The present invention relates to an optical element provided with an antireflection film.
Recently a need for a wide-angle detection has been growing. By way of example, in infrared measurement, a light source for a wide-angle illumination is required for a wide-angle detection. Further, in general, light receiving elements used for detection have a relatively low sensitivity at a relatively great angle and therefore in many cases a light source in which the intensity of light at a relatively great angle is heightened is required. In an optical element used together with alight source, however, in general, reflectance for a ray of light at a relatively great angle is relatively high because of Fresnel reflection and therefore the efficiency is reduced. Further, in general, in the shape of a lens for a wide-angle illumination the sag is great and the paraxial radius of curvature is small and therefore difficulties in the production of a mold and the production of a lens through injection molding are enhanced.
On the other hand, in projecting optical systems, imaging optical systems and the like, optical elements provided with an antireflection film on a surface thereof in order to reduce a ratio of light reflected on the surface thereof, have been used (Patent document 1, for example).
However, an optical element that is used for rays of light in a wide-angle range, the angle range being 150 degrees or greater, is capable of making intensity of rays of light at a relatively great angle in the angle range sufficiently great and can be produced with comparative ease has not been developed.
Accordingly, there is a need for an optical element that is used for rays of light in a wide-angle range, the angle range being 150 degrees or greater, is capable of making intensity of rays of light at a relatively great angle in the angle range sufficiently great and can be produced with comparative ease.
The problem to be solved by the invention is to provide an optical element that is used for rays of light in a wide-angle range, the angle range being 150 degrees or greater, is capable of making intensity of rays of light at a relatively great angle in the angle range sufficiently great and can be produced with comparative ease.
In a combination of an optical element and an antireflection film according to a first aspect of the present invention, the optical element is provided with a microlens array on a first surface and is configured so as to receive a light beam through the first surface, the light beam being parallel to a reference axis parallel to the central axis of each microlens, and to make the light beam go out through a second surface while diverging the light beam such that the maximum value of an angle that a diverged ray of light and the reference axis form in a plane containing the reference axis is D, wherein each microlens is configured such that
is satisfied, where Z represents distance between the vertex and the bottom and P represents the diameter of the smallest circle enclosing the bottom and the antireflection film is designed such that
is satisfied, where T(0) represents transmittance of the film formed on a substrate made of the same material as that of the optical element for an incident ray at the angle of incidence of 0, T(D) represents transmittance of the film formed on the substrate for an incident ray at the angle of incidence of D, T′(0) represents transmittance of the substrate without an antireflection film for an incident ray at the angle of incidence of 0 and T′(D) represents transmittance of the substrate without an antireflection film for an incident ray at the angle of incidence of D. The antireflection film is provided on the second surface so as to realize a target intensity distribution of diverged rays, the distribution being a function of angle with respect to the reference axis. An area of a minute portion of the surface of each microlens, on which an angle of incidence of a ray that travels in the direction parallel to the reference axis is θ, is determined associated with transmittance of the optical element and the antireflection film for the ray that has passed through the minute portion and a target intensity of the ray that has been diverged.
An optical element according to a second aspect of the present invention is provided with a microlens array on a first surface and an antireflection film on a second surface and is configured so as to receive a light beam through the first surface, the light beam being parallel to the central axis of each microlens, and to make the light beam go out through the second surface while diverging the light beam in such a way that the maximum value of an angle that a diverged ray of light forms with the central axis is D, wherein each microlens is configured such that
is satisfied, where Z represents distance between the vertex and the bottom and P represents the diameter of the smallest circle enclosing the bottom, wherein the antireflection film is formed such that
is satisfied, where T(0) represents transmittance for an incident ray at the angle of incidence of 0 is, T(D) represents transmittance for an incident ray at the angle of incidence of D, T′(0) represents transmittance of the optical element proper without an antireflection film for an incident ray at the angle of incidence of 0 and T′(D) represents transmittance of the optical element proper without an antireflection film for an incident ray at the angle of incidence of D, and wherein
is further satisfied.
When attempts are made to make the intensity of rays of the outgoing beam at relatively great angles with respect to the reference axis greater than the intensity of the ray of the outgoing beam in the reference axis in an optical element that is provided with a microlens array on a first surface and an antireflection film on a second surface and is configured so as to receive a light beam through the first surface, the light beam being parallel to the central axis of each microlens, and to make the light beam go out through the second surface while diverging the light beam, a large portion of rays of the outgoing beam at relatively great angles with respect to the reference axis is reflected on the surfaces of the optical element and therefore the ratio of the beam that has passed through the exit surface (light-delivering surface) of the optical element to the beam that reaches the entrance surface (light-receiving surface) of the optical element, that is, the efficiency is reduced. Further, the curvature of each microlens has to be made relatively great and therefore difficulties in the production of a mold for producing the optical element are enhanced.
According to the present invention, the problem described above is solved by properties of an antireflection film provided on the second surface. In order to make the intensity of rays of the outgoing beam at relatively great angles with respect to the reference axis greater than the intensity of ray of the outgoing beam in the reference axis in the optical element, it is supposed that a ratio of transmittance of the surface provided with the antireflection film for a ray at the angle of D to transmittance of the surface provided with the antireflection film for a ray at the angle of 0 should preferably be made as great as possible. Accordingly, an antireflection film that makes the ratio of transmittance of the surface provided with the antireflection film for a ray at the angle of D to transmittance of the surface provided with the antireflection film for a ray at the angle of 0 as great as possible is formed on the second surface. The problem to be solved by the invention is solved by an antireflection film that is formed such that
is satisfied when the surface provided with the antireflection film and the surface without an antireflection film is compared with each other.
In the optical element according to a first embodiment of the present invention, D is 75 degrees or greater.
In the optical element according to a second embodiment of the present invention, D is 80 degrees or greater.
In the optical element according to a third embodiment of the present invention, D is 85 degrees or greater.
In the optical element according to a fourth embodiment of the present invention, the antireflection film consists of a single layer made of a material the refractive index of which is lower than the refractive index of a material of the optical element proper.
In the optical element according to a fifth embodiment of the present invention, the antireflection film includes one or more layers with a relatively low index and one or more layers with a relatively higher index, a layer with a relatively low index and a layer with a relatively higher index being formed on top of another, and the outmost layer is a layer with a relatively low index.
In the optical element according to a sixth embodiment of the present invention, the antireflection film is formed such that Rs (D)<Rp(D) is satisfied where Rs (D) represents reflectance for an incident s-polarized light at the angle of D and Rp (D) represents reflectance for an incident p-polarized light at the angle of D.
When the antireflection film provided with the above-described features is formed,
is easily satisfied when the angle D is 80 degrees or greater and
is easily satisfied when the angle D is 75 degrees or greater.
In the optical element according to a seventh embodiment of the present invention, the antireflection film is formed such that
R(0)≥R′(0)
is satisfied where R(0) represents reflectance of the antireflection film for an incident ray at the angle of 0 and R′(0) represents reflectance of the optical element proper without an antireflection film at the angle of 0.
When the antireflection film provided with the above-described features is formed,
is easily satisfied when the angle D is 80 degrees or greater and
is easily satisfied when the angle D is 75 degrees or greater. When the efficiency of transmitted light is considered, it is preferable that R (0)<0.2 is satisfied.
In a method of producing an optical element provided with a microlens array on a first surface and an antireflection film on a second surface according to a third aspect of the present invention, the optical element is configured so as to receive a light beam through the first surface, the light beam being parallel to a reference axis parallel to the central axis of each microlens, and to make the light beam go out through the second surface while diverging the light beam such that the maximum value of an angle that a diverged ray of light and the reference axis form in a plane containing the reference axis is D, wherein each microlens is configured such that
is satisfied, where Z represents distance between the vertex and the bottom and P represents the diameter of the smallest circle enclosing the bottom. The method includes designing an antireflection film such that
is satisfied, where T(0) represents transmittance of the film formed on a substrate made of the same material as that of the optical element for an incident ray at the angle of incidence of 0, T(D) represents transmittance of the film formed on the substrate for an incident ray at the angle of incidence of D, T′(0) represents transmittance of the substrate without an antireflection film for an incident ray at the angle of incidence of 0 and T′(D) represents transmittance of the substrate without an antireflection film for an incident ray at the angle of incidence of D, obtaining transmittance of the optical element and the antireflection film for a ray that travels in the direction parallel to the reference axis, enters the microlens, the angle of incidence being θ, and passes through the optical element and the antireflection film, obtaining a target intensity on the surface of each microlens of the ray with the angle of incidence of θ, using the transmittance of the optical element and the antireflection film for the ray with the angle of incidence of θ and a target intensity distribution of diverged rays, the distribution being a function of angle with respect to the reference axis, and determining the shape of the surface of each microlens by determining an area of a minute portion of the surface of each microlens, on which an angle of incidence of a ray that travels in the direction parallel to the reference axis is θ, such that the target intensity on the surface of each microlens of the ray with the angle of incidence of θ is realized.
In general, a microlens array used for divergence is configured such that a collimated beam in the direction of the central axes of the curved surfaces of the microlenses is diverged with an angle of divergence with respect to the central axes. A single lens used for divergence is configured such that a collimated beam in the direction of the optical axis is diverged with an angle of divergence with respect to the optical axis. An axis with respect to which an angle of divergence is determined, such as the central axis of the curved surface of a microlens and the optical axis of a single lens, is referred to a reference axis of divergence or merely a reference axis in the description and claims of the present application. The reference axis of the optical element 100 shown in
In step S1010 of
When making attempts to design an optical element with which such a target intensity distribution of the outgoing beam as shown in
Reflectance of a ray that enters the interface between different materials will be described below. In general, reflectance R of a ray is the mean value of reflectance Rs of the s-polarized light and reflectance Rp of the p-polarized light.
Each of rs and rp represents amplitude reflectance of each of s- and p-polarized lights.
An angle of incidence and an angle of refraction at the interface between a material with refractive index of n1 and a material with refractive index of n2 are represented respectively by α and ß, and then the following expressions can be obtained.
According to the Snell's law, the expression
n
1 sin α=n2 sin β
holds. When n1, n2 and α are substituted respectively by n1=1, n2=n and α=θ, and A is defined by the expression
the expressions
can be obtained. Thus reflectance R can be represented as a function of angle of incidence θ.
Since transmittance T can be expressed using reflectance R, transmittance T is also a function of angle of incidence θ.
In step S1020 of
In general, reflectance of a ray traveling from air to a substrate with an angle of incidence of α on the interface between air and the substrate is equal to reflectance of a ray traveling from the substrate to air with an angle of refraction of α on the interface. Accordingly, a relationship between an angle of incidence and reflectance concerning a ray traveling from air to a substrate is identical with a relationship between an angle of refraction and reflectance concerning a ray traveling from the substrate to air. Concerning an outgoing ray that has traveled in the direction of the reference axis, has entered the optical element 100 shown in
Examples and comparative example of antireflection films will be described below.
Each of the antireflection films of Example 1 and Comparative example 1 consists of two layers. The first layer that is on a substrate made of the same material as that of the optical element is a higher refractive index layer made of titanium dioxide and the second layer is a lower refractive index layer made of silicon dioxide. The outmost second layer is a lower refractive index layer. In Examples 1-4, at the reference wavelength of 850 nanometers, the refractive index of the higher refractive index layer made of titanium dioxide is 2.3740 and the refractive index of the lower refractive index layer made of silicon dioxide is 1.4617.
Table 1 shows film thickness of each layer of Example 1 and Comparative example 1. The unit of film thickness is nanometer.
Each of the antireflection films of Example 2 and Comparative example 2 consists of three layers. The first layer that is on a substrate made of the same material as that of the optical element is a lower refractive index layer made of silicon dioxide. The second layer is a higher refractive index layer made of titanium dioxide and the third layer is a lower refractive index layer made of silicon dioxide. The outmost third layer is a lower refractive index layer.
Table 2 shows film thickness of each layer of Example 2 and Comparative example 2. The unit of film thickness is nanometer.
Each of the antireflection films of Example 3 and Comparative example 3 consists of four layers. The first layer that is on a substrate made of the same material as that of the optical element is a higher refractive index layer made of titanium dioxide. The second layer is a lower refractive index layer made of silicon dioxide, the third layer is a higher refractive index layer made of titanium dioxide and the fourth layer is a lower refractive index layer made of silicon dioxide. The outmost fourth layer is a lower refractive index layer.
Table 3 shows film thickness of each layer of Example 3 and Comparative example 3. The unit of film thickness is nanometer.
Each of the antireflection films of Example 4 and Comparative example 4 consists of five layers. The first layer that is on a substrate made of the same material as that of the optical element is a lower refractive index layer made of silicon dioxide. The second layer is a higher refractive index layer made of titanium dioxide, the third layer is a lower refractive index layer made of silicon dioxide, the fourth layer is a higher refractive index layer made of titanium dioxide and the fifth layer is a lower refractive index layer made of silicon dioxide. The outmost fifth layer is a lower refractive index layer.
Table 4 shows film thickness of each layer of Example 4 and Comparative example 4. The unit of film thickness is nanometer.
Each of the antireflection films of Example 5 and Comparative example 5 consists of a single layer. The single layer made of silicon dioxide is formed on a substrate made of the material of the optical element. At the reference wavelength of 850 nanometers, the refractive index of the single layer is 1.3854. The reason why the refractive index of the lower refractive index layer made of silicon dioxide of Example 5 is lower than the refractive index of the lower refractive index layers made of silicon dioxide of Examples 1-4 is that the film of Example 5 is formed by a method different from those of the other examples.
In the present example the substrate functions as a higher refractive index layer and the single layer functions as a lower refractive index layer.
Table 5 shows film thickness of the single layer of Example 5 and the single layer of Comparative example 5. The unit of film thickness is nanometer.
The antireflection films of the examples are designed such that a ratio of transmittance for a ray at the angle D to transmittance for a ray at the angle 0 is relatively great and in other words a ratio of transmittance for a ray at the angle 0 to transmittance for a ray at the angle D is relatively small. Concerning the antireflection films of Examples 1-5, the values of
will be evaluated and compared with one another for each of cases in which the angle D is 85 degrees, 80 degrees, 75 degrees and 70 degrees. T(0) and T(D) respectively represent transmittance of a substrate provided with an antireflection film for a ray at the angle 0 and that for a ray at the angle D and T′(0) and T′(D) respectively represent transmittance of the substrate for a ray at the angle 0 and that for a ray at the angle D. As described above a relationship between an angle of incidence and reflectance concerning a ray traveling from air to a substrate is identical with a relationship between an angle of refraction and reflectance concerning a ray traveling from the substrate to air. Further, when a ray travelling in the reference axis is incident onto the optical element shown in
Table 6 shows the values of
of the substrate provided with the antireflection film of each of Examples 1-5 and Comparative examples 1-5 when the angle D is 85 degrees.
According to Table 6, the value of 1
of the substrate provided with the antireflection film of each of Examples 2-5 is less than 0.75.
Table 7 shows the values of
of the substrate provided with the antireflection film of each of Examples 1-5 and Comparative examples 1-5 when the angle D is 80 degrees.
According to Table 7, the value of
of the substrate provided with the antireflection film of each of Examples 1-5 is less than 0.80.
Table 8 shows the values of
of the substrate provided with the antireflection film of each of Examples 1-5 and Comparative examples 1-5 when the angle D is 75 degrees.
According to Table 8, the value of
of the substrate provided with the antireflection film of each of Examples 1-5 is equal to or less than 0.85.
Table 9 shows the values of
of the substrate provided with the antireflection film of each of Examples 1-5 and Comparative examples 1-5 when the angle D is 70 degrees.
According to Tables 6-9, the value of
of the substrate provided with the antireflection film of each of Examples 1-5 is equal to or less than 0.85 (85%) when the angle D is 85 degrees, 80 degrees and 75 degrees. Further, the value of
of the substrate provided with the antireflection film of each of Examples 1-5 is equal to or less than 0.80 (80%) when the angle D is 85 degrees and the value of
of the substrate provided with the antireflection film of each of Examples 2-5 is equal to or less than 0.80 (80%) when the angle D is 80 degrees. Further, the value of
of the substrate provided with the antireflection film of each of Examples 2-5 is equal to or less than 0.75 (75%) when the angle D is 85 degrees.
According to
R
s(D)<Rp(D)
Rs (D) represents reflectance for the s-polarized light at the angle D and Rp (D) represents reflectance for the p-polarized light at the angle D. On the other hand, according to
R
s(D)>Rp(D)
According to Tables 6-9, the reflectance of the substrate provided with the antireflection film of each of Examples 1 and 2 for a ray at the incidence angle of 0 is greater than the reflectance of the substrate without an antireflection film for a ray at the incidence angle of 0. On the other hand, according to Tables 6-9, the reflectance of the substrate provided with the antireflection film of each of Comparative examples 1-5 for a ray at the incidence angle of 0 is smaller than the reflectance of the substrate without an antireflection film for a ray at the incidence angle of 0. The antireflection films of Comparative examples are formed so as to reduce the reflectance for the ray at the incidence angle of 0.
In step S1040 of
In step S2010 of
When refractive index of the lens is represented by n, the following expressions hold according to the Snell's law.
n sin α=sin θ
n sin β=sin Ø
Using the expressions described above, angle of incidence or inclination θ can be obtained as below.
Thus, inclination θ of the entrance surface of the optical element can be expressed by angle ϕ of an outgoing ray. Further, in
In step S2020 of
In step S2030 of
In step S2040 of
In step S2050 of
In step S1050 of
Examples of optical elements designed according to the method of the flowchart shown in
Concerning the curved surface of each microlens of the microlens array, the origin is located at the vertex of the lens, an x-axis and a y-axis are defined in the plane containing the origin and parallel to the bottom and a z-axis that is orthogonal to the x-axis and the y-axis is defined. The direction of the z-axis is defined as that of a ray travelling along the z-axis.
The curved surface of a microlens and the exit surface of the optical element can be expressed by the following expression.
c represents the curvature at the vertex of the curved surface and is the inverse number of the radius of curvature. r represents distance between a point on the curved surface and the straight line passing through the vertex of the curved surface, that is, the reference axis. k represents a conic constant and ai represents an aspheric coefficient of order i.
The shape of the bottom of each microlens is a regular hexagon and microlenses, each having a regular hexagonal bottom, are arranged on a plane closely leaving no space therebetween to form a microlens array.
Table 10 shows the shape of each microlens of 85-0, 85-1, 85-2, 85-3, 85-4 and 85-5. In the table, “Radius of curvature” and “Curvature” refer to R and c of Expression (1), respectively. “Sag” refers to sag Z when r=P/2=0.15. The value is a distance between the vertex and the bottom of a microlens. “Aspect ratio” refers to Z/P. “Curvature ratio” refers to the ratio of “Curvature” of each example to “Curvature” in the case without an antireflection film.
According to Table 10 the curvature ratio of each microlens of 85-1, 85-2, 85-3, 85-4 and 85-5 is less than 0.9.
Table 11 shows the shape of each microlens of 85-1′, 85-2′, 85-3′, 85-4′ and 85-5′.
Table 12 shows the shape of each microlens of 80-0, 80-1, 80-2, 80-3, 80-4 and 80-5.
According to Table 12 the curvature ratio of each microlens of 80-1, 80-2, 80-3, 80-4 and 80-5 is less than 0.95.
Table 13 shows the shape of each microlens of 80-1′, 80-2′, 80-3′, 80-4′ and 80-5′.
Table 14 shows the shape of each microlens of 75-0, 75-1, 75-2, 75-3, 75-4 and 75-5.
Table 15 shows the shape of each microlens of 75-1′, 75-2′, 75-3′, 75-4′ and 75-5′.
Table 16 shows the shape of each microlens of 70-0, 70-1, 70-2, 70-3, 70-4 and 70-5.
Table 17 shows the shape of each microlens of 70-1′, 70-2′, 70-3′, 70-4′ and 70-5′.
Table 18 shows the efficiency and the shape of each optical element of 85-0, 85-1, 85-2, 85-3, 85-4, 85-5, 85-1′, 85-2′, 85-3′, 85-4′ and 85-5′ for ready comparison.
According to Table 18 the efficiency of each optical element of 85-1, 85-2, 85-3, 85-4 and 85-5 is higher by 9 percent or more than the efficiency of the optical element of 85-0. The aspect ratio (Z/P) of each microlens of 85-1, 85-2, 85-3, 85-4 and 85-5 is 1 or greater and 96 percent of the aspect ratio of each microlens of 85-0 or smaller.
Table 19 shows the efficiency and the shape of each optical element of 80-0, 80-1, 80-2, 80-3, 80-4, 80-5, 80-1′, 80-2′, 80-3′, 80-4′ and 80-5′ for ready comparison.
According to Table 19 the efficiency of each optical element of 80-0, 80-1, 80-2, 80-3, 80-4 and 80-5 is higher by 4 percent or more than the efficiency of the optical element of 80-0. The aspect ratio (Z/P) of each microlens of 80-0, 80-1, 80-2, 80-3, 80-4 and 80-5 is 0.9 or greater and 97 percent of the aspect ratio of each microlens of 80-0 or smaller.
Table 20 shows the efficiency and the shape of each optical element of 75-0, 75-1, 75-2, 75-3, 75-4, 75-5, 75-1′, 75-2′, 75-3′, 75-4′ and 75-5′ for ready comparison.
According to Table 20 the efficiency of each optical element of 75-1, 75-2, 75-3, 75-4 and 75-5 is higher by 2 percent or more than the efficiency of the optical element of 75-0. The aspect ratio (Z/P) of each microlens of 75-1, 75-2, 75-3, 75-4 and 75-5 is 0.8 or greater and 98 percent of the aspect ratio of each microlens of 75-0 or smaller.
Table 21 shows the efficiency and the shape of each optical element of 70-0, 70-1, 70-2, 70-3, 70-4, 70-5, 70-1′, 70-2′, 70-3′, 70-4′ and 70-5′ for ready comparison.
According to Table 21 the efficiency of each optical element of 70-0, 70-1, 70-2, 70-3, 70-4 and 70-5 is higher by 0.8 percent or more than the efficiency of the optical element of 70-0. The aspect ratio (Z/P) of each microlens of 70-0, 70-1, 70-2, 70-3, 70-4 and 70-5 is 0.7 or greater and smaller than 0.8 and 99 percent of the aspect ratio of each microlens of 70-0 or smaller.
This is a Continuation of International Patent Application No. PCT/JP2023/004144 filed Feb. 8, 2023, which designates the U.S., and which claims priority from U.S. Provisional Patent Application No. 63/335,891 filed on Apr. 28, 2022 and U.S. Provisional Patent Application No. 63/392,675 filed on Jul. 27, 2022. The contents of these applications are hereby incorporated by reference.
Number | Date | Country | |
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63335891 | Apr 2022 | US | |
63392675 | Jul 2022 | US |
Number | Date | Country | |
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Parent | PCT/JP2023/004144 | Feb 2023 | WO |
Child | 18826707 | US |