Ayazi et al., “High aspect-ratio polysilicon micromachining technology,” Sensors and Actuators 87 (2000) 46-51. |
Denisse et al., “Plasma-enhanced growth and composition of silicon oxynitride films,” J. Appl. Phys. 60 (7), Oct. 1, 1986, pp. 2536-2542. |
Eldada et al., “Thermooptic Planar Polymer Bragg Grating OADM's with Broad Tuning Range,” IEEE Photonics Technology Letters, vol. 11, No. 4, Apr. 1999, pp. 448-450. |
Fardad et al., “UV-light imprinted Bragg grating in sol-gel ridge glass waveguide with almost 100% reflectivity,” Electronics Letters, Jun. 5, 1997, vol. 33, No. 12. pp. 1069-1070. |
Giles, “Lightwave Applications of Fiber Bragg Gratings,” Journal of Lightwave Technology, vol. 15, No. 8, Aug. 1997, pp. 1391-1403. |
Goh et al., “High-Extinction Ratio and Low-Loss Silica-Based 8×8 Strictly Nonblocking Thermooptic Matrix Switch,” Journal of Lightwave Technology, vol. 17, No. 7, Jul. 1999, pp. 1192-1199. |
Hibino et al., “Temperature-insensitive UV-induced Bragg gratings in silica-based planar lightwave circuits on Si,” Electronics Letters, Oct. 14, 1999, vol. 35, No. 21, pp. 1844-1845. |
Itoh et al., “Low-Loss 1.5% Δ Arrayed Waveguide Grating with Spot-Size Converters,” NTT Photonics Laboratories, 2 pages. |
Kashyap et al., “Laser-Trimmed Four-Port Bandpass Filter Fabricated in Single-Mode Photosensitive Ge-Doped Planar Waveguide,” IEEE Photonics Technology Letters, vol. 5, No. 2, Feb. 1993, pp. 191-194. |
Kitagawa et al., “Single-frequency Er3+-doped silica-based planar waveguide laser with integrated photo-imprinted Bragg reflectors,” Electronics Letters, Aug. 4, 1994, vol. 30, No. 16, pp. 1311-1312. |
Kohnke et al, “Planar waveguide Mach-Zender bandpass filter fabricated with single exposure UV-induced gratings,” OFC '96 Technical Digest, p. 277. |
Mahorowala et al., “In Situ Measurement of RIE Lag during Polysilicon Etching in a Lam TCP using Full Waver Interferometry,” http://www.plasma-processing.com/insitu.htm, 12 pages. |
Maxwell et al., “UV Written 13 dB Reflection Filters in Hydrogenated Low Loss Planar Silica Waveguides,” Electronics Letters, Mar. 4, 1993, vol. 29, No. 5, pp. 425-426. |
Miya et al., “Silica-Based Planar Lightwave Circuits: Passive and Thermally Active Devices,” IEEE Journal of Selected Topics in Quantum Elecrtronics, vol. 6, No. 1, Jan./Feb. 2000, pp. 38-45. |
Moerman et al., “A Review on Fabrication Technologies for the Monolithic Integration of Tapers with III-V Semiconductor Devices,” IEEE Journal of Selected Topics in Quantum Electronics, vol. 3, No. 6, Dec. 1997, pp. 1308-1320. |
Okamoto, “Bringing Telecom Networks up to Speed,” Circuits and Devices, Sep. 1998, pp. 26-34. |
Singh et al., “Apodized Fiber Gratings for DWDM Using Variable Efficiency Phase Masks,” pp. 76-77. |
Takahashi et al., “A 2.5 Gb/s, 4-Channel Multiwavelength Light Source composed of UV Written Waveguide Gratings and Laser Diodes Integrated on Si,” ECOC 97, Sep. 22-25, 1997, pp. 355-358. |
Westerheim et al., “Substrate bias effects in high-aspect-ratio SiO2 contact etching using an inductively coupled plasma reactor,” J. Vac. Sci. Technol. A 13(3), May/Jun. 1995, pp. 853-858. |
White, “Integrated Components for Optical Add/Drop,” 29 pages. |
Yonemura et al., “Session FT3—Inductively Coupled Plasmas I.,” http://www.aps.org/BAPSGEC98/abs/S2000.html, 4 pages. |