The present invention relates to the field of display techniques. In particular, the present invention relates to an organic light emitting diode (OLED) display panel and its manufacturing method.
A polaroid (POL) enables effective reduction of the reflectance of a panel in high-intensity light; however, it will lose approximately 58% of the emitted light. That extremely increases lifespan burden for an organic light emitting diode (OLED). On the other hand, if the POL has a larger thickness and is made of fragile material, it is not conducive to the development of dynamic bending products.
In this sector, a technique for using a color filter substrate to instead of the POL is able to effectively increase the light-emitting efficiency. However, for the spin-coated or ink-jet printed color filter substrate, due to its own property, there is still a higher reflection effect on the self-luminance of the OLED and the ambient light, thereby reducing contrast of an OLED display panel.
For the spin-coated or ink-jet printed color filter substrate, there is a higher reflection effect on the self-luminance of the OLED and the ambient light.
The present invention provides an OLED display panel. The OLED display panel includes:
a display device substrate including a display zone;
an encapsulation layer disposed on the display device substrate; and
a color filter substrate disposed on the encapsulation layer, and the color filter substrate includes a light-transmitting zone corresponding to the display zone, and a shading zone,
and wherein the light-transmitting zone on the color filter substrate is provided with a scattering structure including a plurality of bulges to scatter the ambient light.
Furthermore, a width of the bulges is less than 600 nm.
Furthermore, a longitudinal cross-section of the bulges is triangular.
Moreover, the longitudinal cross-section of the bulges is an isosceles triangle which has base angles greater than 45 degrees.
Moreover, the bulges are arranged with gaps, and a total area of all of the gaps between the bulges is 0.2 to 0.5 times a total area of the light-transmitting zone.
Also, the longitudinal cross-section of the bulges is trapezoidal.
The present invention further provides a manufacturing method of the OLED display panel. The method includes:
a step S10 of providing the display device substrate including the display zone;
a step S20 of forming the encapsulation layer on the display device substrate;
a step S30 of disposing the color filter on the encapsulation layer, and aligning the color filter with the display zone so as to form the light-transmitting zone;
a step S40 of patterning the color filter to form the scattering structure including a plurality of the bulges on the color filter; and
a step S50 of coating a black matrix on the encapsulation layer to form the shading zone.
Furthermore, the width of the bulges is less than 600 nm.
Furthermore, the longitudinal cross-section of the bulges is triangular or trapezoidal.
Also, the bulges are arranged with gaps, and the total area of all of the gaps between the bulges is 0.2 to 0.5 times the total area of the light-transmitting zone.
By providing the scattering structure at the light-transmitting zone on the color filter substrate, it can exert a certain anti-reflection effect on the transmitted light. The scattering structure is a microstructure having a grating-like effect, thereby increasing the transmittance of the color filter substrate and reducing the reflection effect of a surface on the self-luminance of the OLED and the ambient light so as to enhance the contrast of the OLED display panel.
In order to more clearly illustrate embodiments or technical solutions in the prior art, the drawings required for using in the description of the embodiments or the prior art will be briefly described below. Obviously, the drawings in the following description are only some of the embodiments of the present invention. For ordinary technicians in the art, other drawings may also be obtained from these drawings without paying for creative labor.
10 display device substrate; 11 substrate; 12 semiconductor layer; 13 the first gate insulator layer; 14 the first metal insulator layer; 15 the second gate insulator layer; 16 the second metal insulator layer; 17 interlayer dielectric layer; 18 source-drain metal layer; 19 flat layer; 101 pixel defining layer; 102 light-emitting functional layer; 103 display zone; 20 encapsulation layer; 30 color filter substrate; 31 light-transmitting zone; 32 shading zone; 40 scattering structure; 41 bulge; 42 gap
Referring to the accompanying drawings, the description of following embodiments is provided to illustrate the specific embodiment practiced by the present invention. Directional terms described by the present invention, such as upper, lower, front, back, left, right, inner, outer, side, and etc., are only directions by referring to the accompanying drawings. Therefore, the used directional terms are applied to describe and understand the present invention, but the present invention is not limited thereto. In the drawings, units with the similar structure are represented by the same reference symbols.
The present invention is directed to a technical problem that a spin-coated or ink-jet printed color filter substrate has a high reflection effect on the self-luminance of the organic light emitting diode (OLED) and the ambient light in the existing OLED display panel. The present invention is able to solve the above problem.
An OLED display panel, as shown in
Wherein the display device substrate 10 includes a display zone 103, and the color filter substrate 30 includes a light-transmitting zone 31 corresponding to the display zone 103, and a shading zone 32 formed by a black matrix.
Wherein the light-transmitting zone 31 on the color filter substrate 30 is provided with a scattering structure 40 to scatter the ambient light. The scattering structure 40 includes a plurality of bulges 41, where a width of the bulges 41 is less than 600 nm.
By the scattering structure 40 disposed at the light-transmitting zone 31 of the color filter substrate 40, it is known to technicians in the art that when a size of a microstructure is smaller than a specific feature size, it can exert a certain anti-reflection effect on the transmitted light. The scattering structure 40 is the microstructure having a grating-like effect, thereby increasing the transmittance of the color filter substrate 30 and reducing the reflection effect of a surface on the ambient light so as to enhance the contrast of the OLED display panel. Using the color filter substrate 30 to instead of a polaroid (POL) is able to reduce a thickness of a light-emitting functional layer 102 located on the display zone 103, and increase the light-emitting efficiency to improve the display effect.
In one embodiment, the width of the bulges 41 is less than 200 nm.
On the basis of producing the microstructure on a surface of the color filter substrate 30, the feature size and the characteristic of the microstructure are designed, such that there are a preferable transmittance and a surface anti-reflection design for the microstructure on the surface of the color filter substrate 30, and it can further increase the transmittance of the color filter substrate 30, thereby further enhancing the contrast of the OLED display panel.
Specifically, the display device substrate 10 includes a substrate 11, a semiconductor layer 12 and a first gate insulator layer 13 disposed on the substrate 11, a first metal layer 14 and a second gate insulator layer 15 disposed on the first gate insulator layer 13, a second metal insulator layer 16 and a interlayer dielectric layer 17 disposed on the second gate insulator layer 15, a source-drain metal layer 18 and a flat layer 19 disposed on the interlayer dielectric layer 17, as well as a pixel defining layer 101 and a light-emitting functional layer 102 disposed on the flat layer 19.
Wherein the first gate insulator layer 13 covers the semiconductor layer 12; the second gate insulator layer 15 covers the first metal layer 14; the interlayer dielectric layer 17 covers the second metal insulator layer 16; the source-drain metal layer 18 extends downwardly to be in contact with an ion-doped region of the semiconductor layer 12; and an anode metal layer of the light-emitting functional layer 102 extends downwardly to be in contact with the source-drain metal layer 18.
As shown in
In one embodiment, the base angles of the bulges are greater than 60 degrees. The anti-reflection effect of the scattering structure 40 on the transmitted light is further improved, and the reflection effect on the ambient light is simultaneously reduced, and the contrast of the OLED display panel is enhanced.
As shown in
In one embodiment, it should be illustrated that the scattering structure 40 can also be in the form of a microlens to increase the transmittance of the OLED display panel from a geometrical optic perspective.
An OLED display panel, as shown in
Specifically, the longitudinal cross-section of the bulges 41 is rectangular, and the bulges 41 are arranged with gaps 42, and a total area of all of the gaps 42 between the bulges 41 is 0.2 to 0.5 times a total area of the light-transmitting zone.
By the gaps 42 in the scattering structure 40 having a suitable occupied ratio, the anti-reflection effect of the scattering structure 40 on the transmitted light is further improved, while the reflection effect of the ambient light is reduced, and the contrast of the OLED display panel is enhanced.
As shown in
As shown in
Based on the above OLED display panel, the present invention also provides a manufacturing method of the OLED display panel, as shown in
a step S10 of providing the display device substrate 10 including the display zone 103;
a step S20 of forming the encapsulation layer 20 on the display device substrate 10;
a step S30 of disposing the color filter on the encapsulation layer 20, and aligning the color filter with the display zone 103 so as to form the light-transmitting zone 31;
a step S40 of patterning the color filter to form the scattering structure 40 including a plurality of the bulges 41 on the color filter; and
a step S50 of coating a black matrix on the encapsulation layer 20 to form the shading zone 32.
As shown in
As shown in
As shown in
As shown in
Furthermore, the width of the bulges 41 is less than 200 nm.
In one embodiment, the longitudinal cross-section of the bulges 41 is triangular or trapezoidal.
Furthermore, when the longitudinal cross-section of the bulges 41 is triangular, the longitudinal cross-section of the bulges 41 is the isosceles triangle which has base angles greater than 45 degrees.
When the longitudinal cross-section of the bulges 41 is trapezoidal, the longitudinal cross-section of the bulges 41 can be regular trapezoidal and also inverted trapezoidal.
In another embodiment, the bulges 41 are arranged with the gaps, and the total area of all of the gaps 42 between the bulges 41 is 0.2 to 0.5 times the total area of the light-transmitting zone 31.
As shown in
The beneficial effects of the present invention are by providing the scattering structure 40 at the light-transmitting zone 31 of the color filter substrate 30, it is known to the technicians in the art that when the size of the microstructure is smaller than the specific feature size, it can exert the certain anti-reflection effect on the transmitted light. The scattering structure 40 is the microstructure having a grating-like effect, thereby increasing the transmittance of the color filter substrate 30 and reducing the reflection effect of the surface on the self-luminance of the OLED and the ambient light so as to enhance the contrast of the OLED display panel.
In summary, although the present invention has been disclosed with preferred embodiments, they don't intend to limit the present invention, and the ordinary technicians in the art can make various changes and modifications without departing from the spirit and the scope of the present invention. Therefore, the protection of the present invention is defined by the scope of the claims.
Number | Date | Country | Kind |
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201910152005.9 | Feb 2019 | CN | national |
Filing Document | Filing Date | Country | Kind |
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PCT/CN2019/082083 | 4/10/2019 | WO | 00 |