The present invention relates to an optical element, an illumination device, and a projection display device.
In recent years, projectors that use LEDs (Light-Emitting Diodes) as a light source are receiving increasing attention. This type of projector is provided with an LED, illumination optics into which light from the LED is irradiated, a modulating element that modulates light from the illumination optics in accordance with picture signals and emits the result, and projection optics that project light from the modulating element onto a screen.
As one type of illumination optics, the emitted light of the LED is irradiated upon a phosphor and the fluorescent light that is emitted by the phosphor is made incident to a modulating element. In a projector that employs this type of illumination optics, the light intensity of the fluorescent light is preferably raised to increase the luminance of the projected image.
The optical element disclosed in Non-Patent Document 1 is disclosed as a technology for raising the light intensity of fluorescent light. In this optical element, a metallic thin-film and a dielectric layer having a grating structure are successively layered on a substrate. In addition, quantum dots that function as a phosphor are applied to the dielectric layer.
When light is irradiated upon the quantum dots, excitons in the quantum dots are excited by the incident light. A portion of the excitons radiate fluorescent light, and the remaining excitons are consumed in the excitation of surface plasmons or the generation of electron-hole pairs and vanish without emitting fluorescent light. When the dielectric layer has a grating structure as described above, surface plasmons that are excited at the interface of the metallic thin-film and dielectric layer are diffracted and can be extracted as the same light as the fluorescent light.
Accordingly, in the optical element described in Non-Patent Document 1, the light intensity of fluorescent light can be augmented because the photons that are extracted by the diffraction of surface plasmons are added to the photons that are extracted when there is no grating construction. As a result, applying the optical element described in Non-Patent Document 1 to a fluorescent illumination device that performs illumination by fluorescent light enables an improvement of the luminance of the fluorescent light illumination device.
Non-Patent Document 1: Ehren Hwang, Igor I. Smolyaninov, Christopher C. Davis, NANO LETTERS, 2010, 10 pp. 813-820.
When the optical element described in Non-Patent Document 1 is used in the illumination optics of a projector, not only the optical element but also optics such as a condensing lens become necessary for irradiating light from the LED into the optical element or for irradiating the fluorescent light that is generated in the optical element into the modulating element, thereby giving rise to the problem in which the size of the projector increases.
It is therefore an object of the present invention to provide an optical element that can prevent an increase in the size while raising the light intensity of fluorescent light.
The optical element according to the present invention includes a light-guide plate that propagates light that is incident from a light source, a phosphor layer that is provided on the light-guide plate and that generates fluorescent light by the light from the light-guide plate, and a metal layer that is layered on the phosphor layer, wherein a diffraction grating is formed on the interface of the light-guide plate and the phosphor layer.
The illumination device of the present invention includes the above-described optical element and a light source that irradiates light into the light-guide plate of the optical element.
In addition, the projection display device of the present invention includes the above-described illumination device.
The present invention enables that the size of the projector will not become larger while increasing the light intensity of fluorescent light.
Exemplary embodiments of the present invention are next described with reference to the accompanying drawings. In the following explanation, elements having the same functions are given the same reference numbers and redundant explanation of these elements may be omitted.
Illumination device 10 shown in
Light source 1 is, for example, an LED and is arranged on the outer periphery of optical element 2. In
Optical element 2 includes light-guide plate 21, phosphor layer 22, metal layer 23, and dichroic mirror 24.
Light-guide plate 21 is irradiated by light emitted from light source 1, and this incident light is propagated through the interior of light-guide plate 21. In the present exemplary embodiment, light-guide plate 21 is formed as a flat plate, and light source 1 is provided such that light source 1 is in contact with the side surface. The side surface that contacts light source 1 is incident surface 31. The shape of light-guide plate 21 is not limited to a flat plate. In addition, the upper surface of light-guide plate 21 is assumed to be the XY plane, and the direction orthogonal to the XY plane is assumed to be the Z direction.
Phosphor layer 22 is provided on the upper surface of light-guide plate 21. In addition, uneven structure 32 that functions as a diffraction grating is provided on light-guide plate 21 at the interface with phosphor layer 22. In the present exemplary embodiment, the unevenness of uneven structure 32 is arranged in a one-dimensional lattice form, but may be of another arrangement such as a triangular lattice form.
Phosphor layer 22 is arranged on the upper surface of light-guide plate 21. Phosphor layer 22 is a carrier-generating layer that absorbs incident light that is irradiated from light-guide plate 21 to generate excitons (carriers) and generates fluorescent light by means of these excitons. The material of phosphor layer 22 is preferably a nano-inorganic phosphor such as a quantum dot phosphor, but may also be an inorganic phosphor such as Eu, BaMgAlxOy:Eu or BaMgAlxOy:Mn, or an organic phosphor.
Uneven structure 32 that functions as a diffraction grating is formed on light-guide plate 21 at the interface with phosphor layer 22. In the present exemplary embodiment, the unevenness of uneven structure 32 is arranged in a one-dimensional lattice. However, the unevenness of the uneven structure may also be arranged in a triangular lattice form.
Metal layer 23 is layered on phosphor layer 22. The material of metal layer 23 is, for example, gold, silver, copper, platinum, palladium, rhodium, osmium, ruthenium, iridium, iron, tin, zinc, cobalt, nickel, chromium, titanium, tantalum, tungsten, indium, aluminum, or an alloy of these metals. The thickness of metal layer 23 is preferably formed no greater than 200 nm and is more preferably formed at 10 nm-100 nm.
Dichroic mirror 24 is a wavelength-selective component that is provided on the surface of light-guide plate 21 that is opposite the surface on which phosphor layer 22 is formed. Dichroic mirror 24 reflects light that is emitted from light source 1, transmits fluorescent light that is generated by phosphor layer 22, and emits only fluorescent light from optical element 2.
As shown in
A portion of the light that is incident to phosphor layer 22 is reflected by phosphor layer 22 and returned to light-guide plate 21. The light that is returned to light-guide plate 21 is again reflected by dichroic mirror 24 and irradiated into phosphor layer 22.
The remaining light that is irradiated into phosphor layer 22 is absorbed by phosphor layer 22 and causes excitation of excitons inside phosphor layer 22. A portion of the excitons are converted to fluorescent light by relaxating these excitons on and are emitted from optical element 2. A portion of the remaining excitons cause excitation of surface plasmons of the interface of metal layer 23 and phosphor layer 22. The excited surface plasmons are diffracted by uneven structure 32 and emitted from optical element 2.
In order to bring about excitation of the above-described surface plasmons, the wave number kspp of the X and Y components of the wave number of the surface plasmons and the period kg of the diffraction grating must coincide. In other words, if m is a positive integer, kspp=m·Kg must be satisfied.
Wave number kspp is determined according to the dielectric constant distribution of the incident/emission portions of optical element 2. The incident/emission portion is the dielectric constant distribution of the medium that is closer to the light-guide plate 21-side than metal layer 23 (in
If the real part of the dielectric constant of metal layer 23 is εmetal and the wave number of light in a vacuum is k0, the wave number kspp of the X component and Y component of the wave number of the surface plasmons and the Z component kspp,Z of the wave number of surface plasmons is represented by:
εeff is the effective dielectric constant of the incident/emission portions. If the angular frequency of fluorescent light emitted from phosphor layer 22 is co, the dielectric constant distribution of incident/emission portions is ε(ω, x, y, z), and the imaginary number unit is j, the effective dielectric constant εeff is determined based on the dielectric constant distribution of incident/emitted portions and the distribution of surface plasmons with respect to the direction that is perpendicular to the interface of the light-guide body 21-side of metal layer 23, and is represented by:
Here, Re[ ] represents the real part in the brackets [ ].
The integral range D in Equation (3) is the three-dimensional range on the light-guide plate 21-side of metal layer 23. More specifically, the range of the XY plane of integral range D is a range within metal layer 23, and the range in the Z-direction of the integral range is the range from the interface of metal layer 23 and phosphor layer 22 to infinity on the side of light-guide plate 21. The interface of metal layer 23 and phosphor layer 22 is Z=0, and the direction of increasing distance from this interface toward light-guide plate 21 is the +Z direction.
The effective dielectric constant εeff may also be calculated using the following equation. However, the use of Equation (3) is preferable.
Wave number kspp can be found from the dielectric constant distribution ε(ω, x, y, z) of the incident/emission portions by using Equation (1), Equation (2), and Equation (3). More specifically, the dielectric constant distribution ε(ω, x, y, z) of the incident/emission portions is substituted in Equation (3), an initial value that is appropriate to the effective dielectric constant εeff is given, the actual effective dielectric constant εeff is calculated by repeatedly calculating the wave numbers kspp and kspp,Z of surface plasmons and the effective dielectric constant εeff using Equation (1), Equation (2), and Equation (3), and the wave number kspp can then be found from this actual effective dielectric constant εeff.
Accordingly, if Equation (1), Equation (2), and Equation (3) are used to adjust the period of the diffraction grating and the dielectric constant distribution of the incident/emission portions to satisfy kspp=m·Kg, the excited surface plasmons can be efficiently extracted and the effect of augmenting fluorescent light can be increased.
As shown in
Because the effective interactive distance in an actual optical element is in the order of several hundred nanometers, in order to increase the fluorescent light and coupling efficiency of surface plasmons, the particle radius of phosphor material that is the material of phosphor layer 22 is preferably on the nanometer order.
In addition, as shown in
In the present exemplary embodiment as described hereinabove, optical element 2 includes phosphor layer 22 that is provided on light-guide plate 21 and metal layer 23 that is layered on phosphor layer 22, and a diffraction grating is formed on the interface of light-guide plate 21 and phosphor layer 22. Surface plasmons are excited on the interface of phosphor layer 22 and metal layer 23 by the excitons in phosphor layer 22, and these surface plasmons can also be extracted as fluorescent light, whereby the light intensity of the fluorescent light can be increased. In addition, because fluorescent light that is emitted from light-guide plate 21 can be irradiated into a display element, optical element 2 can be used as the illumination optics of a projector, and because optical element 2 and the illumination optics can be of a unified form, an increase in the size of the optical element can be prevented.
In addition, because the light intensity of the fluorescent light can be increased, the size of the emission surface of optical element 2 can be made relatively small.
Still further, fabrication of optical element 2 can be simplified in the present exemplary embodiment because a diffraction grating can be created on the interface of light-guide plate 21 and phosphor layer 22 by merely providing uneven structure 32 on light-guide plate 21. In addition, the fabrication of optical element 2 can be further simplified because phosphor layer 22 can be fabricated by a screen-printing process.
Another exemplary embodiment of the present invention is next described.
Illumination device 10′ shown in
Structure 33 is provided on the surface of dichroic mirror 24 that is opposite the surface on which light-guide plate 21 is provided. Structure 33 reduces reflection of fluorescent light that is emitted from phosphor layer 22 to improve the transmittance of fluorescent light in dichroic mirror 24. A photonic crystal, a moth-eye structure, or a lens array can be used as structure 33.
According to the present exemplary embodiment, the transmittance of fluorescent light is improved by means of structure 33, whereby the luminance of fluorescent light emitted from illumination device 10′ can be improved.
Metal fine-particles 34 increase the apparent absorbance of incident light that is irradiated into phosphor layer 22. The apparent absorbance is the absorbance when phosphor layer 22 is considered a homogeneous layer and light is irradiated over the entire surface of phosphor layer 22. By interacting with the incident light, metal fine-particles 34 cause excitation of surface plasmons on the surface of metal fine-particles 34, giving rise to an enhanced electric field of a magnitude that approaches 100 times that of the electric field intensity of incident light in the vicinity of the surface. This enhanced electric field generates excitons in phosphor layer 22 and therefore increases the number of excitons in phosphor layer 22. As a result, metal fine-particles 34 can, by means of the surface plasmons that are excited in its own surface, increase the apparent absorbance of incident light and thus increase the light intensity of fluorescent light.
Materials that can be used as the material of metal fine-particles include: gold, silver, copper, platinum, palladium, rhodium, osmium, ruthenium, iridium, iron, tin, zinc, cobalt, nickel, chromium, titanium, tantalum, tungsten, indium, and aluminum, or an alloy of these metals. Of these, gold, silver, copper, platinum, and aluminum or an alloy that takes these metals as principal components is preferable, and gold, silver and aluminum or an alloy that takes these metals as principal components is particularly preferable. Metal fine-particles 34 may be a core-shell structure in which metal types differ for the periphery and the core, a combined hemispherical structure in which hemispheres of two types are combined, or a cluster-in-cluster structure in which different clusters are aggregated to produce fine particles.
Making metal fine-particles 34 an alloy or these special structures enables control of the resonant wavelength without varying the dimensions or shapes of the fine particles.
The shape of metal fine-particles 34 may be any shape having a closed surface, such as a rectangular parallelepiped, a regular hexahedron, an ellipsoid, a sphere, a triangular pyramid, or a triangular prism. In addition, metal fine-particles 34 include forms in which metal thin-film is processed by micro-fabrication, of which a semiconductor lithography is representative, to include a structure composed of closed surfaces having one side less than 10 μm.
According to the present exemplary embodiment, the light intensity of fluorescent light can be increased by means of metal fine-particles 34 in phosphor layer 22, whereby luminance can be improved.
A projector (projection image display device) that uses the illumination device is next described.
Illumination devices 101A-101C are made up by illumination device 10 shown in
Display elements 102A-102C modulate the fluorescent light from each of illumination devices 101A-101C, respectively, in accordance with image signals and emit the result to color-combining prism 103. In
Color-combining prism 103 combines the fluorescent light from each of display elements 102A-102C and emits the resulting light by way of projection lens 104.
The configurations shown in the figures in each of the above-described exemplary embodiments are merely examples, and the present invention is not limited to these configurations.
This application claims the benefits of priority based on Japanese Patent Application No. 2011-085370 for which application was submitted on Apr. 7, 2011 and Japanese Patent Application No. 2012-001321 for which application was submitted on Jan. 6, 2012 and incorporates by citation all of the disclosures of these applications.
Number | Date | Country | Kind |
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2011-085370 | Apr 2011 | JP | national |
2012-001321 | Jan 2012 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/JP2012/056730 | 3/15/2012 | WO | 00 | 10/7/2013 |