This application is the national phase of International (PCT) Patent Application Ser. No. PCT/US00/14524, filed May 26, 2000, published under PCT Article 21(2) in English, which claims priority to U.S. Ser. No. 09/328,120 and U.S. Ser. No. 09/328,027, both filed Jun. 8, 1999. The entire disclosures of these three applications are incorporated herein by reference.
The present invention relates to respiratory apparatus and more specifically to a nasal mask useful for providing pressurized air or therapeutic gas to a patient suffering from an airflow limitation or other respiratory ailment.
Patients suffering from a variety of medical conditions often require supplementary respiratory support. Depending on the nature and severity of the condition, this respiratory support can range from providing an elevated oxygen concentration cloud to the vicinity of the nose and mouth, to forcing ventilation of the lungs by intubating the trachea. In general, a supply of pressurized air or therapeutic gas is provided by a tube or conduit to a delivery apparatus designed to conform to particular body structure.
One style of delivery apparatus is a mask which provides the gas to a nasal area of the patient. Nasal masks are often employed in the treatment of sleep apnea syndrome, characterized by intermittent upper airway obstruction during sleep. Due to the resulting blood oxygen desaturation and frequent arousals from sleep, persons suffering from this condition are often unable to achieve deep sleep for extended periods, are chronically tired, and are physically compromised.
Because nasal masks are often worn by persons in unmonitored environments for extended periods, such as in the home during sleep, the nasal mask should be comfortable to wear and conform well to the nasal area. If the mask is deemed too bulky, too heavy, or to fit poorly, the patient will either not wear the mask, wear the mask improperly, or only wear the mask occasionally when the discomfort associated with the respiratory condition exceeds the discomfort of wearing the mask.
One problem associated with nasal masks relates to the conformance of the mask to the nasal area, which is complexly contoured and differs from patient to patient. Customized masks manufactured to suit particular patients tend to be costly; therefore, masks for general use are typically made in several generic sizes, each size designed to accommodate a range of patients. If the mask does not form a good seal around the patient's nose, leakage can occur, reducing the effectiveness of the treatment. When poorly fitting masks are used with variably regulated air supply systems responsive to patient breathing, such as those developed for treating sleep apnea, mask leakage can induce improper system response which may exacerbate the patient's condition. Regulated air supply systems and delivery apparatus for treatment of sleep apnea are disclosed in Patent Cooperation Treaty international application number PCT/US93/05095, published on Dec. 9, 1993, as international publication number WO 93/24169; U.S. patent application Ser. No. 08/184,976 filed Jan. 24, 1994; U.S. Pat. No. 5,199,424; U.S. Pat. No. 5,245,995; U.S. Pat. No. 5,522,382; U.S. Pat. No. 5,645,054; U.S. Pat. No. 6,019,101; and U.S. Des. Pat. No. D398,987, the disclosures of all of which are herein incorporated by reference.
One method of reducing leakage is to provide a compliant sealing flange or surface around a perimeter of the mask in combination with a strap to bias the mask into sealing engagement with the nasal contour of the patient. Typically, the greater the retention force applied by the strap, the better the seal; however, both the strap and the mask can cause excessive pressure on delicate areas, resulting in irritation and patient discomfort.
The retention force required to prevent leakage is also a function of forces and torques induced in the mask. For example, the weight of the conduit supplying air or gas to the mask tends to pull the mask downward, away from the patient's nasal area, when the patient is sitting. Additionally, any movement of the head from side-to-side or up and down can cause lifting of an edge or sliding of the mask and strap. The more rapid the movement, the more pronounced the effect. Mask slippage and displacement are exacerbated in masks employing large diameter, heavy, or stiff tubes which deliver relatively large volumetric flow rates of air, such as those employed in sleep apnea treatment systems.
For nasal masks used by patients when sleeping, the strap and seal arrangement should also accommodate unconscious or reflexive head and body movements. The discomfort associated with masks which apply too much pressure to the head, neck, or nasal area discourage use of the mask during sleep when it is most needed. As a result, treatment is compromised and the patient is ill served by the apparatus.
Accordingly, there exists a need to overcome the limitations of known designs by providing an improved nasal mask which provides a consistent, reliable nasal area seal while being comfortable to wear. Other desirable features would include ease of manufacture and low cost.
Devices of the present invention allow for comfortable delivery of a breathable gas to a user. More particularly, devices of the invention seal with the external skin surrounding the nares at the base of the nose and/or along the inner rim of the nares of a user. The seal is both comfortable for the patient and reliable. Both the softness of a gel seal according to the invention and the design of devices according to the invention which invite minimal contact between the user's epidermal areas and the device, combine to create this comfortable and reliable seal about the user's nares.
In one aspect of the invention a nasal mask includes a shell and a first seal. The shell forms a chamber having an inlet and at least one outlet. The first seal is disposed proximate the outlet for contacting and sealing with external skin proximate at least one naris at a base of a nose of a user donning the mask. Substantially all of the sealing occurs between the seal and the external skin.
Certain embodiments of this aspect of the invention may include any or all of the following features. A nasal mask can include both a second seal and a second outlet. The first seal can be integral with the second seal. The nasal mask also can include a malleable element disposed within the shell. Additionally, a seal of a nasal mask can include a bladder. The bladder can be filled with silicone gel, molded in a predetermined configuration, and/or bonded to the shell.
A conduit can be attached to the inlet of a nasal mask. The conduit can include an angled portion, a rotary connection, and/or a ball and socket connection. Additionally, the conduit can have a side wall defining a lumen within the side wall. The side wall can contain at least one opening in communication with the lumen.
A headgear apparatus can be attached to the mask for retaining the mask on a user. A retainer can be disposed about the inlet and cooperate with the headgear apparatus to retain the mask on a user. One or more connectors can attach the headgear apparatus to the mask. One or more of the connectors can attach to the retainer.
Another aspect of the invention includes a system for treating a respiratory ailment in a recumbent or sleeping user. The system includes a nasal mask as described above connected to a controlled, breathable gas source with a conduit. The nasal mask may include any of the features described above.
Another aspect of the invention comprises a seal for use with a nasal mask including a bladder filled with a molded material in a predetermined configuration. The material has a durometer value less than about ten on a Shore OOO scale. The seal is configured typically with a slight crown to seal against external skin proximate at least one naris at a base of a nose of a user. The material can be silicone.
The bladder can have at least one protrusion on a side thereof for contacting the external skin proximate at least one naris at a base of a nose of a user and/or can be substantially planar on a side thereof for contacting a shell of the nasal mask. The seal can have a thickness and can form at least one aperture therethrough disposable proximate a naris. A thickness of the bladder proximate the aperture can be less than a thickness of the seal remote therefrom.
The invention, in accordance with preferred and exemplary embodiments, together with further advantages thereof, is more particularly described in the following detailed description, taken in conjunction with the accompanying drawings.
In the drawings, like reference characters generally refer to the same parts throughout the different views. Also, the drawings are not necessarily to scale, emphasis instead generally being placed upon illustrating principles of the invention.
The present invention provides a comfortable, reliably sealing nasal mask for delivering a breathable gas to a user. In particular a seal bonded to a shell of the nasal mask is particularly soft. This seal rests comfortably on the external skin surrounding the nares at the base of the nose and/or along the inner rim of the nares of a user.
The design of nasal masks according to this invention provides solutions to several common problems with current designs. First, the nasal mask's contact with the user's face is minimal compared with current masks. Second, the seal distributes contact pressure, unlike many current masks. Third, the design allows the user to comfortably lie in almost any position. Fourth, the design provides a comfortable fit and a reliable seal for a wide range of the population compared with many current masks which either must be stocked in multiple sizes or simply do not properly fit on users with faces of a certain shape.
Referring to
The upper shell 6 is contoured such that two outlets 34, 36 protrude from it symmetrically along its mid-line. The malleable element 4 has holes in it that correspond to and are disposed around the outlets 34, 36 in the upper shell 6. The lower portion of a shell 8 is affixed to the upper portion of the shell 6. The two portions of the shell, for example, but without limitation, can be heated and welded together, welded together with a solvent and/or bonded together with a bonding agent. The shell portions 6, 8 typically, are manufactured from a flexible material, for example, but without limitation, by a molding process using a compliant polymer. Each of the two portions of the shell, for example, but without limitation, can be manufactured from a thermopolymer elastomer. A flange 42 seats the upper shell 6 securely on the lower shell 8 and allows for a larger surface area for affixing the upper shell 6 to the lower shell 8. The combination of the upper and lower shells 6, 8 produces a chamber 30. When in communication with a source of breathable gas, this chamber 30 contains the breathable gas. The gas in the chamber 30 is available to the user donning the nasal mask, and the gas, typically, is pressurized such that the gas is forced into the user's airway, holding open the airway. The chamber 30 is substantially leakage-free due to the bond between the seal 2 and the upper shell 6 (or other attachment methods) and the compliance of the seal 2 against a user's skin
The malleable element 4 is a double ring of a soft metal. Alternatively, the malleable element 4 can be constructed from any material that is formable and is capable of retaining the shape into which it is formed against the force of, for example, the flexible shell portions 6, 8 trying to regain their memory shape. The combination of the compliant and resilient shell portions 6, 8 and the malleable element 4 with sufficient rigidity to hold the shell portions 6, 8 in a selected configuration produces a “custom-fit” as desired by a particular user. Because the shell portions 6, 8 are resilient, the shell portions 6, 8 can be reformed any number of times as desired by a particular user. Typically, a user will adjust the fit of nasal mask 1 by bending the nasal mask 1 along its mid-line and the mid-line of the malleable element 4 contained within the nasal mask 1 into a “V” shape, as shown for example, in
The nasal mask 1 includes an inlet 32 into which a swivel connector 12 fits. The swivel connector 12 has a slightly concave shape on the end that fits into the inlet 32. A conduit elbow 14 fits onto the swivel connector 12 over a flange 28 on the swivel connector 12. The connection between the inlet 32 and the swivel connector 12 and/or the connection between the swivel connector 12 and the conduit elbow 14 can be a permanent and inseparable connection or the connection can be a selectively removable connection. The swivel connector 12 produces a swivel mount connection between the conduit elbow 14 and the inlet 32. In this type of connection, the conduit elbow 14 is capable of being rotated 360 degrees about an axis extending through the center of the inlet 32. In an alternative embodiment, the connection is characterized by a ball and socket connection. In this alternative type of connection, the conduit elbow has a second angular degree of freedom in addition to the single rotational degree of freedom of the swivel mount connection. The conduit elbow 14 may be manufactured from, for example, but without limitation to, polycarbonate. The swivel connector 12 also can be manufactured from, for example, but without limitation, polypropylene.
The conduit elbow 14 is shown with an angled portion of about ninety degrees, as well as apertures 20 as seen in
In addition, a retainer 10 is disposed about the inlet 32. Two tabs 22, 22′ included on the inlet 32 mate with two slots 24, 26, respectively, and hold the retainer 10 in a particular angular orientation. The retainer 10 has four connection points, two lower connection points 18, 18′ and two upper connection points 16, 16′. Typically, the tabs 22, 22′ hold the retainer 10 in an orientation such that the upper connection points 16, 16′ are above the lower connection points 18, 18′. These connection points 16, 16′, 18, 18′ allow for connection between the retainer 10 and a headgear apparatus. The retainer 10 can be constructed from, for example, but without limitation, a polycarbonate. Alternative embodiments may have a different number of connection points and/or may have a mechanically different method of fastening a headgear apparatus to a nasal mask. Fastening devices such as, but without limitation, snaps, hook and eye closures, hook and loop fasteners, or the like, may be used.
Now referring to
The headgear apparatus 48 is connected to the retainer 10. Specifically, the headgear apparatus 48 includes two upper retention straps 44, only one upper retention strap is shown, the other being hidden from view, and two lower retention straps 46, only one lower retention strap is shown, the other being hidden from view, each of which is attached to a corresponding one of two upper connection points 16, 16′, only one upper connection point 16 is shown, the other 16′ being hidden from view, or two lower connection points 18, 18′ only one lower connection point 18 is shown, the other 18′ being hidden from view, respectively. The connection points 16, 16′, 18, 18′ are a unitary part of the retainer 10. Modes of construction other than unitary construction will be appreciated by those skilled in the art.
This four point restraining system allows for the nasal mask 1 to be securely positioned against the nares of a user. The lower connection points 18, 18′, in concert with the lower retention straps 46, generally maintain the nasal mask 1 against a user's face. The seal 2 rests against the external skin at the base of a user's nose and/or along the rim of the nares (the “naric area”). The upper connection points 16, 16′ in concert with the upper retention straps 44 provide additional retention force on the upper portion of the nasal mask 1, closest to a user's eyes. This additional force retains the nasal mask 1 securely against the external skin surrounding the nares at the base of a user's nose and/or along the rim of a user's nares. The upper retention straps 44 do not block the vision of a user.
In use, a user would loop each of the lower and upper retention straps 44, 46 through each of the lower and upper connection points 16, 16′, 18, 18′, respectively. A hook and loop system can be used to maintain the straps 44, 46 at a desired adjustment. The loops are located along the majority of the straps 44, 46 but not at a distal tip portion of the straps 44, 46. Hooks are located on the distal tip portion such that when the distal tip of a strap is passed through a connector, the strap folds over on itself and the hooks engage the loops. Alternatively, the correct length of a strap can be adjusted and a snap on the distal tip can engage with a clip along the strap. Thus, a user only has to adjust a strap once rather than adjusting the straps each time a user dons the nasal mask.
The properly adjusted retention straps 44, 46 of the headgear apparatus 48 secure proper contact between the seal 2 and the naric area. The additional force provided by the upper connection points 16, 16′ and the upper retention straps 44 ensures that the nasal mask 1 rests securely against a user's naric area during a wide range of sleeping behaviors such as entering and maintaining a preferred sleeping position or performing involuntary movements during sleep.
Referring to
Now referring to
As stated hereinabove, according to one embodiment, the seal fill material has a durometer value of less than about ten on the Shore or Type OOO scale. Such low durometer values on this scale can be measured using apparatus and test methodology generally in accordance with Type A, B, C, D, DO, O, OO durometer test method of American Society for Testing and Materials (ASTM) Designation D 2240-97εI: Standard Test Method for Rubber Property—Durometer Hardness, approved Feb. 10, 1997, and revised editorially in February 1999, the disclosure of which is incorporated herein. As is known by those skilled in the art of testing the durometer of ultrasoft gels and sponge rubber on the Shore OOO scale, a 0.5 inch hemispherical end indentor shape is used in combination with a 113 gram-force main spring.
According to this test method, the procedure for obtaining measurements of a specimen's durometer is stated as follows:
When the durometer measurement is made as stated, while maintaining sufficient pressure to maintain contact, but without permitting the presser foot of the measuring apparatus to compress the silicone gel specimen, thereby forcing a portion of the specimen into the aperture formed about the indentor and binding the indentor, reliable, repeatable readings on the Shore OOO scale can be recorded.
Furthermore, the aforementioned test method states:
Although readings below 10 on the Shore scale are not considered reliable by ASTM, the Shore OOO scale is the lowest scale for durometer by Shore readings. In effect, the aforementioned seal fill material is too soft for measurement by ASTM approved Shore durometer test methods. However, a reference of below ten on the Shore OOO scale measured as described hereinabove is Applicant's preferred method for characterization of the seal softness in accordance with the invention. Further, this methodology is generally known by those skilled in the art and represents industry accepted measurement standards.
The bladder itself, typically, is made from a thermopolymer material. The bladder can be formed from, for example, but not limited to, a urethane film or a polyurethane film. Urethane films are commercially available, for example, from Deerfield Urethane, Inc., Deerfield, Mass., and polyurethane films are commercially available, for example, from Elf Atochem S.A. Paris, France. The film forming the bladder can be thicker in some portions relative to other portions. For example,
Now referring to
The seal 2 is about 0.225 inches thick, not including the area in which the two domes 38, 40 are located, and the seal 2 has a substantially planar side, typically the side that contacts the upper shell 6. The domes 38, 40 protrude about 0.225 inches above the surface of the seal 2. The seal 2 has a generally oval shape with two rounded portions 56, 58 on either side of the seal 2. The seal 2 also has an area 78 where the shape is concave instead of a smooth, convex arc. This concave area 78 can better accommodate the contours of the face of a user between the upper lip and the base of the nose. This slightly concave portion is reflected in other components of certain embodiments. For example, referring to
Now referring to
The retainer 210 is disposed about the inlet 232 to facilitate retention of the mask 201 on a user. Two tabs 222, 222′ included on the inlet 232 mate with two slots 226, 224 formed in the retainer 210 in a particular angular orientation. The retainer 210 has three connection points disposed remotely from the inlet 232, two lower connection points 218, 218′ and one upper connection point 216. The nasal mask 201 is substantially symmetrical, as best seen in
The connection points 216, 218, 218′ form slots which allow for connection of the retainer 210 with straps of a headgear apparatus below. A three point restraining system permits the nasal mask 201 to be securely and gently biased against the nares of a user. The lower connection points 218, 218′ in concert with retention straps, generally maintain the nasal mask 201 against a user's face. The seal 202 rests against the external skin at the base of a user's nose and/or along the rim of the nares (the “naric area”). The upper connection point 216 in concert with an upper retention strap provides additional retention force on the upper portion of the nasal mask 201, closest to a user's eyes. This additional force retains the nasal mask 201 securely against the external skin surrounding the nares at the base of a user's nose and/or along the rim of a user's nares. The upper retention strap passes slidably through the upper connection point 216, best seen in
In use, a user loops each of the lower retention straps through respective slots in each of the lower connection points 218, 218′. A hook and loop fastener system can be used to maintain the straps at a desired adjustment. The loops may be located along the majority of the lengths of the straps to provide a wide range of adjustment, with the hooks being located on the distal tip portions of the straps, such that when the distal tip of a strap is passed through a slot in a connector, the strap folds over on itself and the hooks engage the loops. Once the straps are adjusted, a user can slip the pre-formed loop into and out of the lower connection points 218, 218′ at a notch that is cut into an edge of each of the lower connections points 218, 218′. The notch typically is removed from a portion of the lower connection points 218, 218′ towards the centerline of the nasal mask 201 (line B—B in
Now referring to
Disposed within a perimeter portion of the shell 308, such as the flange 306, is a malleable element 304, best seen in
The nasal mask 301 also forms an inlet 332 in the shell 308 through which a breathable gas enters the chamber 390. A headgear apparatus retains the nasal mask 301 in the proper orientation against a user's naric area. The apparatus can include a retainer with other components, as described above, or the apparatus can be integral with the nasal mask 301. The apparatus connects to the nasal mask 301 either directly, or indirectly, through a retainer, with a strap 346 (only one is shown and labeled) positioned at either side of the upper lip. The straps 346 are directed to the nape of the neck, below the ears, of a user donning the nasal mask 301. A third strap 344 connects with the nasal mask 301 either directly, or indirectly, through a retainer, and is directed from the tip of the nose, between the eyes, and over the head of a user donning the nasal mask 301. The nasal mask 301 is maintained comfortably in sealing relation with the user's naric area with the headgear apparatus. This restraining system permits the nasal mask 301 to be securely and gently biased against a user's naric area. More particularly, the seal 302 is in contact with the external skin proximate the nares at the base of the user's nose. A chevron-shaped section 302a of the seal 302 seals against the base of the nose, from the tip along each side, and another section 302b of the seal 302 seals against the area above the upper lip or at the upper lip itself. As such, the chamber 390 is positioned immediately outside the user's nostrils and encloses the space between the edge of the base of the user's nose, proximate the nares, and the general area of the upper lip, best shown in
The seal itself, in some embodiments, is about 0.25 inches (0.64 cm) to about 0.375 inches (0.953 cm) in depth and, at the contact point between the seal and a user's skin, is about 0.25 inches (0.64 cm) to about 0.375 inches (0.953 cm) in width. Also, in certain embodiments, the shell is a flexible thermoplastic elastomer, such as polyurethane or vinyl compounds, and is about 1.1 inches (2.8 cm) to about 1.7 inches (4.3 cm) at its widest point. This width is generally the width of a human's nasal area as measured from the outer edge of one naris to the outer edge of the other naris, although any shell width that fits generally within a human's nasal area is acceptable. For example, but without limitation, these dimensions can be increased or decreased by about 10%. The shell also is shaped to fit within the naric area. Some relevant dimensions for sizing the shell and seal include the length of the philtrum (generally about 0.4 inches (1.0 cm) to about 0.8 inches (2.0 cm)) as well as the amount to which a nose protrudes (generally about 0.7 inches (1.8 cm) to about 1.2 inches (about 3.0 cm)). Also, the chamber, in certain embodiments, at its widest point, is slightly smaller than the width of the shell.
Variations, modifications, and other implementations of what is described herein will occur to those of ordinary skill in the art without departing from the spirit and the scope of the invention as claimed. Accordingly, the invention is to be defined not by the preceding illustrative description, but instead by the spirit and scope of the following claims.
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/US00/14524 | 5/26/2000 | WO | 00 | 11/28/2001 |
Publishing Document | Publishing Date | Country | Kind |
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WO00/74758 | 12/14/2000 | WO | A |
Number | Name | Date | Kind |
---|---|---|---|
428592 | Chapman | May 1890 | A |
1206045 | Smith | Nov 1916 | A |
1610793 | Kaufman | Dec 1926 | A |
1632449 | McKessson | Jun 1927 | A |
2248477 | Lombard | Jul 1941 | A |
2254854 | O'Connell | Sep 1941 | A |
2376871 | Fink | May 1945 | A |
D156060 | Wade | Nov 1949 | S |
D161337 | Hill | Dec 1950 | S |
2540567 | Bennett | Feb 1951 | A |
2625155 | Engelder | Jan 1953 | A |
2693178 | Gilroy | Nov 1954 | A |
2818861 | Russell | Jan 1958 | A |
2837090 | Bloom et al. | Jun 1958 | A |
2868196 | Stampe | Jan 1959 | A |
2902033 | Galleher, Jr. | Sep 1959 | A |
2917045 | Schildknecht et al. | Dec 1959 | A |
2931356 | Schwarz | Apr 1960 | A |
3042035 | Coanda | Jul 1962 | A |
3117574 | Replogle | Jan 1964 | A |
3288138 | Sachs | Nov 1966 | A |
3315672 | Cunningham et al. | Apr 1967 | A |
3330273 | Bennett | Jul 1967 | A |
3725953 | Johnson et al. | Apr 1973 | A |
4062357 | Laerdal | Dec 1977 | A |
D248497 | Slosek | Jul 1978 | S |
4167185 | Lewis | Sep 1979 | A |
4201205 | Bartholomew | May 1980 | A |
4226234 | Gunderson | Oct 1980 | A |
4231363 | Grimes | Nov 1980 | A |
4266540 | Panzik et al. | May 1981 | A |
4337767 | Yahata | Jul 1982 | A |
4354488 | Bartos | Oct 1982 | A |
4369284 | Chen | Jan 1983 | A |
4412537 | Tiger | Nov 1983 | A |
4414973 | Matheson et al. | Nov 1983 | A |
4417575 | Hilton et al. | Nov 1983 | A |
4446576 | Hisataka | May 1984 | A |
4454880 | Muto et al. | Jun 1984 | A |
4458679 | Ward | Jul 1984 | A |
4572323 | Randall | Feb 1986 | A |
4593688 | Payton | Jun 1986 | A |
D285496 | Berman | Sep 1986 | S |
4655213 | Rapoport et al. | Apr 1987 | A |
4665570 | Davis | May 1987 | A |
4674134 | Lundin | Jun 1987 | A |
4707863 | McNeal | Nov 1987 | A |
4770169 | Schmoegner et al. | Sep 1988 | A |
4782832 | Trimble et al. | Nov 1988 | A |
4799477 | Lewis | Jan 1989 | A |
4799526 | Reeves | Jan 1989 | A |
4807617 | Nesti | Feb 1989 | A |
4811730 | Milano | Mar 1989 | A |
4856118 | Sapiejewski | Aug 1989 | A |
D304384 | Derobert | Oct 1989 | S |
4915106 | Aulgur et al. | Apr 1990 | A |
4919128 | Kopala et al. | Apr 1990 | A |
4944310 | Sullivan | Jul 1990 | A |
D310431 | Bellm | Sep 1990 | S |
4960121 | Nelson et al. | Oct 1990 | A |
4971051 | Toffolon | Nov 1990 | A |
4989271 | Sapiejewski et al. | Feb 1991 | A |
5003631 | Richardson | Apr 1991 | A |
5003633 | Itoh | Apr 1991 | A |
5018519 | Brown | May 1991 | A |
5074297 | Venegas | Dec 1991 | A |
5093940 | Nishiyama | Mar 1992 | A |
5109839 | Blasdell et al. | May 1992 | A |
5138722 | Urella et al. | Aug 1992 | A |
5146914 | Sturrock | Sep 1992 | A |
5181506 | Tardiff, Jr. et al. | Jan 1993 | A |
5199424 | Sullivan et al. | Apr 1993 | A |
D335322 | Jones | May 1993 | S |
5243971 | Sullivan et al. | Sep 1993 | A |
5245995 | Sullivan et al. | Sep 1993 | A |
5269296 | Landis | Dec 1993 | A |
5331691 | Runckel | Jul 1994 | A |
5334646 | Chen | Aug 1994 | A |
5343878 | Scarberry et al. | Sep 1994 | A |
5349949 | Schegerin | Sep 1994 | A |
5390373 | Flory | Feb 1995 | A |
5400781 | Davenport | Mar 1995 | A |
5429683 | Le Mitouard | Jul 1995 | A |
5477852 | Landis et al. | Dec 1995 | A |
5485837 | Soles Bee et al. | Jan 1996 | A |
5511541 | Dearstine | Apr 1996 | A |
5517986 | Starr et al. | May 1996 | A |
5522382 | Sullivan et al. | Jun 1996 | A |
5540223 | Starr et al. | Jul 1996 | A |
RE35339 | Rapoport | Oct 1996 | E |
5560354 | Berthon-Jones et al. | Oct 1996 | A |
5570684 | Behr | Nov 1996 | A |
5592938 | Scarberry et al. | Jan 1997 | A |
5617849 | Springett et al. | Apr 1997 | A |
5645054 | Cotner et al. | Jul 1997 | A |
5647357 | Barnett et al. | Jul 1997 | A |
5657752 | Landis et al. | Aug 1997 | A |
5660174 | Jacobelli | Aug 1997 | A |
5662101 | Ogden et al. | Sep 1997 | A |
D385960 | Rudolph | Nov 1997 | S |
5704345 | Berthon-Jones | Jan 1998 | A |
5724965 | Handke et al. | Mar 1998 | A |
5740795 | Brydon | Apr 1998 | A |
5746201 | Kidd | May 1998 | A |
D398987 | Cotner et al. | Sep 1998 | S |
D402755 | Kwok | Dec 1998 | S |
RE36165 | Behr | Mar 1999 | E |
5884624 | Barnett et al. | Mar 1999 | A |
5896857 | Hely et al. | Apr 1999 | A |
5921239 | McCall et al. | Jul 1999 | A |
5966745 | Schwartz et al. | Oct 1999 | A |
6006748 | Hollis | Dec 1999 | A |
D419658 | Matchett et al. | Jan 2000 | S |
D421298 | Kenyon et al. | Feb 2000 | S |
6019101 | Cotner et al. | Feb 2000 | A |
6029660 | Calluaud et al. | Feb 2000 | A |
6029665 | Berthon-Jones | Feb 2000 | A |
D423096 | Kwok | Apr 2000 | S |
6044844 | Kwok et al. | Apr 2000 | A |
6091973 | Colla et al. | Jul 2000 | A |
D428987 | Kwok | Aug 2000 | S |
6098205 | Schwartz et al. | Aug 2000 | A |
6112746 | Kwok et al. | Sep 2000 | A |
6152137 | Schwartz et al. | Nov 2000 | A |
6176538 | Lawson et al. | Jan 2001 | B1 |
6192886 | Rudolph | Feb 2001 | B1 |
6196223 | Belfer et al. | Mar 2001 | B1 |
6631718 | Lovell | Oct 2003 | B1 |
Number | Date | Country |
---|---|---|
618807 | Apr 1961 | CA |
623129 | Jul 1961 | CA |
42 12 259 | Jan 1993 | DE |
195 48 380 | Jul 1996 | DE |
198 07 961 | Aug 1999 | DE |
0 549 299 | Jun 1993 | EP |
0 747 078 | Dec 1996 | EP |
780018 | Apr 1935 | FR |
2 658 725 | Aug 1991 | FR |
2 720 280 | Dec 1995 | FR |
2 749 176 | Dec 1997 | FR |
9324169 | Dec 1993 | WO |
9709090 | Mar 1997 | WO |
9818514 | May 1998 | WO |
9848878 | Nov 1998 | WO |
9943375 | Sep 1999 | WO |
9958181 | Nov 1999 | WO |