This application is based upon and claims the benefit of priority from prior Japanese Patent Applications No. 2022-109955, filed Jul. 7, 2022, the entire contents of which are incorporated herein by this reference.
The disclosure herein relates to an observation system and an observation device.
For example, an observation device for observing cells contained in a culture container as described in WO 2016/158782 A is known. With the observation device, it is possible to photograph and observe the cells in the container only by placing the container on a stage of the observation device.
An observation system according to an aspect of the present invention includes a mounting table on which a sample container is placed, a surface light source that is disposed in one of two regions divided by the mounting table and has a light emitting plane, an observation optical system disposed in the other of the two regions, a conveyance mechanism that is configured to move the observation optical system in a direction orthogonal to an optical axis of the observation optical system to change an observation position at which a bottom surface of a housing portion of the sample container and the optical axis intersect, and a controller that is configured to control a light emission pattern defined by a light emitting region where light is emitted on the light emitting plane. The controller executes first light emission pattern control in which the light emission pattern is changed according to the observation position, or, alternatively, second light emission pattern control in which the light emission pattern is switched between a plurality of periodic light emission patterns having phases different from each other.
An observation device according to an aspect of the present invention includes a mounting table on which a sample container is placed, a light emitting unit that is disposed in one of two regions divided by the mounting table and has a light emitting region including a plurality of fringe regions that is aligned in a first direction at regular intervals on an emission surface, an observation optical system disposed in the other of the two regions, and a conveyance mechanism that is configured to move, in the other of the two regions, the observation optical system in a direction orthogonal to an optical axis of the observation optical system to change an observation position at which a bottom surface of a housing portion of the sample container and the optical axis intersect. The light emitting unit includes a surface light source having a light emitting plane, and a lenticular lens that is disposed between the mounting table and the surface light source and is provided with a plurality of cylindrical lens elements aligned in the first direction at same intervals as the plurality of fringe regions. The observation device satisfies the following conditional expressions.
Y1 represents a shortest distance in the first direction between a curved surface central axis of the cylindrical lens element and the fringe region closest to the cylindrical lens element. Y2 represents a maximum distance in the first direction between the curved surface central axis of the cylindrical lens element and the fringe region closest to the cylindrical lens element. NA represents a numerical aperture on an object side of the observation optical system. P represents a pitch of the plurality of fringe regions. D represents an air-converted length of a distance between the emission surface and the lenticular lens. F1 represents a focal length of the lenticular lens.
The present invention will be more apparent from the following detailed description when the accompanying drawings are referenced.
In order to observe a cell as a phase object with high contrast, it is desirable to employ oblique illumination. However, in general, the oblique illumination is achieved only in a relatively narrow range with respect to the size of the entire container. For this reason, in a case where an observation optical system is shifted in order to observe various regions in the container, the observation position is easily out of a region where the oblique illumination is achieved.
To address this, it is conceivable to shift an illumination optical system together with the shift of the observation optical system and to move the region itself where the oblique illumination is achieved. However, this countermeasure arises other problems. For example, in a case where the oblique illumination is realized by transmitted illumination, a mechanical structure for linking the shift of the observation optical system and the illumination optical system that are placed on the opposite sides with the container interposed therebetween increases in complexity, resulting in the increase in size of the observation device.
Embodiments of the present invention are described below.
The system 100 illustrated in
The system 100 includes one or more observation devices 1 that acquire an image of the sample cultured in the container 2 and a control device 120 that controls the observation device 1. Each observation device 1 and the control device 120 are required to exchange data mutually. Accordingly, each observation device 1 and the control device 120 may be communicably connected by wire as illustrated in
The observation device 1 is an imaging device that captures an image of the sample contained in the container 2 from below the container 2. In order to capture an image of the sample without taking out the sample from an incubator 110, for example, the observation device 1 is used in a state of being disposed in the incubator 110 as illustrated in
As illustrated in
The observation unit 40 and the conveyance mechanism 50 are provided inside the housing 10. On the other hand, the surface light source 60 is provided outside the housing 10. Stated differently, the surface light source 60 is placed in one of two regions divided by the mounting table 11, whereas the observation optical system 20 of the observation unit 40 is placed in the other of the two regions.
The observation unit 40 is a unit in which the observation optical system 20 and the imaging element 30 are integrated. The observation optical system 20 is an optical system that gathers light from a bottom surface 3 of a housing portion of the container 2 to concentrate the light into the imaging element 30, and the observation optical system 20 includes an aperture stop 21 at a pupil position. The observation optical system 20 is telecentric on its object side such that a change in focus position causes no change in imaging magnification. The imaging element 30 is an image sensor, and examples thereof include a charge-coupled device (CCD) image sensor and a complementary MOS (CMOS) image sensor without being particularly limited thereto.
The conveyance mechanism 50 is a device that moves the observation unit 40 in the housing 10, and the observation unit 40 is fixed to the conveyance mechanism 50. The conveyance mechanism 50 moves the observation unit 40 relative to the container 2 in a direction orthogonal to the optical axis AX of the observation optical system 20. The conveyance mechanism 50 changes the relative position of the observation unit 40 with respect to the container 2 to thereby change a position (hereinafter, referred to as an observation position) at which the bottom surface 3 of the housing portion of the container 2 and the optical axis of the observation optical system 20 intersect.
The observation unit 40 is capable of moving in the direction orthogonal to the optical axis AX of the observation optical system 20, more specifically, in the X and Y directions that are orthogonal to each other and are also parallel to the mounting table 11. The observation unit 40 may further move in the Z direction orthogonal to both the X and Y directions.
The surface light source 60 is a surface light source having a light emitting plane 61. The surface light source 60 is, for example, a display device having a plurality of pixels, and forms various light emission patterns by controlling light emitted from each of the plurality of pixels.
Each of the units operate under the control of the control device 120, so that the observation device 1 acquires an image of the sample. Specifically, the surface light source 60 emits light according to an instruction from the control device 120, and the surface light source illuminates the sample on the bottom surface 3 from above the container 2. The light that has transmitted through the sample is condensed on the imaging element 30 by the observation optical system 20. In accordance with an instruction from the control device 120, the imaging element 30 captures an image of the sample to acquire the image of the sample. The image acquired by the observation device 1 is output to the control device 120.
The control device 120 controls the observation device 1. The observation device 1 is required to include one or more processors and one or more non-transitory computer-readable media. For example, the observation device 1 may be a general-purpose computer. The one or more processors are each a hardware electric circuit including, for example, a central processing unit (CPU), a graphics processing unit (GPU), or a digital signal processor (DSP), and execute a program stored in the one or more non-transitory computer-readable media, so that programmed processing is performed. The one or more processors may include, for example, an application specific integrated circuit (ASIC) or a field-programmable gate array (FPGA).
The control device 120 configured as described above transmits an instruction for image acquisition to the observation device 1 disposed in the incubator 110 and then receives the image acquired by the observation device 1. The control device 120 may display the image acquired by the observation device 1 in a display device included in the control device 120. The system 100 may thus function as an observation system for a user to observe a sample being cultured.
The control device 120 may communicate with a client terminal (client terminal 130, client terminal 140) illustrated in
Meanwhile, in order to visualize a sample as a phase object with high contrast to allow a cell or the like to be recognized, it is desirable to form an image of the sample by condensing light having entered the sample at a proper angle, namely, to achieve oblique illumination. However, in general, the oblique illumination is achieved only in a relatively narrow range. Therefore, under a certain illumination environment (specific light emission pattern, for example), when the observation position is changed, the oblique illumination easily deviates from the range where the oblique illumination is achieved at the changed observation position. Thus, a large area in the container cannot be observed with good contrast.
The following description provides an example of the case where the control device 120 controls the surface light source 60 to emit light in a light emission pattern P0 having a rectangular light emitting region 62 around the approximate center of the light emitting plane 61 as illustrated in
In this case, as illustrated in
To address this, in the system 100, the control device 120 executes light emission pattern control of changing the light emission pattern according to the observation position so that the oblique illumination is achieved at the observation position determined by the position of the observation unit 40. Specifically, the control device 120 executes the light emission pattern control so as to change at least one of the position and the width of the light emitting region 62 of the surface light source 60 according to the observation position. Hereinafter, the light emission pattern control for controlling the light emission pattern according to the observation position is referred to as first light emission pattern control, and is distinguished from light emission pattern control (second light emission pattern control) that does not depend on the observation position described later.
In the example illustrated in
As a result, in the system 100, oblique illumination is achieved at each observation position, which enables images with high contrast, such as images M1 to M5 illustrated in
First, the definition of parameters related to the first light emission pattern control will be described. NA represents the numerical aperture on the object side of the observation optical system 20. H represents the air-converted length of a distance between the light emitting plane 61 and the observation position. Ys represents a Y coordinate of the observation position. Ymin and Ymax are Y coordinates of both ends of the light emitting region 62, respectively, and Ymin<Ymax is established. That is, Ymax is the Y coordinate of the other end of the light emitting region 62 located on the positive side with respect to one end of the light emitting region 62 corresponding to Ymin, and Ymax is the Y coordinate of the positive end of the light emitting region 62. Ymin represents a Y coordinate of the negative end of the light emitting region 62. In this example, the Y coordinate is a coordinate in the Y direction in which the observation position changes.
Smin represents a sine of the incident angle of the illumination light from one end (negative end) of the light emitting region 62 corresponding to Ymin to the observation position. Smax represents a sine of the incident angle of the illumination light from the other end (positive end) of the light emitting region 62 corresponding to Ymax to the observation position.
In a case where the oblique illumination is applied to the observation position from the positive side, the system 100 desirably satisfies the following conditional expression.
0.2 NA<Smin<0.9 NA (1)
As a result, the illumination region 22 is formed at a position offset from the center of the pupil, so that the oblique illumination can be achieved at the observation position. In this case, it is desirable that the system 100 further satisfies the following conditional expression.
NA<Smax<1 (2)
As a result, the illumination region 22 reaches the end of the pupil, so that the sample can be illuminated at the maximum incident angle that can be realized by the observation optical system 20. Thus, the sample can be visualized with high contrast.
In a case where the oblique illumination is applied to the observation position from the negative side, the system 100 desirably satisfies the following conditional expression.
−0.9 NA<Smax<−0.2 NA (3)
As a result, the illumination region 22 is formed at a position offset from the center of the pupil, so that the oblique illumination can be achieved at the observation position. In this case, it is desirable that the system 100 further satisfies the following conditional expression.
−1<Smin<−NA (4)
As a result, the illumination region 22 reaches the end of the pupil, so that the sample can be illuminated at the maximum incident angle that can be realized by the observation optical system 20. Thus, the sample can be visualized with high contrast.
The incident angle is represented by a positive value for a case where the illumination light is incident on the optical axis from the positive side, and is represented by a negative value for a case where the illumination light is incident on the optical axis from the negative side. Accordingly, Smin and Smax are defined by the following formulas.
Positions A, B, C, and D of the light emitting region 62 illustrated in
Positions A, B, C, and D of the light emitting region 62 illustrated in
Positions A, B, C, and D of the light emitting region 62 illustrated in
In all of the three specific examples, the oblique illumination from the positive side is achieved at the observation positions (sp11 to sp15), and the oblique illumination from the negative side is achieved at the observation positions (sp41 to sp45). This is to prevent the illumination light from being vignetted on the wall surface of the container 2. Therefore, the oblique illumination may be applied from either the positive side or the negative side as long as the illumination light is not vignetted on the wall surface.
According to the system 100 of the first embodiment, since the oblique illumination is achieved at least at the observation position regardless of the observation position, it is possible to observe the sample in a large area of the container with high contrast.
A system according to the present embodiment (hereinafter, also simply referred to as the present system) is similar to the system 100 in that the observation device 1 and the control device 120 are included. The present system is different from the system 100 in that the control device 120 executes light emission pattern control (hereinafter, referred to as a second light emission pattern control) for switching the light emission pattern between a plurality of periodic light emission patterns having phases different from each other, instead of executing the light emission pattern control (first light emission pattern control) according to the observation position.
In the system according to the present embodiment, the control device 120 executes the second light emission pattern control so as to sequentially switch the light emission pattern to be formed on the light emitting plane 61 to the plurality of periodic light emission patterns at each observation position. The second light emission pattern control is performed by the control device 120 regardless of the observation position. As illustrated in
As illustrated in
As will be described later, by appropriately designing the plurality of periodic light emission patterns to be switched, one or more images acquired in a state where the oblique illumination is achieved are included in the plurality of acquired images regardless of the observation position. The present system thus eliminates the need for execution of different control for each observation position, and enables obtaining an image with high contrast only by executing a constant light emission pattern control (that is, the second light emission pattern control) regardless of the observation position.
First, the definition of parameters related to the second light emission pattern control will be described. NA represents the numerical aperture on the object side of the observation optical system 20. P represents a pitch of the plurality of fringe regions 64. d represents a width of each of the plurality of fringe regions 64. H represents the air-converted length of a distance between the light emitting plane 61 and the observation position. δ represents a distance on the light emitting plane 61 corresponding to a phase difference between the plurality of periodic light emission patterns. That is, δ corresponds to an amount of movement of the fringe region 64 caused at the time of switching between the periodic light emission patterns.
In this case, a Y coordinate YM,k,min of the negative end and a Y coordinate YM,k,max of the positive end of each fringe region 64 in the periodic light emission pattern (light emission pattern P16) illustrated in
Y
M,k,min=δ0+(k−1)δ+M·P (7)
Y
M,k,max
=Y
M,k,min
+d (8)
Here, M specifies a fringe region 64 of the plurality of fringe regions 64 included in the periodic light emission pattern, and is the fringe region number. k specifies a periodic light emission pattern of the plurality of periodic light emission patterns (for example, a light emission pattern P17 to a light emission pattern P19 illustrated in
The present system desirably satisfies the following conditional expression.
As a result, an interval (P-d) between the fringe regions 64 is appropriately set without becoming too narrow. This prevents simultaneous application of the oblique illumination to the observation position from two directions of the positive side and the negative side by the illumination light from two adjacent fringe regions 64. It is therefore possible to obtain an image with high contrast by oblique illumination. Incidentally, in a case where the oblique illumination is achieved from both the positive side and the negative side, the shading cancel each other, which makes it difficult to obtain an image with high contrast.
It is desirable that the present system further satisfies the following conditional expression.
As a result, the amount of movement of the fringe region 64 caused by the switching between the periodic light emission patterns is limited and appropriately set. Therefore, the oblique illumination is always achieved in any of the plurality of periodic light emission patterns. In a case where the amount of movement of the fringe region 64 is too large, the oblique illumination is not achieved in any of the periodic light emission patterns in some cases, which makes it difficult to obtain an image with high contrast.
It is desirable that the present system further satisfies the following conditional expression.
As a result, the width of the fringe region 64 is appropriately set without becoming too large. Therefore, since the illumination state at the observation position changes due to the switching between the plurality of periodic light emission patterns, it is possible to avoid unnecessary image capturing such as acquisition of the same image a plurality of times.
It is desirable that the present system further satisfies the following conditional expression. N is an integer of 1 or more.
As a result, as illustrated in
In the present system, when the multi-point imaging processing illustrated in
The control device 120 shifts the observation optical system 20 (step S2). Here, the observation optical system 20 is shifted to the position designated in the project settings acquired in step S1, and the observation position is changed.
Thereafter, the control device 120 causes the surface light source 60 to emit light in the periodic light emission pattern (step S3), captures an image of the sample with the imaging element 30 (step S4), and further stores the acquired image (step S5). The processing from step S3 to step S5 is repeated a plurality of times corresponding to the number of periodic light emission patterns. When finishing the repetition of the processing from step S3 to step S5 by a plurality of times corresponding to the number of periodic light emission patterns (YES in step S6), the control device 120 executes image processing depicted in
In the image processing depicted in
Specifically, as illustrated in
In step S11, the control device 120 performs filter processing of cutting a low-frequency cut component on each of the plurality of images. This filter processing is performed on the entire image region. As a result, the plurality of images obtained by the imaging (hereinafter, also referred to as a plurality of original images) is converted into a plurality of images from which the illumination unevenness has been removed (hereinafter, referred to as a plurality of filtered images). Hereinafter, the intensity of each pixel of the plurality of original images is referred to by Io,k,x,y, and the intensity of each pixel of the plurality of filtered images is referred to by ILCF,k,x,y. k represents the image number, x represents the row number of the pixel, and y represents the column number of the pixel.
In step S12, the control device 120 normalizes the plurality of filtered images and converts the resultant into a plurality of normalized images having the same average intensity. Specifically, for example, the control device 120 is required to generate the plurality of normalized images so that each pixel of the plurality of normalized images has intensity calculated by the following formula.
Here, Inml,k,x,y represents the intensity of each pixel of the plurality of normalized images. Iave represents average pixel intensity of the plurality of normalized images. n represents the number of pixels of the filtered image.
In step S13, the control device 120 combines the plurality of normalized images to generate an oblique illumination image. Specifically, for example, the control device 120 is required to generate the oblique illumination image so that each pixel of the oblique illumination image has intensity calculated by the following formula. That is, the oblique illumination image is generated such that each pixel has intensity different from background intensity by a value proportional to the sum of differences between pixel intensities of the plurality of normalized images and the pixel average intensity.
I
dm,x,y
=AΣ
k=1
N
|I
nml,k,x,y
−I
ave
|+I
bg (14)
Here, Idm,x,y represents the intensity of each pixel of the oblique illumination image. Ibg represents the background intensity. A represents a contrast adjustment value. N represents the number of normalized images.
By performing the image processing illustrated in
Hereinafter, a specific example of the second light emission pattern control will be described. The second light emission pattern control is performed by the present system in a case where images of the sample are acquired at a total of 20 observation positions of 4×5 (sp11 to sp15, sp21 to sp25, sp31 to sp35, sp41 to sp45) in the container 2 of
As illustrated in
The second light emission pattern control for switching between the periodic light emission patterns is executed under the above conditions, and thereby, as illustrated in
The horizontal axis of each of the graphs illustrated in
According to the present system also, similarly to the system 100 of the first embodiment, since the oblique illumination is achieved regardless of the observation position, it is possible to observe the sample in a large area of the container with high contrast. Further, according to the present system, the control device 120 does not need to change the control content for each observation position, and it is possible to obtain an image with high contrast at an arbitrary observation position. Furthermore, according to the present system, adjustment for each observation position is unnecessary, which realizes high robustness.
Although the processing including the image synthesis as depicted in
In such a case, in step S12, the control device 120 normalizes the plurality of filtered images and converts the resultant into a plurality of normalized images having the same average intensity. Specifically, for example, the control device 120 is required to generate the plurality of normalized images so that each pixel of the plurality of normalized images has intensity calculated by the following formula. I′nml,k,x,y represents the intensity of each pixel of the plurality of normalized images.
Thereafter, the control device 120 calculates the variance of the intensity of each normalized image using the following formula. s2k represents the variance of the intensity of the normalized image.
Finally, the control device 120 selects an oblique illumination image based on the calculated variance. Specifically, the control device 120 is required to select an image having the largest variance as the oblique illumination image. The oblique illumination image may be a normalized image having the largest variance, may be a filtered image corresponding to the normalized image having the largest variance, or may be the original image corresponding to the normalized image having the largest variance. For example, in the case of analyzing the number of cells, the cell density, and the like, the filtered image corresponding to the normalized image having the largest variance is most desirable from the viewpoint of stability of the analysis result.
In the present system, the oblique illumination is achieved at the observation position in at least any of the plurality of periodic light emission patterns by the second light emission pattern control. Therefore, even in a case where the processing including the image selection described above is performed as the image processing, it is possible to obtain an oblique illumination image and to obtain an effect similar to that in a case where the processing including the image synthesis depicted in
The light emitting regions 63 corresponding to the plurality of first periodic light emission patterns include a plurality of first fringe regions (fringe regions 64) aligned in a first direction (X direction, for example) at regular intervals, whereas the light emitting regions 63 corresponding to the plurality of second periodic light emitting patterns include a plurality of second fringe regions (fringe regions 64) aligned in a second direction (Y direction, for example), different from the first direction, at regular intervals. In this example, the first direction and the second direction are orthogonal to each other.
First, the definition of parameters related to the first periodic light emission pattern will be described. NA represents the numerical aperture on the object side of the observation optical system 20. Px represents a pitch of the plurality of fringe regions 64 included in the first periodic light emission pattern. dx represents the width of each of the plurality of fringe regions 64 included in the first periodic light emission pattern. H represents the air-converted length of a distance between the light emitting plane 61 and the observation position. δx represents a distance on the light emitting plane 61 corresponding to a phase difference between the plurality of first periodic light emission patterns. That is, δx corresponds to an amount of movement of the fringe region 64 caused at the time of switching between the first periodic light emission patterns.
In this case, an X coordinate XL,kx,min of the negative end and an X coordinate XL,kx,max of the positive end of each fringe region 64 in the first periodic light emission pattern (light emission pattern P37) illustrated in
X
L,kx,min=δx0+(kx−1)δx+L·Px (17)
X
L,kx,max
=X
L,kx,min
+d
x (18)
Here, L specifies a fringe region 64 of the plurality of fringe regions 64 included in the first periodic light emission pattern, and is the fringe region number. kx specifies a first periodic light emission pattern of the plurality of first periodic light emission patterns (for example, a light emission pattern P38 to a light emission pattern P41 illustrated in
The present system desirably satisfies the following conditional expression.
Conditional expressions (19) to (22) correspond to the above-described conditional expressions (9) to (12), and the same applies to the meanings thereof. Conditional expression (23) is derived from the conditional expression (20) and the conditional expression (22).
Next, the definition of parameters related to the second periodic light emission pattern will be described. Py represents a pitch of the plurality of fringe regions 64 included in the second periodic light emission pattern. dy represents the width of each of the plurality of fringe regions 64 included in the second periodic light emission pattern. δy represents a distance on the light emitting plane 61 corresponding to a phase difference between the plurality of second periodic light emission patterns. That is, δy corresponds to an amount of movement of the fringe region 64 caused at the time of switching between the second periodic light emission patterns.
In this case, a Y coordinate YM,ky,min of the negative end and a Y coordinate YM,ky,max of the positive end of each fringe region 64 in the second periodic light emission pattern (light emission pattern P42) illustrated in
Y
M,ky,min=δy0+(ky−1)δy+M·Py (24)
Y
M,ky,max
=Y
M,ky,min
+d
y (25)
Here, M specifies a fringe region 64 of the plurality of fringe regions 64 included in the second periodic light emission pattern, and is the fringe region number. ky specifies a second periodic light emission pattern of the plurality of second periodic light emission patterns, and is the second periodic light emission pattern number. δy0 represents a Y coordinate of the negative end of the first fringe region in one of the second periodic light emission patterns which comes first. Ydmin Ydmax are the minimum Y coordinate and the maximum Y coordinate on the light emitting plane 61 respectively, and Ydmin<YM,ky,min<Ydmax and Ydmin<YM,ky,min<Ydmax are established.
The present system desirably satisfies the following conditional expression.
Conditional expressions (26) to (29) correspond to the above-described conditional expressions (9) to (12), and the same applies to the meanings thereof. Conditional expression (30) is derived from the conditional expression (27) and the conditional expression (29).
In the present embodiment also, as illustrated in
In step S11, the control device 120 performs filter processing of cutting a low-frequency cut component on each of the plurality of first images acquired in the plurality of first periodic light emission patterns and the plurality of second images acquired in the plurality of second periodic light emission patterns. This filter processing is performed on the entire image region. As a result, the plurality of first images (hereinafter, also referred to as a plurality of first original images) and the plurality of second images (hereinafter, also referred to as a plurality of second original images) are converted into the plurality of first images and the plurality of second images from which the illumination unevenness has been removed (hereinafter, referred to as the plurality of first filtered images and the plurality of second filtered images).
Hereinafter, the intensity of each pixel of the plurality of first original images is referred to by Io,kx,x,y, and the intensity of each pixel of the plurality of first filtered images is referred to by ILCF,kx,x,y. Further, the intensity of each pixel of the plurality of second original images is referred to by Io,ky,x,y, and the intensity of each pixel of the plurality of second filtered images is referred to by ILCF,ky,x,y. kx represents the first image number, ky represents the second image number, x represents the row number of the pixel, and y represents the column number of the pixel.
In step S12, the control device 120 normalizes the plurality of first filtered images and the plurality of second filtered images, and converts the resultant into a plurality of first normalized images and a plurality of second normalized images having the same average intensity.
Specifically, for example, the control device 120 is required to generate the plurality of first normalized images so that each pixel of the plurality of first normalized images has intensity calculated by the following formula.
Here, Inml,kx,x,y represents the intensity of each pixel of the plurality of first normalized images. Iave represents average pixel intensity of the plurality of first normalized images (second normalized images). n represents the number of pixels of the first filtered image (second filtered image).
Further, the control device 120 is required to generate the plurality of second normalized images so that each pixel of the plurality of second normalized images has intensity calculated by the following formula.
Here, Inml,kx,x,y represents the intensity of each pixel of the plurality of second normalized images.
In step S13, the control device 120 combines the plurality of first normalized images with the plurality of second normalized images to generate an oblique illumination image. Specifically, for example, the control device 120 is required to generate the oblique illumination image so that each pixel of the oblique illumination image has intensity calculated by the following formula. That is, the oblique illumination image is generated such that each pixel has intensity different from background intensity by a value proportional to the sum of differences between pixel intensities of the plurality of normalized images (first normalized image and second normalized image) and the pixel average intensity.
I
dm,x,y
=A(Σkx=1N
Here, Idm,x,y represents the intensity of each pixel of the oblique illumination image. Ibg represents the background intensity. A represents a contrast adjustment value. Nx represents the number of first normalized images. Ny represents the number of second normalized images.
The image processing described above is performed, so that the contrast generated in the plurality of first original images and the contrast generated in the plurality of second original images are substantially added up. Therefore, in the present embodiment also, it is possible to generate an oblique illumination image having high contrast such as an image M8 illustrated in
As illustrated in
Incidentally, the detailed parameters of the present system are as indicated in
The second light emission pattern control is executed under the above conditions, and thereby, the region where the oblique illumination is achieved is moved in the X direction every time the first periodic light emission pattern is switched, and all the first periodic light emission patterns are executed, so that the entire container is covered as the region where the oblique illumination is achieved, and further, the region where the oblique illumination is achieved is moved in the Y direction every time the second periodic light emission pattern is switched, and all the second periodic light emission patterns are executed, so that the entire container is covered as the region where the oblique illumination is achieved.
According to the present system also, similarly to the system of the embodiment described above, since the oblique illumination is achieved regardless of the observation position, it is possible to observe the sample in a large area of the container with high contrast. In addition, the present system is similar to the system according to the second embodiment in that it is not necessary to change the control content for each observation position and high robustness can be realized. Further, the system according to the present embodiment enables obtaining an image with higher symmetry than the system according to the embodiment described above.
With reference to
Therefore, according to the present system, unlike the conventional system, even in a container having a narrow housing portion such as the 96 well microplate, an arbitrary observation position can be observed with good contrast without causing an unobservable position. In the vicinity of the well end (well peripheral portion), the illumination light on the wall of the well W is disturbed and uneven in the illumination direction due to the vignetting or the curvature of the liquid surface. As a result, as illustrated in
As illustrated in
As illustrated in
The surface light source 81 is any light source having a light emitting plane, and may be, for example, a display device having a plurality of pixels, similarly to the surface light source 60 described above. As illustrated in
In the observation device 5, the plurality of fringe regions (openings 82a) and the cylindrical lens elements 84 are appropriately set, which allows the illumination light emitted from the openings 82a of the slit plate 82 to be emitted at substantially the same angle for each position of the opening 82a by the lenticular lens 83, as illustrated in
Therefore, the observation device 5 can achieve the oblique illumination under substantially the same conditions in a large area of the container, and can obtain an image with high contrast regardless of the observation position. In the observation device 5, the oblique illumination under substantially the same conditions is achieved for each height at various sample heights. Therefore, even when various containers having different heights of the bottom surface 3 are used, it is possible to obtain an image with high contrast regardless of the observation position.
First, the definition of parameters of the observation device 5 will be described. NA represents the numerical aperture on the object side of the observation optical system 20. D represents the air-converted length of a distance between the emission surface of the slit plate 82 and the lenticular lens 83. More specifically, D represents the air-converted length of a distance between the emission surface and the surface top of the cylindrical lens element 84. P represents a pitch of the plurality of openings 82a, and also represents a pitch of the plurality of cylindrical lens elements 84. In other words, P represents a pitch of the plurality of fringe regions. Y1 represents the shortest distance in the first direction (Y direction, in this case) between a curved surface central axis CX of the cylindrical lens element 84 and the fringe region closest to the cylindrical lens element 84. Y2 represents the maximum distance in the first direction between the curved surface central axis CX of the cylindrical lens element 84 and the fringe region closest to the cylindrical lens element 84.
In this case, a Y coordinate Yax,N of the curved surface central axis CX of each cylindrical lens element 84 of the lenticular lens 83 and an effective range Yef,N of each cylindrical lens element 84 in the Y direction are defined by the following formulas. Here, N is an arbitrary integer. Yax0 represents a Y coordinate of the curved surface central axis CX of the reference cylindrical lens element 84.
Y
ax,N
=N·P+Y
ax0 (34)
γax,N−P/2<Yef,N<Yax,N+P/2 (35)
The range of the N-th fringe region in the Y direction is expressed by the following formula for each of the case of applying the oblique illumination from the positive side and the case of applying the oblique illumination from the negative side.
(Oblique Illumination from Negative Side)
Y
ax,N
+Y
2
≤Y
ILL,N
≤Y
ax,N
+Y
1 (36)
(Oblique Illumination from Positive Side)
Y
ax,N
+Y
1
≤Y
ILL,N
≤Y
ax,N
+Y
2 (37)
The observation device 5 desirably satisfies the following conditional expression.
As a result, the illumination light from the fringe region enters at least the pupil plane. In a case where the absolute value of Y1 exceeds the upper limit value, the illumination light does not enter the pupil of the observation optical system 20, and all the illumination light is vignetted, so that the oblique illumination is not achieved. In a case where the absolute value of Y1 is less than the lower limit value, the effect of the oblique illumination is reduced, leading to the reduction in contrast of the image.
It is desirable that the present system further satisfies the following conditional expression.
As a result, the illumination light from the fringe region is distributed across the outer edge of the pupil. In a case where the absolute value of Y2 exceeds the upper limit value, the illumination light from the adjacent fringe region (opening 82a) enters the pupil of the observation optical system 20. In this case, since the incident direction of the illumination light is opposite to the normal direction, the contrast of the image is reduced. In a case where the absolute value of Y2 is less than the lower limit value, the entire illumination light from the fringe region falls within the pupil of the observation optical system 20. Therefore, good oblique illumination is not obtained, and the image does not have a sufficient contrast.
It is desirable that the observation device 5 further satisfies the following conditional expression. F1 represents a focal length of the lenticular lens.
The focal length of the lenticular lens 83 is defined by the following formula. R represents a radius of curvature of the cylindrical surface of the cylindrical lens element 84. n represents a refractive index of the lenticular lens 83.
As a result, excessive convergence and divergence of the light flux of the illumination light from the fringe region can be avoided. As illustrated in
As illustrated in
NA=0.25, β=2.2, H=70 mm, D=0.6 mm, P=0.5 mm, Y1=0.1 mm, Y2=0.2 mm, R=0.5 mm, L=2 mm, n=1.493, F1=1.014 mm.
As illustrated in
Also in the present system, similarly to the system according to the fifth embodiment, a light emitting region including a plurality of fringe regions 64 aligned in the first direction (Y direction) at regular intervals is formed on the front side of the lenticular lens 83. The present system is different from the system according to the fifth embodiment in that the second light emission pattern control is performed by gradually moving the fringe regions 64 in the first direction.
When the fringe regions 64 are moved on the front side of the lenticular lens 83, the illumination state changes depending on the positions of the fringe regions 64 as illustrated in
First, the definition of parameters of the present system will be described. In the present system, Y0 and d are defined instead of Y1 and Y2. Y0 represents a distance between the curved surface central axis CX of the cylindrical lens element 84 and the center of the fringe region. Y0 is particularly referred to as Y0+ when positioned on the positive side with respect to the curved surface central axis CX, and is particularly referred to as Y0− when positioned on the negative side with respect to the curved surface central axis CX. d represents a width of each of the plurality of fringe regions.
In this case, a Y coordinate Yax,N of the curved surface central axis CX of each cylindrical lens element 84 of the lenticular lens 83 and an effective range Yef,N of each cylindrical lens element 84 in the Y direction are as described in the fifth embodiment.
The range of the N-th fringe region in the Y direction is expressed by the following formula for each of the case of applying the oblique illumination from the positive side and the case of applying the oblique illumination from the negative side.
(Oblique Illumination from Positive Side)
Y
ax,N
+Y
0+
d/2≤YILL,N≤Yax,N+Y0++d/2 (42)
(Oblique Illumination from Negative Side)
Y
ax,N
+Y
0−
−d/2≤YILL,N≤Yax,N+Y0−+d/2 (43)
It is desirable that the present system further satisfies the following conditional expression.
Accordingly, by appropriately setting Y0, it is possible to realize the oblique illumination while preventing the light from the adjacent fringe region from entering the pupil of the observation optical system 20. In a case where d exceeds the upper limit value, the illumination light from the adjacent fringe region enters the pupil of the observation optical system 20 even if the oblique illumination is achieved by the illumination light from the fringe region. Since the incident direction of the illumination light from the adjacent fringe region is opposite to the normal direction, the contrast of the image is reduced. In a case where d is less than the lower limit value, no illumination light is generated.
Further, in the present system, it is desirable that the following conditional expressions are satisfied in a case where the oblique illumination is applied from the positive side and in a case where the oblique illumination is applied from the negative side.
As a result, the oblique illumination can be realized. In a case where Y0+ exceeds the upper limit value or in a case where Y0− is less than the lower limit value, no illumination light enters the pupil and the oblique illumination is not achieved. In a case where Y0+ is less than the lower limit value or in a case where Y0− exceeds the upper limit value, all the illumination light from the fringe regions falls within the pupil, so that the effect of the oblique illumination decreases and the contrast of the image decreases.
Further, in the present system, it is desirable that the following conditional expressions are satisfied in a case where the oblique illumination is applied from the positive side and in a case where the oblique illumination is applied from the negative side.
As a result, it is possible to prevent the illumination light from the adjacent fringe region from entering the pupil. In a case where Y0+ exceeds the upper limit value or in a case where Y0− is less than the lower limit value, illumination light from the adjacent fringe region enters the pupil. Since the incident direction of the illumination light from the adjacent fringe region is opposite to the normal direction, the contrast of the image is reduced. In a case where Y0+ is less than the lower limit value or in a case where Y0− exceeds the upper limit value, the illumination light spreads across the pupil center of the observation optical system 20, so that the oblique illumination is not achieved and the image does not have contrast.
It is desirable that the present system further satisfies the following conditional expression. The meaning of the formula is similar to that of the fifth embodiment.
Detailed parameters of the system according to the present embodiment are as follows. β represents a magnification of the observation optical system 20.
NA=0.25, β=2.2, H=70 mm, D=6 mm, P=4.8 mm, d=1 mm, R=5 mm, L=6 mm, n=1.493, F1=1.014 mm.
As illustrated in
In the system according to the present embodiment, as illustrated in
The fly-eye lens 93 includes a plurality of lens elements 94 that are aligned in the first direction at the same intervals as the plurality of first fringe regions included in the first periodic light emission pattern and are aligned in the second direction at the same intervals as the plurality of second fringe regions included in the second periodic light emission pattern.
First, the definition of parameters of the present system will be described. The present system is different from that of the sixth embodiment in that X0 is also defined in addition to Y0. X0 and Y0 represent a distance in the X direction between the curved surface central axis CX of the lens element 94 and the center of the fringe region, and a distance in the Y direction therebetween, respectively. X0 is particularly referred to as X0+ when positioned on the positive side with respect to the curved surface central axis CX, and is particularly referred to as X0− when positioned on the negative side with respect to the curved surface central axis CX. Y0 is particularly referred to as Y0+ when positioned on the positive side with respect to the curved surface central axis CX, and is particularly referred to as Y0− when positioned on the negative side with respect to the curved surface central axis CX.
In this case, an X coordinate Xax,M and a Y coordinate Yax,N of the curved surface central axis CX of each lens element 94 of the fly-eye lens 93 and an effective range Xef,M in the X direction and an effective range Yef,N in the Y direction of each lens element 94 of the fly-eye lens 93 are defined by the following formulas. Here, M and N are arbitrary integers. Xax0 and Yax0 represent an X coordinate and a Y coordinate of the curved surface central axis CX of the reference lens element 94, respectively.
X
ax,M
=MP+X
ax0 (50)
Y
ax,N
=NP+Y
ax0 (51)
X
ax,M
−P/2<Xef,M<Xax,M+P/2 (52)
Y
ax,N
−P/2<Yef,N<Yax,N+P/2 (53)
For each of the case of applying the oblique illumination from the positive side and the case of applying the oblique illumination from the negative side, a range XiLL,M in the X direction of the M-th fringe region in the first periodic light emission pattern and a range YiLL,N in the Y direction of the N-th fringe region in the second periodic light emission pattern are expressed by the following formulas.
(Oblique Illumination from Positive Side)
X
ax,M
+X
0+
−d/2≤XILL,M≤Xax,M+X0++d/2 (54)
Y
ax,N
+Y
0+
−d/2≤YILL,N≤Yax,N+Y0++d/2 (55)
(Oblique Illumination from Negative Side)
X
ax,M
+X
0+
−d/2≤XILL,M≤Xax,M+X0++d/2 (56)
Y
ax,N
+Y
0−
−d/2≤YILL,N≤Yax,N+Y0−+d/2 (57)
It is desirable that the present system further satisfies the following conditional expression.
Accordingly, by appropriately setting Y0, it is possible to realize the oblique illumination while preventing the light from the adjacent fringe region from entering the pupil of the observation optical system 20. In a case where d exceeds the upper limit value, the illumination light from the adjacent fringe region enters the pupil of the observation optical system 20 even if the oblique illumination is achieved by the illumination light from the fringe region. Since the incident direction of the illumination light from the adjacent fringe region is opposite to the normal direction, the contrast of the image is reduced. In a case where d is less than the lower limit value, no illumination light is generated.
Conditional expressions (58) and (67) are the same as the above-described conditional expressions (44) and (49), and the same applies to the meanings thereof. F1 represents the focal length of the fly-eye lens 93. Conditional expressions (59) to (62) for the X direction and the conditional expressions (63) to (66) for the Y direction correspond to the conditional expressions (45) to (48) described above, and the same applies to the meanings thereof.
Detailed parameters of the system according to the present embodiment are as follows. β represents a magnification of the observation optical system 20.
NA=0.25, β=2.2, H=70 mm, D=6 mm, P=4.8 mm, d=1 mm, R=5 mm, L=6 mm, n=1.493, F1=1.014 mm.
As illustrated in
In the system according to the present embodiment, as illustrated in
The above-described embodiments are specific examples to facilitate an understanding of the invention, and hence the present invention is not limited to such embodiments. Modifications obtained by modifying the above-described embodiments and alternatives to the above-described embodiments may also be included. In other words, the constituent elements of each embodiment can be modified without departing from the spirit and scope of the embodiment. Moreover, new embodiments can be implemented by appropriately combining a plurality of constituent elements disclosed in one or more of the embodiments. Furthermore, some constituent elements may be omitted from the constituent elements in each embodiment, or some constituent elements may be added to the constituent elements in each embodiment. Further, the order of the processing procedure disclosed in each embodiment may be changed as long as no contradiction results. In other words, the observation system and the observation device of the present invention can be variously modified and changed without departing from the scope of the invention defined by the claims.
In the embodiments described above, the case where the observation device and the control device are separate devices has been exemplified, but the observation device and the control device may be configured as a single device. In other words, the observation device itself may operate as the control device, and may function as the control unit (controller) that performs the above-described light emission control and the image processing unit (image processor) that performs the image processing. In addition, the control device, which is a separate device from the observation device, may realize only one function of the control unit (controller) that performs the light emission control and the image processing unit (image processor) that performs the image processing, and the other function may be realized by the observation device. In other words, the observation device alone may operate as the above-described observation system.
The processor 1001 is any electric circuit. For example, the processor 1001 may be a single processor, a multiprocessor, or a multi-core processor. The processor 1001 reads out a program stored in the storage device 1003 and executes the program, to execute the above-described light emission control and image processing.
The memory 1002 is, for example, a semiconductor memory and may include a RAM area and a ROM area. The storage device 1003 is, for example, a hard disk, a semiconductor memory, such as a flash memory, or an external storage device.
For example, the reading device 1004 accesses a storage medium 1005, in accordance with an instruction from the processor 1001. For example, the storage medium 1005 is implemented by a semiconductor device, a medium to or from which information is input or output due to a magnetic effect, or a medium to or from which information is input or output due to an optical effect. Note that such a semiconductor device is, for example, a universal serial bus (USB) memory. Such a medium to and from which information is input and output by a magnetic effect is, for example, a magnetic disk. Such a medium to and from which information is input and output by an optical effect is, for example, a compact disc (CD)-ROM, a digital versatile disk (DVD), or a Blu-ray disc (Blu-ray is a registered trademark).
For example, the communication interface 1006 communicates with other devices, in accordance with an instruction from the processor 1001. The input/output interface 1007 is, for example, an interface between an input device and an output device. For example, the input device may be a device that receives an instruction from a user, such as a keyboard, a mouse, or a touch panel. The output device is, for example, a display device such as a display, or a sound device such as a speaker.
For example, the program that the processor 1001 executes is provided to the computer 1000 in the following forms:
Note that the hardware configuration of the computer 1000 for implementing the control device described with reference to
In the present specification, the expression “based on A” does not indicate “based on only A” but indicates “based on at least A” and further indicates “based partially on at least A”. That is, “based on A” may indicate “based on B in addition to A” or “based on a part of A”.
Number | Date | Country | Kind |
---|---|---|---|
2022-109955 | Jul 2022 | JP | national |