Patent Application
20220333913
The present disclosure relates to an optical unit and a film thickness measurement device.
Recently, devices, which can realize a high-density storage compared to 2D memories in the related art, have been attracting attention. A high-density storage device is constituted by vertically stacking layers of data storage cells. For example, each data storage cell has a multilayer film structure in which silicon oxide films and silicon nitride films are repeatedly stacked on a silicon substrate, and a pair of a silicon oxide film and a silicon nitride film forms one data storage cell. Since a memory capacity of the device is proportional to the number of pairs of a silicon oxide film and a silicon nitride film, multilayering and thinning of devices have been progressing. A non-uniform film thickness affects electrical characteristics of a device. A non-uniform film formation rate causes deterioration in productivity due to increase in cleaning. Therefore, the importance of quality control of a film thickness and process control of film formation in manufacturing devices is increasing.
In a case of considering application to an in-line film thickness monitor, a film thickness measurement technique (spectroscopic method) utilizing spectroscopy can be mentioned. When a spectroscopic method is used, a measurement head is easily embedded into a film formation device, and there are few restrictions on embodiments. Therefore, it is easy to be applied to an in-line film thickness monitor compared to a cross-sectional observation technology. For example, in the film thickness measurement device described in Patent Literature 1, candidates for an optimal solution to a film thickness are obtained using a result of comparison between an actual measurement reflectance and a theoretical reflectance for each wavelength of a measurement target in a first wavelength range, and the optimal solution to the film thickness is determined from the candidates for the optimal solution using a result of comparison between the actual measurement reflectance and the theoretical reflectance for each wavelength of a measurement target S in a second wavelength range different from the first wavelength range.
An amount of change in a reflectance spectrum with respect to a film thickness of a multilayer film tends to be larger in an ultraviolet region than in a visible region. For this reason, in the current circumstances in which multilayering and thinning of devices have been progressing, from a viewpoint of improving measurement accuracy, it is considered effective to perform spectroscopy using light in the ultraviolet region. However, when dealing with light in the ultraviolet region, there are various technical problems, such as stray light, dispersion, scattering, luminance, durability, and costs. Particularly, when an intensity of light in the visible region drastically exceeds that of light in the ultraviolet region, an exposure time is limited to a range in which a sensitivity of light in the visible region is not saturated in a detection system, and thus there is concern that it may be difficult to obtain a required sensitivity of light in the ultraviolet region. For this reason, there is a demand for a technology capable of constituting a spectrum which is optimal for film thickness measurement.
The present disclosure has been made in order to resolve the foregoing problems, and an object thereof is to provide an optical unit capable of constituting a spectrum which is optimal for film thickness measurement, and a film thickness measurement device using this.
An optical unit according to an aspect of the present disclosure includes an input portion configured to have light having a wavelength extending from an ultraviolet region to a visible region input thereto, an optical system configured to condense the light in a state where a chromatic aberration is caused to occur, and an opening portion configured not to image light having a wavelength in the visible region and to image light having a wavelength in the ultraviolet region of the light having the chromatic aberration having occurred therein.
In this optical unit, a chromatic aberration is caused to occur in input light so that light having a wavelength in the visible region is not imaged and light having a wavelength in the ultraviolet region is imaged in the opening portion. In this optical unit, a spectral intensity in the ultraviolet region of light output from the opening portion can be relatively increased with respect to a spectral intensity in the visible region. Therefore, a sensitivity of light in the ultraviolet region required in a detection system is likely to be obtained so that a spectrum which is optimal for film thickness measurement can be constituted.
The optical system may further include a diffusion plate disposed along an optical axis of the light. When light having a wavelength in the ultraviolet region is imaged in the opening portion utilizing a chromatic aberration, in light in the visible region which is not imaged in the opening portion, only a component having a comparatively small numerical aperture is incident on the opening portion. For this reason, it is conceivable that a distribution of an emission angle for each wavelength of light output from the opening portion will greatly vary. In contrast, the distribution of the emission angle for each wavelength of light output from the opening portion can be made uniform by disposing the diffusion plate along the optical axis of light.
The diffusion plate may be disposed along the optical axis of the light between the optical system and the opening portion. In this case, a diffusion plate having a small size with respect to light condensed by the optical system can be disposed. Therefore, miniaturization of the optical unit can be achieved. In addition, a loss in quantity of light can be minimized by disposing the diffusion plate in the immediate vicinity of the opening portion.
The optical system may be configured to include a lens and a parabolic mirror. Occurrence of a greater chromatic aberration than necessary with respect to light having a wavelength in the ultraviolet region and the visible region can be curbed by combining the lens and the parabolic mirror.
The optical system may be configured to include a plane parallel plate or a wedge prism. Occurrence of a greater chromatic aberration than necessary with respect to light having a wavelength in the ultraviolet region and the visible region can be curbed by combining the plane parallel plate or the wedge prism and the parabolic mirror. When the plane parallel plate is used, a comparatively small chromatic aberration can be caused to occur. The wedge prism is significant when the numerical aperture for light is comparatively small.
The opening portion may be an input end toward an optical fiber. In this case, light in which the spectral intensity in the ultraviolet region is relatively increased with respect to the spectral intensity in the visible region can be introduced into the optical fiber.
The opening portion may be a pin hole. In this case, light in which the spectral intensity in the ultraviolet region is relatively increased with respect to the spectral intensity in the visible region can be taken out via the pin hole.
A film thickness measurement device according to another aspect of the present disclosure includes the foregoing optical unit, a light source configured to input light having a wavelength extending from an ultraviolet region to a visible region to the optical unit, a light guide portion configured to guide light output from the light source unit via the opening portion to a measurement object as measurement light, a detection portion configured to spectrally detect detected light from the measurement object, and an analysis portion configured to analyze a film thickness of the measurement object on the basis of detection results of the detection portion.
In this film thickness measurement device, light in which the spectral intensity in the ultraviolet region is relatively increased with respect to the spectral intensity in the visible region is output from the optical unit as the measurement light. Therefore, the sensitivity of light in the ultraviolet region required in the detection system is likely to be obtained so that a spectrum which is optimal for film thickness measurement can be constituted.
The light input from the light source to the optical unit may include a wavelength range of 200 nm to 300 nm. An amount of change in a reflectance spectrum with respect to the film thickness of a multilayer film tends to be larger in an ultraviolet region than in a visible region. Therefore, when light input from the light source to the optical unit includes the foregoing wavelength range, improvement of measurement accuracy can be achieved.
The light input from the light source to the optical unit may include a wavelength range of 300 nm to 800 nm. When light input from the light source to the optical unit includes the foregoing wavelength range, balance of an intensity spectrum of detected light can be maintained and improvement of measurement accuracy can be achieved.
The light input from the light source to the optical unit may include a wavelength range of 300 nm to 1,100 nm. When light input from the light source to the optical unit includes the foregoing wavelength range, balance of the intensity spectrum of detected light can be maintained and, improvement of measurement accuracy can be achieved.
According to the present disclosure, a spectrum which is optimal for film thickness measurement can be constituted.
Hereinafter, a preferable embodiment of a film thickness measurement device and a film thickness measurement method according to an aspect of the present invention will be described in detail with reference to the drawings.
As illustrated in
A display device 6 such as a monitor, and an input device 7 such as a keyboard, a mouse, and the like are connected to the control device 5. For example, the display device 6 displays a film thickness measured by the film thickness measurement device 1, set measurement conditions, and the like. In addition, the input device 7 executes various kinds of inputs such as an input for starting measurement and an input of measurement conditions with respect to the control device 5 on the basis of an operation of a user. The control device 5, the display device 6, and the input device 7 may be embedded into the film thickness measurement device 1 as constituents thereof.
As illustrated in
The optical unit 13 is a unit for adjusting a spectral intensity of the measurement light L1 output from the measurement head 11. This optical unit 13 has a function of relatively increasing the spectral intensity in the ultraviolet region of the measurement light L1 with respect to the spectral intensity in the visible region. The optical unit 13 will be described below in detail.
The detection portion 14 is a part for detecting detected light L2 from the measurement object S. For example, the detection portion 14 is constituted of a multi-channel-type spectral detector. For example, the detection portion 14 performs spectroscopy of the detected light L2 into each of wavelength components using a spectral element such as a grating or a prism and detects an intensity of light of each of the wavelengths subjected to spectroscopy using an optical sensor group. For example, the optical sensor group is constituted of a plurality of light receiving portions which are arrayed in a one-dimensional manner. The optical sensor group detects the intensity of light of each of the wavelength components in the detected light L2 using the light receiving portions corresponding to the respective wavelengths and outputs detection results to the analysis portion 15.
The light input/output portion 16 is a part for performing irradiation with the measurement light L1 and reception of the detected light L2 with respect to the measurement object S disposed inside the chamber 3 of the film formation device 2. For example, the light input/output portion 16 is optically connected to the optical unit 13 by an optical fiber 17 and is optically connected to the detection portion 14 by an optical fiber 18, and the light input/output portion 16 is disposed in the vicinity of a viewport 19 provided in the chamber 3 of the film formation device 2.
The measurement light L1 from the light input/output portion 16 is guided by the optical fiber 17 and is incident on the measurement object S through the viewport 19. The detected light L2 from the measurement object S is incident on the light input/output portion through the viewport 19. The detected light L2 incident on the light input/output portion 16 is guided by the optical fiber 18 and is incident on the detection portion 14. In the example in
The analysis portion 15 is a part for analyzing the film thickness of a film constituting the measurement object S. For example, similar to the control device 5, the analysis portion 15 may be constituted of a computer or may be constituted of an integrated circuit such as a field-programmable gate array (FPGA). When detection results of the intensity of light of each of the wavelength components of the detected light L2 are received from the detection portion 14, the analysis portion 15 analyzes each of the film thicknesses of the first films and the film thicknesses of the second films of the measurement object S on the basis of the detection results.
Subsequently, the foregoing optical unit 13 will be described in detail.
The optical system 22 is a part for condensing the measurement light L1 in a state where a chromatic aberration is caused to occur. In the example in
The measurement light L1 which has passed through the lens 26 is reflected by one parabolic mirror 27 and is collimated. The collimated measurement light L1 is reflected by the other parabolic mirror 27 and is condensed toward the measurement output portion 24. The beam splitter 28 is disposed along an optical axis of the measurement light L1 from the other parabolic mirror 27 toward the measurement output portion 24 and reflects a part of the measurement light L1 toward the monitor output portion 23. A reflectance of the beam splitter 28 is 8%, for example, due to surface reflection of an uncoated glass. The reflectance of the beam splitter 28 may be further increased by means of coating with chromium or the like. For example, a part of the measurement light L1 output from the monitor output portion 23 is utilized for drift correction of the light source 12. The rest of the measurement light L1 which has been transmitted through the beam splitter 28 passes through the diffusion plate 29 and then is incident on the measurement output portion 24. The measurement light L1 output from the measurement output portion 24 is incident on the optical fiber 17 (refer to
The measurement output portion 24 has an opening portion 31 for imaging the measurement light L1. In the present embodiment, the measurement output portion 24 is a connector to which the optical fiber 17 is connected. As illustrated in
Accordingly, in the measurement light L1 output from the measurement output portion 24, the spectral intensity in the ultraviolet region is relatively increased with respect to the spectral intensity in the visible region.
As illustrated in
As in the present embodiment, in a form in which the measurement light L1 from the optical unit 13 is guided to the light input/output portion 16 by the optical fiber 17, it is assumed that vibration is applied to the optical fiber 17. In this case, it is conceivable that the balance of the spectral intensity of the detected light L2 ultimately detected by the detection portion 14 change and an error in film thickness measurement increase. In contrast, when a diffusion plate is disposed along the optical axis of the measurement light L1, as illustrated in
As described above, in the optical unit 13 and the film thickness measurement device 1 using this, a chromatic aberration is caused to occur in the input measurement light L1, and the light La having a wavelength in the visible region is not imaged and the light Lb having a wavelength in the ultraviolet region is imaged in the opening portion 31. In this optical unit 13, the spectral intensity in the ultraviolet region of light output from the opening portion 31 can be relatively increased with respect to the spectral intensity in the visible region. Therefore, a sensitivity of light in the ultraviolet region required in a detection system is likely to be obtained so that a spectrum which is optimal for film thickness measurement can be constituted.
Regarding a technique of relatively increasing the spectral intensity in the ultraviolet region of light with respect to the spectral intensity in the visible region, a technique of causing the measurement light L1 to pass through a filter can also be considered. However, for example, when a dielectric multilayer film filter is used, in film design in which a transmittance of light having a wavelength in the visible region is actively reduced, a coating substance having absorbability with respect to light in the vicinity of a wavelength 200 nm has to be used so that it is difficult to reduce only the spectral intensity in the visible region. In addition, when an absorption filter is used, at present, there is no filter having properties of reducing only the transmittance of light in the visible region without reducing the transmittance of light in the vicinity of the wavelength 200 nm. Therefore, a technique of using a chromatic aberration as in the optical unit 13 becomes significant in relatively increasing the spectral intensity in the ultraviolet region of light with respect to the spectral intensity in the visible region.
In addition, in the optical unit 13 and the film thickness measurement device 1, the optical system 22 includes the diffusion plate 29 disposed along the optical axis of the measurement light L1. The distribution of the emission angle for each wavelength of the measurement light L1 output from the opening portion 31 can be made uniform by disposing this diffusion plate 29. Therefore, occurrence of change in the balance of the spectral intensity of the detected light L2 ultimately detected by the detection portion 14 can be curbed, and increase of an error in film thickness measurement can be avoided. In the present embodiment, the diffusion plate 29 is disposed along the optical axis of the measurement light L1 between the optical system 22 and the opening portion 31. Accordingly, a small-sized diffusion plate 29 with respect to the measurement light L1 condensed by the optical system 22 can be disposed. Therefore, miniaturization of the optical unit 13 can be achieved. In addition, a loss in quantity of light can be minimized by disposing the diffusion plate 29 in the immediate vicinity of the opening portion 31. The diffusion plate 29 is not necessarily disposed between the optical system 22 and the opening portion 31. The diffusion plate 29 may be disposed in a latter stage of the output end 17b of the optical fiber 17.
In addition, in the optical unit 13 and the film thickness measurement device 1, the optical system 22 is constituted to include the lens 26 and the parabolic mirrors 27. An optical system constituted of only a lens is generally adopted for light in the visible region. However, when dealing with light having a wavelength extending from the ultraviolet region to the visible region, it is conceivable that a greater chromatic aberration than necessary will occur. Therefore, occurrence of a greater chromatic aberration than necessary with respect to the measurement light L1 having a wavelength in the ultraviolet region and the visible region can be curbed by combining the lens 26 and the parabolic mirrors 27 as in the optical unit 13 and the film thickness measurement device 1.
In addition, in the optical unit 13 and the film thickness measurement device 1, the opening portion 31 is constituted of the input end 17a toward the optical fiber 17. In this case, the measurement light L1 of which the spectral intensity in the ultraviolet region is relatively increased with respect to the spectral intensity in the visible region can be introduced into the optical fiber 17.
The present disclosure is not limited to the foregoing embodiment. For example, in the foregoing embodiment, the optical system 22 is constituted to include the lens 26 and the parabolic mirrors 27. However, as illustrated in
In addition, as illustrated in
There is a need for the lens 26, the diffusion plate 29, the plane parallel plate 41, and the wedge prism 42 described above to be formed of materials having transmission properties with respect to ultraviolet light. Examples of such a material include synthetic quartz, calcium fluoride, magnesium fluoride, and sapphire.
In addition, in the foregoing embodiment, for example, the light source 12 is constituted of a light source device which outputs white light including a wavelength in the ultraviolet region (200 nm to 300 nm) and a wavelength in the visible region (300 nm to 800 nm). However, for example, the light source 12 may be constituted of a light source device which outputs white light including a wavelength in the ultraviolet region (200 nm to 300 nm) and a wavelength extending from the visible region to a near infrared region (300 nm to 1,100 nm). That is, the optical unit 13 may be constituted to include the input portion 21 to which the measurement light L1 having a wavelength extending from the ultraviolet region to the near infrared region is input, the optical system 22 which condenses the measurement light L1 in a state where a chromatic aberration is caused to occur, and the opening portion 31 which does not image light La′ having a wavelength extending from the visible region to the near infrared region and images the light Lb having a wavelength in the ultraviolet region of the measurement light L1 having a chromatic aberration having occurred therein. Also in such a constitution, the spectral intensity in the ultraviolet region of light output from the opening portion 31 can be relatively increased with respect to the spectral intensity from the visible region to the near infrared region. Therefore, the sensitivity of light in the ultraviolet region required in the detection system is likely to be obtained so that a spectrum which is optimal for film thickness measurement can be constituted.
The film thickness measurement device 1 is constituted as an in-line film thickness monitor in the film formation device 2, space saving of the device is required. For this reason, it is important to make the optical unit 13 applied to the film thickness measurement device 1 be further miniaturized. Hereinafter, examples of constitutions of the optical units 13 (13A to 13D) aiming at miniaturization will be described.
As illustrated in
The measurement light L1 output from the light source 12 is guided to the optical unit 13A by the optical fiber 54 and is transmitted through the beam splitter 51 and the lens 52. A chromatic aberration occurs in the measurement light L1 which has passed through the lens 52 due to dispersion of the lens material. Thereafter, the measurement light L1 is reflected by the ellipsoidal mirror 53 and is incident on the beam splitter 51 again. A part of the measurement light L1 is reflected by the beam splitter 51 and is incident on the optical fiber 55 serving as the monitor output portion 23. The rest of the measurement light L1 is transmitted through the beam splitter 51 and is incident on the optical fiber 56 serving as the measurement output portion 24. An input end of the optical fiber 55 does not image the light La having a wavelength in the visible region and images the light Lb having a wavelength in the ultraviolet region of the measurement light L1 having a chromatic aberration having occurred therein. Similarly, an input end 56a of the optical fiber 56 (opening portion 31) does not image the light La having a wavelength in the visible region and images the light Lb having a wavelength in the ultraviolet region of the measurement light L1 having a chromatic aberration having occurred therein.
Also in such an optical unit 13A, the spectral intensity in the ultraviolet region of light output from the opening portion 31 can be relatively increased with respect to the spectral intensity in the visible region. Therefore, the sensitivity of light in the ultraviolet region required in the detection system is likely to be obtained so that a spectrum which is optimal for film thickness measurement can be constituted. In addition, due to miniaturization of the optical unit 13A, space saving of the device when used as an in-line film thickness monitor in the film formation device can be achieved.
As illustrated in
The measurement light L1 output from one of the branched optical fibers 54 passes through the lens 52 in the unit of the monitor output portion 23, is reflected by the ellipsoidal mirror 53 in a state where a chromatic aberration has occurred, and then is incident on the optical fiber 55 serving as the monitor output portion 23. The measurement light L1 output from the other of the branched optical fibers 54 passes through the lens 52 in the unit of the measurement output portion 24, is reflected by the ellipsoidal mirror 53 in a state where a chromatic aberration has occurred, and then is incident on the optical fiber 56 serving as the measurement output portion 24. The input end of the optical fiber 55 does not image the light La having a wavelength in the visible region and images the light Lb having a wavelength in the ultraviolet region of the measurement light L1 having a chromatic aberration having occurred therein. Similarly, the input end 56a of the optical fiber 56 (opening portion 31) does not image the light La having a wavelength in the visible region and images the light Lb having a wavelength in the ultraviolet region of the measurement light L1 having a chromatic aberration having occurred therein.
Also in such an optical unit 13B, the spectral intensity in the ultraviolet region of light output from the opening portion 31 can be relatively increased with respect to the spectral intensity in the visible region. Therefore, the sensitivity of light in the ultraviolet region required in the detection system is likely to be obtained so that a spectrum which is optimal for film thickness measurement can be constituted. In addition, due to miniaturization of the optical unit 13B, space saving of the device when used as an in-line film thickness monitor in the film formation device can be achieved. In this optical unit 13B, although there is a need to dispose an optical component constituting the optical system 22 in each of the optical system 22 of the unit of the monitor output portion 23 and the optical system 22 of the unit of the measurement output portion 24, since the beam splitter 51 is not required, the optical system 22 of each unit can be simplified, and thus easiness of manufacturing can be enhanced.
As illustrated in
The measurement light L1 output from the light source 12 passes through the lens 52, is reflected by the ellipsoidal mirror 53 in a state where a chromatic aberration has occurred, and then is incident on the optical fiber 56 serving as the measurement output portion 24. The input end 56a of the optical fiber 56 (opening portion 31) does not image the light La having a wavelength in the visible region and images the light Lb having a wavelength in the ultraviolet region of the measurement light L1 having a chromatic aberration having occurred therein. In the ellipsoidal mirror 53, a part of the measurement light L1 passes through the hole portion 53a and is incident on the optical fiber 55 serving as the monitor output portion 23.
Also in such an optical unit 13C, the spectral intensity in the ultraviolet region of light output from the opening portion 31 can be relatively increased with respect to the spectral intensity in the visible region. Therefore, the sensitivity of light in the ultraviolet region required in the detection system is likely to be obtained so that a spectrum which is optimal for film thickness measurement can be constituted. In addition, due to miniaturization of the optical unit 13C, space saving of the device when used as an in-line film thickness monitor in the film formation device can be achieved. In the optical unit 13C, the spectral intensity in the ultraviolet region is relatively increased in only the measurement output portion 24. However, depending on the purpose of the optical unit 13C, this constitution can be employed when relative increase of the spectral intensity in the ultraviolet region in the monitor output portion 23 is not required. When the diffusion plate 29 is disposed between the ellipsoidal mirror 53 and the optical fiber 55, a monitor signal can be made stable.
As illustrated in
In addition, the optical fiber 56 constituting the measurement output portion 24 in a direction in which it faces the parabolic mirror 58 is inserted into the center on the reflection surface in the parabolic mirror 57. The input end 56a of the optical fiber 56 (opening portion 31) is in a state of being exposed on the reflection surface of the parabolic mirror 57 at a position adjacent to the hole portion 57a. A shutter for switching between ON and OFF of the measurement light L1 may be disposed between the parabolic mirror 57 and the parabolic mirror 58 and between the parabolic mirror 57 and the optical fiber 55.
The measurement light L1 output from the light source 12 is guided into the optical unit 13D via the input portion 21 and is transmitted through the lens 52. A chromatic aberration occurs in the measurement light L1 which has passed through the lens 52 due to dispersion of the lens material. Thereafter, a part of the measurement light L1 passes through the hole portion 57a from the reflection surface of the parabolic mirror 57 and is incident on the optical fiber 55 serving as the monitor output portion 23. The rest of the measurement light L1 is collimated by the parabolic mirror 57 and is reflected by the parabolic mirror 58. The rest of the measurement light L1 which has been reflected by the parabolic mirror 58 and has returned to the parabolic mirror 57 is incident on the optical fiber 56 serving as the measurement output portion 24 on the reflection surface of the parabolic mirror 57. The input end 56a of the optical fiber 56 (opening portion 31) does not image the light La having a wavelength in the visible region and images the light Lb having a wavelength in the ultraviolet region of the measurement light L1 having a chromatic aberration having occurred therein.
Also in such an optical unit 13D, the spectral intensity in the ultraviolet region of light output from the opening portion 31 can be relatively increased with respect to the spectral intensity in the visible region. Therefore, the sensitivity of light in the ultraviolet region required in the detection system is likely to be obtained so that a spectrum which is optimal for film thickness measurement can be constituted. In addition, due to miniaturization of the optical unit 13D, even when the head output-type light source 12 is used, space saving of the device when used as an in-line film thickness monitor in the film formation device can be achieved. In the optical unit 13D, the spectral intensity in the ultraviolet region is relatively increased in only the signal output portion 24. However, depending on the purpose of the optical unit 13D, this constitution can be employed when relative increase of the spectral intensity in the ultraviolet region in the monitor output portion 23 is not required. When the diffusion plate 29 is disposed between the parabolic mirror 57 and the optical fiber 55, a monitor signal can be made stable.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2019-213046 | Nov 2019 | JP | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/JP2020/032919 | 8/31/2020 | WO |
