Claims
- 1. A method of manufacturing a nozzle plate assembly of a micro-injecting device, comprising the steps of:
forming a master plate defining a nozzle region; polishing a surface of the master plate; electroforming a nozzle plate on said surface of the master plate; and separating the nozzle plate from the master plate.
- 2. The method of claim 1, said step of forming the master plate further comprising the steps of:
forming a first metal layer on a protective film formed on a substrate; forming a second metal layer on the first metal layer; and etching said first metal layer and second metal layer to expose a portion of the protective film to define the nozzle region.
- 3. The method of claim 2, said step of forming the first metal layer comprising forming the first metal layer of vanadium.
- 4. The method of claim 2, said step of forming the second metal layer comprising forming the second metal layer of nickel.
- 5. The method of claim 1, said step of polishing a surface of the master plate further comprising:
degreasing the surface of the second metal layer; heat-treating the surface of the second metal layer; and dipping the master plate into a passivation solution.
- 6. The method of claim 5, said heat-treating being performed at a temperature in the range of approximately 32 to 37° C.
- 7. The method of claim 6, said heat-treating being performed for in the range of approximately 10 to 14 minutes.
- 8. The method of claim 5, said dipping in passivation solution being performed at a temperature in the range of approximately 22 to 27° C.
- 9. The method of claim 8, said dipping being performed for in the range of approximately 10 to 20 seconds.
- 10. The method of claim 1, said step of electroforming the nozzle plate being performed in an aqueous solution comprising NiH2/SO3/H, NiCl2, H3BO3 and C12H25SO4/NaS.
- 11. The method of claim 10, said aqueous solution having the concentration of NiH2/SO3/H in the range of approximately 280 to 320 g/liter, the concentration of NiCl2 in the range of approximately 18 to 22 g/liter, the concentration of H3BO3 in the range of approximately 28 to 32 g/liter and the concentration of C12H25SO4/NaS in the range of approximately 0.03 to 0.08 g/liter.
- 12. The method of claim 11, said aqueous solution having the concentration of NiH2/SO3/H be approximately 300 g/liter, the concentration of NiCl2 be approximately 20 g/liter, the concentration of H3BO3 be approximately 30 g/liter and the concentration of C12H25SO4/NaS be approximately 0.05 g/liter.
- 13. The method of claim 1, said electroforming step comprising electroforming nickel metal.
- 14. The method of claim 1, said step of electroforming the nozzle plate being performed by applying power in steps to the nozzle plate and a target substance in an electrolyte so as to draw a current density of approximately 0.1 A/m2 for in the range of approximately 40 to 60 minutes, then approximately 0.2 A/m2 for in the range of approximately 25 to 30 minutes, then approximately 0.3 A/m2 for in the range of approximately 18 to 22 minutes, then approximately 0.4 A/m2 for in the range of approximately 18 to 22 minutes, and then approximately 0.1 A/m2 for in the range of approximately 8 to 12 minutes.
- 15. The method of claim 14, said step of electroforming the nozzle plate being performed by applying power in steps to the nozzle plate and a target substance in an electrolyte so as to draw a current density of approximately 0.1 A/m2 for approximately 60 minutes, then approximately 0.2 A/m2 for approximately 30 minutes, then approximately 0.3 A/m2 for approximately 20 minutes, then approximately 0.4 A/m2 for approximately 20 minutes, and then approximately 0.1 A/m2 for approximately 10 minutes.
- 16. The method of claim 1, said electroforming step being stopped when a desired thickness of the nozzle plate is achieved.
- 17. The method of claim 17, the thickness of the electroformed nozzle plate being determined from the weight gain of the master plate using the equation:
- 18. The method of claim 1, said electroforming step being performed to deposit a nozzle plate of thickness in the range of approximately 15 to 25 μm.
- 19. The method of claim 16, further comprising the steps of:
removing the nozzle plate from electrolyte; treating the nozzle plate at a temperature in the range of 20 to 30° C.; and dipping the nozzle plate into deionized water for approximately 5 minutes.
- 20. The method of claim 1, further comprising the step of:
before separating the nozzle plate from the master plate, forming an ink chamber barrier layer on the nozzle plate.
- 21. The method of claim 20, said step of forming an ink chamber barrier layer on the nozzle plate further comprising the step of:
depositing an organic film on the nozzle plate.
- 22. The method of claim 21, further comprising:
said organic film being made of polyimide.
- 23. The method of claim 21, further comprising:
depositing said organic film to a thickness of approximately 30 μm.
- 24. The method of claim 21, further comprising the step of:
depositing a protection mask on said organic film; depositing a photoresist on the protection mask; and photoetching the photoresist layer to define the pattern of the ink chamber barrier layer; and removing the photoresist, patterning the organic film using the protection mask, and removing the protection mask.
- 25. An assembly in the manufacture of a nozzle plate of a micro-injecting device, comprising:
a substrate; a protective film formed on the substrate; a vanadium film formed by chemical vapor deposition on the protective film, said vanadium film having a nozzle region in which the protective film is exposed; a nickel film formed by chemical vapor deposition on the vanadium film and then polished to a root-mean-square roughness in the range of approximately 0.008 to 0.016 μm; and a nozzle plate of nickel of thickness in the range of approximately 15 to 25 μm electroformed on the nickel film to a root-mean-square roughness in the range of approximately 1.0 to 1.5 μm.
- 26. The assembly of claim 25, further comprising:
said nozzle plate being electroformed in an electrolyte solution comprising NiH2/SO3/H, NiCl2, H3BO3 and C12H25SO4/NaS.
- 27. A nozzle plate assembly of a micro-injecting device, comprising:
a plate of nickel of thickness in the range of approximately 15 to 25 μm, said plate having a nozzle region formed in the plate, said plate having one surface of root-mean-square roughness in the range of approximately 0.008 to 0.016 μm and said plate having the opposite surface of root-mean-square roughness in the range of approximately 1.0 to 1.5 μm, said nozzle plate being made by electroforming in an electrolyte solution comprising NiH2/SO3/H, NiCl2, H3BO3 and C12H25SO4/NaS.
- 28. The nozzle plate assembly of claim 27, further comprising an ink chamber barrier layer formed on said opposite surface.
Priority Claims (1)
Number |
Date |
Country |
Kind |
98119954 |
Nov 1998 |
RU |
|
CLAIM OF PRIORITY
[0001] This application makes reference to, incorporates the same herein, and claims all benefits accruing under 35 U.S.C. § 119 from an application for NOZZLE PLATE ASSEMBLY OF MICRO-INJECTING DEVICE AND METHOD FOR MANUFACTURING THE SAME earlier filed in the Russian Federation Patent Office on the 3rd of November 1998 and there duly assigned Ser. No. 98119954.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09432461 |
Nov 1999 |
US |
Child |
10021010 |
Dec 2001 |
US |