increases the density of transient carriers in the ferromagnetic semiconductor material.
- 35. A method for nonthermally modifying a ferromagnetic II-V semiconductor material, comprising:
(A) providing the ferromagnetic III-V semiconductor material, wherein the ferromagnetic semiconductor material comprises at least one Group III element, at least one Group V element, and a dopant; and (B) exposing the ferromagnetic semiconductor material to laser pulses to produce transient carriers, wherein the transient carriers interact with the dopant to modify the ferromagnetic semiconductor material.
- 36. The method of claim 35, wherein the ferromagnetic semiconductor material comprises an original magnetization direction, and wherein modifying the ferromagnetic semiconductor material comprises reversing the direction of the original magnetization direction.
- 37. The method of claim 35, wherein the ferromagnetic semiconductor material comprises an original coercivity and an expected photo-modified coercivity, and wherein the expected photo-modified coercivity is lower than the original coercivity.
- 38. The method of claim 35, further comprising cooling the ferromagnetic semiconductor material to a temperature below its curie temperature prior to step (B).
- 39. The method of claim 35, wherein step (B) further comprises cooling the ferromagnetic semiconductor material to a temperature below its curie temperature.
- 40. The method of claim 35, wherein the dopant comprises Mn or Cr.
- 41. The method of claim 35, wherein the ferromagnetic semiconductor material comprises Ga1-xMnxAs, Ga1-xMnxN, (In0.53Ga0.47)1-xMnxAs, or In1-xMnxAs.
- 42. The method of claim 35, wherein the dopant comprises 10 molar % or less of the ferromagnetic semiconductor material.
- 43. The method of claim 35, wherein step (B) further comprises exposing the ferromagnetic semiconductor material in an external magnetic field.
- 44. The method of claim 43, wherein the ferromagnetic semiconductor material comprises an original coercivity and an expected photo-modified coercivity, and wherein the external magnetic field has a strength lower than that of the original coercivity but higher than that of the expected photo-modified coercivity.
- 45. The method of claim 35, wherein the laser pulses have a predetermined wavelength and a predetermined pulse pattern.
- 46. The method of claim 35, wherein the laser pulses are less than about 2 picoseconds in duration.
- 47. The method of claim 35, further comprising
(C) exposing the ferromagnetic semiconductor material to a second set of laser pulses wherein the second set of laser pulses have the same pulse pattern as the laser pulses of step (B).
- 48. The method of claim 47, wherein the second set of laser pulses provides information on the ferromagnetic semiconductor material.
- 49. A method for providing a transient decrease of coercivity in a hysteresis loop of a ferromagnetic III-V semiconductor material, comprising:
(A) providing the ferromagnetic III-V semiconductor material, wherein the ferromagnetic III-V semiconductor material comprises at least one Group III element, at least one Group V element, and a dopant; and (B) exposing the ferromagnetic III-V semiconductor material to ultrashort laser pulses having a predetermined wavelength to produce transient carriers within the ferromagnetic semiconductor material.
- 50. The method of claim 49, wherein the dopant comprises Mn or Cr.
- 51. The method of claim 49, further comprising cooling the ferromagnetic semiconductor material to a temperature below its curie temperature prior to step (B).
- 52. The method of claim 49, wherein step (B) further comprises cooling the ferromagnetic semiconductor material to a temperature below its curie temperature.
- 53. The method of claim 49, wherein the hysteresis loop is unchanged in the vertical direction.
- 54. The method of claim 49, further comprising
(C) exposing the ferromagnetic semiconductor material to a second set of laser pulses wherein the second set of laser pulses have the same pulse pattern as the laser pulses of step (B).
- 55. The method of claim 54, wherein the second set of laser pulses provide information on the ferromagnetic semiconductor material.
- 56. A method for increasing the carrier density in a ferromagnetic III-V semiconductor material comprising exposing the ferromagnetic semiconductor material to ultrashort laser pulses with a predetermined wavelength.
- 57. The method of claim 56, wherein the ferromagnetic semiconductor material further comprises Mn or Cr.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This non-provisional application claims the benefit of U.S. Provisional Application No. 60/454,091, filed on Mar. 12, 2003, which is hereby incorporated by reference in its entirety.
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT
[0002] This invention was made with government support under Grant No. MDA 972-00-1-0034 by DARPA and Grant No. DMR-0134058 by NSF.
Provisional Applications (1)
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Number |
Date |
Country |
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60454091 |
Mar 2003 |
US |