This application claims priority to Taiwan Application Serial Number 109142114, filed Nov. 30, 2020, which is herein incorporated by reference.
The present disclosure relates to an organic light-emitting diode. More particularly, the present disclosure relates to an organic light-emitting diode including a quasicrystalline material.
The organic light-emitting diode (OLED) is one type of light-emitting diodes which has an electroluminescence layer made from organic materials. Compare the organic light-emitting diode to the conventional liquid-crystal display, the organic light-emitting diode has advantages, such as low cost, simple manufacturing process, high contrast, wide view angle, short response time, high flexibility and energy efficiency, due to the difference in materials. Thus, it makes the organic light-emitting diode become a light-emitting element with great potential.
However, the light extraction efficiency of the organic light-emitting diode is still poor because the refractive indices of the electrode layers and the glass substrate in the organic light-emitting diode and the refractive index of the atmosphere are different from one another. In order to remedy this defect, a lot of methods, such as Bragg grating, low-index grid or substrate with nano structural surface have been developed to enhance the light extraction efficiency. Nevertheless, the costs of the aforementioned methods are pretty high, and the manufacturing processes thereof are complicated for large-scale production.
In this regard, how to improve the luminescence properties of the organic light-emitting diode through simple manufacturing process has become a pursuit target for vendors.
According to one embodiment of one aspect in the present disclosure, a manufacturing method of an organic light-emitting diode includes steps as follows. A substrate is provided and a layered structure forming step is performed. In the layered structure forming step, an anode layer, a scattering layer, an emissive layer and a cathode layer are sequentially formed on the substrate, so as to obtain an organic light-emitting diode. A material of the scattering layer is a quasicrystalline material.
According to one embodiment of another aspect in the present disclosure, an organic light-emitting diode is provided. The organic light-emitting diode is manufactured by the aforementioned manufacturing method of the organic light-emitting diode.
According to another embodiment of one aspect in the present disclosure, a manufacturing method of an organic light-emitting diode includes steps as follows. A substrate is provided, a scattering layer forming step is performed and a layered structure forming step is performed. The substrate includes an upper surface and a bottom surface opposite to the upper surface. In the scattering layer forming step, a scattering layer is formed on the bottom surface of the substrate. In the layered structure forming step, an anode layer, an emissive layer and a cathode layer are sequentially formed on the upper surface of the substrate, so as to obtain an organic light-emitting diode. A material of the scattering layer is a quasicrystalline material.
According to another embodiment of another aspect in the present disclosure, an organic light-emitting diode is provided. The organic light-emitting diode is manufactured by the aforementioned manufacturing method of the organic light-emitting diode.
The present disclosure can be more fully understood by reading the following detailed description of the embodiment, with reference made to the accompanying drawings as follows:
Please refer to
In Step 110, a substrate 210 is provided. A material of the substrate 210 can be a transparent material with high transmittance, such as glass, polyimide (PI) or polyethylene naphthalate (PEN).
In Step 120, a layered structure forming step is performed to sequentially form an anode layer 220, a scattering layer 230, an emissive layer 250 and a cathode layer 270 on the substrate 210, so as to obtain the organic light-emitting diode 200. Furthermore, a hole transport layer 240 can be formed between the scattering layer 230 and the emissive layer 250, or an electron transport layer 260 can be formed between the emissive layer 250 and the cathode layer 270. The hole transport layer 240 and the electron transport layer 260 are configured to improve the transport of holes and electrons. Thus, the hole transport layer 240 and the electron transport layer 260 can be arranged according to the transport properties of the materials of other layers.
Please note that the scattering layer 230 can be spin-coated on the anode layer 220 to obtain better coating results. A material of the scattering layer 230 is a quasicrystalline material, and the quasicrystalline material can be an aluminum-cobalt-copper nano-quasicrystal. Please refer to
In detail, a raw material is provided in Step 310. The raw material includes an aluminum metal, a cobalt metal and a copper metal.
In Step 320, an annealing step is performed to anneal the raw material after the raw material is melted, so as to obtain an aluminum-cobalt-copper quasicrystal. The raw material, which is melted, can be annealed under 900° C. in the vacuum for 15 days.
In Step 330, an exfoliating step is performed. The aluminum-cobalt-copper quasicrystal is mixed with a solvent to form a quasicrystalline solution. The quasicrystalline solution is sonicated, so as to make the aluminum-cobalt-copper quasicrystal exfoliate into the aluminum-cobalt-copper nano-quasicrystal. The solvent can be an N,N-dimethylformamide solvent, and the quasicrystalline solution can be sonicated for 60 hours.
Please refer to
In Step 410, a substrate 510 is provided. A material of the substrate 510 can be the aforementioned materials, and the substrate 510 includes an upper surface 511 and a bottom surface 512 opposite to the upper surface 511.
In Step 420, a scattering layer forming step is performed to form a scattering layer 530 on the bottom surface 512 of the substrate 510. The scattering layer 530 can be drop-cast on the bottom surface 512 of the substrate 510 to obtain better coating results. Similarly, a material of the scattering layer 530 is a quasicrystalline material, which can be an aluminum-cobalt-copper nano-quasicrystal. The synthesis method for manufacturing the aluminum-cobalt-copper nano-quasicrystal has been introduced above, and the details will not be given herein.
In Step 430, a layered structure forming step is performed to sequentially form an anode layer 520, an emissive layer 550 and a cathode layer 570 on the upper surface 511 of the substrate 510, so as to obtain the organic light-emitting diode 500. In the layered structure forming step, it can choose to arrange the hole transport layer 540 and the electron transport layer 560, and the details are described above and will not be given herein.
Please refer to
The luminescence properties of the organic light-emitting diodes manufactured by different manufacturing method are tested as below. In the following tests, the current-voltage-luminance characterization of each example and comparison was carried out. The emission area of each example and comparison is 0.09 cm2, and the tests are done in an ambient atmosphere without encapsulation.
The organic light-emitting diodes of Example 1 and Comparison 1 are both manufactured by the manufacturing method of
Please refer to
Furthermore, please refer to
The organic light-emitting diodes of Example 2 and Comparison 2 are both manufactured by the manufacturing method of
Please refer to
From
The organic light-emitting diodes of Example 3 and Comparison 3 are both manufactured by the manufacturing method of
Please refer to
From
Furthermore, please refer to
In this regard, according to the manufacturing method of the organic light-emitting diode of the present disclosure, the material of the scattering layer is chosen to be the quasicrystalline material. Therefore, the luminous efficiency and luminance of the organic light-emitting diode are enhanced. The complexity of forming the scattering layer is also reduced, which facilitates the large-scale production.
Although the present disclosure has been described in considerable detail with reference to certain embodiments thereof, other embodiments are possible. Therefore, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein.
It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present disclosure without departing from the scope or spirit of the disclosure. In view of the foregoing, it is intended that the present disclosure cover modifications and variations of this disclosure provided they fall within the scope of the following claims.
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