Claims
- 1. The chemical process which comprises reacting a monosilyl compound of the formula: ##STR11## wherein R is selected from the group consisting of hydrogen, lower alkyl of 1 through 4 carbon atoms, and cyclopropyl and R' is selected from the group consisting of hydrogen and lower alkyl of 1 through 4 carbon atoms; with a 2-deoxy-3,5-blocked-D-pentofuranosyl halide in the presence of a Lewis acid and a solvent selected from the group consisting of acetonitrile or nitromethane at a temperature of about minus (-) 25.degree. C. with subsequent warming to about 25.degree. C.; to form a 1-(2-deoxy-3,5-di-O-blocked-D-pentofuranosyl)-5-R-6-R'-5,6-dihydro-s-triazine-2,4-(1H,3H)-dione.
- 2. The process according to claim 1, wherein the monosilyl compound is reacted with a 2-deoxy-3,5-blocked-D-pentofuranosyl chloride in the presence of stannic chloride.
- 3. The process according to claim 2, wherein the 2-deoxy-3,5-blocked-D-pentofuranosyl chloride is a 2-deoxy-3,5-blocked-D-ribofuranosyl chloride.
- 4. The process according to claim 3, wherein the monosilyl compound is 5-ethyl-5,6-dihydro-2-O-trimethylsilyl-s-triazine-4-(3H)-one.
- 5. The process according to claim 4, wherein the 2-deoxy-3,5-blocked-D-ribofuranosyl chloride is selected from the group consisting of 2-deoxy-3,5-di-O-acetyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-benzoyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-toluoyl-D-ribofuranosyl chloride, and a 2-deoxy-3,5-di-O-p-nitrobenzoyl-D-ribofuranosyl chloride.
- 6. The process according to claim 3 wherein the monosilyl compound is 5-methyl-5,6-dihydro-2-O-trimethyl-silyl-4-(3H)-one.
- 7. The process according to claim 6, wherein the 2-deoxy-3,5-blocked-D-ribofuranosyl chloride is selected from the group consisting of 2-deoxy-3,5-di-O-acetyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-benzoyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-toluoyl-D-ribofuranosyl chloride, and a 2-deoxy-3,5-di-O-p-nitrobenzoyl-D-ribofuranosyl chloride.
- 8. The chemical process which comprises reacting a 2,4-bis-silyl compound of the formula: ##STR12## wherein R is selected from the group consisting of hydrogen, lower alkyl of 1 through 4 carbon atoms, and cyclopropyl and R' is selected from the group consisting of hydrogen and lower alkyl of 1 through 4 carbon atoms; with a 2-deoxy-3,5-blocked-D-pentofuranosyl halide in the presence of a Lewis acid and a solvent selected from the group consisting of acetonitrile or nitromethane at a temperature of about minus (-) 25.degree. C. with subsequent warming to about 25.degree. C.; to form a 1-(2-deoxy-3,5-di-O-blocked-.beta.-D-pentofuranosyl)-5-R-6-R'-5,6-dihydro-s-triazine-2,4-(1H,3H)-dione.
- 9. The process according to claim 8, wherein the bis-silyl compound is reacted with a 2-deoxy-3,5-di-blocked-D-pentofuranosyl chloride in the presence of stannic chloride.
- 10. The process according to claim 9, wherein the 2-deoxy-3,5-blocked-D-pentofuranosyl chloride is a 2-deoxy-3,5-blocked-D-ribofuranosyl chloride.
- 11. The process according to claim 10, wherein the bis-silyl compound is 5-ethyl-5,6-dihydro-2,4-bis-O-trimethylsilyl-s-triazine.
- 12. The process according to claim 11, wherein the 2-deoxy-3,5-blocked-D-ribofuranosyl chloride is selected from the group consisting of 2-deoxy-3,5-di-O-acetyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-acetyl-D-ribofuranosyl chloride, and a 2-deoxy-3,5-di-O-toluoyl-D-ribofuranosyl chloride, and a 2-deoxy-3,5-di-O-p-nitrobenzoyl-D-ribofuranosyl chloride.
- 13. The process according to claim 10, wherein the bis-silyl compound is 5-methyl-5,6-dihydro-2,4-bis-O-trimethylsilyl-s-triazine.
- 14. The process according to claim 13, wherein the 2-deoxy-3,5-blocked-D-ribofuranosyl chloride is selected from the group consisting of 2-deoxy-3,5-di-O-acetyl-D-ribofuranosyl chloride, and a 2-deoxy-3,5-di-O-toluoyl-D-ribofuranosyl chloride.
- 15. The chemical process which comprises reacting a monosilyl compound of the formula: ##STR13## wherein R is selected from the group consisting of hydrogen, lower alkyl of 1 through 4 carbon atoms, and cyclopropyl and R' is selected from the group consisting of hydrogen and lower alkyl of 1 through 4 carbon atoms; with a 2-deoxy-3,5-blocked-D-pentofuranosyl halide in the presence of a Lewis acid and acetonitrile at a temperature of about minus (-) 25.degree. C. with subsequent warming to about 25.degree. C.; to form a 1-(2-deoxy-3,5-di-O-blocked-.beta.-D-pentofuranosyl)-5-R-6-R'-5,6-dihydro-s-triazine-2,4-(1H,3H)-dione.
- 16. The process according to claim 15, wherein the monosilyl compound is reacted with a 2-deoxy-3,5-blocked-D-pentofuranosyl chloride in the presence of stannic chloride.
- 17. The process according to claim 16, wherein the 2-deoxy-3,5-blocked-D-pentofuranosyl chloride is a 2-deoxy-3,5-blocked-D-ribofuranosyl chloride.
- 18. The process according to claim 17, wherein the monosilyl compound is 5-ethyl-5,6-dihydro-2-O-trimethylsilyl-s-triazine-4-(3H)-one.
- 19. The process according to claim 18, wherein the 2-deoxy-3,5-blocked-D-ribofuranosyl chloride is selected from the group consisting of 2-deoxy-3,5-di-O-acetyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-benzoyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-toluoyl-D-ribofuranosyl chloride, and a 2-deoxy-3,5-di-O-p-nitrobenzoyl-D-ribofuranosyl chloride.
- 20. The process according to claim 17 wherein the monosilyl compound is 5-methyl-5,6-dihydro-2-O-trimethyl-silyl-4-(3H)-one.
- 21. The process according to claim 20, wherein the 2-deoxy-3,5-blocked-D-ribofuranosyl chloride is selected from the group consisting of 2-deoxy-3,5-di-O-acetyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-benzoyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-toluoyl-D-ribofuranosyl chloride, and a 2-deoxy-3,5-di-O-p-nitrobenzoyl-D-ribofuranosyl chloride.
- 22. The chemical process which comprises reacting a 2,4-bis-silyl compound of the formula: ##STR14## wherein R is selected from the group consisting of hydrogen, lower alkyl of 1 through 4 carbon atoms, and cyclopropyl and R' is selected from the group consisting of hydrogen and lower alkyl of 1 through 4 carbon atoms; with a 2-deoxy-3,5-blocked-D-pentofuranosyl halide in the presence of a Lewis acid and acetonitrile at a temperature of about minus (-) 25.degree. C. with subsequent warming to about 25.degree. C.; to form a 1-(2-deoxy-3,5-di-O-blocked-.beta.-D-pentofuranosyl)-5-R-6-R'-5,6-dihydro-s-triazine-2,4-(1H,3H)-dione.
- 23. The process according to claim 22, wherein the bis-silyl compound is reacted with a 2-deoxy-3,5-di-blocked-D-pentofuranosyl chloride in the presence of stannic chloride.
- 24. The process according to claim 23, wherein the 2-deoxy-3,5-blocked-D-pentofuranosyl chloride is a 2-deoxy-3,5-blocked-D-ribofuranosyl chloride.
- 25. The process according to claim 24, wherein the bis-silyl compound is 5-ethyl-5,6-dihydro-2,4-bis-O-trimethylsilyl-s-triazine.
- 26. The process according to claim 25, wherein the 2-deoxy-3,5-blocked-D-ribofuranosyl chloride is selected from the group consisting of 2-deoxy-3,5-di-O-acetyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-benzoyl-D-ribofuranosyl chloride, a 2-deoxy-3,5-di-O-toluoyl-D-ribofuranosyl chloride, and a 2-deoxy-3,5-di-O-p-nitrobenzoyl-D-ribofuranosyl chloride.
- 27. The process according to claim 24, wherein the bis-silyl compound is 5-methyl-5,6-dihydro-2,4-bis-O-trimethylsilyl-s-triazine.
- 28. The process according to claim 27, wherein the 2-deoxy-3,5-blocked-D-ribofuranosyl chloride is selected from the group consisting of 2-deoxy-3,5-di-O-acetyl-D-ribofuranosyl chloride, and a 2-deoxy-3,5-di-O-toluoyl-D-ribofuranosyl chloride.
- 29. The chemical process which comprises reacting a monosilyl compound of the formula: ##STR15## wherein R is selected from the group consisting of hydrogen, lower alkyl of 1 through 4 carbon atoms, and cyclopropyl and R' is selected from the group consisting of hydrogen and lower alkyl of 1 through 4 carbon atoms; with a 2-deoxy-3,5-blocked-D-pentofuranosyl halide that has been dissolved in ethylene dichloride, in the presence of stannic chloride and acetonitrile at a temperature of about minus (-) 25.degree. C. with subsequent warming to about 25.degree. C.; to form a 1-(2-deoxy-3,5-di-O-blocked-.beta.-D-pentofuranosyl)-5-R-6-R'-5,6-dihydro-s-triazine-2,4-(1H,3H)-dione.
- 30. The process according to claim 29, wherein the 2-deoxy-3,5-blocked-D-pentofuranosyl chloride is 2-deoxy-3,5-blocked-D-ribofuranosyl chloride.
- 31. The process according to claim 30, wherein the monosilyl compound is selected from the group consisting of 5-ethyl-5,6-dihydro-2-O-trimethylsilyl-s-triazine-4-(3H)-one or 5-methyl-5,6-dihydro-2-O-trimethylsilyl-4-(3H)-one.
- 32. The chemical process which comprises reacting a 2,4-bis-silyl compound of the formula: ##STR16## wherein R is selected from the group consisting of hydrogen, lower alkyl of 1 through 4 carbon atoms, and cyclopropyl and R' is selected from the group consisting of hydrogen and lower alkyl of 1 through 4 carbon atoms; with a 2-deoxy-3,5-blocked-D-pentofuranosyl halide that has been dissolved in ethylene dichloride, in the presence of stannic chloride and acetonitrile at a temperature of about minus (-) 25.degree. C. with subsequent warming to about 25.degree. C.; to form a 1-(2-deoxy-3,5-di-O-blocked-.beta.-D-pentofuranosyl)-5-R-6-R'-5,6-dihydro-s-triazine-2,4-(1H,3H)-dione.
- 33. The process according to claim 32, wherein the 2-deoxy-3,5-blocked-D-pentofuranosyl chloride is 2-deoxy-3,5-blocked-D-ribofuranosyl chloride.
- 34. The process according to claim 33, wherein the bis-silyl compound is selected from the group consisting of 5-ethyl-5,6-dihydro-2,4-bis-O-trimethylsilyl-s-triazine-4-(3H)-one or 5-methyl-5,6-dihydro-2,4-bis-O-trimethylsilyl-4-(3H)-one.
CROSS REFERENCE TO RELATED APPLICATION
This is a continuation, of application Ser. No. 001,663, filed Jan. 8, 1979, now abandoned, which is a continuation of application Ser. No. 802,555, filed June 1, 1977, now U.S. Pat. No. 4,171,431 which is a continuation-in-part of application Ser. No. 715,664, filed Aug. 19, 1976, now abandoned.
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