The present disclosure generally relates to organometallic compounds and formulations and their various uses including as emitters in devices such as organic light emitting diodes and related electronic devices.
Opto-electronic devices that make use of organic materials are becoming increasingly desirable for various reasons. Many of the materials used to make such devices are relatively inexpensive, so organic opto-electronic devices have the potential for cost advantages over inorganic devices. In addition, the inherent properties of organic materials, such as their flexibility, may make them well suited for particular applications such as fabrication on a flexible substrate. Examples of organic opto-electronic devices include organic light emitting diodes/devices (OLEDs), organic phototransistors, organic photovoltaic cells, and organic photodetectors. For OLEDs, the organic materials may have performance advantages over conventional materials.
OLEDs make use of thin organic films that emit light when voltage is applied across the device. OLEDs are becoming an increasingly interesting technology for use in applications such as flat panel displays, illumination, and backlighting.
One application for phosphorescent emissive molecules is a full color display. Industry standards for such a display call for pixels adapted to emit particular colors, referred to as “saturated” colors. In particular, these standards call for saturated red, green, and blue pixels. Alternatively, the OLED can be designed to emit white light. In conventional liquid crystal displays emission from a white backlight is filtered using absorption filters to produce red, green and blue emission. The same technique can also be used with OLEDs. The white OLED can be either a single emissive layer (EML) device or a stack structure. Color may be measured using CIE coordinates, which are well known to the art.
In one aspect, the present disclosure provides a compound comprising a first ligand LA of Formula I:
In Formula I:
In another aspect, the present disclosure provides a formulation including a compound comprising a first ligand LA of Formula I as described herein.
In yet another aspect, the present disclosure provides an OLED having an organic layer comprising a compound comprising a first ligand LA of Formula I as described herein.
In yet another aspect, the present disclosure provides a consumer product comprising an OLED with an organic layer comprising a compound comprising a first ligand LA of Formula I as described herein.
Unless otherwise specified, the below terms used herein are defined as follows:
As used herein, the term “organic” includes polymeric materials as well as small molecule organic materials that may be used to fabricate organic opto-electronic devices. “Small molecule” refers to any organic material that is not a polymer, and “small molecules” may actually be quite large. Small molecules may include repeat units in some circumstances. For example, using a long chain alkyl group as a substituent does not remove a molecule from the “small molecule” class. Small molecules may also be incorporated into polymers, for example as a pendent group on a polymer backbone or as a part of the backbone. Small molecules may also serve as the core moiety of a dendrimer, which consists of a series of chemical shells built on the core moiety. The core moiety of a dendrimer may be a fluorescent or phosphorescent small molecule emitter. A dendrimer may be a “small molecule,” and it is believed that all dendrimers currently used in the field of OLEDs are small molecules.
As used herein, “top” means furthest away from the substrate, while “bottom” means closest to the substrate. Where a first layer is described as “disposed over” a second layer, the first layer is disposed further away from substrate. There may be other layers between the first and second layer, unless it is specified that the first layer is “in contact with” the second layer. For example, a cathode may be described as “disposed over” an anode, even though there are various organic layers in between.
As used herein, “solution processable” means capable of being dissolved, dispersed, or transported in and/or deposited from a liquid medium, either in solution or suspension form.
A ligand may be referred to as “photoactive” when it is believed that the ligand directly contributes to the photoactive properties of an emissive material. A ligand may be referred to as “ancillary” when it is believed that the ligand does not contribute to the photoactive properties of an emissive material, although an ancillary ligand may alter the properties of a photoactive ligand.
As used herein, and as would be generally understood by one skilled in the art, a first “Highest Occupied Molecular Orbital” (HOMO) or “Lowest Unoccupied Molecular Orbital” (LUMO) energy level is “greater than” or “higher than” a second HOMO or LUMO energy level if the first energy level is closer to the vacuum energy level. Since ionization potentials (IP) are measured as a negative energy relative to a vacuum level, a higher HOMO energy level corresponds to an IP having a smaller absolute value (an IP that is less negative). Similarly, a higher LUMO energy level corresponds to an electron affinity (EA) having a smaller absolute value (an EA that is less negative). On a conventional energy level diagram, with the vacuum level at the top, the LUMO energy level of a material is higher than the HOMO energy level of the same material. A “higher” HOMO or LUMO energy level appears closer to the top of such a diagram than a “lower” HOMO or LUMO energy level.
As used herein, and as would be generally understood by one skilled in the art, a first work function is “greater than” or “higher than” a second work function if the first work function has a higher absolute value. Because work functions are generally measured as negative numbers relative to vacuum level, this means that a “higher” work function is more negative. On a conventional energy level diagram, with the vacuum level at the top, a “higher” work function is illustrated as further away from the vacuum level in the downward direction. Thus, the definitions of HOMO and LUMO energy levels follow a different convention than work functions.
The terms “halo,” “halogen,” and “halide” are used interchangeably and refer to fluorine, chlorine, bromine, and iodine.
The term “acyl” refers to a substituted carbonyl radical (C(O)—Rs).
The term “ester” refers to a substituted oxycarbonyl (—O—C(O)—Rs or —C(O)—O—Rs) radical.
The term “ether” refers to an —OR, radical.
The terms “sulfanyl” or “thio-ether” are used interchangeably and refer to a —SR, radical.
The term “selenyl” refers to a —SeRs radical.
The term “sulfinyl” refers to a —S(O)—Rs radical.
The term “sulfonyl” refers to a —SO2—Rs radical.
The term “phosphino” refers to a —P(Rs)2 radical, wherein each Rs can be same or different.
The term “silyl” refers to a —Si(Rs)3 radical, wherein each Rs can be same or different.
The term “germyl” refers to a —Ge(Rs)3 radical, wherein each Rs can be same or different.
The term “boryl” refers to a —B(Rs)2 radical or its Lewis adduct —B(Rs)3 radical, wherein Rs can be same or different.
In each of the above, Rs can be hydrogen or a substituent selected from the group consisting of deuterium, halogen, alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, and combination thereof. Preferred Rs is selected from the group consisting of alkyl, cycloalkyl, aryl, heteroaryl, and combination thereof.
The term “alkyl” refers to and includes both straight and branched chain alkyl radicals. Preferred alkyl groups are those containing from one to fifteen carbon atoms and includes methyl, ethyl, propyl, 1-methylethyl, butyl, 1-methylpropyl, 2-methylpropyl, pentyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1,1-dimethylpropyl, 1,2-dimethylpropyl, 2,2-dimethylpropyl, and the like. Additionally, the alkyl group may be optionally substituted.
The term “cycloalkyl” refers to and includes monocyclic, polycyclic, and spiro alkyl radicals. Preferred cycloalkyl groups are those containing 3 to 12 ring carbon atoms and includes cyclopropyl, cyclopentyl, cyclohexyl, bicyclo[3.1.1]heptyl, spiro[4.5]decyl, spiro[5.5]undecyl, adamantyl, and the like. Additionally, the cycloalkyl group may be optionally substituted.
The terms “heteroalkyl” or “heterocycloalkyl” refer to an alkyl or a cycloalkyl radical, respectively, having at least one carbon atom replaced by a heteroatom. Optionally the at least one heteroatom is selected from O, S, N, P, B, Si and Se, preferably, O, S or N. Additionally, the heteroalkyl or heterocycloalkyl group may be optionally substituted.
The term “alkenyl” refers to and includes both straight and branched chain alkene radicals. Alkenyl groups are essentially alkyl groups that include at least one carbon-carbon double bond in the alkyl chain. Cycloalkenyl groups are essentially cycloalkyl groups that include at least one carbon-carbon double bond in the cycloalkyl ring.
The term “heteroalkenyl” as used herein refers to an alkenyl radical having at least one carbon atom replaced by a heteroatom. Optionally the at least one heteroatom is selected from O, S, N, P, B, Si, and Se, preferably, O, S, or N. Preferred alkenyl, cycloalkenyl, or heteroalkenyl groups are those containing two to fifteen carbon atoms. Additionally, the alkenyl, cycloalkenyl, or heteroalkenyl group may be optionally substituted.
The term “alkynyl” refers to and includes both straight and branched chain alkyne radicals. Alkynyl groups are essentially alkyl groups that include at least one carbon-carbon triple bond in the alkyl chain. Preferred alkynyl groups are those containing two to fifteen carbon atoms. Additionally, the alkynyl group may be optionally substituted.
The terms “aralkyl” or “arylalkyl” are used interchangeably and refer to an alkyl group that is substituted with an aryl group. Additionally, the aralkyl group may be optionally substituted.
The term “heterocyclic group” refers to and includes aromatic and non-aromatic cyclic radicals containing at least one heteroatom. Optionally the at least one heteroatom is selected from O, S, N, P, B, Si, and Se, preferably, O, S, or N. Hetero-aromatic cyclic radicals may be used interchangeably with heteroaryl. Preferred hetero-non-aromatic cyclic groups are those containing 3 to 7 ring atoms which includes at least one hetero atom, and includes cyclic amines such as morpholino, piperidino, pyrrolidino, and the like, and cyclic ethers/thio-ethers, such as tetrahydrofuran, tetrahydropyran, tetrahydrothiophene, and the like. Additionally, the heterocyclic group may be optionally substituted.
The term “aryl” refers to and includes both single-ring aromatic hydrocarbyl groups and polycyclic aromatic ring systems. The polycyclic rings may have two or more rings in which two carbons are common to two adjoining rings (the rings are “fused”) wherein at least one of the rings is an aromatic hydrocarbyl group, e.g., the other rings can be cycloalkyls, cycloalkenyls, aryl, heterocycles, and/or heteroaryls. Preferred aryl groups are those containing six to thirty carbon atoms, preferably six to twenty carbon atoms, more preferably six to twelve carbon atoms. Especially preferred is an aryl group having six carbons, ten carbons or twelve carbons. Suitable aryl groups include phenyl, biphenyl, triphenyl, triphenylene, tetraphenylene, naphthalene, anthracene, phenalene, phenanthrene, fluorene, pyrene, chrysene, perylene, and azulene, preferably phenyl, biphenyl, triphenyl, triphenylene, fluorene, and naphthalene. Additionally, the aryl group may be optionally substituted.
The term “heteroaryl” refers to and includes both single-ring aromatic groups and polycyclic aromatic ring systems that include at least one heteroatom. The heteroatoms include, but are not limited to O, S, N, P, B, Si, and Se. In many instances, O, S, or N are the preferred heteroatoms. Hetero-single ring aromatic systems are preferably single rings with 5 or 6 ring atoms, and the ring can have from one to six heteroatoms. The hetero-polycyclic ring systems can have two or more rings in which two atoms are common to two adjoining rings (the rings are “fused”) wherein at least one of the rings is a heteroaryl, e.g., the other rings can be cycloalkyls, cycloalkenyls, aryl, heterocycles, and/or heteroaryls. The hetero-polycyclic aromatic ring systems can have from one to six heteroatoms per ring of the polycyclic aromatic ring system. Preferred heteroaryl groups are those containing three to thirty carbon atoms, preferably three to twenty carbon atoms, more preferably three to twelve carbon atoms. Suitable heteroaryl groups include dibenzothiophene, dibenzofuran, dibenzoselenophene, furan, thiophene, benzofuran, benzothiophene, benzoselenophene, carbazole, indolocarbazole, pyridylindole, pyrrolodipyridine, pyrazole, imidazole, triazole, oxazole, thiazole, oxadiazole, oxatriazole, dioxazole, thiadiazole, pyridine, pyridazine, pyrimidine, pyrazine, triazine, oxazine, oxathiazine, oxadiazine, indole, benzimidazole, indazole, indoxazine, benzoxazole, benzisoxazole, benzothiazole, quinoline, isoquinoline, cinnoline, quinazoline, quinoxaline, naphthyridine, phthalazine, pteridine, xanthene, acridine, phenazine, phenothiazine, phenoxazine, benzofuropyridine, furodipyridine, benzothienopyridine, thienodipyridine, benzoselenophenopyridine, and selenophenodipyridine, preferably dibenzothiophene, dibenzofuran, dibenzoselenophene, carbazole, indolocarbazole, imidazole, pyridine, triazine, benzimidazole, 1,2-azaborine, 1,3-azaborine, 1,4-azaborine, borazine, and aza-analogs thereof. Additionally, the heteroaryl group may be optionally substituted.
Of the aryl and heteroaryl groups listed above, the groups of triphenylene, naphthalene, anthracene, dibenzothiophene, dibenzofuran, dibenzoselenophene, carbazole, indolocarbazole, imidazole, pyridine, pyrazine, pyrimidine, triazine, and benzimidazole, and the respective aza-analogs of each thereof are of particular interest.
The terms alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aralkyl, heterocyclic group, aryl, and heteroaryl, as used herein, are independently unsubstituted, or independently substituted, with one or more general substituents.
In many instances, the General Substituents are selected from the group consisting of deuterium, halogen, alkyl, cycloalkyl, heteroalkyl, heterocycloalkyl, arylalkyl, alkoxy, aryloxy, amino, silyl, germyl, boryl, alkenyl, cycloalkenyl, heteroalkenyl, alkynyl, aryl, heteroaryl, acyl, carboxylic acid, ether, ester, nitrile, isonitrile, sulfanyl, selenyl, sulfinyl, sulfonyl, phosphino, and combinations thereof.
In some instances, the Preferred General Substituents are selected from the group consisting of deuterium, fluorine, alkyl, cycloalkyl, heteroalkyl, alkoxy, aryloxy, amino, silyl, germyl, boryl, alkenyl, cycloalkenyl, heteroalkenyl, aryl, heteroaryl, nitrile, isonitrile, sulfanyl, and combinations thereof.
In some instances, the More Preferred General Substituents are selected from the group consisting of deuterium, fluorine, alkyl, cycloalkyl, alkoxy, aryloxy, amino, silyl, aryl, heteroaryl, sulfanyl, and combinations thereof.
In yet other instances, the Most Preferred General Substituents are selected from the group consisting of deuterium, fluorine, alkyl, cycloalkyl, aryl, heteroaryl, and combinations thereof.
The terms “substituted” and “substitution” refer to a substituent other than H that is bonded to the relevant position, e.g., a carbon or nitrogen. For example, when R1 represents mono-substitution, then one R1 must be other than H (i.e., a substitution). Similarly, when R1 represents di-substitution, then two of R1 must be other than H. Similarly, when R1 represents zero or no substitution, R1, for example, can be a hydrogen for available valencies of ring atoms, as in carbon atoms for benzene and the nitrogen atom in pyrrole, or simply represents nothing for ring atoms with fully filled valencies, e.g., the nitrogen atom in pyridine. The maximum number of substitutions possible in a ring structure will depend on the total number of available valencies in the ring atoms.
As used herein, “combinations thereof” indicates that one or more members of the applicable list are combined to form a known or chemically stable arrangement that one of ordinary skill in the art can envision from the applicable list. For example, an alkyl and deuterium can be combined to form a partial or fully deuterated alkyl group; a halogen and alkyl can be combined to form a halogenated alkyl substituent; and a halogen, alkyl, and aryl can be combined to form a halogenated arylalkyl. In one instance, the term substitution includes a combination of two to four of the listed groups. In another instance, the term substitution includes a combination of two to three groups. In yet another instance, the term substitution includes a combination of two groups.
Preferred combinations of substituent groups are those that contain up to fifty atoms that are not hydrogen or deuterium, or those which include up to forty atoms that are not hydrogen or deuterium, or those that include up to thirty atoms that are not hydrogen or deuterium. In many instances, a preferred combination of substituent groups will include up to twenty atoms that are not hydrogen or deuterium.
The “aza” designation in the fragments described herein, i.e. aza-dibenzofuran, aza-dibenzothiophene, etc. means that one or more of the C—H groups in the respective aromatic ring can be replaced by a nitrogen atom, for example, and without any limitation, azatriphenylene encompasses both dibenzo[f,h]quinoxaline and dibenzo[f,h]quinoline. One of ordinary skill in the art can readily envision other nitrogen analogs of the aza-derivatives described above, and all such analogs are intended to be encompassed by the terms as set forth herein.
As used herein, “deuterium” refers to an isotope of hydrogen. Deuterated compounds can be readily prepared using methods known in the art. For example, U.S. Pat. No. 8,557,400, Patent Pub. No. WO 2006/095951, and U.S. Pat. Application Pub. No. US 2011/0037057, which are hereby incorporated by reference in their entireties, describe the making of deuterium-substituted organometallic complexes. Further reference is made to Ming Yan, et al., Tetrahedron 2015, 71, 1425-30 and Atzrodt et al., Angew. Chem. Int. Ed. (Reviews) 2007, 46, 7744-65, which are incorporated by reference in their entireties, describe the deuteration of the methylene hydrogens in benzyl amines and efficient pathways to replace aromatic ring hydrogens with deuterium, respectively.
It is to be understood that when a molecular fragment is described as being a substituent or otherwise attached to another moiety, its name may be written as if it were a fragment (e.g. phenyl, phenylene, naphthyl, dibenzofuryl) or as if it were the whole molecule (e.g. benzene, naphthalene, dibenzofuran). As used herein, these different ways of designating a substituent or attached fragment are considered to be equivalent.
In some instance, a pair of adjacent substituents can be optionally joined or fused into a ring. The preferred ring is a five, six, or seven-membered carbocyclic or heterocyclic ring, includes both instances where the portion of the ring formed by the pair of substituents is saturated and where the portion of the ring formed by the pair of substituents is unsaturated. As used herein, “adjacent” means that the two substituents involved can be on the same ring next to each other, or on two neighboring rings having the two closest available substitutable positions, such as 2, 2′ positions in a biphenyl, or 1, 8 position in a naphthalene, as long as they can form a stable fused ring system.
In one aspect, the present disclosure provides a compound comprising a first ligand LA of Formula I,
In some embodiments, at least two RA or at least two RB are joined together to form a 7-membered ring, which is referred to as condition 1.
In some embodiments, L1 is NR, and the R is joined with one RA or one RB to form a structure comprising a 7-membered ring, which is referred to as condition 2.
In some embodiments, at least one of RA or RB comprises a 7-membered ring moiety, which is referred to as condition 3.
In some embodiments, only condition 1 is true. In some embodiments, only condition 2 is true. In some embodiments, only condition 3 is true. In some embodiments, both condition 1 and condition 2 are true. In some embodiments, both condition 1 and condition 3 are true. In some embodiments, both condition 2 and condition 3 are true. In some embodiments, all the three conditions are true.
In some embodiments, if moiety A or moiety B is a 5-membered ring fused to the 7-membered ring, then at least one of the 5-membered or the 7-membered ring is heterocyclic.
The compound having a first ligand LA of Formula I is not any of the following compounds:
In some embodiments, a pair of substituents attaching to the adjacent ring atoms of the 7-membered ring moiety are joined together to form a ring. In some embodiments, two pairs of substituents attaching to the adjacent ring atoms of the 7-membered ring moiety are joined together from each pair to form two rings. In some such embodiments, the formed two rings are fused together, connected by a direct bond, or by one ring atom of the 7-membered ring moiety. In some embodiments, three pairs of substituents attaching to the adjacent ring atoms of the 7-membered ring moiety are joined together from each pair to form three rings. In some such embodiments, only two of the formed three rings are fused together. In some such embodiments, three of the formed three rings are not fused to each other. In some embodiments, the substituents attaching to the seven ring atoms of the 7-membered ring moiety are used to form four rings where two of them are fused together. In some embodiments, the above formed rings can be carbocyclic or heterocyclic, and they can be aromatic or non-aromatic. In some embodiments, at least one of the above formed rings, when it is present, is heterocyclic that contains at least one, two, three, or four heteroatoms. In some embodiments, at least two of the above formed rings when they are present is heterocyclic that contains at least one, two, three, or four heteroatoms. In some embodiments, at least three of the above formed rings when they are present is heterocyclic that contains at least one, two, three, or four heteroatoms. In some embodiments, at least one of the above formed rings is further fused by another ring that does not contain the ring atom of the 7-membered ring moiety.
In some embodiments of Formula I, at least one of RA, or RB is partially or fully deuterated. In some embodiments, at least one RA is partially or fully deuterated. In some embodiments, at least one RB is partially or fully deuterated. In some embodiments of Formula I, at least R or R′ if present is partially or fully deuterated.
In some embodiments, each of R, R′, R″, Rα, Rβ, RA, and RB is independently a hydrogen or a substituent selected from the group consisting of the Preferred General Substituents defined herein. In some embodiments, each of R, R′, R″, RA, and RB is independently a hydrogen or a substituent selected from the group consisting of the More Preferred General Substituents defined herein. In some embodiments, each R, R′, R″, RA, and RB is independently a hydrogen or a substituent selected from the group consisting of the Most Preferred General Substituents defined herein.
In some embodiments, the metal M is selected from the group consisting of Ir, Rh, Re, Ru, Os, Pt, Pd, Ag, Au, and Cu. In some embodiments, the metal M is Ir. In some embodiments, the metal M is Pt or Pd. In some embodiments, the metal M is Pt.
In some embodiments, moiety A is a monocyclic ring. In some such embodiments, moiety A is selected from the group consisting of benzene, pyridine, pyrimidine, pyridazine, pyrazine, imidazole, pyrazole, pyrrole, oxazole, furan, thiophene, and thiazole.
In some embodiments, moiety A is a polycyclic fused ring system. In some embodiments, moiety A is selected from the group consisting of naphthalene, quinoline, isoquinoline, quinazoline, benzofuran, benzoxazole, benzothiophene, benzothiazole, benzoselenophene, indene, indole, benzimidazole, carbazole, dibenzofuran, dibenzothiophene, quinoxaline, phthalazine, phenanthrene, phenanthridine, and fluorene.
In some embodiments, moiety B is a monocyclic ring. In some embodiments, moiety B is selected from the group consisting of benzene, pyridine, pyrimidine, pyridazine, pyrazine, imidazole, pyrazole, pyrrole, oxazole, furan, thiophene, and thiazole.
In some embodiments, moiety B is a polycyclic fused ring system. In some embodiments, moiety B is selected from the group consisting of naphthalene, quinoline, isoquinoline, quinazoline, benzofuran, benzoxazole, benzothiophene, benzothiazole, benzoselenophene, indene, indole, benzimidazole, carbazole, dibenzofuran, dibenzothiophene, quinoxaline, phthalazine, phenanthrene, phenanthridine, and fluorene.
In some embodiments, each of moiety A and moiety B can independently be a polycyclic fused ring structure. In some embodiments, each of moiety A and moiety B can independently be a polycyclic fused ring structure comprising at least three fused rings. In some embodiments, the polycyclic fused ring structure has two 6-membered rings and one 5-membered ring. In some such embodiments, the 5-membered ring is fused to the ring coordinated to metal M and the second 6-membered ring is fused to the 5-membered ring. In some embodiments, each of moiety A and moiety B can independently be selected from the group consisting of dibenzofuran, dibenzothiophene, dibenzoselenophene, and aza-variants thereof. In some such embodiments, each of moiety A and moiety B can independently be further substituted at the ortho- or meta-position of the O, S, or Se atom by a substituent selected from the group consisting of deuterium, fluorine, nitrile, alkyl, cycloalkyl, aryl, heteroaryl, and combinations thereof. In some such embodiments, the aza-variants contain exactly one N atom at the 6-position (ortho to the O, S, or Se) with a substituent at the 7-position (meta to the O, S, or Se).
In some embodiments, each of moiety A and moiety B can independently be a polycyclic fused ring structure comprising at least four fused rings. In some embodiments, the polycyclic fused ring structure comprises three 6-membered rings and one 5-membered ring. In some such embodiments, the 5-membered ring is fused to the ring coordinated to metal M, the second 6-membered ring is fused to the 5-membered ring, and the third 6-membered ring is fused to the second 6-membered ring. In some such embodiments, the third 6-membered ring is further substituted by a substituent selected from the group consisting of deuterium, fluorine, nitrile, alkyl, cycloalkyl, aryl, heteroaryl, and combinations thereof.
In some embodiments, each of moiety A and moiety B is independently a polycyclic fused ring structure comprising at least five fused rings. In some embodiments, the polycyclic fused ring structure comprises four 6-membered rings and one 5-membered ring or three 6-membered rings and two 5-membered rings. In some embodiments comprising two 5-membered rings, the 5-membered rings are fused together. In some embodiments comprising two 5-membered rings, the 5-membered rings are separated by at least one 6-membered ring. In some embodiments with one 5-membered ring, the 5-membered ring is fused to the ring coordinated to metal M, the second 6-membered ring is fused to the 5-membered ring, the third 6-membered ring is fused to the second 6-membered ring, and the fourth 6-membered ring is fused to the third-6-membered ring.
In some embodiments, each of moiety A and moiety B can independently be an aza version of the polycyclic fused rings described above. In some such embodiments, each of moiety A and moiety B can independently contain exactly one aza N atom. In some such embodiments, each of moiety A and moiety B can contain exactly two aza N atoms, which can be in one ring, or in two different rings. In some such embodiments, the ring having aza N atom is separated by at least two other rings from the metal M atom. In some such embodiments, the ring having aza N atom is separated by at least three other rings from the metal M atom. In some such embodiments, each of the ortho position of the aza N atom is substituted.
In some embodiments, moiety A is selected from the group consisting of pyridine, imidazole, benzimidazole, and pyrazole.
In some embodiments, moiety B is selected from the group consisting of benzene, naphthalene, and dibenzofuran.
In some embodiments, each of X1, X2, and X3 is C. In some embodiments, X1 and X2 are C, and X3 is N. In some embodiments, X1 and X3 are C, and X2 is N.
In some embodiments, Z1 is N and Z2 is C.
In some embodiments, K1 is a direct bond. In some embodiments, K1 is O. In some embodiments, K1 is S.
In some embodiments, L1 is selected from the group consisting of O, S, and Se. In some embodiments, L1 is selected from the group consisting of BR, NR, and PR. In some embodiments, L1 is NR. In some embodiments, where L1 is BR, NR, or PR, (i) R is joined with an RA to form a ring, (ii) R is joined with an RB to form a ring, or (iii) both (i) and (ii). In some embodiments, L1 is selected from the group consisting of P(O)R, C═O, C═S, C═Se, C═NR′, C═CR′R″, S═O, and SO2. In some embodiments, L1 is selected from the group consisting of BRR′, CRR′, SiRR′, and GeRR′.
In some embodiments, a ring formed between an R of L1 and RA is a 5-membered ring. In such embodiments, a ring formed between an R of L1 and RA is the 7-membered ring. In some embodiments, a ring formed between an R of L1 and RB is a 5-membered ring. In such embodiments, a ring formed between an R of L1 and RB is the 7-membered ring.
In some embodiments, the 7-membered ring has at least two rings fused thereto. In some such embodiments, each of the at least two rings is independently an aryl or heteroaryl ring. In some such embodiments, the at least two rings are not fused together.
In some embodiments, the 7-membered ring has at least three rings fused thereto. In some such embodiments, each of the at least two rings is independently an aryl or heteroaryl ring. In some such embodiments, none of the at least three rings are fused together. In some embodiments, at least two of the at least three rings are fused together.
In some embodiments, the 7-membered ring has at least four rings fused thereto. In some such embodiments, each of the at least four rings is independently an aryl or heteroaryl ring. In some embodiments, at least three of the at least four rings are fused to another one of the at least four rings. In some embodiments, each of the at least four rings is fused to another one of the at least four rings.
In some embodiments, the 7-membered ring has at least five rings fused thereto. In some embodiments, exactly four of the at least five rings are fused to another one of the at least five rings. In some embodiments, each of the at least five rings is fused to another one of the at least five rings.
In some embodiments, the 7-membered ring comprises at least one heteroatom. In some embodiments, the heteroatom is selected from the group consisting of N, O, B, Ge, Se, and Si.
In some embodiments, the 7-membered ring comprises at least two heteroatoms. In some embodiments, each of the at least two heteroatoms is independently selected from the group consisting of N, O, B, Ge, Se, and Si.
In some embodiments, the 7-membered ring comprises at least three heteroatoms. In some embodiments, each of the at least three heteroatoms is independently selected from the group consisting of N, O, B, Ge, Se, and Si.
In some embodiments, at least two RA or two RB substituents are joined together to form a 7-membered ring.
In some embodiments, moiety A is a polycyclic fused ring system and at least two rings of moiety A are part of the 7-membered ring. In some embodiments, two RA are joined to form a 7-membered heterocyclic ring when moiety A is a 5-membered ring.
In some embodiments, moiety B is a polycyclic fused ring system and at least two rings of moiety B are part of the 7-membered ring. In some embodiments, two RB are joined to form a 7-membered heterocyclic ring when moiety B is a 5-membered ring.
In some embodiments, at least one RA or RB comprises a 7-membered ring moiety. In some such embodiments, the 7-membered ring is not bonded or fused to any other RA or RB. In some such embodiments, the 7-membered ring is not bonded or fused to any other RA, RB, R, R′, or R″.
In some embodiments, at least one RA comprises a 7-membered ring moiety and the 7-membered ring is not bonded or fused to an RB or any other RA.
In some embodiments, at least one RB comprises a 7-membered ring moiety and the 7-membered ring is not bonded or fused to an RA or any other RB.
In some embodiments, the compound comprises at least two 7-membered ring moieties.
In some embodiments, at least one RA or RB comprises
wherein W is selected from the structures in the following LIST W:
wherein: each X is independently N or C; the dashed bond indicates the attachment point to moiety A, moiety B, or the ring G; each of RCC and RGG independently represents zero to the maximum allowable substitutions; each of RCC, and RDD is independently selected from the group consisting of the General Substituents as defined herein; XG for each occurrence is independently C, Si, N, Ge, B, O, Se, S, or P; each RGG is independently selected from the group consisting of the General Substituents as defined herein or can be an additional W group; and any two substituents can be fused or joined to form a ring.
It should be understood that any ring or substituent of a moiety in LIST W can be an attachment point to moiety A, moiety B, or ring G unless explicitly indicated otherwise.
In some embodiments for
at least one of RCC is not hydrogen when the chelating metal is Pt. In some embodiments for
at least one of RCC is not hydrogen. In some embodiments for
at least one of RCC is selected from the group consisting of the Preferred General Substituents defined herein.
In some embodiments for
all the three XG are carbon. In some embodiments, at least one of the three XG is a heteroatom. In some embodiments, two of the three XG are Si. In some embodiments, one of the three XG is Ge. In some embodiments, all X are C. In some embodiments, at least one X for each structure is N. In some embodiments, two substituents on two neighboring XG can be joined to form a ring. In some embodiments, two geminal substituents on an XG can be joined to form a ring. In some of these embodiments, the formed ring can be a 5-membered or 6-membered aromatic ring. In some of these embodiments, the formed ring can be a phenyl or a pyridine ring.
In some embodiments, Formula I comprises an electron-withdrawing group. In these embodiments, the electron-withdrawing group commonly comprises one or more highly electronegative elements including but not limited to fluorine, oxygen, sulfur, nitrogen, chlorine, and bromine.
In some embodiments, the electron-withdrawing group has a Hammett constant larger than 0. In some embodiments, the electron-withdrawing group has a Hammett constant equal or larger than 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1.0, or 1.1.
In some embodiments, the electron-withdrawn group is selected from the group consisting of the following structures (LIST EWG 1): F, CF3, CN, COCH3, CHO, COCF3, COOMe, COOCF3, NO2, SF3, SiF3, PF4, SFS, OCF3, SCF3, SeCF3, SOCF3, SeOCF3, SO2F, SO2CF3, SeO2CF3, OSeO2CF3, OCN, SCN, SeCN, NC, +N(Rk2)3, (Rk2)2CCN, (Rk2)2CCF3, CNC(CF3)2, BRk3Rk2, substituted or unsubstituted dibenzoborole, 1-substituted carbazole, 1,9-substituted carbazole, substituted or unsubstituted carbazole, substituted or unsubstituted pyridine, substituted or unsubstituted pyrimidine, substituted or unsubstituted pyrazine, substituted or unsubstituted pyridoxine, substituted or unsubstituted triazine, substituted or unsubstituted oxazole, substituted or unsubstituted benzoxazole, substituted or unsubstituted thiazole, substituted or unsubstituted benzothiazole, substituted or unsubstituted imidazole, substituted or unsubstituted benzimidazole, ketone, carboxylic acid, ester, nitrile, isonitrile, sulfinyl, sulfonyl, partially and fully fluorinated alkyl, partially and fully fluorinated aryl, partially and fully fluorinated heteroaryl cyano-containing alkyl cyano-containing aryl cyano-containing heteroaryl isocyanate,
In some embodiments, the electron-withdrawing group is selected from the group consisting of the structures in the following list LIST EWG 2:
In some embodiments, the electron-withdrawing group is selected from the group consisting of the structures in the following list LIST EWG 3:
In some embodiments, the electron-withdrawing group is selected from the group consisting of the structures in the following list LIST EWG 4:
In some embodiments, the electron-withdrawing group is a π-electron deficient electron-withdrawing group. In some embodiments, the π-electron deficient electron-withdrawing group is selected from the group consisting of the structures in the following list LIST Pi-EWG: CN, COCH3, CHO, COCF3, COOMe, COOCF3, NO2, SF3, SiF3, PF4, SFs, OCF3, SCF3, SeCF3, SOCF3, SeOCF3, SO2F, SO2CF3, SeO2CF3, OSeO2CF3, OCN, SCN, SeCN, NC, +N(Rk1)3, BRk1Rk2, substituted or unsubstituted dibenzoborole, 1-substituted carbazole, 1,9-substituted carbazole, substituted or unsubstituted carbazole, substituted or unsubstituted pyridine, substituted or unsubstituted pyrimidine, substituted or unsubstituted pyrazine, substituted or unsubstituted pyridazine, substituted or unsubstituted triazine, substituted or unsubstituted oxazole, substituted or unsubstituted benzoxazole, substituted or unsubstituted thiazole, substituted or unsubstituted benzothiazole, substituted or unsubstituted imidazole, substituted or unsubstituted benzimidazole, ketone, carboxylic acid, ester, nitrile, isonitrile, sulfinyl, sulfonyl, partially and fully fluorinated aryl, partially and fully fluorinated heteroaryl, cyano-containing aryl, cyano-containing heteroaryl, isocyanate,
wherein the variables are the same as previously defined.
In some embodiments of Formula I, at least one of RA, or RB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments of Formula I, at least one of RA, or RB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments of Formula I, at least one of RA, or RB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments of Formula I, at least one of RA, or RB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments of Formula I, at least one of RA, or RB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of Formula I, at least one RA is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments of Formula I, at least one of RA is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments of Formula I, at least one of RA is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments of Formula I, at least one of RA is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments of Formula I, at least one of RA is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of Formula I, at least one RB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments of Formula I, at least one of RB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments of Formula I, at least one of RB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments of Formula I, at least one of RB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments of Formula I, at least one of RB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments of the compound, the compound comprises at least an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments of the compound, the compound comprises at least an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments of the compound, the compound comprises at least an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments of the compound, the compound comprises at least an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments of the compound, the compound comprises at least an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments, ligand LA is selected from the group consisting of the structures in the following
In some embodiments for the structures of LIST 1, at least one of RA1, RA2, RAA or RBB is partially or fully deuterated. In some embodiments, at least one RA1 is partially or fully deuterated. In some embodiments, at least one RA2 is partially or fully deuterated. In some embodiments, at least one RAA is partially or fully deuterated. In some embodiments, at least one RBB is partially or fully deuterated.
In some embodiments for the structures of LIST 1, at least one RA1 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1, at least one RA2 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1, at least one RAA is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1, at least one RBB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RBBis/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1, at least one of RA1, RA2, RAA or RBB comprises
as defined herein.
In some embodiments, ligand LA is selected from the group consisting of the structures in the following
In some embodiments for the structures of LIST 1a, at least one of RA1, RA2, RAA or RBB is partially or fully deuterated. In some embodiments, at least one RA1 is partially or fully deuterated. In some embodiments, at least one RA2 is partially or fully deuterated. In some embodiments, at least one RAA is partially or fully deuterated. In some embodiments, at least one RBB is partially or fully deuterated.
In some embodiments for the structures of LIST 1a, at least one RA1 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1a, at least one RA2 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1a, at least one RAA is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1a, at least one RBB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 1a, at least one of RA1, RA2, RAA or RBB comprises
as defined herein.
In some embodiments, ligand LA is selected from the group consisting of the structures in the following
In some embodiments for the structures of LIST 2, at least one of RA1, RA2, RAA or RBB is partially or fully deuterated. In some embodiments, at least one RA1 is partially or fully deuterated. In some embodiments, at least one RA2 is partially or fully deuterated. In some embodiments, at least one RAA is partially or fully deuterated. In some embodiments, at least one RBB is partially or fully deuterated.
In some embodiments for the structures of LIST 2, at least one RA1 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2, at least one RA2 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2, at least one RBB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2, at least one of RA1, RA2, RAA or RBB comprises
as defined herein.
In some embodiments, ligand LA is selected from the group consisting of the structures in the following LIST 2a:
In some embodiments for the structures of LIST 2a, at least one of RA1, RA2, RAA or RBB is partially or fully deuterated. In some embodiments, at least one RA1 is partially or fully deuterated. In some embodiments, at least one RA2 is partially or fully deuterated. In some embodiments, at least one RAA is partially or fully deuterated. In some embodiments, at least one RBB is partially or fully deuterated.
In some embodiments for the structures of LIST 2a, at least one RA1 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA1 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2a, at least one RA2 is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RA2 is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2a, at least one RAA is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RAA is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2a, at least one RBB is/comprises an electron-withdrawing group from LIST EWG 1 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 2 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 3 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST EWG 4 as defined herein. In some embodiments, at least one of RBB is/comprises an electron-withdrawing group from LIST Pi-EWG as defined herein.
In some embodiments for the structures of LIST 2a, at least one of RA1, RA2, RAA or RBB comprises
as defined herein.
In some embodiments, when LA has a structure selected from the group consisting of
wherein at least one RAA, RA1, RA2 or RBB is not hydrogen or deuterium. In some such embodiments, at least one RAA, RA1, RA2, or RBB comprises alkyl, cycloalkyl, aryl, or heteroaryl.
In some embodiments, ligand LA is selected from the group consisting of LAi-(RG)(RH)(RI)(GJ), and LAw-(RG)(RH)(RI)(GJ), wherein i is an integer from 1 to 30, w is an integer from 31 to 36, and each of RG, RH, and RI is independently selected from R1 to R450, while RI is selected from R418 to R450 for LAw-(RG)(RH)(RI)(GJ), and GJ is independently selected from Q1 to Q80; wherein LA1-(R1)(R1)(R1)(Q1) to LA30-(R450)(R450)(R450)(Q80) and LA31-(R1)(R1)(R418)(Q1) to LA36-(R450)(R450)(R450)(Q80) are defined in the following LIST 3:
In some embodiments, the compound has a formula of M(LA)p(LB)q(LC)r wherein LB and LC are each a bidentate ligand; and wherein p is 1, 2, or 3; q is 0, 1, or 2; r is 0, 1, or 2; and p+q+r is the oxidation state of the metal M.
In some embodiments, the compound has a formula selected from the group consisting of Ir(LA)3, Ir(LA)(LB)2, Ir(LA)2(LB), Ir(LA)2(LC), and Ir(LA)(LB)(LC); and wherein LA, LB, and LC are different from each other. In some embodiments, LB is a substituted or unsubstituted phenylpyridine, and LC is a substituted or unsubstituted acetylacetonate.
In some embodiments, the compound has a formula of Pt(LA)(LB); and wherein LA and LB can be same or different. In some such embodiments, LA and LB are connected to form a tetradentate ligand.
In some embodiments, LB and LC are each independently selected from the group consisting of the structures of the following LIST 6:
In some embodiments, LB and LC are each independently selected from the group consisting of the structures of the following LIST 7:
In some embodiments, the compound can have the formula Ir(LA)3, the formula Ir(LA)(LBk)2, the formula Ir(LA)2(LBk), the formula Ir(LA)2(LCj-I), the formula Ir(LA)2(LCj-II), the formula Ir(LA)(LBk)(LCj-I), or the formula Ir(LA)(LBk)(LCj-II), wherein LA is a ligand with respect to Formula I as defined here; LBk is defined herein; and LCj-I and LCj-II are each defined herein.
In some embodiments, LA is selected from the group consisting of the structures of LIST 1, LIST 2, and LIST 3. In some embodiments, LA is selected from the group consisting of the structures of LIST 1 and LBk is selected from the structures of the group consisting of LIST 8. In some embodiments, LA is selected from the group consisting of the structures of LIST 2 and LBk is selected from the structures of the group consisting of LIST 8. In some embodiments, LA is selected from the group consisting of the structures of LIST 3 and LBk is selected from the structures of the group consisting of LIST 8.
In some embodiments, LA is selected from the group consisting of the structures of LIST 1 and LCj-I and LCj-II are selected from the structures of the group consisting of LIST 9. In some embodiments, LA is selected from the group consisting of the structures of LIST 2 and LCj-I and LCj-II are selected from the structures of the group consisting of LIST 9. In some embodiments, LA is selected from the group consisting of the structures of LIST 3 and LCj-I and LCj-II are selected from the structures of the group consisting of LIST 9.
In some embodiments, LA is selected from the group consisting of the structures of LIST 1, LIST 1a, LIST 2, LIST 2a, and LIST 3. In some embodiments, LA is selected from LIST 3 of LAi-(RG)(RH)(RI)(GJ) consisting of LA1-(R1)(R1)(R1)(Q1) to LA30-(R450)(R450)(R450)(Q80) as defined and LAw-(RG)(RH)(RI)(GJ) consisting of LA31-(R1)(R1)(R418)(Q1) to LA36-(R450)(R450)(R450)(Q80).
In some embodiments, LB is selected from the group consisting of the structures of LIST 6, LIST 7, and LIST 8. In some embodiments, LB is selected from LIST 8 of LBk consisting of LB1 to LB474 as defined herein wherein k is an integer from 1 to 474,
In some embodiments, the compound can be Ir(LA)2(LB), or Ir(LA)(LB)2. In some of these embodiments, the compound can be Ir(LA)2(LBk), or Ir(LA)(LBk)2. In some of these embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))2(LB), or Ir(LAi-(RG)(RH)(RI)(GJ))(LB)2. In some of these embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))2(LBk) consisting of the compounds of Ir(LA1-(R1)(R1)(R1)(Q1))2(LB1) to Ir(LA30-(R450)(R450)(R450)(Q80))2(LB474), LAw-(RG)(RH)(RI)(GJ) consisting of the compounds of Ir(LA31-(R1)(R1)(R418)(Q1))2(LB1) to Ir(LA36-(R450)(R450)(R450)(Q80))2(LB474), Ir(LAi-(RG)(RH)(RI)(GJ))2(LBk)2 consisting of the compounds of Ir(LA1-(R1)(R1)(R1)(Q1))(LB1)2 to Ir(LA30-(R450)(R450)(R450)(Q80))(LB474)2, or Ir(LAw-(RG)(RH)(RI)(GJ))(LBk)2 consisting of the compounds of Ir(LA31-(R1)(R1)(R418)(Q1))(LB1)2 to Ir(LA36-(R450)(R450)(R450)(Q80))(LB474)2.
In some embodiments, the compound can be Ir(LA)2(LC). In some embodiments, the compound can be Ir(LA)2(LCj-I). In some embodiments, the compound can be Ir(LA)2(LCj-II). In some embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))2(LC). In some embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))2(LCj-I) consisting of the compounds of Ir(LA1-(R1)(R1)(R1)(Q1))2(LC1-I) to Ir(LA30-(R450)(R450)(R450)(Q80))2(LC1416-I). In some embodiments, the compound can be Ir(LAw-(RG)(RH)(RI)(GJ))2(LCj-I) consisting of the compounds of Ir(LA31-(R1)(R1)(R418)(Q1))2(LC1-I) to Ir(LA36-(R450)(R450)(R450)(Q80))2(LC1416-I). In some embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))2(LCj-II) consisting of the compounds of Ir(LA1-(R1)(R1)(R1)(Q1))2(LC1-II) to Ir(LA30-(R450)(R450)(R450)(Q80))2(LC1416-II). In some embodiments, the compound can be Ir(LAw-(RG)(RH)(RI)(GJ))2(LCj-II) consisting of the compounds of Ir(LA31-(R1)(R1)(R418)(Q1))2(LC1-II) to Ir(LA36-(R450)(R450)(R450)(Q80))2(LC1416-II).
In some embodiments, the compound can be Ir(LA)(LB)(LC). In some of these embodiments, the compound can be Ir(LA)(LB)(LCj-I). In some of these embodiments, the compound can be Ir(LA)(LB)(LCj-II). In some of these embodiments, the compound can be Ir(LA)(LBk)(LCj-I). In some of these embodiments, the compound can be Ir(LA)(LBk)(LCj-II). In some of these embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))(LBk)(LCj-I) consisting of the compounds of Ir(LA1-(R1)(R1)(R1)(Q1))(LB1)(LC1-I) to Ir(LA30-(R450)(R450)(R450)(Q80))(LB474)(LC1416-I). In some of these embodiments, the compound can be Ir(LAw-(RG)(RH)(RI)(GJ))(LBk)(LCj-I) consisting of the compounds of Ir(LA31-(R1)(R1)(R418)(Q1))(LB1)(LC1-I) to Ir(LA36-(R450)(R450)(R450)(Q80))(LB474)(LC1416-I). In some of these embodiments, the compound can be Ir(LAi-(RG)(RH)(RI)(GJ))(LBk)(LCj-II) consisting of the compounds of Ir(LA1-(R1)(R1)(R1)(Q1))(LB1)(LC1-II) to Ir(LA30-(R450)(R450)(R450)(Q80))(LB474)(LC1416-II). In some of these embodiments, the compound can be Ir(LAw-(RG)(RH)(RI)(GJ))(LBk)(LCj-II) consisting of the compounds of Ir(LA31-(R1)(R1)(R418)(Q1))(LB1)(LC1-II) to Ir(LA36-(R450)(R450)(R450)(Q80))(LB474)(LC1416-II). In some embodiments, the compound has formula Ir(LA)3, formula Ir(LA)(LBk)2, formula Ir(LA)2(LBk), formula Ir(LA)2(LCj-II), or formula Ir(LA)2(LCj-II), wherein:
wherein each LCj-I has a structure based on formula
and
each LCj-II has a structure based on formula
wherein for each LCj in LCj-I and LCj-II, R201 and R202 are each independently defined in the following LIST 9:
In some embodiments, the compound is selected from the group consisting of only those compounds whose LBk corresponds to one of the following: LB1, LB2, LB18, LB28, LB38, LB108, LB118, LB122, LB124, LB126, LB128, LB130, LB132, LB134, LB136, LB138, LB140, LB142, LB144, LB156, LB158, LB160, LB162, LB164, LB168, LB172, LB175, LB204, LB206, LB214, LB216, LB218, LB220, LB222, LB231, LB233, LB235, LB237, LB240, LB242, LB244, LB246, LB248, LB250, LB252, LB254, LB256, LB258, LB260, LB262, LB264, LB265, LB266, LB267, LB268, LB269, and LB270.
In some embodiments, the compound is selected from the group consisting of only those compounds whose LBk corresponds to one of the following: LB1, LB2, LB18, LB28, LB38, LB108, LB118, LB122, LB126, LB128, LB132, LB136, LB138, LB142, LB156, LB162, LB204, LB206, LB214, LB216, LB218, LB220, LB231, LB233, LB237, LB264, LB265, LB266, LB267, LB268, LB269, and LB270.
In some embodiments, the compound is selected from the group consisting of only those compounds having LCj-I or LCj-II ligand whose corresponding R201 and R202 are defined to be one of the following structures: RD1, RD3, RD4, RD5, RD9, RD10, RD17, RD18, RD20, RD22, RD37, RD40, RD41, RD42, RD43, RD48, RD49, RD50, RD54, RD55, RD58, RD59, RD78, RD79, RD81, RD87, RD88, RD89, RD93, RD116, RD117, RD118, RD119, RD120, RD133, RD134, RD135, RD136, RD143, RD144, RD145, RD146, RD147, RD149, RD151, RD154, RD155, RD161, RD175, RD190, RD193, RD200, RD201, RD206, RD210, RD214, RD215, RD216, RD218, RD219, RD220, RD227, RD237, RD241, RD242, RD245, and RD246.
In some embodiments, the compound is selected from the group consisting of only those compounds having LCj-I or LCj-II ligand whose corresponding R201 and R202 are defined to be one of selected from the following structures: RD1, RD3, RD4, RD5, RD9, RD10, RD17, RD22, RD43, RD50, RD78, RD116, RD118, RD133, RD134, RD135, RD136, RD143, RD144, RD145, RD146, RD149, RD151, RD154, RD155, RD190, RD193, RD200, RD201, RD206, RD210, RD214, RD215, RD216, RD218, RD219, RD220, RD227, RD237, RD241, RD242, RD245, AND RD246.
In some embodiments, the compound is selected from the group consisting of only those compounds having one of the following structures for the LCj-I ligand:
In some embodiments, the compound is selected from the group consisting of the structures of the following LIST 11:
This application is a continuation-in-part application of co-pending U.S. patent application Ser. No. 18/366,076, filed on Aug. 7, 2023, which in turn claims priority under 35 U.S.C. § 119(e) to U.S. Provisional Application No. 63/403,433, filed on Sep. 2, 2022, the entire contents of the above referenced applications are incorporated herein by reference.
Number | Date | Country | |
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63403433 | Sep 2022 | US |
Number | Date | Country | |
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Parent | 18366076 | Aug 2023 | US |
Child | 18419587 | US |