OPTICAL MULTILAYER FILTER, METHOD FOR MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS

Abstract

An optical multilayer filter comprises a substrate, and an inorganic thin film that is composed of a plurality of layers and formed on the substrate. An uppermost surface layer of the inorganic thin film is a silicon oxide layer having a density of from 1.9 g/cm3 to 2.2 g/cm3.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

The invention will be described with reference to the accompanying drawings, wherein like numbers reference like elements.

FIG. 1 is a sectional view illustrating an optical multilayer filter of the invention.

FIG. 2 is a sectional view illustrating the optical multilayer filter with an earthing cable.

FIG. 3 schematically illustrates adhesion levels in an adhesion test of Ti₃O₅ powder.

FIG. 4 is a schematic view of a surface potential measuring device.

FIG. 5 is a schematic view of a surface resistivity measuring device.

FIG. 6 is a block diagram schematically illustrating an electronic apparatus (image pick-up device) of the invention.

Claims

1. An optical multilayer filter, comprising: a substrate; andan inorganic thin film that is composed of a plurality of layers and formed on the substrate, wherein an uppermost surface layer of the inorganic thin film is a silicon oxide layer having a density of from 1.9 g/cm3 to 2.2 g/cm3.

2. The optical multilayer filter according to claim 1, wherein a layer adjacent to the silicon oxide layer serving as the uppermost surface layer is a transparent conductive film.

3. The optical multilayer filter according to claim 1, wherein the inorganic thin film is one of a UV-IR cut film and an IR cut film.

4. The optical multilayer filter according to claim 1, wherein the substrate is one of a glass substrate and a quartz substrate.

5. An electronic apparatus, comprising the optical multilayer filter according to claim 1.

6. The electronic apparatus according to claim 5, the uppermost surface layer of the inorganic thin film is grounded.

7. A method for manufacturing an optical multilayer filter, comprising: forming an inorganic thin film composed of a plurality of layers on a substrate, wherein a vacuum in forming an uppermost surface layer of the inorganic thin film by vacuum deposition is from 5×10−4 Pa to 5×10−2 Pa.