Claims
- 1. A salt of a compound of formula (I)
- 2. A salt as in claim 1, wherein the compound of formula (I) is topiramate.
- 3. A salt as in claim 1, wherein an alkali metal or magnesium cation displaces one hydrogen atom of the sulfamate.
- 4. A salt as in claim 1, wherein a choline cation displaces one hydrogen atom of the sulfamate.
- 5. A salt as in claim 1, wherein the salt of the compound of formula (I) is a sodium salt of topiramate.
- 6. A salt as in claim 5, of the formula (II)
- 7. A salt as in claim 6, characterized essentially by the following X-ray diffraction pattern:
- 8. A salt as in claim 6, characterized essentially by the following X-ray diffraction pattern:
- 9. A salt as in claim 6, characterized essentially by the following X-ray diffraction pattern:
- 10. A salt as in claim 6, characterized essentially by the following X-ray diffraction pattern:
- 11. A salt as in claim 1, wherein the salt of the compound of formula (I) is a potassium salt of topiramate.
- 12. A salt as in claim 11, of the formula (III)
- 13. A salt as in claim 12, characterized essentially by the following X-ray diffraction pattern:
- 14. A salt as in claim 12, characterized essentially by the following X-ray diffraction pattern:
- 15. A salt as in claim 12, characterized essentially by the following X-ray diffraction pattern:
- 16. A salt as in claim 12, characterized essentially by the following X-ray diffraction pattern:
- 17. A salt as in claim 1, wherein the salt of the compound of formula (I) is a lithium salt of topiramate.
- 18. A salt as in claim 17, of the formula (IV)
- 19. A salt as in claim 1, wherein the salt of the compound of formula (I) is a magnesium salt of topiramate.
- 20. A salt as in claim 19, of the formula (V)
- 21. A salt as in claim 1, wherein the salt of the compound of formula (I) is a choline salt of topiramate.
- 22. A salt as in claim 21, of the formula (VI)
- 23. A salt as in claim 22, characterized essentially by the following X-ray diffraction pattern:
- 24. A salt as in claim 22, characterized essentially by the following X-ray diffraction pattern:
- 25. A salt as in claim 22, characterized essentially by the following X-ray diffraction pattern:
- 26. A pharmaceutical composition comprising a salt of claim 1 and a pharmaceutically acceptable carrier.
- 27. A pharmaceutical composition prepared by combining a salt of claim 1 and a pharmaceutically acceptable carrier.
- 28. A process for making a pharmaceutical composition comprising combining a salt of claim 1 with a pharmaceutically acceptable carrier.
- 29. A process for preparing an alkali metal salt of a compound of formula (I) comprising reacting a compound of formula (I)
- 30. A process as in claim 29, wherein the alkali metal hydride is sodium hydride, the alkali metal hydroxide is sodium hydroxide, the alkali metal lower alkoxide is sodium lower alkoxide or the alkali metal amide is sodium amide.
- 31. A process as in claim 29, wherein the alkali metal hydride is potassium hydride, the alkali metal hydroxide is potassium hydroxide, the alkali metal lower alkoxide is potassium lower alkoxide or the alkali metal amide is potassium amide.
- 32. A process for preparing a lithium salt of a compound of formula (I) comprising
reacting a compound of formula (I) 17with lithium hydride under anhydrous conditions, lithium hydroxide, lithium lower alkoxide, alkyl lithium under anhydrous conditions or lithium amide under anhydrous conditions, in an organic solvent; and precipitating the product.
- 33. A process for preparing a magnesium salt of a compound of formula (I) comprising
reacting a compound of formula (I) 18with a magnesium lower alkoxide, under anhydrous conditions, in an organic solvent; and precipitating the product.
- 34. A process for preparing a choline salt of a compound of formula (I) comprising
reacting a compound of formula (I) 19with choline hydroxide, in an organic solvent; and precipitating the product.
- 35. A process as in claim 29, wherein the compound of formula (I) is a topiramate.
- 36. A process as in claim 30, wherein the compound of formula (I) is topiramate.
- 37. A process as in claim 31, wherein the compound of formula (I) is topiramate.
- 38. A process as in claim 32, wherein the compound of formula (I) is topiramate.
- 39. A process as in claim 33, wherein the compound of formula (I) is topiramate.
- 40. A process as in claim 34, wherein the compound of formula (I) is a topiramate.
CROSS REFERENCE TO RELATED APPLICATION
[0001] This application is a continuation in part of U.S. non-provisional application Ser. No. 10/188,924 filed Jul. 3, 2002 which claims priority from U.S. provisional application Serial No. 60/303,962 filed Jul. 9, 2001, the contents of which are hereby incorporated by reference.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60303962 |
Jul 2001 |
US |
Continuation in Parts (1)
|
Number |
Date |
Country |
| Parent |
10188924 |
Jul 2002 |
US |
| Child |
10336435 |
Jan 2003 |
US |