The invention relates to on-chip integrated detectors for analyzing fluids.
The International Application WO 00/51180 discloses an silicon-on-insulator sensor having a silicon oxide sensing surface. Drain and source of a FET are formed on one side of a silicon oxide layer forming the substrate, and the other side of the silicon oxide layer is brought in contact with the analyte.
The patent publication DE 102 21 799 A1 discloses a local silicon-on-insulator biosensor with a flat surface being used for adsorption based sensing. Biofunctionalized structures of the surface are use for local biosensing.
It is an object of the present invention to provide highly sensitive, miniaturized biosensor chip for analyzing fluids.
This object is achieved by a Biosensor chip for analyzing fluids, comprising insulating material partly enclosing a cavity for accommodating an analyte, said cavity being defined at the bottom and at least partly at its sides by said insulating material, and a gateless field effect transistor (FET) formed in a distance from the bottom of the cavity, the sensing surface of which is facing the analyte.
When the analyte fluid is introduced in said cavity, the sensing surface the channel of the FET is influenced by the fluid. The change in the current flowing or Resistance through the FET before the fluid influences the channel of the FET and when the fluid influences the channel of the FET is then evaluated for analyzing the fluid.
This biosensor chip has a minimum size because the FET is part of the housing or of the walls of the cavity which accommodates the analyte.
According to a preferred embodiment of the invention, the cavity is formed as a channel.
According to one embodiment the cavity has an opening which is substantially opposed to the bottom side.
The material defining the bottom of the cavity can consist of Si and it may have a passivation layer on it. The material defining the bottom side of the cavity and the buried layer material defining further part of the cavity may consist of SiO2. The FET is preferably formed in the top silicon flat layer.
There can be one or plural FETS partly extend over the opening of the cavity. The one or plural FETs can bridge the opening. This embodiment is especially advantageous when the cavity has the form of a channel. The FET or FETs can be arranged such that the sensing area(s) of the channel(s) of the FET(s) bridge the opening.
According to a further embodiment there also can be a gate electrode is provided for biasing the gate of the FET. In this case, too, the analyte is the gate of the FET. The additional gate electrode rather serves to bias the channel of the FET by a fixed amount in order to adjust the working range of the FET.
A thin positive passivating layer can be sputtered or grown on the sensing area(s) of the FET(s). This passivating layer also serves as a protection against corrosion of the sensing area.
According to a preferred embodiment of the invention, channel like cavity has an inlet opening and an outlet opening. There may be provided an inlet reservoir and a waste reservoir for the channel like cavity.
This preferred embodiment is a novel FET design integrated with micro-fluidic structures. It is a new combination of a micro-fluidic system and a detector system, all integrated on one platform, namely on one chip.
With this embodiment a removable cover plate can be provided for covering any further open part of the channel like cavity. The removable cover plate can have openings for accessing the main reservoir and the waste reservoir.
According to a further development of the invention the channel like cavity has a meander like form. This development yields the advantage that a relative long channel can be achieved on a small chip. This can be of advantage when travelling length is used to separate components contained in the analyte.
According to the invention pumping means are provided for conveying analyte from the main reservoir to the waste reservoir.
According to another development of the invention electrokinetic means are provided for conveying analyte through the channel like cavity. Such electrokinetic means can comprise an electrical means for applying a voltage across part or all the length of the channel like cavity.
In operation, the charged analytes and the medium, more specifically the buffer solution (electrolyte medium held on a specific electrical potential) and the charged species, passing laterally or underneath the doped and preferably passivated top silicon layer act as the gate electrode.
According to another embodiment of the invention inlet opening of and/or channels or channels of the biosensor are deliberately constructed to enhance turbulent flows to facilitate mixing of the analyte itself or of the analyte and buffer solution.
According to another preferred embodiment of the invention, there is a second channel like cavity oriented substantially rectangular to the main channel like cavity and communicating with it at a crossing point. Each channel like cavity communicates with a main or inlet reservoir and with a waste reservoir.
This further development makes yields a lab-on-chip.
The inlet reservoir of one of the channel like cavities can accommodate the analyte and the other inlet reservoir can accommodate a buffer solution. Both fluids are mixed at the crossing point and thereby electrophoretic migration can be controlled and detected in the main channel like cavity downstream of the crossing point.
Again, an additional gate electrode can be provided for biasing the channel of the FET.
According to a still further embodiment of the invention, from a main channel like cavity a number of branch channels is branched off and there is at least one means for measuring the electric charge of the fluid in a region of each branch channel in a distance from the main channel like cavity.
This is a different lab-on-chip which is especially apt for analyzing proteins.
Preferably there are electrical means for variably applying a bias voltage across the length or part of the length of the branch channels. The electrical means can bias the branch channels to prevent movement of the fluids from the main channel like cavity into the branch channels.
The electrical means can bias the branch channels to promote movement of the fluids from the main channel like cavity to the distant end of the branch channels.
The measuring means can be FETs which can be crossing the branch channels. Preferably the channels of the FETs are bridging the branch channels.
There can be plural measuring means at each branch channel.
The invention will now be described by way of example and with reference to the accompanying drawings in which:
a & b shows working and multi-detection on protein chip,
The invention will now be described by way of example and with reference to the accompanying drawings in which:
Like components bear the same reference signs.
It is to be noted that the invention is not limited to the described single embodiments but rather covers combined features of them.
Local Sensor
The proposed invention consists essentially of a sensor microchip resting on a mount (preferably made up Teflon) and covered by a cover plate (made by polymeric substance such as PDMS, PMMA or Polyimide). The sensor chip consists of two main reservoirs a sample reservoir and a waste reservoir connected by a microchannel. The analyte(s) of interest are manipulated by pumping or by electrokinetic means, towards the waste reservoir and the FETs incorporated sense the charged analytes passing by.
Fabrication of structures: The reservoir and micro-channels are fabricated by photolithography and wet or dry etching techniques. The photolithography steps are used to transfer structures from a Chromium mask onto the sensor chip. In the wet etching technique, in the first step the top Silicon layer is removed by a mixture of HNO3 (69% ) and HF (1.5%) in the ratio 70:30 and in the next step the photoresist is removed and the silicon dioxide layer (box oxide layer) is etched using 5% HF, known to be very selective against silicon oxide. The chip may be passivated or not passivated depending on the mode used for manipulation of analyte sample.
In case a pump is used, no passivation is required. If an electrokinetic mode is used for sample manipulation then passivation is desirable as silicon has a low breakdown potential, a passivated layer thick of 200 nm of dry silicon oxide gives good passivation and the structure is able to withstand electric field strengths of the order of 440 V/cm or even more as has already been witnessed by us.
The detection of the analytes of interest is performed by the Field effect transistors which are monolithically integrated on the same platform. The FETs could be seated on freely suspended bridges over the micro-channels (
Charge carriers can be introduced into a previously undoped top silicon layer by either diffusion doping (Spin-on-dopant and annealing), or by ion-implantation of the substrate before sample processing (entire wafer) or by operating the device with a back-gate voltage accumulating carriers in an inverted MOSFET (Metal-oxide-semiconductor FET) mode. The latter mode operation of operation works only for non-underetched FET structures. Alternatively, the top Si layer may be epitaxially overgrown with a doped Si layer by using, e.g., molecular beam epitaxy (MBE). FET structures are fabricated out of this layer either by using standard photolithographic techniques as described above for lateral dimensions down to ˜1 μm. To achieve enhanced spatial resolution and enhanced sensitivity in the case of In-Plane-Gate (IPG) FET operation, i.e., with typical structure sizes down to 30-100 nm, high resolution lithographic techniques have to be employed in combination with selective doping or dry etching techniques. These can comprise of electron beam lithography for resist etch mask patterning, ion implantation or diffusion for masked doping and plasma etching such as reactive ion etching (RIE). Alternatively, IPG-FETs structures can be directly written by focused ion beam (FIB) or by focus laser beam oxidation (R. A. Deutschmann, M. Huber et al., Microelectronic Engineering 48 (1999) 367-370) into overhanging Si structures. After micro- and sub-micron-fabrication the structures are passivated by growing 200 nm of dry oxide. For obtaining the source and drain regions, photolithography is again used to remove the oxide layer (passivated layer) after which the source and drain regions are defined by metal deposition (TiAu). In a bridge-like support for the IPG-FET detectors, the source and drain are formed on the two ends of the bridge. The bridge is passivated above and below with Silicon dioxide and this region forms the gate region.
Sensor Based Lab on Chip Device:
Fabrication: The fabrication of this device is done by steps similar to the ones described in the sensor section, the design of the Chromium mask is modified according to the requirement.
Sensor Based Protein Chip Device:
Fabrication: The fabrication of this device is done by steps similar to the ones described in the sensor section, the design of the Chromium mask is modified according to the requirement.
1. Local Sensor:
Working: The analyte would be introduced in the reservoirs and then manipulated from the sample reservoir towards the waste reservoir. As the charged analytes pass underneath the bridge coming in contact with the surface, a change in surface potential would be observed leading to change in the band structure and thus charge distribution of the silicon material changing its conductivity, which is measured as electrical signal. IPG FETs allow the fine tuning of their sensitivity to surface potential changes by adjusting the electrical width of the transistor channel (i.e., its working point) through the in-plane electric fields. Using LabView or other interface program the protocols are run in an automated format.
2. Sensor Based Lab on Chip Device:
Working: The sample comprising several analytes is introduced in the sample reservoir and the sample is mobilized electrokinetically towards the sample waste reservoir. Buffer solution from the buffer reservoir is driven in perpendicular direction so that a fine plug of the sample is introduced into the longer microchannel section which facilitates separation of the individual analytes based on the differential electrophoretic mobility. The analyte bands passing by are sensed by the Field effect Transistors seated on the same platform and detected in manner similar to that described before in Section
The microstructures on such sensor based chips could be simple intersection channels terminating into reservoirs shown in
Besides, other detection techniques such as Optical detection, mass spectrometry can be coupled to the sensor chip, in this case the sensor based chip just acts as a platform for pre-reactions such as derivatization, injection and separation and other related manual techniques.
Various parameters associated with injection (such as the potential parameters), separation (such as the separation potential and buffer conditions) and detection are optimized and tailor made for specific analyte matrices. Besides, using programming and interface software the device is automated according to the application.
3. Sensor Based Protein Chip Device:
Working: The protein mixture are prepared in a buffer solution and introduced into the sample reservoir (27 in
The proteins separated in the first dimension on the basis of their isoelectric points are rinsed electro-kinetically with a surfactant such as sodium dodecylsulphate (SDS) solution so that equal charge are incorporated on all proteins leaving the size factor as the major separating factor. The SDS treated proteins are then electro-kinetically moved in perpendicular direction. The moving proteins are assorted by the sieving matrix in the second dimensional channels (37 in
Simulations on electrophoretic migration of proteins through a given matrix would enable correlate the migration speeds with the molecular mass and thus identifying the protein.
The chip according to the present invention can be used for analyzing a wide range of samples, e.g. biochemical, environmental, clinical or forensic samples.
Number | Date | Country | Kind |
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10 2004 014 537.7 | Mar 2004 | DE | national |