Claims
- 1. An electrode comprising a body formed of a sintered mixture of powders of at least one film-forming metallic material selected from the group consisting of a valve metal and silicon-iron alloys and at least one additive metal selected from the group consisting of Cr, Mn, Re, Fe, Co, Ni, Cu, Ag, Au, Zn, Cd, Ge, Sn, Pb, La and the lanthanide series of the Periodic Table and oxides, metallates and intermetallates thereof, the additive metal at the surface of the electrode being in the oxide form.
- 2. An electrode of claim 1 wherein the film-forming metallic material is selected from the group consisting of titanium, zirconium, tantalum, vanadium, tungsten, hafnium and silicon-iron alloys.
- 3. An electrode of claim 1 wherein the film-forming metallic material is titanium.
- 4. An electrode of claim 1 wherein the outer surface of the base is titanium containing 1.0 to 50% by weight of nickel oxide or cobalt oxide.
- 5. An electrode of claim 1 wherein the additive metal is in its oxide form.
- 6. An electrode of claim 1 wherein the body is comprised of at least one film-forming metallic material and at least one metal belonging to Groups VIB, VIIB, VIII, IIB, IB, IVA and lanthanum and lanthanide series of the Periodic Table and is obtained by sintering a mixture of powders of the metals comprising the surface of the base.
- 7. The electrode of claim 6 wherein oxides of at least one of the metals belonging to the said Groups of the Periodic Table are sintered with the film-forming metal matrix.
- 8. The electrode of claim 6 wherein intermetallic compounds of at least one of the metals belonging to the said Groups of the Periodic Table are sintered with the film-forming metal matrix.
- 9. The electrode of claim 6 wherein metallates comprising at least one of the metals belonging to the said Groups of the Periodic Table are sintered with the film-forming metal matrix.
- 10. The electrode of claim 6 wherein the powders have a mesh number comprised between 60 and 320.
- 11. The electrode of claim 6 wherein the film-forming metal material is selected from the groups consisting of titanium, tantalum, zirconium, niobium, vanadium, tungsten, hafnium and silicon-iron alloys.
- 12. The electrode of claim 6 wherein the concentration of metals belonging to said Groups of the Periodic Table is greater near the surface of the sintered electrode than within its bulk.
- 13. An electrode comprised of a body formed of a sintered mixture of powders consisting essentially of (a) 75 to 93% by weight of at least one film-forming metallic material selected from the group consisting of titanium, zirconium, tantalum, vanadium, tungsten, niobium, hafnium, and silicon-iron alloys, (b) 0 to 25% by weight of at least one member of the group consisting of metals and oxides of cobalt, nickel, iron and chromium, (c) 0 to 10% by weight of at least one member of the group consisting of platinum group metals and their oxides and (d) 0 to 4% by weight of titanium dioxide, the sum of (b) and (c) being at least 3% by weight and the sum of (b), (c), and (d) being at least 7% by weight.
Priority Claims (1)
Number |
Date |
Country |
Kind |
19679 A/73 |
Jan 1973 |
ITX |
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PRIOR APPLICATION
The present application is a continuation-in-part application of copending, application Ser. No. 856,486 filed Dec. 1, 1977, now abandoned which is a continuation of application Ser. No. 436,687 filed Jan. 25, 1974, now abandoned.
US Referenced Citations (4)
Continuations (1)
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Number |
Date |
Country |
Parent |
436687 |
Jan 1974 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
856486 |
Dec 1977 |
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