The present disclosure generally relates to organometallic compounds and formulations and their various uses including as emitters in devices such as organic light emitting diodes and related electronic devices.
Opto-electronic devices that make use of organic materials are becoming increasingly desirable for various reasons.
Many of the materials used to make such devices are relatively inexpensive, so organic opto-electronic devices have the potential for cost advantages over inorganic devices. In addition, the inherent properties of organic materials, such as their flexibility, may make them well suited for particular applications such as fabrication on a flexible substrate. Examples of organic opto-electronic devices include organic light emitting diodes/devices (OLEDs), organic phototransistors, organic photovoltaic cells, and organic photodetectors. For OLEDs, the organic materials may have performance advantages over conventional materials.
OLEDs make use of thin organic films that emit light when voltage is applied across the device. OLEDs are becoming an increasingly interesting technology for use in applications such as flat panel displays, illumination, and backlighting.
One application for phosphorescent emissive molecules is a full color display. Industry standards for such a display call for pixels adapted to emit particular colors, referred to as “saturated” colors. In particular, these standards call for saturated red, green, and blue pixels. Alternatively, the OLED can be designed to emit white light. In conventional liquid crystal displays emission from a white backlight is filtered using absorption filters to produce red, green and blue emission. The same technique can also be used with OLEDs. The white OLED can be either a single emissive layer (EML) device or a stack structure. Color may be measured using CIE coordinates, which are well known to the art.
In one aspect, the present disclosure provides a compound comprising a first ligand LA of Formula I:
In another aspect, the present disclosure provides a formulation including a compound comprising a first ligand LA of Formula I as described herein.
In yet another aspect, the present disclosure provides an OLED having an organic layer comprising a compound comprising a first ligand LA of Formula I as described herein.
In yet another aspect, the present disclosure provides a consumer product comprising an OLED with an organic layer comprising a compound comprising a first ligand LA of Formula I as described herein.
Unless otherwise specified, the below terms used herein are defined as follows:
As used herein, the term “organic” includes polymeric materials as well as small molecule organic materials that may be used to fabricate organic opto-electronic devices. “Small molecule” refers to any organic material that is not a polymer, and “small molecules” may actually be quite large. Small molecules may include repeat units in some circumstances. For example, using a long chain alkyl group as a substituent does not remove a molecule from the “small molecule” class. Small molecules may also be incorporated into polymers, for example as a pendent group on a polymer backbone or as a part of the backbone. Small molecules may also serve as the core moiety of a dendrimer, which consists of a series of chemical shells built on the core moiety. The core moiety of a dendrimer may be a fluorescent or phosphorescent small molecule emitter. A dendrimer may be a “small molecule,” and it is believed that all dendrimers currently used in the field of OLEDs are small molecules.
As used herein, “top” means furthest away from the substrate, while “bottom” means closest to the substrate. Where a first layer is described as “disposed over” a second layer, the first layer is disposed further away from substrate. There may be other layers between the first and second layer, unless it is specified that the first layer is “in contact with” the second layer. For example, a cathode may be described as “disposed over” an anode, even though there are various organic layers in between.
As used herein, “solution processable” means capable of being dissolved, dispersed, or transported in and/or deposited from a liquid medium, either in solution or suspension form.
A ligand may be referred to as “photoactive” when it is believed that the ligand directly contributes to the photoactive properties of an emissive material. A ligand may be referred to as “ancillary” when it is believed that the ligand does not contribute to the photoactive properties of an emissive material, although an ancillary ligand may alter the properties of a photoactive ligand.
As used herein, and as would be generally understood by one skilled in the art, a first “Highest Occupied Molecular Orbital” (HOMO) or “Lowest Unoccupied Molecular Orbital” (LUMO) energy level is “greater than” or “higher than” a second HOMO or LUMO energy level if the first energy level is closer to the vacuum energy level. Since ionization potentials (IP) are measured as a negative energy relative to a vacuum level, a higher HOMO energy level corresponds to an IP having a smaller absolute value (an IP that is less negative). Similarly, a higher LUMO energy level corresponds to an electron affinity (EA) having a smaller absolute value (an EA that is less negative). On a conventional energy level diagram, with the vacuum level at the top, the LUMO energy level of a material is higher than the HOMO energy level of the same material. A “higher” HOMO or LUMO energy level appears closer to the top of such a diagram than a “lower” HOMO or LUMO energy level.
As used herein, and as would be generally understood by one skilled in the art, a first work function is “greater than” or “higher than” a second work function if the first work function has a higher absolute value. Because work functions are generally measured as negative numbers relative to vacuum level, this means that a “higher” work function is more negative. On a conventional energy level diagram, with the vacuum level at the top, a “higher” work function is illustrated as further away from the vacuum level in the downward direction. Thus, the definitions of HOMO and LUMO energy levels follow a different convention than work functions.
The terms “halo,” “halogen,” and “halide” are used interchangeably and refer to fluorine, chlorine, bromine, and iodine.
The term “acyl” refers to a substituted carbonyl radical (C(O)—Rs).
The term “ester” refers to a substituted oxycarbonyl (—O—C(O)—Rs or —C(O)—O—Rs) radical.
The term “ether” refers to an —ORs radical.
The terms “sulfanyl” or “thio-ether” are used interchangeably and refer to a —SRs radical.
The term “selenyl” refers to a —SeRs radical.
The term “sulfinyl” refers to a —S(O)—Rs radical.
The term “sulfonyl” refers to a —SO2—Rs radical.
The term “phosphino” refers to a —P(Rs)2 radical, wherein each Rs can be same or different.
The term “silyl” refers to a —Si(Rs)3 radical, wherein each Rs can be same or different.
The term “germyl” refers to a —Ge(Rs)3 radical, wherein each Rs can be same or different.
The term “boryl” refers to a —B(Rs)2 radical or its Lewis adduct —B(Rs)3 radical, wherein Rs can be same or different.
In each of the above, Rs can be hydrogen or a substituent selected from the group consisting of deuterium, halogen, alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, and combination thereof. Preferred Rs is selected from the group consisting of alkyl, cycloalkyl, aryl, heteroaryl, and combination thereof.
The term “alkyl” refers to and includes both straight and branched chain alkyl radicals. Preferred alkyl groups are those containing from one to fifteen carbon atoms and includes methyl, ethyl, propyl, 1-methylethyl, butyl, 1-methylpropyl, 2-methylpropyl, pentyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1,1-dimethylpropyl, 1,2-dimethylpropyl, 2,2-dimethylpropyl, and the like. Additionally, the alkyl group may be optionally substituted.
The term “cycloalkyl” refers to and includes monocyclic, polycyclic, and spiro alkyl radicals. Preferred cycloalkyl groups are those containing 3 to 12 ring carbon atoms and includes cyclopropyl, cyclopentyl, cyclohexyl, bicyclo[3.1.1]heptyl, spiro[4.5]decyl, spiro[5.5]undecyl, adamantyl, and the like. Additionally, the cycloalkyl group may be optionally substituted.
The terms “heteroalkyl” or “heterocycloalkyl” refer to an alkyl or a cycloalkyl radical, respectively, having at least one carbon atom replaced by a heteroatom. Optionally the at least one heteroatom is selected from O, S, N, P, B, Si and Se, preferably, O, S or N. Additionally, the heteroalkyl or heterocycloalkyl group may be optionally substituted.
The term “alkenyl” refers to and includes both straight and branched chain alkene radicals. Alkenyl groups are essentially alkyl groups that include at least one carbon-carbon double bond in the alkyl chain. Cycloalkenyl groups are essentially cycloalkyl groups that include at least one carbon-carbon double bond in the cycloalkyl ring. The term “heteroalkenyl” as used herein refers to an alkenyl radical having at least one carbon atom replaced by a heteroatom. Optionally the at least one heteroatom is selected from O, S, N, P, B, Si, and Se, preferably, O, S, or N. Preferred alkenyl, cycloalkenyl, or heteroalkenyl groups are those containing two to fifteen carbon atoms. Additionally, the alkenyl, cycloalkenyl, or heteroalkenyl group may be optionally substituted.
The term “alkynyl” refers to and includes both straight and branched chain alkyne radicals. Alkynyl groups are essentially alkyl groups that include at least one carbon-carbon triple bond in the alkyl chain. Preferred alkynyl groups are those containing two to fifteen carbon atoms. Additionally, the alkynyl group may be optionally substituted.
The terms “aralkyl” or “arylalkyl” are used interchangeably and refer to an alkyl group that is substituted with an aryl group. Additionally, the aralkyl group may be optionally substituted.
The term “heterocyclic group” refers to and includes aromatic and non-aromatic cyclic radicals containing at least one heteroatom. Optionally the at least one heteroatom is selected from O, S, N, P, B, Si, and Se, preferably, O, S, or N. Hetero-aromatic cyclic radicals may be used interchangeably with heteroaryl. Preferred hetero-non-aromatic cyclic groups are those containing 3 to 7 ring atoms which includes at least one hetero atom, and includes cyclic amines such as morpholino, piperidino, pyrrolidino, and the like, and cyclic ethers/thio-ethers, such as tetrahydrofuran, tetrahydropyran, tetrahydrothiophene, and the like. Additionally, the heterocyclic group may be optionally substituted.
The term “aryl” refers to and includes both single-ring aromatic hydrocarbyl groups and polycyclic aromatic ring systems. The polycyclic rings may have two or more rings in which two carbons are common to two adjoining rings (the rings are “fused”) wherein at least one of the rings is an aromatic hydrocarbyl group, e.g., the other rings can be cycloalkyls, cycloalkenyls, aryl, heterocycles, and/or heteroaryls. Preferred aryl groups are those containing six to thirty carbon atoms, preferably six to twenty carbon atoms, more preferably six to twelve carbon atoms. Especially preferred is an aryl group having six carbons, ten carbons or twelve carbons. Suitable aryl groups include phenyl, biphenyl, triphenyl, triphenylene, tetraphenylene, naphthalene, anthracene, phenalene, phenanthrene, fluorene, pyrene, chrysene, perylene, and azulene, preferably phenyl, biphenyl, triphenyl, triphenylene, fluorene, and naphthalene. Additionally, the aryl group may be optionally substituted.
The term “heteroaryl” refers to and includes both single-ring aromatic groups and polycyclic aromatic ring systems that include at least one heteroatom. The heteroatoms include, but are not limited to O, S, N, P, B, Si, and Se. In many instances, O, S, or N are the preferred heteroatoms. Hetero-single ring aromatic systems are preferably single rings with 5 or 6 ring atoms, and the ring can have from one to six heteroatoms. The hetero-polycyclic ring systems can have two or more rings in which two atoms are common to two adjoining rings (the rings are “fused”) wherein at least one of the rings is a heteroaryl, e.g., the other rings can be cycloalkyls, cycloalkenyls, aryl, heterocycles, and/or heteroaryls. The hetero-polycyclic aromatic ring systems can have from one to six heteroatoms per ring of the polycyclic aromatic ring system. Preferred heteroaryl groups are those containing three to thirty carbon atoms, preferably three to twenty carbon atoms, more preferably three to twelve carbon atoms. Suitable heteroaryl groups include dibenzothiophene, dibenzofuran, dibenzoselenophene, furan, thiophene, benzofuran, benzothiophene, benzoselenophene, carbazole, indolocarbazole, pyridylindole, pyrrolodipyridine, pyrazole, imidazole, triazole, oxazole, thiazole, oxadiazole, oxatriazole, dioxazole, thiadiazole, pyridine, pyridazine, pyrimidine, pyrazine, triazine, oxazine, oxathiazine, oxadiazine, indole, benzimidazole, indazole, indoxazine, benzoxazole, benzisoxazole, benzothiazole, quinoline, isoquinoline, cinnoline, quinazoline, quinoxaline, naphthyridine, phthalazine, pteridine, xanthene, acridine, phenazine, phenothiazine, phenoxazine, benzofuropyridine, furodipyridine, benzothienopyridine, thienodipyridine, benzoselenophenopyridine, and selenophenodipyridine, preferably dibenzothiophene, dibenzofuran, dibenzoselenophene, carbazole, indolocarbazole, imidazole, pyridine, triazine, benzimidazole, 1,2-azaborine, 1,3-azaborine, 1,4-azaborine, borazine, and aza-analogs thereof. Additionally, the heteroaryl group may be optionally substituted.
Of the aryl and heteroaryl groups listed above, the groups of triphenylene, naphthalene, anthracene, dibenzothiophene, dibenzofuran, dibenzoselenophene, carbazole, indolocarbazole, imidazole, pyridine, pyrazine, pyrimidine, triazine, and benzimidazole, and the respective aza-analogs of each thereof are of particular interest.
The terms alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aralkyl, heterocyclic group, aryl, and heteroaryl, as used herein, are independently unsubstituted, or independently substituted, with one or more general substituents.
In many instances, the General Substituents are selected from the group consisting of deuterium, halogen, alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, germyl, boryl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carboxylic acid, ether, ester, nitrile, isonitrile, sulfanyl, selenyl, sulfinyl, sulfonyl, phosphino, and combinations thereof.
In some instances, the Preferred General Substituents are selected from the group consisting of deuterium, fluorine, alkyl, cycloalkyl, heteroalkyl, alkoxy, aryloxy, amino, silyl, germyl, boryl, alkenyl, cycloalkenyl, heteroalkenyl, aryl, heteroaryl, nitrile, isonitrile, sulfanyl, and combinations thereof.
In some instances, the More Preferred General Substituents are selected from the group consisting of deuterium, fluorine, alkyl, cycloalkyl, alkoxy, aryloxy, amino, silyl, aryl, heteroaryl, sulfanyl, and combinations thereof.
In yet other instances, the Most Preferred General Substituents are selected from the group consisting of deuterium, fluorine, alkyl, cycloalkyl, aryl, heteroaryl, and combinations thereof.
The terms “substituted” and “substitution” refer to a substituent other than H that is bonded to the relevant position, e.g., a carbon or nitrogen. For example, when R1 represents mono-substitution, then one R1 must be other than H (i.e., a substitution). Similarly, when R1 represents di-substitution, then two of R1 must be other than H. Similarly, when R1 represents zero or no substitution, R1, for example, can be a hydrogen for available valencies of ring atoms, as in carbon atoms for benzene and the nitrogen atom in pyrrole, or simply represents nothing for ring atoms with fully filled valencies, e.g., the nitrogen atom in pyridine. The maximum number of substitutions possible in a ring structure will depend on the total number of available valencies in the ring atoms.
As used herein, “combinations thereof” indicates that one or more members of the applicable list are combined to form a known or chemically stable arrangement that one of ordinary skill in the art can envision from the applicable list. For example, an alkyl and deuterium can be combined to form a partial or fully deuterated alkyl group; a halogen and alkyl can be combined to form a halogenated alkyl substituent; and a halogen, alkyl, and aryl can be combined to form a halogenated arylalkyl. In one instance, the term substitution includes a combination of two to four of the listed groups. In another instance, the term substitution includes a combination of two to three groups. In yet another instance, the term substitution includes a combination of two groups. Preferred combinations of substituent groups are those that contain up to fifty atoms that are not hydrogen or deuterium, or those which include up to forty atoms that are not hydrogen or deuterium, or those that include up to thirty atoms that are not hydrogen or deuterium. In many instances, a preferred combination of substituent groups will include up to twenty atoms that are not hydrogen or deuterium.
The “aza” designation in the fragments described herein, i.e. aza-dibenzofuran, aza-dibenzothiophene, etc. means that one or more of the C—H groups in the respective aromatic ring can be replaced by a nitrogen atom, for example, and without any limitation, azatriphenylene encompasses both dibenzo[f,h]quinoxaline and dibenzo[f,h]quinoline. One of ordinary skill in the art can readily envision other nitrogen analogs of the aza-derivatives described above, and all such analogs are intended to be encompassed by the terms as set forth herein.
As used herein, “deuterium” refers to an isotope of hydrogen. Deuterated compounds can be readily prepared using methods known in the art. For example, U.S. Pat. No. 8,557,400, Patent Pub. No. WO 2006/095951, and U.S. Pat. Application Pub. No. US 2011/0037057, which are hereby incorporated by reference in their entireties, describe the making of deuterium-substituted organometallic complexes. Further reference is made to Ming Yan, et al., Tetrahedron 2015, 71, 1425-30 and Atzrodt et al., Angew. Chem. Int. Ed. (Reviews) 2007, 46, 7744-65, which are incorporated by reference in their entireties, describe the deuteration of the methylene hydrogens in benzyl amines and efficient pathways to replace aromatic ring hydrogens with deuterium, respectively.
It is to be understood that when a molecular fragment is described as being a substituent or otherwise attached to another moiety, its name may be written as if it were a fragment (e.g. phenyl, phenylene, naphthyl, dibenzofuryl) or as if it were the whole molecule (e.g. benzene, naphthalene, dibenzofuran). As used herein, these different ways of designating a substituent or attached fragment are considered to be equivalent.
In some instance, a pair of adjacent substituents can be optionally joined or fused into a ring. The preferred ring is a five, six, or seven-membered carbocyclic or heterocyclic ring, includes both instances where the portion of the ring formed by the pair of substituents is saturated and where the portion of the ring formed by the pair of substituents is unsaturated. As used herein, “adjacent” means that the two substituents involved can be on the same ring next to each other, or on two neighboring rings having the two closest available substitutable positions, such as 2, 2′ positions in a biphenyl, or 1, 8 position in a naphthalene, as long as they can form a stable fused ring system.
In one aspect, the present disclosure provides a compound comprising a first ligand LA of Formula I,
wherein:
In some embodiments, at least two RA or two RB are joined together to form a 7-membered ring (condition 1).
In some embodiments, when L1 is NR, and the R is joined with one RA or one RB to form a structure comprising a 7-membered ring (condition 2).
In some embodiments, at least one of RA or RB comprises a 7-membered ring moiety (condition 3).
In some embodiments, only condition 1 is true. In some embodiments, only condition 2 is true. In some embodiments, only condition 3 is true. In some embodiments, both condition 1 and condition 2 are true. In some embodiments, both condition 1 and condition 3 are true. In some embodiments, both condition 2 and condition 3 are true. In some embodiments, all the three conditions are true.
In some embodiments, if moiety A or moiety B is a 5-membered ring fused to the 7-membered ring, then at least one of the 5-membered or the 7-membered ring is heterocyclic.
In some embodiments, the following compounds are not included in the compound having a first ligand LA of Formula I:
In some embodiments of Formula I, at least one of RA, or RB is partially or fully deuterated. In some embodiments, at least one RA is partially or fully deuterated. In some embodiments, at least one RB is partially or fully deuterated. In some embodiments of Formula I, at least R or R′ if present is partially or fully deuterated.
In some embodiments, each R, R′, R″, Ra, Rβ, RA, and RB is independently a hydrogen or a substituent selected from the group consisting of the Preferred General Substituents defined herein. In some embodiments, each R, R′, R″, RA, and RB is independently a hydrogen or a substituent selected from the group consisting of the More Preferred General Substituents defined herein. In some embodiments, each R, R′, R″, RA, and RB is independently a hydrogen or a substituent selected from the group consisting of the Most Preferred General Substituents defined herein.
In some embodiments, the metal M is selected from the group consisting of Ir, Rh, Re, Ru, Os, Pt, Pd, Ag, Au, and Cu. In some embodiments, the metal M is Ir. In some embodiments, the metal M is Pt or Pd. In some embodiments, the metal M is Pt.
In some embodiments, moiety A is a monocyclic ring. In some such embodiments, moiety A is selected from the group consisting of benzene, pyridine, pyrimidine, pyridazine, pyrazine, imidazole, pyrazole, pyrrole, oxazole, furan, thiophene, and thiazole.
In some embodiments, moiety A is a polycyclic fused ring system. In some embodiments, moiety A is selected from the group consisting of naphthalene, quinoline, isoquinoline, quinazoline, benzofuran, benzoxazole, benzothiophene, benzothiazole, benzoselenophene, indene, indole, benzimidazole, carbazole, dibenzofuran, dibenzothiophene, quinoxaline, phthalazine, phenanthrene, phenanthridine, and fluorene.
In some embodiments, moiety B is a monocyclic ring. In some embodiments, moiety B is selected from the group consisting of benzene, pyridine, pyrimidine, pyridazine, pyrazine, imidazole, pyrazole, pyrrole, oxazole, furan, thiophene, and thiazole.
In some embodiments, moiety B is a polycyclic fused ring system. In some embodiments, moiety B is selected from the group consisting of naphthalene, quinoline, isoquinoline, quinazoline, benzofuran, benzoxazole, benzothiophene, benzothiazole, benzoselenophene, indene, indole, benzimidazole, carbazole, dibenzofuran, dibenzothiophene, quinoxaline, phthalazine, phenanthrene, phenanthridine, and fluorene.
In some embodiments, each of moiety A and moiety B can independently be a polycyclic fused ring structure. In some embodiments, each of moiety A and moiety B can independently be a polycyclic fused ring structure comprising at least three fused rings. In some embodiments, the polycyclic fused ring structure has two 6-membered rings and one 5-membered ring. In some such embodiments, the 5-membered ring is fused to the ring coordinated to metal M and the second 6-membered ring is fused to the 5-membered ring. In some embodiments, each of moiety A and moiety B can independently be selected from the group consisting of dibenzofuran, dibenzothiophene, dibenzoselenophene, and aza-variants thereof. In some such embodiments, each of moiety A and moiety B can independently be further substituted at the ortho- or meta-position of the O, S, or Se atom by a substituent selected from the group consisting of deuterium, fluorine, nitrile, alkyl, cycloalkyl, aryl, heteroaryl, and combinations thereof. In some such embodiments, the aza-variants contain exactly one N atom at the 6-position (ortho to the O, S, or Se) with a substituent at the 7-position (meta to the O, S, or Se).
In some embodiments, each of moiety A and moiety B can independently be a polycyclic fused ring structure comprising at least four fused rings. In some embodiments, the polycyclic fused ring structure comprises three 6-membered rings and one 5-membered ring. In some such embodiments, the 5-membered ring is fused to the ring coordinated to metal M, the second 6-membered ring is fused to the 5-membered ring, and the third 6-membered ring is fused to the second 6-membered ring. In some such embodiments, the third 6-membered ring is further substituted by a substituent selected from the group consisting of deuterium, fluorine, nitrile, alkyl, cycloalkyl, aryl, heteroaryl, and combinations thereof.
In some embodiments, each of moiety A and moiety B is independently a polycyclic fused ring structure comprising at least five fused rings. In some embodiments, the polycyclic fused ring structure comprises four 6-membered rings and one 5-membered ring or three 6-membered rings and two 5-membered rings. In some embodiments comprising two 5-membered rings, the 5-membered rings are fused together. In some embodiments comprising two 5-membered rings, the 5-membered rings are separated by at least one 6-membered ring. In some embodiments with one 5-membered ring, the 5-membered ring is fused to the ring coordinated to metal M, the second 6-membered ring is fused to the 5-membered ring, the third 6-membered ring is fused to the second 6-membered ring, and the fourth 6-membered ring is fused to the third-6-membered ring.
In some embodiments, each of moiety A and moiety B can independently be an aza version of the polycyclic fused rings described above. In some such embodiments, each of moiety A and moiety B can independently contain exactly one aza N atom. In some such embodiments, each of moiety A and moiety B can contain exactly two aza N atoms, which can be in one ring, or in two different rings. In some such embodiments, the ring having aza N atom is separated by at least two other rings from the metal M atom. In some such embodiments, the ring having aza N atom is separated by at least three other rings from the metal M atom. In some such embodiments, each of the ortho position of the aza N atom is substituted.
In some embodiments, moiety A is selected from the group consisting of pyridine, imidazole, benzimidazole, and pyrazole.
In some embodiments, moiety B is selected from the group consisting of benzene, naphthalene, and dibenzofuran.
In some embodiments, each of X1, X2, and X3 is C. In some embodiments, X1 and X2 are C, and X3 is N. In some embodiments, X1 and X3 are C, and X2 is N.
In some embodiments, Z1 is N and Z2 is C.
In some embodiments, K1 is a direct bond. In some embodiments, K1 is O. In some embodiments, K1 is S.
In some embodiments, L1 is selected from the group consisting of O, S, and Se. In some embodiments, L1 is selected from the group consisting of BR, NR, and PR. In some embodiments, L1 is NR. In some embodiments, where L1 is BR, NR, or PR, (i) R is joined with an RA to form a ring, (ii) R is joined with an RB to form a ring, or (iii) both (i) and (ii). In some embodiments, L1 is selected from the group consisting of P(O)R, C═O, C═S, C═Se, C═NR′, C═CR′R″, S═O, and SO2. In some embodiments, L1 is selected from the group consisting of BRR′, CRR′, SiRR′, and GeRR′.
In some embodiments, a ring formed between an R of L1 and RA is a 5-membered ring. In such embodiments, a ring formed between an R of L1 and RA is the 7-membered ring. In some embodiments, a ring formed between an R of L1 and RB is a 5-membered ring. In such embodiments, a ring formed between an R of L1 and RB is the 7-membered ring.
In some embodiments, the 7-membered ring has at least two rings fused thereto. In some such embodiments, each of the at least two rings is independently an aryl or heteroaryl ring. In some such embodiments, the at least two rings are not fused together.
In some embodiments, the 7-membered ring has at least three rings fused thereto. In some such embodiments, each of the at least two rings is independently an aryl or heteroaryl ring. In some such embodiments, none of the at least three rings are fused together. In some embodiments, at least two of the at least three rings are fused together.
In some embodiments, the 7-membered ring has at least four rings fused thereto. In some such embodiments, each of the at least four rings is independently an aryl or heteroaryl ring. In some embodiments, at least three of the at least four rings are fused to another one of the at least four rings. In some embodiments, each of the at least four rings is fused to another one of the at least four rings.
In some embodiments, the 7-membered ring has at least five rings fused thereto. In some embodiments, exactly four of the at least five rings are fused to another one of the at least five rings. In some embodiments, each of the at least five rings is fused to another one of the at least five rings.
In some embodiments, the 7-membered ring comprises at least one heteroatom. In some embodiments, the heteroatom is selected from the group consisting of N, O, B, Ge, Se, and Si.
In some embodiments, the 7-membered ring comprises at least two heteroatoms. In some embodiments, each of the at least two heteroatoms is independently selected from the group consisting of N, O, B, Ge, Se, and Si.
In some embodiments, the 7-membered ring comprises at least three heteroatoms. In some embodiments, each of the at least three heteroatoms is independently selected from the group consisting of N, O, B, Ge, Se, and Si.
In some embodiments, at least two RA or two RB substituents are joined together to form a 7-membered ring.
In some embodiments, moiety A is a polycyclic fused ring system and at least two rings of moiety A are part of the 7-membered ring. In some embodiments, two RA are joined to form a 7-membered heterocyclic ring when moiety A is a 5-membered ring.
In some embodiments, moiety B is a polycyclic fused ring system and at least two rings of moiety B are part of the 7-membered ring. In some embodiments, two RB are joined to form a 7-membered heterocyclic ring when moiety B is a 5-membered ring.
In some embodiments, at least one RA or RB comprises a 7-membered ring moiety. In some such embodiments, the 7-membered ring is not bonded or fused to any other RA or RB. In some such embodiments, the 7-membered ring is not bonded or fused to any other RA, RB, R, R′, or R″.
In some embodiments, at least one RA comprises a 7-membered ring moiety and the 7-membered ring is not bonded or fused to an RB or any other RA.
In some embodiments, at least one RB comprises a 7-membered ring moiety and the 7-membered ring is not bonded or fused to an RA or any other RB.
In some embodiments, the compound comprises at least two 7-membered ring moieties.
In some embodiments, at least one RA or RB comprises
wherein W is selected from the following structures (LIST W):
It should be understood that any ring or substituent of a moiety in LIST W can be an attachment point to moiety A, moiety B, or ring G unless explicitly indicated otherwise.
In some embodiments for
at least one of RCC is not hydrogen when the chelating metal is Pt. In some embodiments for
at least one of RCC is not hydrogen. In some embodiments for
at least one of RCC is selected from the group consisting of the Preferred General Substituents defined herein.
In some embodiments, Formula I comprises an electron-withdrawing group. In these embodiments, the electron-withdrawing group commonly comprises one or more highly electronegative elements including but not limited to fluorine, oxygen, sulfur, nitrogen, chlorine, and bromine.
In some embodiments, the electron-withdrawing group has a Hammett constant larger than 0. In some embodiments, the electron-withdrawing group has a Hammett constant equal or larger than 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1.0, or 1.1.
In some embodiments, the electron-withdrawn group is selected from the group consisting of the following structures (LIST EWG 1): F, CF3, CN, COCH3, CHO, COCF3, COOMe, COOCF3, NO2, SF3, SiF3, PF4, SF5, OCF3, SCF3, SeCF3, SOCF3, SeOCF3, SO2F, SO2CF3, SeO2CF3, OSeO2CF3, OCN, SCN, SeCN, NC, +N(Rk2)3, (Rk2)2CCN, (Rk2)2CCF3, CNC(CF3)2, BRk3Rk2, substituted or unsubstituted dibenzoborole, 1-substituted carbazole, 1,9-substituted carbazole, substituted or unsubstituted carbazole, substituted or unsubstituted pyridine, substituted or unsubstituted pyrimidine, substituted or unsubstituted pyrazine, substituted or unsubstituted pyridoxine, substituted or unsubstituted triazine, substituted or unsubstituted oxazole, substituted or unsubstituted benzoxazole, substituted or unsubstituted thiazole, substituted or unsubstituted benzothiazole, substituted or unsubstituted imidazole, substituted or unsubstituted benzimidazole, ketone, carboxylic acid, ester, nitrile, isonitrile, sulfinyl, sulfonyl, partially and fully fluorinated alkyl, partially and fully fluorinated aryl, partially and fully fluorinated heteroaryl, cyano-containing alkyl, cyano-containing aryl, cyano-containing heteroaryl, isocyanate,
wherein YG is selected from the group consisting of BRe, NRe, PRe, O, S, Se, C═O, S═O, SO2, CReRf, SiReRf, and GeReRf; and
Rk1 each independently represents mono to the maximum allowable substitutions, or no substitution;
wherein each of Rk1, Rk2, Rk3, Re, and Rf is independently a hydrogen or a substituent selected from the group consisting of the General Substituents defined herein.
In some embodiments, the electron-withdrawing group is selected from the group consisting of the following structures (LIST EWG 2):
In some embodiments, the electron-withdrawing group is selected from the group consisting of the following structures (LIST EWG 3):
In some embodiments, the electron-withdrawing group is selected from the group consisting of the following structures (LIST EWG 4):
In some embodiments, the electron-withdrawing group is a π-electron deficient electron-withdrawing group. In some embodiments, the π-electron deficient electron-withdrawing group is selected from the group consisting of the following structures (LIST Pi-EWG): CN, COCH3, CHO, COCF3, COOMe, COOCF3, NO2, SF3, SiF3, PF4, SF5, OCF3, SCF3, SeCF3, SOCF3, SeOCF3, SO2F, SO2CF3, SeO2CF3, OSeO2CF3, OCN, SCN, SeCN, NC, +N(Rk1)3, BRk1Rk2, substituted or unsubstituted dibenzoborole, 1-substituted carbazole, 1,9-substituted carbazole, substituted or unsubstituted carbazole, substituted or unsubstituted pyridine, substituted or unsubstituted pyrimidine, substituted or unsubstituted pyrazine, substituted or unsubstituted pyridazine, substituted or unsubstituted triazine, substituted or unsubstituted oxazole, substituted or unsubstituted benzoxazole, substituted or unsubstituted thiazole, substituted or unsubstituted benzothiazole, substituted or unsubstituted imidazole, substituted or unsubstituted benzimidazole, ketone, carboxylic acid, ester, nitrile, isonitrile, sulfinyl, sulfonyl, partially and fully fluorinated aryl, partially and fully fluorinated heteroaryl, cyano-containing aryl, cyano-containing heteroaryl, isocyanate,
wherein the variables are the same as previously defined.
In some embodiments of Formula I, at least one of RA, or RB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments of Formula I, at least one of RA, or RB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments of Formula I, at least one of RA, or RB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments of Formula I, at least one of RA, or RB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments of Formula I, at least one of RA, or RB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of Formula I, at least one RA is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments of Formula I, at least one of RA is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments of Formula I, at least one of RA is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments of Formula I, at least one of RA is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments of Formula I, at least one of RA is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of Formula I, at least one RB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments of Formula I, at least one of RB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments of Formula I, at least one of RB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments of Formula I, at least one of RB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments of Formula I, at least one of RB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of the compound, the compound comprises at least an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments of the compound, the compound comprises at least an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments of the compound, the compound comprises at least an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments of the compound, the compound comprises at least an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments of the compound, the compound comprises at least an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments, ligand LA is selected from the group consisting of the following structures (LIST 1):
In some embodiments for the structures of LIST 1, at least one of RA1, RA2, RAA or RBB is partially or fully deuterated. In some embodiments, at least one RA1 is partially or fully deuterated. In some embodiments, at least one RA2 is partially or fully deuterated. In some embodiments, at least one RAA is partially or fully deuterated. In some embodiments, at least one RBB is partially or fully deuterated.
In some embodiments for the structures of LIST 1, at least one RA1 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1, at least one RA2 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1, at least one RAA is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1, at least one RBB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1, at least one of RA1, RA2, RAA or RBB comprises
as defined herein.
In some embodiments, ligand LA is selected from the group consisting of the following structures (LIST 1a):
wherein moieties A1 and A2 are each independently a monocyclic ring or a polycyclic fused ring system, wherein each ring in moiety A1 and moiety A2 is independently a 5-membered or 6-membered carbocyclic or heterocyclic ring;
each of RAA, RA1, RA2, and RBB independently represents mono to the maximum allowable substitutions, or no substitutions;
each RA′, RA1, RA2, RAA, and RBB is independently a hydrogen or a substituent selected from the group consisting of the General Substituents defined herein; and
any two RA′, RA1, RA2, RAA, and RBB can be joined or fused to form a ring.
In some embodiments for the structures of LIST 1a, at least one of RA, RA2, RAA or RBB is partially or fully deuterated. In some embodiments, at least one RA1 is partially or fully deuterated. In some embodiments, at least one RA2 is partially or fully deuterated. In some embodiments, at least one RA is partially or fully deuterated. In some embodiments, at least one RBB is partially or fully deuterated.
In some embodiments for the structures of LIST 1a, at least one RA1 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1a, at least one RA2 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1a, at least one RAA is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1a, at least one RBB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1a, at least one of RA1, RA2, RAA or RBB comprises
as defined herein.
In some embodiments, ligand LA is selected from the group consisting of the following structures (LIST 2):
wherein the variables are as defined above.
In some embodiments for the structures of LIST 2, at least one of RA1, RA2, RAA or RBB is partially or fully deuterated.
In some embodiments, at least one RA1 is partially or fully deuterated. In some embodiments, at least one RA2 is partially or fully deuterated. In some embodiments, at least one RAA is partially or fully deuterated. In some embodiments, at least one RBB is partially or fully deuterated.
In some embodiments for the structures of LIST 2, at least one RA1 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2, at least one RA2 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2, at least one RAA is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2, at least one RBB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2, at least one of RA1, RA2, RAA or RBB comprises
as defined herein.
In some embodiments, ligand LA is selected from the group consisting of the following structures (LIST 2a):
wherein the variables are the same as previously defined.
In some embodiments for the structures of LIST 2a, at least one of RA1, RA2, RAA or RBB is partially or fully deuterated. In some embodiments, at least one RA1 is partially or fully deuterated. In some embodiments, at least one RA2 is partially or fully deuterated. In some embodiments, at least one RAA is partially or fully deuterated. In some embodiments, at least one RBB is partially or fully deuterated.
In some embodiments for the structures of LIST 2a, at least one RA1 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2a, at least one RA2 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2a, at least one RAA is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2a, at least one RBB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2a, at least one of RA1, RA2, RAA or RBB comprises
as defined herein.
In some embodiments, when LA has a structure selected from one of the following
at least one RAA, RA1, RA2, or RBB is not hydrogen or deuterium. In some such embodiments, at least one RAA, RA1, RA2, or RBB comprises alkyl, cycloalkyl, aryl, or heteroaryl.
In some embodiments, ligand LA is selected from the group consisting of LAi-(RG)(RH)(RI)(GJ), wherein i is an integer from 1 to 30 and each of RG, RH, and RI is independently selected from R1 to R447, and GJ is independently selected from Q1 to Q70; wherein LA1-(R1)(R1)(R1)(Q1) to LA30-(R447)(R447)(R447)(Q70) are defined in the following LIST 3:
wherein R1 to R447 have the structures in the following LIST 4:
wherein Q1 to Q70 have the structures in the following LIST 5:
In some embodiments, the compound has a formula of M(LA)p(LB)q(LC)r wherein LB and LC are each a bidentate ligand; and wherein p is 1, 2, or 3; q is 0, 1, or 2; r is 0, 1, or 2; and p+q+r is the oxidation state of the metal M.
In some embodiments, the compound has a formula selected from the group consisting of Ir(LA)3, Ir(LA)(LB)2, Ir(LA)2(LB), Ir(LA)2(LC), and Ir(LA)(LB)(LC); and wherein LA, LB, and LC are different from each other. In some embodiments, LB is a substituted or unsubstituted phenylpyridine, and LC is a substituted or unsubstituted acetylacetonate.
In some embodiments, the compound has a formula of Pt(LA)(LB); and wherein LA and LB can be same or different. In some such embodiments, LA and LB are connected to form a tetradentate ligand.
In some embodiments, LB and LC are each independently selected from the group consisting of the structures of the following LIST 6:
wherein:
In some embodiments, LB and LC are each independently selected from the group consisting of the structures of the following LIST 7:
wherein:
In some embodiments, the compound can have the formula Ir(LA)3, the formula Ir(LA)(LBk)2, the formula Ir(LA)2(LBk), the formula Ir(LA)2(LCj-I), the formula Ir(LA)2(LCj-II), the formula Ir(LA)(LBk)(LCj-I), or the formula Ir(LA)(LBk)(LCj-II), wherein LA is a ligand with respect to Formula I as defined here; LBk is defined herein; and LCj-I and LCj-II are each defined herein.
In some embodiments, LA is selected from the group consisting of the structures of LIST 1, LIST 2, and LIST 3. In some embodiments, LA is selected from the group consisting of the structures of LIST 1 and LBk is selected from the structures of the group consisting of LIST 8. In some embodiments, LA is selected from the group consisting of the structures of LIST 2 and LBk is selected from the structures of the group consisting of LIST 8. In some embodiments, LA is selected from the group consisting of the structures of LIST 3 and LBk is selected from the structures of the group consisting of LIST 8.
In some embodiments, LA is selected from the group consisting of the structures of LIST 1 and LCj-I and LCj-II are selected from the structures of the group consisting of LIST 9. In some embodiments, LA is selected from the group consisting of the structures of LIST 2 and LCj-I and LCj-II are selected from the structures of the group consisting of LIST 9. In some embodiments, LA is selected from the group consisting of the structures of LIST 3 and LCj-I and LCj-II are selected from the structures of the group consisting of LIST 9.
In some embodiments, LA is selected from the group consisting of the structures of LIST 1, LIST 1a, LIST 2, LIST 2a, and LIST 3. In some embodiments, LA is selected from LIST 3 of LAi-(RG)(RH)(RI)(GJ) consisting of LA1-(R1)(R1)(R1)(Q1) to LA30-(R447)(R447)(R447)(Q70) as defined.
In some embodiments, LB is selected from the group consisting of the structures of LIST 6, LIST 7, and LIST 8. In some embodiments, LB is selected from LIST 8 of LBk consisting of LB1 to LB474 as defined herein wherein k is an integer from 1 to 474,
In some embodiments, the compound can be Ir(LA)2(LB), or Ir(LA)(LB)2. In some of these embodiments, the compound can be Ir(LA)2(LBk), or Ir(LA)(LBk)2. In some of these embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))2(LB), or Ir(LAi-(RG)(RH)(RI)(GJ)(LB)2. In some of these embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))2(LBk), or Ir(LAi-(RG)(RH)(RI)(GJ))(LBk)2.
In some embodiments, the compound can be Ir(LA)2(LC). In some embodiments, the compound can be Ir(LA)2(LCj-I).
In some embodiments, the compound can be Ir(LA)2(LCj-I). In some embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))2(LC). In some embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))2(LCj-I). In some embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))2(LCj-II).
In some embodiments, the compound can be Ir(LA)(LB)(LC). In some of these embodiments, the compound can be Ir(LA)(LB)(LCJ-I). In some of these embodiments, the compound can be Ir(LA)(LB)(LCJ-I). In some of these embodiments, the compound can be Ir(LA)(LBk)(LCJ-I). In some of these embodiments, the compound can be Ir(LA)(LBk)(LCJ-I). In some of these embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))(LBk)(LCJ-I). In some of these embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))(LBk)(LCJ-II).
In some embodiments, the compound has formula Ir(LA)3, formula Ir(LA)(LBk)2, formula Ir(LA)2(LBk), formula Ir(LA)2(LCj-I), or formula Ir(LA)2(LCj-II), wherein:
wherein each LCj-I has a structure based on formula
and
each LCj-II has a structure based on formula
wherein for each LCj in LCj-I and LCj-II, R201 and R202 are each independently defined in the following LIST 9:
wherein RD1 to RD246 have the structures of the following LIST 10:
In some embodiments, the compound is selected from the group consisting of only those compounds whose LBk corresponds to one of the following: LB1, LB2, LB18, LB28, LB38, LB108, LB118, LB122, LB124, LB126, LB128, LB130, LB132, LB134, LB136, LB138, LB140, LB142, LB144, LB156, LB158, LB160, LB162, LB164, LB168, LB172, LB175, LB204, LB206, LB214, LB216, LB218, LB220, LB222, LB231, LB233, LB235, LB237, LB240, LB242, LB244, LB246, LB248, LB250, LB252, LB254, LB256, LB258, LB260, LB262, LB264, LB265, LB266, LB267, LB268, LB269, and LB270.
In some embodiments, the compound is selected from the group consisting of only those compounds whose LBk corresponds to one of the following: LB1, LB2, LB18, LB28, LB38, LB108, LB118, LB122, LB126, LB128, LB132, LB136, LB138, LB142, LB156, LB162, LB204, LB206, LB214, LB216, LB218, LB220, LB231, LB233, LB237, LB264, LB265, LB266, LB267, LB268, LB269, and LB270.
In some embodiments, the compound is selected from the group consisting of only those compounds having LCj-I, or LCj-II ligand whose corresponding R201 and R202 are defined to be one of the following structures: RD1, RD3, RD4, RD5, RD9, RD10, RD17, RD18, RD20, RD22, RD37, RD40, RD41, RD42, RD43, RD48, RD49, RD50, RD54, RD5, RD58, RD59, RD78, RD79, RD81, RD87, RD88, RD89, RD93, RD116, RD17, RD118, RD119, RD120, RD133, RD134, RD135, RD136, RD143, RD144, RD145, RD146, RD147, RD149, RD15, RD154, RD155, RD161, RD175 RD190, RD193, RD200, RD201, RD206, RD210, RD214, RD215, RD216, RD218, RD219, RD220, RD227, RD237, RD241, RD242, RD245 and RD246.
In some embodiments, the compound is selected from the group consisting of only those compounds having LCj-I or LCj-I n ligand whose corresponding R201 and R202 are defined to be one of selected from the following structures: RD1, RD3, RD4RD5, RD9, RD10, RD17, RD22, RD43, RD50, RD78, RD116, RD118, RD133, RD134, RD135, RD136, RD143, RD144, RD145, RD146, RD149, RD151, RD154, RD155 RD190, RD193, RD200, RD201, RD206, RD210, RD214, RD215, RD216, RD218, RD219, RD220, RD227, RD237, RD241, RD242, RD245, and RD246.
In some embodiments, the compound is selected from the group consisting of only those compounds having one of the following structures for the LCj-I ligand:
In some embodiments, the compound is selected from the group consisting of the structures of the following LIST 11:
In some embodiments, the compound has a structure of Formula II:
wherein:
In some embodiments of Formula II, at least one of RA, RB, RE, or RF is partially or fully deuterated. In some embodiments, at least one RA is partially or fully deuterated. In some embodiments, at least one RB is partially or fully deuterated. In some embodiments, at least one RE is partially or fully deuterated. In some embodiments, at least one RF is partially or fully deuterated. In some embodiments of Formula II, at least R or R′ if present is partially or fully deuterated.]
In some embodiments of Formula II, at least one RA is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of Formula II, at least one RB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of Formula II, at least one RE is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RE is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RE is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RE is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RE is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of Formula II, at least one RF is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RF is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RF is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RF is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RF is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of Formula II, Formula II comprises at least one electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, Formula II comprises at least one electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, Formula II comprises at least one electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, Formula II comprises at least one electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, Formula II comprises at least one electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of Formula II, at least one of RA, RB, RE, or RF comprises
as defined herein.
In some embodiments of Formula II, moiety E and moiety F each comprise a 6-membered aromatic ring bonded to metal M1. In some embodiments of Formula II, moiety F is a 5-membered or 6-membered heteroaromatic ring.
In some embodiments of Formula II, L1′ is O or CRR′.
In some embodiments of Formula II, Z2′ is N and Z1′ is C. In some embodiments of Formula II, Z2′ is C and Z1′ is N.
In some embodiments of Formula II, L2 is a direct bond. In some embodiments of Formula II, L2 is NR.
In some embodiments of Formula II, K1, K1′, and K2′ are all direct bonds. In some embodiments of Formula II, one of K1, K1′, and K2′ is O.
In some embodiments, the compound is selected from the group consisting of compounds have the formula of Pt(LA′)(Ly)
wherein LA′ is selected from the group consisting of the structures in the following LIST 12:
wherein Ly is selected from the group consisting of the structures shown in the following LIST 13:
wherein:
In some embodiments, if LA′ is from LIST 17, at least one of RA, RB, RA′, RA1, RA2, RAA, RBB, RE, RF, RF1, and RN comprises
In some embodiments, each RA, RB, R, R′, R″, RA′, RA1, RA2, RAA, RBB, RE, RF, RF1, and RN is independently selected from the group consisting of:
In some embodiments, the compound is selected from the group consisting of the compounds have the formula of Pt(LA′)(Ly):
wherein ligand LA′ is selected from the group consisting of LA′i″-(Ri)(Rj)(Rk)(Rl), wherein i″ is an integer from 43 to 88, and each of Ri, Rj, Rk, and Rl is independently selected from R1 to R447; wherein LA′43-(R1)(R1)(R1)(R1) to LA′88-(R447)(R447)(R447)(R447) are defined in the following LIST 18:
In some embodiments, the compound is selected from the group consisting of the structures of the following LIST 16:
In some embodiments, the compound having a first ligand LA of Formula I described herein can be at least 30% deuterated, at least 40% deuterated, at least 50% deuterated, at least 60% deuterated, at least 70% deuterated, at least 80% deuterated, at least 90% deuterated, at least 95% deuterated, at least 99% deuterated, or 100% deuterated. As used herein, percent deuteration has its ordinary meaning and includes the percent of possible hydrogen atoms (e.g., positions that are hydrogen or deuterium) that are replaced by deuterium atoms.
In some embodiments of heteroleptic compound having the formula of M(LA)p(LB)q(LC)r as defined above, the ligand LA has a first substituent RI, where the first substituent RI has a first atom a-I that is the farthest away from the metal M among all atoms in the ligand LA. Additionally, the ligand LB, if present, has a second substituent RII, where the second substituent RII has a first atom a-II that is the farthest away from the metal M among all atoms in the ligand LB. Furthermore, the ligand LCj, if present, has a third substituent RIII, where the third substituent RIII has a first atom a-III that is the farthest away from the metal M among all atoms in the ligand LC.
In such heteroleptic compounds, vectors VD1, VD2, and VD3 can be defined that are defined as follows. VD1 represents the direction from the metal M to the first atom a-I and the vector VD1 has a value D1 that represents the straight line distance between the metal M and the first atom a-I in the first substituent RI. VD2 represents the direction from the metal M to the first atom a-II and the vector VD2 has a value D2 that represents the straight line distance between the metal M and the first atom a-II in the second substituent RII. VD3 represents the direction from the metal M to the first atom a-III and the vector VD3 has a value D3 that represents the straight line distance between the metal M and the first atom a-III in the third substituent RIII.
In such heteroleptic compounds, a sphere having a radius r is defined whose center is the metal M and the radius r is the smallest radius that will allow the sphere to enclose all atoms in the compound that are not part of the substituents RI, RII and RIII; and where at least one of D1, D2, and D3 is greater than the radius r by at least 1.5 Å. In some embodiments, at least one of D1, D2, and D3 is greater than the radius r by at least 2.9, 3.0, 4.3, 4.4, 5.2, 5.9, 7.3, 8.8, 10.3, 13.1, 17.6, or 19.1 Å.
In some embodiments of such heteroleptic compound, the compound has a transition dipole moment axis and angles are defined between the transition dipole moment axis and the vectors VD1, VD2, and VD3, where at least one of the angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 is less than 40°. In some embodiments, at least one of the angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 is less than 30°. In some embodiments, at least one of the angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 is less than 20°. In some embodiments, at least one of the angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 is less than 15°. In some embodiments, at least one of the angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 is less than 10°. In some embodiments, at least two of the angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 are less than 20°. In some embodiments, at least two of the angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 are less than 15°. In some embodiments, at least two of the angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 are less than 10°.
In some embodiments, all three angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 are less than 20°. In some embodiments, all three angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 are less than 15°. In some embodiments, all three angles between the transition dipole moment axis and the vectors VD1, VD2, and VD3 are less than 10°.
In some embodiments of such heteroleptic compounds, the compound has a vertical dipole ratio (VDR) of 0.33 or less. In some embodiments of such heteroleptic compounds, the compound has a VDR of 0.30 or less. In some embodiments of such heteroleptic compounds, the compound has a VDR of 0.25 or less. In some embodiments of such heteroleptic compounds, the compound has a VDR of 0.20 or less. In some embodiments of such heteroleptic compounds, the compound has a VDR of 0.15 or less.
One of ordinary skill in the art would readily understand the meaning of the terms transition dipole moment axis of a compound and vertical dipole ratio of a compound. Nevertheless, the meaning of these terms can be found in U.S. Pat. No. 10,672,997 whose disclosure is incorporated herein by reference in its entirety. In U.S. Pat. No. 10,672,997, horizontal dipole ratio (HDR) of a compound, rather than VDR, is discussed. However, one skilled in the art readily understands that VDR=1−HDR.
In another aspect, the present disclosure also provides an OLED device comprising a first organic layer that contains a compound as disclosed in the above compounds section of the present disclosure.
In some embodiments, the OLED comprises: an anode; a cathode; and an organic layer disposed between the anode and the cathode, where the organic layer comprises a compound comprising a first ligand LA of Formula I as described herein.
In some embodiments, the organic layer may be an emissive layer and the compound as described herein may be an emissive dopant or a non-emissive dopant.
In some embodiments, the emissive layer comprises one or more quantum dots.
In some embodiments, the organic layer may further comprise a host, wherein the host comprises a triphenylene containing benzo-fused thiophene or benzo-fused furan, wherein any substituent in the host is an unfused substituent independently selected from the group consisting of CnH2n+1, OCnH2n+1, OAr1, N(CnH2n+1)2, N(Ar1)(Ar2), CH═CH—CnH2n+1, C≡CCnH2n+1, Ar1, Ar1—Ar2, CnH2n—Ar1, or no substitution, wherein n is an integer from 1 to 10; and wherein Ar1 and Ar2 are independently selected from the group consisting of benzene, biphenyl, naphthalene, triphenylene, carbazole, and heteroaromatic analogs thereof.
In some embodiments, the organic layer may further comprise a host, wherein host comprises at least one chemical group selected from the group consisting of triphenylene, carbazole, indolocarbazole, dibenzothiophene, dibenzofuran, dibenzoselenophene, 5,2-benzo[d]benzo[4,5]imidazo[3,2-a]imidazole, 5,9-dioxa-13b-boranaphtho[3,2,1-de]anthracene, triazine, boryl, silyl, aza-triphenylene, aza-carbazole, aza-indolocarbazole, aza-dibenzothiophene, aza-dibenzofuran, aza-dibenzoselenophene, aza-5,2-benzo[d]benzo[4,5]imidazo[3,2-a]imidazole, and aza-(5,9-dioxa-13b-boranaphtho[3,2,1-de]anthracene).
In some embodiments, the host can be selected from the group consisting of the structures of the following HOST
wherein:
In some embodiments, the host may be selected from the HOST Group 2 consisting of:
and combinations thereof.
In some embodiments, the organic layer may further comprise a host, wherein the host comprises a metal complex.
In some embodiments, the emissive layer can comprise two hosts, a first host and a second host. In some embodiments, the first host is a hole transporting host, and the second host is an electron transporting host. In some embodiments, the first host and the second host can form an exciplex.
In some embodiments, the compound as described herein may be a sensitizer; wherein the device may further comprise an acceptor; and wherein the acceptor may be selected from the group consisting of fluorescent emitter, delayed fluorescence emitter, and combination thereof.
In yet another aspect, the OLED of the present disclosure may also comprise an emissive region containing a compound as disclosed in the above compounds section of the present disclosure.
In some embodiments, the emissive region can comprise a compound comprising a first ligand LA of Formula I as described herein.
In some embodiments, at least one of the anode, the cathode, or a new layer disposed over the organic emissive layer functions as an enhancement layer. The enhancement layer comprises a plasmonic material exhibiting surface plasmon resonance that non-radiatively couples to the emitter material and transfers excited state energy from the emitter material to non-radiative mode of surface plasmon polariton. The enhancement layer is provided no more than a threshold distance away from the organic emissive layer, wherein the emitter material has a total non-radiative decay rate constant and a total radiative decay rate constant due to the presence of the enhancement layer and the threshold distance is where the total non-radiative decay rate constant is equal to the total radiative decay rate constant. In some embodiments, the OLED further comprises an outcoupling layer. In some embodiments, the outcoupling layer is disposed over the enhancement layer on the opposite side of the organic emissive layer. In some embodiments, the outcoupling layer is disposed on opposite side of the emissive layer from the enhancement layer but still outcouples energy from the surface plasmon mode of the enhancement layer. The outcoupling layer scatters the energy from the surface plasmon polaritons. In some embodiments this energy is scattered as photons to free space. In other embodiments, the energy is scattered from the surface plasmon mode into other modes of the device such as but not limited to the organic waveguide mode, the substrate mode, or another waveguiding mode. If energy is scattered to the non-free space mode of the OLED other outcoupling schemes could be incorporated to extract that energy to free space. In some embodiments, one or more intervening layer can be disposed between the enhancement layer and the outcoupling layer. The examples for interventing layer(s) can be dielectric materials, including organic, inorganic, perovskites, oxides, and may include stacks and/or mixtures of these materials.
The enhancement layer modifies the effective properties of the medium in which the emitter material resides resulting in any or all of the following: a decreased rate of emission, a modification of emission line-shape, a change in emission intensity with angle, a change in the stability of the emitter material, a change in the efficiency of the OLED, and reduced efficiency roll-off of the OLED device. Placement of the enhancement layer on the cathode side, anode side, or on both sides results in OLED devices which take advantage of any of the above-mentioned effects. In addition to the specific functional layers mentioned herein and illustrated in the various OLED examples shown in the figures, the OLEDs according to the present disclosure may include any of the other functional layers often found in OLEDs.
The enhancement layer can be comprised of plasmonic materials, optically active metamaterials, or hyperbolic metamaterials. As used herein, a plasmonic material is a material in which the real part of the dielectric constant crosses zero in the visible or ultraviolet region of the electromagnetic spectrum. In some embodiments, the plasmonic material includes at least one metal. In such embodiments the metal may include at least one of Ag, Al, Au, Ir, Pt, Ni, Cu, W, Ta, Fe, Cr, Mg, Ga, Rh, Ti, Ru, Pd, In, Bi, Ca alloys or mixtures of these materials, and stacks of these materials. In general, a metamaterial is a medium composed of different materials where the medium as a whole acts differently than the sum of its material parts. In particular, we define optically active metamaterials as materials which have both negative permittivity and negative permeability. Hyperbolic metamaterials, on the other hand, are anisotropic media in which the permittivity or permeability are of different sign for different spatial directions. Optically active metamaterials and hyperbolic metamaterials are strictly distinguished from many other photonic structures such as Distributed Bragg Reflectors (“DBRs”) in that the medium should appear uniform in the direction of propagation on the length scale of the wavelength of light. Using terminology that one skilled in the art can understand: the dielectric constant of the metamaterials in the direction of propagation can be described with the effective medium approximation. Plasmonic materials and metamaterials provide methods for controlling the propagation of light that can enhance OLED performance in a number of ways.
In some embodiments, the enhancement layer is provided as a planar layer. In other embodiments, the enhancement layer has wavelength-sized features that are arranged periodically, quasi-periodically, or randomly, or sub-wavelength-sized features that are arranged periodically, quasi-periodically, or randomly. In some embodiments, the wavelength-sized features and the sub-wavelength-sized features have sharp edges.
In some embodiments, the outcoupling layer has wavelength-sized features that are arranged periodically, quasi-periodically, or randomly, or sub-wavelength-sized features that are arranged periodically, quasi-periodically, or randomly. In some embodiments, the outcoupling layer may be composed of a plurality of nanoparticles and in other embodiments the outcoupling layer is composed of a plurality of nanoparticles disposed over a material. In these embodiments the outcoupling may be tunable by at least one of varying a size of the plurality of nanoparticles, varying a shape of the plurality of nanoparticles, changing a material of the plurality of nanoparticles, adjusting a thickness of the material, changing the refractive index of the material or an additional layer disposed on the plurality of nanoparticles, varying a thickness of the enhancement layer, and/or varying the material of the enhancement layer. The plurality of nanoparticles of the device may be formed from at least one of metal, dielectric material, semiconductor materials, an alloy of metal, a mixture of dielectric materials, a stack or layering of one or more materials, and/or a core of one type of material and that is coated with a shell of a different type of material. In some embodiments, the outcoupling layer is composed of at least metal nanoparticles wherein the metal is selected from the group consisting of Ag, Al, Au, Ir, Pt, Ni, Cu, W, Ta, Fe, Cr, Mg, Ga, Rh, Ti, Ru, Pd, In, Bi, Ca, alloys or mixtures of these materials, and stacks of these materials. The plurality of nanoparticles may have additional layer disposed over them. In some embodiments, the polarization of the emission can be tuned using the outcoupling layer. Varying the dimensionality and periodicity of the outcoupling layer can select a type of polarization that is preferentially outcoupled to air. In some embodiments the outcoupling layer also acts as an electrode of the device.
In yet another aspect, the present disclosure also provides a consumer product comprising an organic light-emitting device (OLED) having an anode; a cathode; and an organic layer disposed between the anode and the cathode, wherein the organic layer may comprise a compound as disclosed in the above compounds section of the present disclosure.
In some embodiments, the consumer product comprises an OLED having an anode; a cathode; and an organic layer disposed between the anode and the cathode, wherein the organic layer may comprise a compound comprising a first ligand LA of Formula I as described herein.
In some embodiments, the consumer product can be one of a flat panel display, a computer monitor, a medical monitor, a television, a billboard, a light for interior or exterior illumination and/or signaling, a heads-up display, a fully or partially transparent display, a flexible display, a laser printer, a telephone, a cell phone, tablet, a phablet, a personal digital assistant (PDA), a wearable device, a laptop computer, a digital camera, a camcorder, a viewfinder, a micro-display that is less than 2 inches diagonal, a 3-D display, a virtual reality or augmented reality display, a vehicle, a video wall comprising multiple displays tiled together, a theater or stadium screen, a light therapy device, and a sign.
Generally, an OLED comprises at least one organic layer disposed between and electrically connected to an anode and a cathode. When a current is applied, the anode injects holes and the cathode injects electrons into the organic layer(s). The injected holes and electrons each migrate toward the oppositely charged electrode. When an electron and hole localize on the same molecule, an “exciton,” which is a localized electron-hole pair having an excited energy state, is formed. Light is emitted when the exciton relaxes via a photoemissive mechanism. In some cases, the exciton may be localized on an excimer or an exciplex. Non-radiative mechanisms, such as thermal relaxation, may also occur, but are generally considered undesirable.
Several OLED materials and configurations are described in U.S. Pat. Nos. 5,844,363, 6,303,238, and 5,707,745, which are incorporated herein by reference in their entirety.
The initial OLEDs used emissive molecules that emitted light from their singlet states (“fluorescence”) as disclosed, for example, in U.S. Pat. No. 4,769,292, which is incorporated by reference in its entirety. Fluorescent emission generally occurs in a time frame of less than 10 nanoseconds.
More recently, OLEDs having emissive materials that emit light from triplet states (“phosphorescence”) have been demonstrated. Baldo et al., “Highly Efficient Phosphorescent Emission from Organic Electroluminescent Devices,” Nature, vol. 395, 151-154, 1998; (“Baldo-I”) and Baldo et al., “Very high-efficiency green organic light-emitting devices based on electrophosphorescence,” Appl. Phys. Lett., vol. 75, No. 3, 4-6 (1999) (“Baldo-II”), are incorporated by reference in their entireties. Phosphorescence is described in more detail in U.S. Pat. No. 7,279,704 at cols. 5-6, which are incorporated by reference.
More examples for each of these layers are available. For example, a flexible and transparent substrate-anode combination is disclosed in U.S. Pat. No. 5,844,363, which is incorporated by reference in its entirety. An example of a p-doped hole transport layer is m-MTDATA doped with F4-TCNQ at a molar ratio of 50:1, as disclosed in U.S. Patent Application Publication No. 2003/0230980, which is incorporated by reference in its entirety. Examples of emissive and host materials are disclosed in U.S. Pat. No. 6,303,238 to Thompson et al., which is incorporated by reference in its entirety. An example of an n-doped electron transport layer is BPhen doped with Li at a molar ratio of 1:1, as disclosed in U.S. Patent Application Publication No. 2003/0230980, which is incorporated by reference in its entirety. U.S. Pat. Nos. 5,703,436 and 5,707,745, which are incorporated by reference in their entireties, disclose examples of cathodes including compound cathodes having a thin layer of metal such as Mg:Ag with an overlying transparent, electrically-conductive, sputter-deposited ITO layer. The theory and use of blocking layers is described in more detail in U.S. Pat. No. 6,097,147 and U.S. Patent Application Publication No. 2003/0230980, which are incorporated by reference in their entireties. Examples of injection layers are provided in U.S. Patent Application Publication No. 2004/0174116, which is incorporated by reference in its entirety. A description of protective layers may be found in U.S. Patent Application Publication No. 2004/0174116, which is incorporated by reference in its entirety.
The simple layered structure illustrated in
Structures and materials not specifically described may also be used, such as OLEDs comprised of polymeric materials (PLEDs) such as disclosed in U.S. Pat. No. 5,247,190 to Friend et al., which is incorporated by reference in its entirety. By way of further example, OLEDs having a single organic layer may be used. OLEDs may be stacked, for example as described in U.S. Pat. No. 5,707,745 to Forrest et al, which is incorporated by reference in its entirety. The OLED structure may deviate from the simple layered structure illustrated in
Unless otherwise specified, any of the layers of the various embodiments may be deposited by any suitable method. For the organic layers, preferred methods include thermal evaporation, ink-jet, such as described in U.S. Pat. Nos. 6,013,982 and 6,087,196, which are incorporated by reference in their entireties, organic vapor phase deposition (OVPD), such as described in U.S. Pat. No. 6,337,102 to Forrest et al., which is incorporated by reference in its entirety, and deposition by organic vapor jet printing (OVJP, also referred to as organic vapor jet deposition (OVJD)), such as described in U.S. Pat. No. 7,431,968, which is incorporated by reference in its entirety. Other suitable deposition methods include spin coating and other solution based processes. Solution based processes are preferably carried out in nitrogen or an inert atmosphere. For the other layers, preferred methods include thermal evaporation. Preferred patterning methods include deposition through a mask, cold welding such as described in U.S. Pat. Nos. 6,294,398 and 6,468,819, which are incorporated by reference in their entireties, and patterning associated with some of the deposition methods such as ink-jet and organic vapor jet printing (OVJP). Other methods may also be used. The materials to be deposited may be modified to make them compatible with a particular deposition method. For example, substituents such as alkyl and aryl groups, branched or unbranched, and preferably containing at least 3 carbons, may be used in small molecules to enhance their ability to undergo solution processing. Substituents having 20 carbons or more may be used, and 3-20 carbons are a preferred range. Materials with asymmetric structures may have better solution processability than those having symmetric structures, because asymmetric materials may have a lower tendency to recrystallize. Dendrimer substituents may be used to enhance the ability of small molecules to undergo solution processing.
Devices fabricated in accordance with embodiments of the present disclosure may further optionally comprise a barrier layer. One purpose of the barrier layer is to protect the electrodes and organic layers from damaging exposure to harmful species in the environment including moisture, vapor and/or gases, etc. The barrier layer may be deposited over, under or next to a substrate, an electrode, or over any other parts of a device including an edge. The barrier layer may comprise a single layer, or multiple layers. The barrier layer may be formed by various known chemical vapor deposition techniques and may include compositions having a single phase as well as compositions having multiple phases. Any suitable material or combination of materials may be used for the barrier layer. The barrier layer may incorporate an inorganic or an organic compound or both. The preferred barrier layer comprises a mixture of a polymeric material and a non-polymeric material as described in U.S. Pat. No. 7,968,146, PCT Pat. Application Nos. PCT/US2007/023098 and PCT/US2009/042829, which are herein incorporated by reference in their entireties. To be considered a “mixture”, the aforesaid polymeric and non-polymeric materials comprising the barrier layer should be deposited under the same reaction conditions and/or at the same time. The weight ratio of polymeric to non-polymeric material may be in the range of 95:5 to 5:95. The polymeric material and the non-polymeric material may be created from the same precursor material. In one example, the mixture of a polymeric material and a non-polymeric material consists essentially of polymeric silicon and inorganic silicon.
Devices fabricated in accordance with embodiments of the present disclosure can be incorporated into a wide variety of electronic component modules (or units) that can be incorporated into a variety of electronic products or intermediate components. Examples of such electronic products or intermediate components include display screens, lighting devices such as discrete light source devices or lighting panels, etc. that can be utilized by the end-user product manufacturers. Such electronic component modules can optionally include the driving electronics and/or power source(s). Devices fabricated in accordance with embodiments of the present disclosure can be incorporated into a wide variety of consumer products that have one or more of the electronic component modules (or units) incorporated therein. A consumer product comprising an OLED that includes the compound of the present disclosure in the organic layer in the OLED is disclosed. Such consumer products would include any kind of products that include one or more light source(s) and/or one or more of some type of visual displays. Some examples of such consumer products include flat panel displays, curved displays, computer monitors, medical monitors, televisions, billboards, lights for interior or exterior illumination and/or signaling, heads-up displays, fully or partially transparent displays, flexible displays, rollable displays, foldable displays, stretchable displays, laser printers, telephones, mobile phones, tablets, phablets, personal digital assistants (PDAs), wearable devices, laptop computers, digital cameras, camcorders, viewfinders, micro-displays (displays that are less than 2 inches diagonal), 3-D displays, virtual reality or augmented reality displays, vehicles, video walls comprising multiple displays tiled together, theater or stadium screen, a light therapy device, and a sign. Various control mechanisms may be used to control devices fabricated in accordance with the present disclosure, including passive matrix and active matrix. Many of the devices are intended for use in a temperature range comfortable to humans, such as 18 degrees C. to 30 degrees C., and more preferably at room temperature (20-25° C.), but could be used outside this temperature range, for example, from −40 degree C. to +80° C.
More details on OLEDs, and the definitions described above, can be found in U.S. Pat. No. 7,279,704, which is incorporated herein by reference in its entirety.
The materials and structures described herein may have applications in devices other than OLEDs. For example, other optoelectronic devices such as organic solar cells and organic photodetectors may employ the materials and structures. More generally, organic devices, such as organic transistors, may employ the materials and structures.
In some embodiments, the OLED has one or more characteristics selected from the group consisting of being flexible, being rollable, being foldable, being stretchable, and being curved. In some embodiments, the OLED is transparent or semi-transparent. In some embodiments, the OLED further comprises a layer comprising carbon nanotubes.
In some embodiments, the OLED further comprises a layer comprising a delayed fluorescent emitter. In some embodiments, the OLED comprises a RGB pixel arrangement or white plus color filter pixel arrangement. In some embodiments, the OLED is a mobile device, a hand held device, or a wearable device. In some embodiments, the OLED is a display panel having less than 10 inch diagonal or 50 square inch area. In some embodiments, the OLED is a display panel having at least 10 inch diagonal or 50 square inch area. In some embodiments, the OLED is a lighting panel.
In some embodiments, the compound can be an emissive dopant. In some embodiments, the compound can produce emissions via phosphorescence, fluorescence, thermally activated delayed fluorescence, i.e., TADF (also referred to as E-type delayed fluorescence; see, e.g., U.S. application Ser. No. 15/700,352, which is hereby incorporated by reference in its entirety), triplet-triplet annihilation, or combinations of these processes. In some embodiments, the emissive dopant can be a racemic mixture, or can be enriched in one enantiomer. In some embodiments, the compound can be homoleptic (each ligand is the same). In some embodiments, the compound can be heteroleptic (at least one ligand is different from others). When there are more than one ligand coordinated to a metal, the ligands can all be the same in some embodiments. In some other embodiments, at least one ligand is different from the other ligands. In some embodiments, every ligand can be different from each other. This is also true in embodiments where a ligand being coordinated to a metal can be linked with other ligands being coordinated to that metal to form a tridentate, tetradentate, pentadentate, or hexadentate ligands. Thus, where the coordinating ligands are being linked together, all of the ligands can be the same in some embodiments, and at least one of the ligands being linked can be different from the other ligand(s) in some other embodiments.
In some embodiments, the compound can be used as a phosphorescent sensitizer in an OLED where one or multiple layers in the OLED contains an acceptor in the form of one or more fluorescent and/or delayed fluorescence emitters. In some embodiments, the compound can be used as one component of an exciplex to be used as a sensitizer. As a phosphorescent sensitizer, the compound must be capable of energy transfer to the acceptor and the acceptor will emit the energy or further transfer energy to a final emitter. The acceptor concentrations can range from 0.001% to 100%. The acceptor could be in either the same layer as the phosphorescent sensitizer or in one or more different layers. In some embodiments, the acceptor is a TADF emitter. In some embodiments, the acceptor is a fluorescent emitter. In some embodiments, the emission can arise from any or all of the sensitizer, acceptor, and final emitter.
According to another aspect, a formulation comprising the compound described herein is also disclosed.
The OLED disclosed herein can be incorporated into one or more of a consumer product, an electronic component module, and a lighting panel. The organic layer can be an emissive layer and the compound can be an emissive dopant in some embodiments, while the compound can be a non-emissive dopant in other embodiments.
In yet another aspect of the present disclosure, a formulation that comprises the novel compound disclosed herein is described. The formulation can include one or more components selected from the group consisting of a solvent, a host, a hole injection material, hole transport material, electron blocking material, hole blocking material, and an electron transport material, disclosed herein.
The present disclosure encompasses any chemical structure comprising the novel compound of the present disclosure, or a monovalent or polyvalent variant thereof. In other words, the inventive compound, or a monovalent or polyvalent variant thereof, can be a part of a larger chemical structure. Such chemical structure can be selected from the group consisting of a monomer, a polymer, a macromolecule, and a supramolecule (also known as supermolecule). As used herein, a “monovalent variant of a compound” refers to a moiety that is identical to the compound except that one hydrogen has been removed and replaced with a bond to the rest of the chemical structure. As used herein, a “polyvalent variant of a compound” refers to a moiety that is identical to the compound except that more than one hydrogen has been removed and replaced with a bond or bonds to the rest of the chemical structure. In the instance of a supramolecule, the inventive compound can also be incorporated into the supramolecule complex without covalent bonds.
D. Combination of the Compounds of the Present Disclosure with Other Materials
The materials described herein as useful for a particular layer in an organic light emitting device may be used in combination with a wide variety of other materials present in the device. For example, emissive dopants disclosed herein may be used in conjunction with a wide variety of hosts, transport layers, blocking layers, injection layers, electrodes and other layers that may be present. The materials described or referred to below are non-limiting examples of materials that may be useful in combination with the compounds disclosed herein, and one of skill in the art can readily consult the literature to identify other materials that may be useful in combination.
A charge transport layer can be doped with conductivity dopants to substantially alter its density of charge carriers, which will in turn alter its conductivity. The conductivity is increased by generating charge carriers in the matrix material, and depending on the type of dopant, a change in the Fermi level of the semiconductor may also be achieved. Hole-transporting layer can be doped by p-type conductivity dopants and n-type conductivity dopants are used in the electron-transporting layer.
Non-limiting examples of the conductivity dopants that may be used in an OLED in combination with materials disclosed herein are exemplified below together with references that disclose those materials: EP01617493, EP01968131, EP2020694, EP2684932, US20050139810, US20070160905, US20090167167, US2010288362, WO06081780, WO2009003455, WO2009008277, WO2009011327, WO2014009310, US2007252140, US2015060804, US20150123047, and US2012146012.
A hole injecting/transporting material to be used in the present disclosure is not particularly limited, and any compound may be used as long as the compound is typically used as a hole injecting/transporting material. Examples of the material include, but are not limited to: a phthalocyanine or porphyrin derivative; an aromatic amine derivative; an indolocarbazole derivative; a polymer containing fluorohydrocarbon; a polymer with conductivity dopants; a conducting polymer, such as PEDOT/PSS; a self-assembly monomer derived from compounds such as phosphonic acid and silane derivatives; a metal oxide derivative, such as MoOx; a p-type semiconducting organic compound, such as 1,4,5,8,9,12-Hexaazatriphenylenehexacarbonitrile; a metal complex, and a cross-linkable compounds.
Examples of aromatic amine derivatives used in HIL or HTL include, but not limit to the following general structures:
Each of Ar1 to Ar9 is selected from the group consisting of aromatic hydrocarbon cyclic compounds such as benzene, biphenyl, triphenyl, triphenylene, naphthalene, anthracene, phenalene, phenanthrene, fluorene, pyrene, chrysene, perylene, and azulene; the group consisting of aromatic heterocyclic compounds such as dibenzothiophene, dibenzofuran, dibenzoselenophene, furan, thiophene, benzofuran, benzothiophene, benzoselenophene, carbazole, indolocarbazole, pyridylindole, pyrrolodipyridine, pyrazole, imidazole, triazole, oxazole, thiazole, oxadiazole, oxatriazole, dioxazole, thiadiazole, pyridine, pyridazine, pyrimidine, pyrazine, triazine, oxazine, oxathiazine, oxadiazine, indole, benzimidazole, indazole, indoxazine, benzoxazole, benzisoxazole, benzothiazole, quinoline, isoquinoline, cinnoline, quinazoline, quinoxaline, naphthyridine, phthalazine, pteridine, xanthene, acridine, phenazine, phenothiazine, phenoxazine, benzofuropyridine, furodipyridine, benzothienopyridine, thienodipyridine, benzoselenophenopyridine, and selenophenodipyridine; and the group consisting of 2 to 10 cyclic structural units which are groups of the same type or different types selected from the aromatic hydrocarbon cyclic group and the aromatic heterocyclic group and are bonded to each other directly or via at least one of oxygen atom, nitrogen atom, sulfur atom, silicon atom, phosphorus atom, boron atom, chain structural unit and the aliphatic cyclic group. Each Ar may be unsubstituted or may be substituted by a substituent selected from the group consisting of deuterium, halogen, alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carboxylic acids, ether, ester, nitrile, isonitrile, sulfanyl, sulfinyl, sulfonyl, phosphino, and combinations thereof.
In one aspect, Ar1 to Ar9 is independently selected from the group consisting of:
wherein k is an integer from 1 to 20; X101 to X108 is C (including CH) or N; Z101 is NAr1, O, or S; Ar1 has the same group defined above.
Examples of metal complexes used in HIL or HTL include, but are not limited to the following general formula:
wherein Met is a metal, which can have an atomic weight greater than 40; (Y101-Y102) is a bidentate ligand, Y101 and Y102 are independently selected from C, N, O, P, and S; L101 is an ancillary ligand; k′ is an integer value from 1 to the maximum number of ligands that may be attached to the metal; and k′+k″ is the maximum number of ligands that may be attached to the metal.
In one aspect, (Y101-Y102) is a 2-phenylpyridine derivative. In another aspect, (Y101-Y102) is a carbene ligand. In another aspect, Met is selected from Ir, Pt, Os, and Zn. In a further aspect, the metal complex has a smallest oxidation potential in solution vs. Fc+/Fc couple less than about 0.6 V.
Non-limiting examples of the HIL and HTL materials that may be used in an OLED in combination with materials disclosed herein are exemplified below together with references that disclose those materials: CN102702075, DE102012005215, EP01624500, EP01698613, EP01806334, EP01930964, EP01972613, EP01997799, EP02011790, EP02055700, EP02055701, EP1725079, EP2085382, EP2660300, EP650955, JP07-073529, JP2005112765, JP2007091719, JP2008021687, JP2014-009196, KR20110088898, KR20130077473, TW201139402, U.S. Ser. No. 06/517,957, US20020158242, US20030162053, US20050123751, US20060182993, US20060240279, US20070145888, US20070181874, US20070278938, US20080014464, US20080091025, US20080106190, US20080124572, US20080145707, US20080220265, US20080233434, US20080303417, US2008107919, US20090115320, US20090167161, US2009066235, US2011007385, US20110163302, US2011240968, US2011278551, US2012205642, US2013241401, US20140117329, US2014183517, U.S. Pat. Nos. 5,061,569, 5,639,914, WO05075451, WO07125714, WO08023550, WO08023759, WO2009145016, WO2010061824, WO2011075644, WO2012177006, WO2013018530, WO2013039073, WO2013087142, WO2013118812, WO2013120577, WO2013157367, WO2013175747, WO2014002873, WO2014015935, WO2014015937, WO2014030872, WO2014030921, WO2014034791, WO2014104514, WO2014157018.
An electron blocking layer (EBL) may be used to reduce the number of electrons and/or excitons that leave the emissive layer. The presence of such a blocking layer in a device may result in substantially higher efficiencies, and/or longer lifetime, as compared to a similar device lacking a blocking layer. Also, a blocking layer may be used to confine emission to a desired region of an OLED. In some embodiments, the EBL material has a higher LUMO (closer to the vacuum level) and/or higher triplet energy than the emitter closest to the EBL interface. In some embodiments, the EBL material has a higher LUMO (closer to the vacuum level) and/or higher triplet energy than one or more of the hosts closest to the EBL interface. In one aspect, the compound used in EBL contains the same molecule or the same functional groups used as one of the hosts described below.
The light emitting layer of the organic EL device of the present disclosure preferably contains at least a metal complex as light emitting material, and may contain a host material using the metal complex as a dopant material. Examples of the host material are not particularly limited, and any metal complexes or organic compounds may be used as long as the triplet energy of the host is larger than that of the dopant. Any host material may be used with any dopant so long as the triplet criteria is satisfied.
Examples of metal complexes used as host are preferred to have the following general formula:
wherein Met is a metal; (Y103-Y104) is a bidentate ligand, Y103 and Y104 are independently selected from C, N, O, P, and S; L101 is an another ligand; k′ is an integer value from 1 to the maximum number of ligands that may be attached to the metal; and k′+k″ is the maximum number of ligands that may be attached to the metal.
In one aspect, the metal complexes are:
wherein (O—N) is a bidentate ligand, having metal coordinated to atoms O and N.
In another aspect, Met is selected from Ir and Pt. In a further aspect, (Y103-Y104) is a carbene ligand.
In one aspect, the host compound contains at least one of the following groups selected from the group consisting of aromatic hydrocarbon cyclic compounds such as benzene, biphenyl, triphenyl, triphenylene, tetraphenylene, naphthalene, anthracene, phenalene, phenanthrene, fluorene, pyrene, chrysene, perylene, and azulene; the group consisting of aromatic heterocyclic compounds such as dibenzothiophene, dibenzofuran, dibenzoselenophene, furan, thiophene, benzofuran, benzothiophene, benzoselenophene, carbazole, indolocarbazole, pyridylindole, pyrrolodipyridine, pyrazole, imidazole, triazole, oxazole, thiazole, oxadiazole, oxatriazole, dioxazole, thiadiazole, pyridine, pyridazine, pyrimidine, pyrazine, triazine, oxazine, oxathiazine, oxadiazine, indole, benzimidazole, indazole, indoxazine, benzoxazole, benzisoxazole, benzothiazole, quinoline, isoquinoline, cinnoline, quinazoline, quinoxaline, naphthyridine, phthalazine, pteridine, xanthene, acridine, phenazine, phenothiazine, phenoxazine, benzofuropyridine, furodipyridine, benzothienopyridine, thienodipyridine, benzoselenophenopyridine, and selenophenodipyridine; and the group consisting of 2 to 10 cyclic structural units which are groups of the same type or different types selected from the aromatic hydrocarbon cyclic group and the aromatic heterocyclic group and are bonded to each other directly or via at least one of oxygen atom, nitrogen atom, sulfur atom, silicon atom, phosphorus atom, boron atom, chain structural unit and the aliphatic cyclic group. Each option within each group may be unsubstituted or may be substituted by a substituent selected from the group consisting of deuterium, halogen, alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carboxylic acids, ether, ester, nitrile, isonitrile, sulfanyl, sulfinyl, sulfonyl, phosphino, and combinations thereof.
In one aspect, the host compound contains at least one of the following groups in the molecule:
wherein R101 is selected from the group consisting of hydrogen, deuterium, halogen, alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carboxylic acids, ether, ester, nitrile, isonitrile, sulfanyl, sulfinyl, sulfonyl, phosphino, and combinations thereof, and when it is aryl or heteroaryl, it has the similar definition as Ar's mentioned above. k is an integer from 0 to 20 or 1 to 20. X101 to X108 are independently selected from C (including CH) or N. Z101 and Z102 are independently selected from NR101, O, or S.
Non-limiting examples of the host materials that may be used in an OLED in combination with materials disclosed herein are exemplified below together with references that disclose those materials: EP2034538, EP2034538A, EP2757608, JP2007254297, KR20100079458, KR20120088644, KR20120129733, KR20130115564, TW201329200, US20030175553, US20050238919, US20060280965, US20090017330, US20090030202, US20090167162, US20090302743, US20090309488, US20100012931, US20100084966, US20100187984, US2010187984, US2012075273, US2012126221, US2013009543, US2013105787, US2013175519, US2014001446, US20140183503, US20140225088, US2014034914, U.S. Pat. No. 7,154,114, WO2001039234, WO2004093207, WO2005014551, WO2005089025, WO2006072002, WO2006114966, WO2007063754, WO2008056746, WO2009003898, WO2009021126, WO2009063833, WO2009066778, WO2009066779, WO2009086028, WO2010056066, WO2010107244, WO2011081423, WO2011081431, WO2011086863, WO2012128298, WO2012133644, WO2012133649, WO2013024872, WO2013035275, WO2013081315, WO2013191404, WO2014142472, US20170263869, US20160163995, U.S. Pat. No. 9,466,803,
One or more additional emitter dopants may be used in conjunction with the compound of the present disclosure. Examples of the additional emitter dopants are not particularly limited, and any compounds may be used as long as the compounds are typically used as emitter materials. Examples of suitable emitter materials include, but are not limited to, compounds which can produce emissions via phosphorescence, fluorescence, thermally activated delayed fluorescence, i.e., TADF (also referred to as E-type delayed fluorescence), triplet-triplet annihilation, or combinations of these processes. Non-limiting examples of the emitter materials that may be used in an OLED in combination with materials disclosed herein are exemplified below together with references that disclose those materials: CN103694277, CN1696137, EB01238981, EP01239526, EP01961743, EP1239526, EP1244155, EP1642951, EP1647554, EP1841834, EP1841834B, EP2062907, EP2730583, JP2012074444, JP2013110263, JP4478555, KR1020090133652, KR20120032054, KR20130043460, TW201332980, U.S. Ser. No. 06/699,599, U.S. Ser. No. 06/916,554, US20010019782, US20020034656, US20030068526, US20030072964, US20030138657, US20050123788, US20050244673, US2005123791, US2005260449, US20060008670, US20060065890, US20060127696, US20060134459, US20060134462, US20060202194, US20060251923, US20070034863, US20070087321, US20070103060, US20070111026, US20070190359, US20070231600, US2007034863, US2007104979, US2007104980, US2007138437, US2007224450, US2007278936, US20080020237, US20080233410, US20080261076, US20080297033, US200805851, US2008161567, US2008210930, US20090039776, US20090108737, US20090115322, US20090179555, US2009085476, US2009104472, US20100090591, US20100148663, US20100244004, US20100295032, US2010102716, US2010105902, US2010244004, US2010270916, US20110057559, US20110108822, US20110204333, US2011215710, US2011227049, US2011285275, US2012292601, US20130146848, US2013033172, US2013165653, US2013181190, US2013334521, US20140246656, US2014103305, U.S. Pat. Nos. 6,303,238, 6,413,656, 6,653,654, 6,670,645, 6,687,266, 6,835,469, 6,921,915, 7,279,704, 7,332,232, 7,378,162, 7,534,505, 7,675,228, 7,728,137, 7,740,957, 7,759,489, 7,951,947, 8,067,099, 8,592,586, 8,871,361, WO06081973, WO06121811, WO07018067, WO07108362, WO07115970, WO07115981, WO08035571, WO2002015645, WO2003040257, WO2005019373, WO2006056418, WO2008054584, WO2008078800, WO2008096609, WO2008101842, WO2009000673, WO2009050281, WO2009100991, WO2010028151, WO2010054731, WO2010086089, WO2010118029, WO2011044988, WO2011051404, WO2011107491, WO2012020327, WO2012163471, WO2013094620, WO2013107487, WO2013174471, WO2014007565, WO2014008982, WO2014023377, WO2014024131, WO2014031977, WO2014038456, WO2014112450.
A hole blocking layer (HBL) may be used to reduce the number of holes and/or excitons that leave the emissive layer. The presence of such a blocking layer in a device may result in substantially higher efficiencies and/or longer lifetime as compared to a similar device lacking a blocking layer. Also, a blocking layer may be used to confine emission to a desired region of an OLED. In some embodiments, the HBL material has a lower HOMO (further from the vacuum level) and/or higher triplet energy than the emitter closest to the HBL interface. In some embodiments, the HBL material has a lower HOMO (further from the vacuum level) and/or higher triplet energy than one or more of the hosts closest to the HBL interface.
In one aspect, compound used in HBL contains the same molecule or the same functional groups used as host described above.
In another aspect, compound used in HBL contains at least one of the following groups in the molecule:
wherein k is an integer from 1 to 20; L101 is another ligand, k′ is an integer from 1 to 3.
Electron transport layer (ETL) may include a material capable of transporting electrons. Electron transport layer may be intrinsic (undoped), or doped. Doping may be used to enhance conductivity. Examples of the ETL material are not particularly limited, and any metal complexes or organic compounds may be used as long as they are typically used to transport electrons.
In one aspect, compound used in ETL contains at least one of the following groups in the molecule:
wherein R101 is selected from the group consisting of hydrogen, deuterium, halogen, alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carboxylic acids, ether, ester, nitrile, isonitrile, sulfanyl, sulfinyl, sulfonyl, phosphino, and combinations thereof, when it is aryl or heteroaryl, it has the similar definition as Ar's mentioned above. Ar1 to Ar3 has the similar definition as Ar's mentioned above. k is an integer from 1 to 20. X101 to X108 is selected from C (including CH) or N.
In another aspect, the metal complexes used in ETL contains, but not limit to the following general formula:
wherein (O—N) or (N—N) is a bidentate ligand, having metal coordinated to atoms O, N or N, N; L101 is another ligand; k′ is an integer value from 1 to the maximum number of ligands that may be attached to the metal.
Non-limiting examples of the ETL materials that may be used in an OLED in combination with materials disclosed herein are exemplified below together with references that disclose those materials: CN103508940, EP01602648, EP01734038, EP01956007, JP2004-022334, JP2005149918, JP2005-268199, KR0117693, KR20130108183, US20040036077, US20070104977, US2007018155, US20090101870, US20090115316, US20090140637, US20090179554, US2009218940, US2010108990, US2011156017, US2011210320, US2012193612, US2012214993, US2014014925, US2014014927, US20140284580, U.S. Pat. Nos. 6,656,612, 8,415,031, WO2003060956, WO2007111263, WO2009148269, WO2010067894, WO2010072300, WO2011074770, WO2011105373, WO2013079217, WO2013145667, WO2013180376, WO2014104499, WO2014104535,
In tandem or stacked OLEDs, the CGL plays an essential role in the performance, which is composed of an n-doped layer and a p-doped layer for injection of electrons and holes, respectively. Electrons and holes are supplied from the CGL and electrodes. The consumed electrons and holes in the CGL are refilled by the electrons and holes injected from the cathode and anode, respectively; then, the bipolar currents reach a steady state gradually. Typical CGL materials include n and p conductivity dopants used in the transport layers.
In any above-mentioned compounds used in each layer of the OLED device, the hydrogen atoms can be partially or fully deuterated. The minimum amount of hydrogen of the compound being deuterated is selected from the group consisting of 30%, 40%, 50%, 60%, 70%, 80%, 90%, 95%, 99%, and 100%. Thus, any specifically listed substituent, such as, without limitation, methyl, phenyl, pyridyl, etc. may be undeuterated, partially deuterated, and fully deuterated versions thereof. Similarly, classes of substituents such as, without limitation, alkyl, aryl, cycloalkyl, heteroaryl, etc. also may be undeuterated, partially deuterated, and fully deuterated versions thereof.
It is understood that the various embodiments described herein are by way of example only and are not intended to limit the scope of the invention. For example, many of the materials and structures described herein may be substituted with other materials and structures without deviating from the spirit of the invention. The present invention as claimed may therefore include variations from the particular examples and preferred embodiments described herein, as will be apparent to one of skill in the art. It is understood that various theories as to why the invention works are not intended to be limiting.
1-Bromo-2-fluoro-3-nitrobenzene (1) (5.30 g, 24.1 mmol), 2-bromophenylboronic acid (2) (4.60 g, 22.9 mmol) and sodium carbonate (9.29 g, 87.6 mmol) in toluene (80 mL), ethanol (20 mL) and water (40 mL) were degassed for 15 minutes. Then tetrakis(triphenylphosphine)palladium(0) (1.27 g, 1.10 mmol) was added and the reaction mixture was degassed for 15 minutes before being heated at 85° C. for 18 hours. The reaction mixture was poured into sodium hydrogen carbonate solution and extracted with ethyl acetate. The ethyl acetate extracts were combined, washed with brine, dried over magnesium sulphate, filtered, and evaporated under reduced pressure to give an orange oil. Purification by column chromatography and evaporated under reduced pressure provided 2′-bromo-2-fluoro-3-nitro-1,1′-biphenyl (3) as a yellow solid (6.65 g, 93% yield).
2-(4,4,5,5-Tetramethyl-1,3,2-dioxaborolan-2-yl)aniline (4) (3.26 g, 14.9 mmol) and potassium phosphate tribasic (8.73 g, 40.5 mmol) in 1,4-dioxane (60 mL) and water (30 mL) was degassed for 15 minutes. Then 1-(2-bromophenyl)-2-fluoro-3-nitro-benzene (3) (4.00 g, 13.5 mmol) and SPhos-Pd-G2 (487 mg, 0.675 mmol) were added and the reaction mixture was degassed for 15 minutes before being heated at 95° C. for 3 hours. The reaction mixture was poured into brine and extracted with ethyl acetate. The ethyl acetate extracts were combined, washed with brine, dried over magnesium sulphate, filtered and evaporated under reduced pressure to give 8-nitro-9H-tribenzo[b, d,]azepine as a dark red solid. (3.89 g, ˜100% yield).
Iron (reduced) (3.77 g, 67.5 mmol) was added to a slurry of 8-nitro-9H-tribenzo[b,d,f]azepine (5) (3.89 g, 13.5 mmol) and ammonium chloride (3.61 g, 67.5 mmol) in ethanol (200 mL) and water (100 mL). The reaction mixture was heated to 60° C. for 2 hours. The reaction mixture was filtered through a pad of Celite (diatomaceous earth) and washed with ethanol. The filtrate was evaporated to remove the ethanol. The residue was basified with sodium carbonate solution and extracted with ethyl acetate. The ethyl acetate extracts were combined, washed with brine dried over magnesium sulphate, filtered and evaporated under reduced pressure to give 9H-tribenzo[b,d,f]azepin-8-amine (6) as a brown oil (3.4 g, 97.5% yield).
9H-Tribenzo[b,d,f]azepin-8-amine (6) (3.45 g, 13.4 mmol), sodium metabisulfite (3.85 g, 20.0 mmol) and dibenzo[b,d]furan-4-carbaldehyde (7) (2.88 g, 14.7 mmol) in N,N-dimethylformamide (120 mL) were heated in an open flask at 120° C. for 7 days. After allowing to cool down the reaction mixture was poured onto ice/water and the precipitate obtained was collected by filtration, washed with water and air dried. The solid was dissolved in dichloromethane and washed with water. The dichloromethane extracts were combined, dried over magnesium sulphate, filtered and evaporated under reduced pressure to give a brown oil. The oil was triturated with methanol, the solid obtained was collected by filtration washed with methanol and dried to give product as a brown solid, which was subjected to column chromatography on silica gel, eluted with iso-hexane/dichloromethane gradient provided a light brown solid. The solid was triturated with methanol, heated to reflux then allowed to cool down to room temperature the solid was collected by filtration washed with methanol and dried to give target product as a white solid (4.88 g, about 67.5% yield).
To a stirred solution of 2-bromo-4-(trifluoromethyl)aniline (12.0 g, 1 Eq, 50.0 mmol) in dry CPME (100 mL) under a nitrogen atmosphere was added 1-fluoro-2-nitrobenzene (8.50 g, 6.4 mL, 1.21 Eq, 60.24 mmol), potassium bis(trimethylsilyl)amide (125 mL, 1.0 molar in THF, 2.5 Eq, 125 mmol) was then added slowly over 20 mins. The reaction mixture was stirred at 50° C. for 2 hours, cooled to room temperature and diluted with 1M HCl (250 mL). The organic layer was washed with brine (250 mL) and concentrated in vacuo. The concentrate was partitioned between 2 M aqueous NaOH (500 mL) and EtOAc (300 mL) and the organic layer was extracted, dried over MgSO4 and concentrated. The crude product was purified by chromatography on silica gel (silica dry load, 330 g cartridge, 0-80% MTBE/iso-hexane) and the concentrated clean fractions dissolved in MTBE (500 mL) and washed in 1 M aqueous HCl (500 mL) prior to drying over MgSO4 and concentration to give 2-bromo-N-(2-nitrophenyl)-4-(trifluoromethyl)aniline (12, 11.0 g, 29 mmol, 57% yield, 94% purity) as an orange solid.
To a stirred solution of 2-bromo-N-(2-nitrophenyl)-4-(trifluoromethyl)aniline (12, 11.0 g, 1 Eq, 30.46 mmol) in EtOAc (250 mL) under a nitrogen atmosphere was added platinum on carbon (Type 117A, 1.19 g, 5% Wt, 0.01 Eq, 305 μmol). The reaction mixture was then placed under an atmosphere of H2 (5 bar) and stirred at 25° C. for 3 hours. The reaction mixture was filtered, concentrated and azeotropically dried with MTBE (100 mL) to afford N1-(2-bromo-4-(trifluoromethyl)phenyl)benzene-1,2-diamine (13, 10.0 g, 26 mmol, 84% yield, 85% purity).
To a stirred solution of copper(II) bromide (32.4 g, 3 Eq, 145.0 mmol) in water (500 mL) under in open air was added 2-(4-(tert-butyl)naphthalen-2-yl)-4,4,5,5-tetramethyl-1,3,2-dioxaborolane (14, 15.0 g, 1 Eq, 48.35 mmol) followed by methanol (500 mL). The reaction mixture was stirred at 80° C. for 16 hours. Additional MeOH (ca. 500 mL) was then added and the reaction mixture heated at 80° C. for a further 4 hours. The reaction mixture was cooled to room temperature and the MeOH removed under reduced pressure. The reaction mixture was diluted with water (500 mL) and extracted with EtOAc (2×600 mL). The organic extracts were washed with brine (600 mL), dried over MgSO4 and concentrated. The crude product was purified by chromatography on silica gel (dry loading, 220 g cartridge, 100% heptane) to give 3-bromo-1-(tert-butyl)naphthalene (15, 10.5 g, 39 mmol, 81% yield, 98% purity) as yellow oil.
In a flow reactor at −25° C. (bath T) were mixed solutions of 3-bromo-1-(tert-butyl)naphthalene (15, 0.3 M in THF, 108 ml, 32.3 mmol), delivered at 17 mL/min and BuLi (1.6 M solution in hexanes, nominal; 22.2 mL, 35.5 mmol) at −25° C. delivered at 3.5 mL/min, giving an in-reactor residence time of 0.5 s. The outgoing stream was quenched with 1 M DMF in THF (38.7 mL, 38.7 mmol; delivered at 6.12 mL/min) in a separate reactor loop also at −25° C., giving a residence time of 0.5 s. The combined effluent was collected into a flask containing saturated aqueous NH4Cl (300 mL) at room temperature and the resulting solution was extracted with MTBE (3×100 mL). The combined organic layers were washed with brine (100 mL), dried over Na2SO4 and concentrated. The crude product was purified by chromatography on silica gel (loaded on as a solution in hexane, 80 g cartridge, 0-40% MTBE/iso-hexane) to give 4-(tert-butyl)-2-naphthaldehyde (16, 5.66 g, 25.7 mmol, 80% yield, 97% purity) as a colourless oil.
To a stirred solution of N1-(2-bromo-4-(trifluoromethyl)phenyl)benzene-1,2-diamine (13, 3.49 g, 1 Eq, 10.5 mmol) in dry ethanol (60 mL) under a nitrogen atmosphere was added 4-(tert-butyl)-2-naphthaldehyde (2.68 g, 1.20 Eq, 12.6 mmol). The reaction mixture was stirred at 90° C. for 24 hours. The solvent was then removed in vacuo and the residue redissolved in DCM (100 mL). Iodine (3.6 g, 1.35 Eq, 14.2 mmol) and potassium carbonate (4.37 g, 3 Eq, 31.62 mmol) were then added and the reaction mixture was stirred at room temperature for 72 hours. The mixture was diluted with 20% aqueous sodium thiosulfate (250 mL) and transferred into a separating funnel. The organic layer was washed with brine (250 mL), dried over MgSO4, filtered and concentrated in vacuo. The crude product was purified by chromatography on silica gel (silica dry load, 120 g cartridge, 0-40% MTBE/heptane) to give 1-(2-bromo-4-(trifluoromethyl)phenyl)-2-(4-(tert-butyl)naphthalen-2-yl)-1H-benzo[d]imidazole (17, 3.50 g, 6.0 mmol, 57% yield, 90% purity) as a brown solid.
1-(2-Bromo-4-(trifluoromethyl)phenyl)-2-(4-(tert-butyl)naphthalen-2-yl)-1H-benzo[d]imidazole (17, 1.64 g, 1 Eq, 3.13 mmol) was dissolved in MeOH (16 mL) and the mixture was cooled to 0° C. (bath T). The resulting suspension was stirred for 4 hours prior to being filtered, to give 1-(2-bromo-4-(trifluoromethyl)phenyl)-2-(4-(tert-butyl)naphthalen-2-yl)-1H-benzo[d]imidazole (1.45 g, 2.5 mmol, 80% yield, 90% purity) as a pink solid.
1-(2-Bromo-4-(trifluoromethyl)phenyl)-2-(4-(tert-butyl)naphthalen-2-yl)-1H-benzo[d]imidazole (17, 1.50 g, 95% Wt, 1 Eq, 2.72 mmol) and (2-chlorophenyl)boronic acid (550 mg, 1.3 Eq, 3.54 mmol) and Pd(dppf)Cl2·DCM (450 mg, 0.2 Eq, 550 μmol) were added to a vial. Potassium carbonate in water (1.24 g, 6.0 mL, 1.5 molar, 3.31 Eq, 9.0 mmol) and toluene (24 mL) were then added. The reaction mixture was sparged with N2 for 5 minutes prior to being heated to 80° C. (block temperature) for 4 h. After cooling to room temperature, the mixture was filtered through Celite, and the filtrate was diluted with EtOAc (100 mL), and washed with water (50 mL). The aqueous layer extracted with further EtOAc (2×50 mL). The combined organic layers were washed with brine (50 mL), dried over MgSO4 and concentrated. The crude product was purified by chromatography on silica gel (dry loaded, 80 g gold cartridge, 0-20% MTBE/iso-hexane) to give a solid that was triturated in MeOH (30 mL) and collected by vacuum filtration to give 2-(4-(tert-butyl)naphthalen-2-yl)-1-(2′-chloro-5-(trifluoromethyl)-[1,1′-biphenyl]-2-yl)-1H-benzo[d]imidazole (18, 0.98 g, 1.7 mmol, 63% yield, 95% purity) as a pink solid.
2-(4-(tert-Butyl)naphthalen-2-yl)-1-(2′-chloro-5-(trifluoromethyl)-[1,1′-biphenyl]-2-yl)-1H-benzo[d]imidazole (18, 2.50 g, 95% Wt, 1 Eq, 4.279 mmol), Pd-178 (P(Cy)3 Pd(crotyl)Cl) (107.5 mg, 0.0526 Eq, 225.2 μmol), cesium carbonate (8.80 g, 6.3 Eq, 27.0 mmol), tricyclohexylphosphine tetrafluoroborate (165 mg, 0.1050 Eq, 449.3 μmol) and pivalic acid (230 mg, 254 μL, 0.5263 Eq, 2.252 mmol) were dissolved in xylene (25 mL). The solution was then sparged with N2 for 5 minutes prior to being heated to 130° C. (block temperature) for 2.5 hours. The reaction mixture was cooled to room temperature, filtered through celite, diluted with EtOAc (100 mL), and washed with water (150 mL). The aqueous layer washed extracted with EtOAc (50 mL). The combined organic layers were then washed with 1M HCl (100 mL) and then brine (100 mL). The combined organic layers were dried over MgSO4, filtered and concentrated under reduced pressure. The crude product was purified by chromatography on silica gel (dry load, 40 g gold cartridge, 0-15% MTBE/heptane, step gradient) to give 1-(4-(tert-butyl)naphthalen-2-yl)-11-(trifluoromethyl)-2,13b-diazatribenzo[cd,f,h]azulene (19, 2.03 g, 3.5 mmol, 82% yield, 90% purity) as a white powder.
A 250 mL 2-neck round-bottom flask was charged with 1-(4-(tert-butyl)naphthalen-2-yl)-11-(trifluoromethyl)-2,13b-diazatribenzo[cd,f,h]azulene (1.992 g, 1 Eq, 3.841 mmol), iridium(III) chloride trihydrate (745.0 mg, 0.55 Eq, 2.113 mmol), 2-ethoxyethanol (57.62 mL), and water (19.21 mL). Nitrogen was passed through the suspension for 10 minutes, and the reaction was heated to 100° C. under nitrogen for 18 hours. LCMS analysis indicated incomplete consumption of the ligand. An additional 250 mg IrCl3(H2O)3 was added, and the reaction was heated for an additional two hours, at which point the reaction was considered complete. The reaction was cooled to room temperature, and poured onto 200 mL deionized water. The reg/orange suspension was filtered, washed with water, and dried in vacuuo. This material 10 was used without further purification.
A 100 mL Schlenk flask was charged with 10 (2.440 g, 1 Eq, 966.1 μmol), 3,7-diethylnonane-4,6-dione (1.026 g, 1.1 mL, 5 Eq, 4.830 mmol), K2CO3 (667.6 mg, 5 Eq, 4.830 mmol), dichloromethane (24.15 mL), and methanol (24.15 mL). Nitrogen was passed through the suspension for 10 minutes, and the reaction was heated to 40° C. under nitrogen for 18 hours, followed by stirring at room temperature for an additional 36 hours, at which point LCMS analysis showed full conversion of 10 to the desired product. The suspension was concentrated on a rotary evaporator, resulting in an orange/red solid that was very insoluble in common organics. The material was dissolved in 400 mL of dichloromethane and passed through a 1 cm pad of silica, washing with copious amount of dichloromethane until the filtrate ran clear. The resulting solution was concentrated on a rotary evaporator and the red/orange solid was triturated with a mixture of dichloromethane and methanol. Due to extreme insolubility, no further purification was performed, though LCMS analysis showed 99%+ purity. Inventive Compound 2 was obtained as an orange solid, 0.441 g, 32% yield.
Emission spectra were collected on a Horiba Fluorolog-3 spectrofluorometer equipped with a Synapse Plus CCD detector. All samples were excited at 340 nm. Transient data was measured by time correlated single photon counting (TCSPC) in the Fluorolog-3 using a 335 nm NanoLED pulsed excitation source. PLQY values were measured using a Hamamatsu Quantaurus-QY Plus UV-NIR absolute PL quantum yield spectrometer with an excitation wavelength of 340 nm. Solutions of 1% emitter with PMMA in toluene were prepared, filtered, and dropcast onto Quartz substrates.
The triplet state energy (emission wavelength, T1) for Inventive Compound 1 was measured to be 543 nm, and for Inventive Compound 2 was measured to be 601 nm. The T1 was obtained from emission onset taken at 20% of the peak height of the gated emission of a frozen sample in 2-MeTHF at 77 K. The gated emission spectra were collected on a Horiba Fluorolog-3 spectrofluorometer equipped with a Xenon Flash lamp with a flash delay of 10 milliseconds and a collection window of 50 milliseconds. The sample was excited at 300 nm. The photophysical properties are summarized in Table 1 below.
The data demonstrated that these inventive compounds can be efficient red and green phosphorescent OLED emitters.
DFT Calculations were performed using the B3LYP functional with a CEP-31G basis set. Geometry optimizations were performed in vacuum. Excitation energies were obtained at these optimized geometries using time-dependent density functional theory (TDDFT). A continuum solvent model was applied in the TDDFT calculation to simulate tetrahydrofuran solvent. All calculations were carried out using the program Gaussian.
The calculations obtained with the above-identified DFT functional set and basis set are theoretical. Computational composite protocols, such as Gaussian with the CEP-31G basis set used herein, rely on the assumption that electronic effects are additive and, therefore, larger basis sets can be used to extrapolate to the complete basis set (CBS) limit. However, when the goal of a study is to understand variations in HOMO, LUMO, S1, T1, bond dissociation energies, etc. over a series of structurally related compounds, the additive effects are expected to be similar. Accordingly, while absolute errors from using the B3LYP may be significant compared to other computational methods, the relative differences between the HOMO, LUMO, S1, T1, and bond dissociation energy values calculated with B3LYP protocol are expected to reproduce experiment quite well. See, e.g., Hong et al., Chem. Mater. 2016, 28, 5791-98, 5792-93 and Supplemental Information (discussing the reliability of DFT calculations in the context of OLED materials). Moreover, with respect to iridium or platinum complexes that are useful in the OLED art, the data obtained from DFT calculations correlates very well to actual experimental data. See Tavasli et al., J. Mater. Chem. 2012, 22, 6419-29, 6422 (Table 3) (showing DFT calculations closely correlating with actual data for a variety of emissive complexes); Morello, G. R., J. Mol. Model. 2017, 23:174 (studying of a variety of DFT functional sets and basis sets and concluding the combination of B3LYP and CEP-31G is particularly accurate for emissive complexes).
Table 2 summarizes DFT calculation results of T1, HOMO, and LUMO for Inventive Compounds 1-15. The calculated T1 values show that these inventive compounds cover full color gamut owing to the unique inventive features from deep green to deep red color. Selection of appropriate ancillary ligand can provide a shift of HOMO and LUMO values and make it compatible with device architectures, used in modern OLEDs. These properties open possibilities for application of invented compounds in variety of OLED devices.
This application claims priority under 35 U.S.C. § 119(e) to U.S. Provisional Application No. 63/403,433, filed on Sep. 2, 2022, the entire contents of which are incorporated herein by reference.
Number | Date | Country | |
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63403433 | Sep 2022 | US |