The present invention provides an organic EL element on which a protective film, which can be thickened and has a high barrier property, can be formed with high productivity, and a method of manufacturing the same. An organic electroluminescence element having a substrate 1, a first electrode 2 provided thereon, an organic luminescent layer 3, a second electrode 4, and a protective film 5 in this order, wherein the protective film 5 is formed with carbon-containing silicon nitride (SiNxCy), and the carbon content in the protective film 5 is continuously altered. The protective film of the element is formed by using an organic silicon compound, and nitrogen and hydrogen as a source gas, with a plasma CVD method while altering the voltage.
Description
BRIEF DESCRIPTION OF DRAWINGS
FIG. 1 shows a cross-sectional view for illustrating one example of the organic EL element of the present invention.
Claims
1. An organic electroluminescence element comprising a substrate, a first electrode provided on the substrate, an organic luminescent layer, a second electrode, and a protective film in this order, wherein the protective film is formed with carbon-containing silicon nitride (SiNxCy), and the carbon content in the protective film is continuously altered.
2. The organic electroluminescence element according to claim 1 wherein the carbon content included in the protective film varies to be high on the second electrode side and be reduced as the distance from the second electrode increases.
3. The organic electroluminescence element according to claim 1 wherein the protective film comprises: a layer having the amount of nitrogen and carbon included in the carbon-containing silicon nitride (SiNxCy) which constitutes the protective film falling within the range of
1.0≦x≦1.4, and0.2≦y≦0.4;and a layer having the amount thereof falling within the range of0.4≦x≦1.0, and0.4<y<1.0.
4. The organic electroluminescence element according to claim 1 wherein a sealing substrate is further provided on the protective film.
5. A method of manufacturing an organic electroluminescence element comprising a substrate, a first electrode provided on the substrate, an organic luminescent layer, a second electrode, and a protective film in this order, wherein
the method comprises:forming at least the first electrode, the organic luminescent layer and the second electrode on the substrate; andforming the protective film on the second electrode, and whereinforming the protective film on the second electrode comprisesusing an organic silicon compound, either one or both of ammonia and nitrogen, and hydrogen as a source gas, andforming by a plasma CVD method a carbon-containing silicon nitride thin film which can be represented by the chemical formula: SiNxCy.
6. A method of manufacturing an organic electroluminescence element comprising a substrate, a first electrode provided on the substrate, an organic luminescent layer, a second electrode, and a protective film in this order, wherein
the method comprises:forming at least the first electrode, the organic luminescent layer and the second electrode on the substrate; andforming the protective film on the second electrode, and whereinforming the protective film on the second electrode comprisesusing silane, either one or both of ammonia and nitrogen, hydrogen, and a carbon-containing gas as a source gas, andforming by a plasma CVD method a carbon-containing silicon nitride thin film which can be represented by the chemical formula: SiNxCy while altering the content of the carbon-containing gas.