Claims
- 1. A method of forming an anode for an optical magnetron, comprising the steps of:forming a photoresist layer around an outer surface of a cylindrical core made of a first material; patterning and etching the photoresist layer to form a plurality of vanes which extend radially from the outer surface of the cylindrical core to define a plurality of slots; plating the cylindrical core and vanes with a second material different from the photoresist and the first material; and removing the vanes and cylindrical core from the plating to produce a cylindrical anode having a plurality of slots.
- 2. The method of claim 1, wherein the vanes and cylindrical core are removed chemically via a solvent.
- 3. The method of claim 1, wherein the step of patterning is carried out via a photolithographic technique.
- 4. The method of claim 3, wherein the photolithographic technique is electron beam lithography.
- 5. A method of forming an anode for an optical magnetron, comprising the steps of:forming a layer of material from which the anode is to be made; patterning and etching the layer to form a first layer of a cylindrical anode with a plurality of resonant cavities formed along an inner circumference of the anode; forming at least one subsequent layer of material and repeating the step of patterning and etching in order to increase the vertical height of the anode.
Parent Case Info
This is a division of application Ser. No. 09/584,887, filed Jun. 1, 2000 which is now U.S. Pat. No. 6,373,194.
US Referenced Citations (9)
Non-Patent Literature Citations (1)
Entry |
Partial International Search Report Re: PCT/US01/16622 mailed on Nov. 13, 2001 with Invitation to Pay Additional Fees. |