Claims
- 1. An on-spot selectively activated hydrophobic slide, comprising:
a substrate; and a hydrophobic layer coated on the substrate, the hydrophobic layer comprising functional active copolymer spots separated by inactive copolymer, wherein the functional active copolymer comprises a hydrophobic material and a compound bearing a functional group which is imide or cyclic amide, and the inactive copolymer comprises a hydrophobic material and a compound bearing a functional group protected by a protecting group, wherein the functional group is imide or cyclic amide, and the protecting group is a photo acid group.
- 2. The slide as claimed in claim 1, wherein the photo acid group is a sulfonyloxy group, N-methanesulfonyloxy group, N-trifluoro-methanesulfonyloxy group, camphorsulfonyloxy group or tosyloxy group.
- 3. The slide as claimed in claim 1, wherein the photo acid group is a tosyloxy group.
- 4. The slide as claimed in claim 1, wherein the hydrophobic material is styrene, urethane, ethylene, or derivatives thereof.
- 5. The slide as claimed in claim 1, wherein the functional active copolymer comprises poly(styrene-co-maleimide), or poly(ethylene-co-maleimide).
- 6. The slide as claimed in claim 1, wherein the inactive copolymer comprises poly(styrene-co-[N-(tosyloxy)-maleimide]), or poly(ethylene-co-[N-(tosyloxy)-maleimide]).
- 7. The slide as claimed in claim 1, wherein the substrate comprises a polymer polymerized by organic monomers, wherein the organic monomers are ethylene, styrene, propylene, ester, acrylic acid, acrylate, alkyl acrylic acid, or alkyl acrylate.
- 8. The slide as claimed in claim 1, wherein the substrate comprises a polymer consisting of poly(styrene-co-maleimide), or poly(ethylene-co-maleimide).
- 9. The slide as claimed in claim 1, wherein the substrate comprises an inorganic material of silicon wafer, ceramic material, glass, or metal.
- 10. The slide as claimed in claim 1, wherein the substrate further comprises a photoactive polymer having a photo acid group.
- 11. An on-spot selectively activated hydrophobic microarray, comprising:
a substrate; a hydrophobic layer coated on the substrate, the hydrophobic layer comprising functional active copolymer spots separated by inactive copolymer, wherein the functional active copolymer comprises a hydrophobic material and a compound bearing a functional group which is imide or cyclic amide, and the inactive copolymer comprises a hydrophobic material and a compound bearing a functional group protected by a protecting group, wherein the functional group is imide or cyclic amide, and the protecting group is a photo acid group; and a biologically active material comprising a nucleophile immobilized to the functional active copolymer via a ring-opening reaction between the functional group of the hydrophobic functional copolymer and the nucleophile of the biologically active material.
- 12. The microarray as claimed in claim 11, wherein the photo acid group is a sulfonyloxy group, N-methanesulfonyloxy group, N-trifluoro-methanesulfonyloxy group, camphorsulfonyloxy group or tosyloxy group.
- 13. The microarrays claimed in claim 11, wherein the photo acid group is a tosyloxy group.
- 14. The microarray as claimed in claim 11, wherein the hydrophobic material is styrene, urethane, ethylene, or derivatives thereof.
- 15. The microarray as claimed in claim 11, wherein the functional active copolymer comprises poly(styrene-co-maleimide), or poly(ethylene-co-maleimide).
- 16. The microarray as claimed in claim 11, wherein the inactive copolymer comprises poly(styrene-co-[N-(tosyloxy)-maleimide]), or poly(ethylene-co-[N-(tosyloxy)-maleimide]).
- 17. The microarray as claimed in claim 11, wherein the substrate comprises a polymer polymerized by organic monomers, wherein the organic monomers are ethylene, styrene, propylene, ester, acrylic acid, acrylate, alkyl acrylic acid, or alkyl acrylate.
- 18. The microarray as claimed in claim 11, wherein the substrate comprises a polymer consisting of poly(styrene-co-maleimide), or poly(ethylene-co-maleimide).
- 19. The microarray as claimed in claim 11, wherein the substrate comprises an inorganic material of silicon wafer, ceramic material, glass, or metal.
- 20. The microarray as claimed in claim 11, wherein the substrate further comprises a photoactive polymer having a photo acid group.
- 21. The microarray as claimed in claim 11, wherein the biologically active material comprises nucleic acid, oligonucleotide, peptide, peptide nucleic acid, antigen, antibody, enzyme, or protein.
- 22. A method for preparing an on-spot selectively activated hydrophobic slide, comprising the steps of:
preparing a hydrophobic copolymer in a solvent to obtain a solution of hydrophobic copolymer; coating the solution of hydrophobic copolymer on a substrate; removing the solvent; and photolithographically activating the hydrophobic copolymer with light to convert the hydrophobic copolymer to a functional active copolymer.
- 23. The method as claimed in claim 22, further comprising applying a photo mask on the hydrophobic copolymer layer during the photolithographical activation step, wherein the mask has a pattern that covers areas not to be activated and exposes areas to be activated.
- 24. The method as claimed in claim 22, wherein the hydrophobic copolymer is prepared by blending, grafting or co-polymerization of a hydrophobic material and a compound bearing a functional group protected by a protecting group, where the functional group is imide or cyclic amide, and the protecting group is a photo acid group.
- 25. The method as claimed in claim 22, wherein the photo acid group is a sulfonyloxy group, N-methanesulfonyloxy group, N-trifluoro-methanesulfonyloxy group, camphorsulfonyloxy group or tosyloxy group.
- 26. The method as claimed in claim 22, wherein the photo acid group is a tosyloxy group.
- 27. The method as claimed in claim 22, wherein the hydrophobic material is styrene, urethane, ethylene, or derivatives thereof.
- 28. The method as claimed in claim 22, wherein the hydrophobic copolymer comprises poly(styrene-co-[N-(tosyloxy)maleimide]), or poly(ethylene-co-[N-(tosyloxy)maleimide]).
- 29. The method as claimed in claim 22, wherein the functional active copolymer comprises poly(styrene-co-maleimide), or poly(ethylene-co-maleimide).
- 30. The method as claimed in claim 22, wherein the substrate comprises a polymer polymerized by organic monomers, wherein the organic monomers are ethylene, styrene, propylene, ester, acrylic acid, acrylate, alkyl acrylic acid, or alkyl acrylate.
- 31. The method as claimed in claim 22, wherein the organic substrate comprises a polymer consisting of poly(styrene-co-maleimide), or poly(ethylene-co-maleimide).
- 32. The method as claimed in claim 22, wherein the substrate comprises an inorganic material of silicon wafer, ceramic material, glass, or metal.
- 33. The method as claimed in claim 22, further comprising activating the substrate surface prior to the coating step.
- 34. The method as claimed in claim 22, wherein the activating step comprising treating the substrate surface with an acid or a base, or treating the substrate surface by plasma activation.
- 35. The method as claimed in claim 22, further comprising cleaning the substrate surface before coating the solution of hydrophobic copolymer onto a substrate.
- 36. The method as claimed in claim 22, wherein the cleaning step is performed by the pretreatment with a solvent and/or sonication, wherein the solvent is surfactant, water, alcohol, or acetone.
- 37. The method as claimed in claim 22, wherein the coating step comprises spin coating, screen printing, roller coating, curtain coating, or dip coating.
- 38. The method as claimed in claim 22, wherein the step of removing solvent comprises vacuum evaporation, heating evaporation, or evaporation under reduced pressure.
CROSS REFERENCE TO RELATED APPLICATION
[0001] This application is a continuation-in-part of the continuation-in-part application Ser. No. 10/115,103 which is a continuation-in-part of U.S. patent application Ser. No. 09/695,254 filed on Oct. 10, 2000, which hereby incorporated by reference.
Continuation in Parts (2)
|
Number |
Date |
Country |
Parent |
10115103 |
Apr 2002 |
US |
Child |
10189405 |
Jul 2002 |
US |
Parent |
09695254 |
Oct 2000 |
US |
Child |
10115103 |
Apr 2002 |
US |