1. Field of the Invention
The present invention relates to the field of piezoelectric resonators.
2. Prior Art
Piezoelectric resonators are primarily used for signal filtering and reference oscillators. These resonators are commonly referred to as FBAR (film bulk acoustic resonators) or BAW (bulk acoustic wave resonators).
The resonator consists of piezoelectric material (i.e., aluminum nitride, AlN) sandwiched between two electrodes as shown in
Bragg mirrors have been developed in both microwave and optical applications to create a high reflection coefficient at a specified interface. In the case of the BAW resonator, the interface of interest is between the bottom electrode of the BAW resonator and the top of the Bragg mirror stack. An ideal Bragg mirror stack would create a unity reflection coefficient at this interface and perfectly isolate the BAW resonator from the substrate. In that case the substrate (typically silicon) would have no influence on the performance of the BAW resonator. This is not achievable in practice, since for an acceptable level of isolation (i.e., nominally 99% or better reflection coefficient) at the interface, several layers of high and low impedance materials (also called bi-layers) are required, which is generally not practical from a processing or cost standpoint. Typically only 2 to 3 bi-layers are practical, which allows some leakage of acoustic energy into the substrate that manifests itself as loss in the passband. Of interest to this invention is that when the substrate is an odd multiple of quarter wavelengths thick, it can present a boundary condition at the bottom of the Bragg mirror stack that will cause the required reflection condition to fail, causing ripples in the passband. These ripples are harmonically related to the substrate thickness T. Both of these phenomena are shown in
Referring to
It has been proposed that BAW resonator performance can be improved by roughening the substrate backside, by either mechanical or chemical means (See “Face-mounted piezoelectric resonators”, W. E. Newell, Proc. IEEE, Vol. 53, June 1965, Pgs. 575-581 and U.S. Pat. No. 5,373,268) and/or adding an epoxy (See “Face-mounted piezoelectric resonators”, W. E. Newell, Proc. IEEE, Vol. 53, June 1965, Pgs. 575-581) or other material to that rough backside as shown in
A typical BAW resonator and Bragg mirror on a substrate is shown in
In
This is shown
To reduce passband ripple, the substrate backside can be coated with a lossy material preferably having an acoustic impedance in the range of 0.01× to 1.0× that of the acoustic impedance of the high impedance Bragg mirror layer. This prevents a condition that causes the Bragg mirror to not function correctly, as subsequently described. To accomplish this, the material, such as epoxy, is bonded to a polished substrate backside as shown in
When Tungsten is the Bragg mirror high impedance layer (101×106 kg/m2s), the material applied to the polished substrate backside preferably should have an acoustic impedance in the range of 1−100×106 kg/m2s. In the following examples, an epoxy is used that has an acoustic impedance of approximately 2.4×106 kg/m2s, which satisfies this condition.
Reduction of passband ripple after epoxy is applied is shown in
Thinning the wafer improves the effectiveness of the epoxy on suppression of passband ripple. This is illustrated by an example of suppressing ripple in the transmission coefficient S21 for a BAW filter on a thick wafer (725 μm) as shown in
The following description is to provide a better understanding of the various aspects of the invention. The generic structure of a BAW resonator on a Bragg mirror on a substrate is shown in
To understand the operation of this invention, consider the basic BAW resonator shown in
In a practical BAW resonator this requirement for R≈−1 is easily accomplished for the top electrode by having air as the load impedance, but requires a Bragg mirror (See FIG. 12) to achieve this condition for the bottom electrode in an SMR (solidly mounted resonator) BAW by generating the virtual low impedance Zn. To accomplish this, the acoustic load impedance Zload should be lower than the acoustic impedance of the high acoustic impedance Bragg mirror layers (i.e., tungsten, W, with an acoustic impedance of 101×106 kg/m2s).
To understand the operation of the Bragg mirror, start with the transmission line impedance equation that computes the input impedance Zi for a section of transmission line of phase shift θi, with characteristic impedance Zi and terminating impedance Zi-1:
Where:
Where:
The reflection coefficient R at the top surface of the Bragg mirror is computed using the standard equation:
Where:
Zp is the acoustic impedance of the piezoelectric (AlN) material.
Zn is the acoustic impedance at the top surface of layer n, which is adjacent to the bottom of the piezoelectric (AlN) layer. For simplicity, the electrodes may be ignored, so assume that the bottom of the AlN piezoelectric layer is in contact with the top of the Bragg mirror.
The above equations are used to compute the reflection coefficient R at the top of the Bragg mirror for the longitudinal wave mode using the acoustic impedances and velocities listed in Table 1.
To meet the requirement that the substrate have a lower acoustic impedance than the Bragg mirror high acoustic impedance layer (W in this case), it is typically assumed that the substrate is silicon and infinitely thick. At frequencies where the low and high impedance layers in the Bragg mirror are a quarter wavelength thick (λL/4) for the longitudinal mode, as shown in
For a finite thickness substrate (with acoustic impedance Zsub) there are frequencies where the substrate thickness T is equal to odd multiples of a longitudinal mode quarter wavelength. When this happens the acoustic impedance of the substrate backside Zbackside will be transformed into an acoustic load impedance Zload at the bottom of the Bragg mirror given by:
Zload=Zsub2/Zbackside
1. The bottom electrode reflection coefficient (R=0.975) is not of the same sign as the top electrode reflection coefficient (R≈−1). This does not satisfy the necessary boundary condition for proper operation of the BAW resonator.
2. The reflection coefficient is not large enough in magnitude (i.e., >0.99) to prevent leakage from the resonator into the Bragg mirror.
This condition will cause ripples in the BAW resonator response, and they will occur at frequencies where the substrate thickness T is an odd multiple of a quarter wavelength, as given by:
For example, for silicon vsub=8847 (m/s) and T=725 μm, then freq=(2n+1)3.05 MHz, which means that the ripples will occur every 6.1 MHz as shown in
In summary, the acoustic impedance of the material applied to the polished backside should be on the order of 0.01× to 1.0× that of the acoustic impedance of the high impedance Bragg mirror layer. In this example where Tungsten is the high impedance layer, the acoustic impedance of the material applied to the polished substrate backside should range from 1−100×106 kg/m2s. In the data shown, the impedance of the epoxy used was approximately 2.4×106 kg/m2s, which satisfies this condition.
The invention solves the inherent problem of passband ripple in BAW resonators and BAW filters caused by longitudinal modes resonating in the finite thickness BAW resonator substrate. The consequence of this achievement is improved passband linearity, reduced phase dispersion, and adherence to passband insertion loss (I.L.) specifications through elimination of dips in passband.
Thus while certain preferred embodiments of the present invention have been disclosed and described herein for purposes of illustration and not for purposes of limitation, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention.
Number | Name | Date | Kind |
---|---|---|---|
5325012 | Sato et al. | Jun 1994 | A |
5373268 | Dworsky et al. | Dec 1994 | A |
6060818 | Ruby et al. | May 2000 | A |
6239536 | Lakin | May 2001 | B1 |
6291931 | Lakin | Sep 2001 | B1 |
6480074 | Kaitila et al. | Nov 2002 | B1 |
6577043 | Tsukai et al. | Jun 2003 | B2 |
6878604 | Aigner et al. | Apr 2005 | B2 |
6943647 | Aigner et al. | Sep 2005 | B2 |
7002437 | Takeuchi et al. | Feb 2006 | B2 |
7221242 | Asai et al. | May 2007 | B2 |
7463117 | Ohara et al. | Dec 2008 | B2 |
7466213 | Lobl et al. | Dec 2008 | B2 |
7554426 | Lee et al. | Jun 2009 | B2 |
7612488 | Bouche et al. | Nov 2009 | B1 |
20010008205 | Wilke et al. | Jul 2001 | A1 |
20020030420 | Tsukai et al. | Mar 2002 | A1 |
20020084873 | Ella et al. | Jul 2002 | A1 |
20030087177 | Miyamoto et al. | May 2003 | A1 |
20030199105 | Kub et al. | Oct 2003 | A1 |
20040140869 | Marksteiner et al. | Jul 2004 | A1 |
20040146264 | Auner et al. | Jul 2004 | A1 |
20040212277 | Stommer | Oct 2004 | A1 |
20040227591 | Aigner et al. | Nov 2004 | A1 |
20050073027 | Irikura et al. | Apr 2005 | A1 |
20050093157 | Noguchi et al. | May 2005 | A1 |
20060043507 | Lobl et al. | Mar 2006 | A1 |
20060202779 | Fazzio et al. | Sep 2006 | A1 |
20080042780 | Lee et al. | Feb 2008 | A1 |
20080150653 | Hara et al. | Jun 2008 | A1 |
Number | Date | Country |
---|---|---|
0 609 555 | Aug 1994 | EP |
0 771 070 | May 1997 | EP |
1 418 671 | May 2004 | EP |
1 748 556 | Jan 2007 | EP |
WO-03006701 | Jan 2003 | WO |
WO-2006004470 | Jan 2006 | WO |
WO-2006101450 | Sep 2006 | WO |
Entry |
---|
Loebl et al. “low-level effects in sbars and their applicatin to device optimisation” IEEE Ultrasonics Symposium 2003. |
“International Search Report and Written Opinion of the International Searching Authority Dated Nov. 14, 2008”, International Application No. PCT/US2008/008527. |
“International Search Report and Written Opinion of the International Searching Authority Dated Nov. 7, 2008”, International Application No. PCT/US2008/007282. |
“International Search Report and Written Opinion of the International Searching Authority Dated Sep. 8, 2008”, International Application No. PCT/US2008/005628. |
Auner, G. W., et al., “Microstructure of low temperature grown AlN thin films on Si (111)”, Journal of Applied Physics, vol. 85, No. 11, (Jun. 1, 1999), pp. 7879-7883. |
Fattinger, G.G. , et al., “Optimization of Acoustic Dispersion for High Performance Thin Film BAW Resonators”, IEEE Ultrasonics Symposium, (2005), pp. 1175-1178. |
Kaitila, J., et al., “Spurious Resonance Free Bulk Acoustic Wave Resonators”, IEEE Ultrasonics Symposium, (2003), pp. 84-87. |
Loebl, H.P., et al., “Low-Level Effects in Sbars and Their Application to Device Optimisation”, IEEE Ultrasonics Symposium, (2003), pp. 182-186. |
Loebl, H.P., et al., “RF Bulk Acoustic Wave Resonators and Filters”, Journal of Electroceramics, No. 12, (2004), pp. 109-118. |
Park, Jae Y., et al., “Micromachined FBAR RF Filters for Advanced Handset Applications”, 12th International Conference on Solid State Sensors, Actuators and Microsystems, (2003), pp. 911-914. |
Pensala, Tuomas , et al., “Spurious resonance suppression in ZnO based thin-film BAW resonators: FEM modeling and experiment”, IEEE Ultrasonics Symposium, (2005), pp. 1844-1847. |
Schmidhammer, Edgar , et al., “High Volume Production of a fully matched 5050 PCS-CDMA-BAW Duplexer”, IEEE Ultrasonics Symposium, (2006), pp. 329-332. |
Ueda, Masanori , et al., “High-Q Resonators using FBAR/SAW Technology and their Applications”, IEEE, (2005), 4 pgs. |
W. E. Newell, “Face-Mounted Piezoelectric Resonators”, Proceedings of the IEEE, Jun. 1965, pp. 575-581, vol. 53. |
K.M. Lakin et al., “Stacked Crystal Filters Implemented with Thin Films”, 43rd Annual Symposium on Frequency Control, May 1989, pp. 536-543. |
R. Aigner et al., “Advancement of MEMS into RF-Filter Applications”, Proceedings of the IEDM, Dec. 2002, pp. 897-900. |
Lakin, K.M. and Lakin K. G., Numerical Analysis of Thin Film BAW Resonators, IEEE 2003 Ultrasonics Symposium, Oct. 5-8, Paper 4A-3, TFR Technologies, Inc., Sep. 27, 2003. |
Number | Date | Country | |
---|---|---|---|
20090142480 A1 | Jun 2009 | US |