BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a diagram schematically showing a plan view of an exemplary electrode pattern of a coma aberration correction device embodying the invention.
FIG. 2 is a diagram showing a schematical plan view of an electrode pattern example of one prior art coma aberration correction device.
FIG. 3 is a diagram graphically showing the relationship of an incident light beam's relative position deviation and aberration correction factor in the prior art coma aberration correction device.
FIG. 4 is a graph showing an exemplary relation of a relative position deviation of an incident light beam in the coma aberration correction device of the illustrative embodiment and a relative phase difference to be added to each electrode portion penetration light beam in order to perform optimum aberration correction of a coma aberration amount, 0.01 λrms, in each case.
FIG. 5 is a graph showing a relation between relative position deviation of an incident light beam in the coma aberration correction device of this embodiment and an aberration correction factor with the optimum aberration correction applied thereto in each case.
FIG. 6 is a diagram schematically showing a configuration of one embodiment of an optical pickup with the coma aberration correction device of the embodiment being built therein.