Claims
- 1. A method for controlling the photoresponsiveness of tellurium comprising fusion of intimate mixture of tellurium with at least one compound of the formula: ##EQU2## wherein R is selected from divalent hydrocarbylene radicals of from 5 to 50 carbon atoms, divalent heterocyclic, alicyclic and aromatic radicals having from 3 to 50 carbon atoms;
- n is a positive integer; and
- x is the radical --Se--R--Se--; or linear polymers comprising recurring units represented by the formula:
- Se -- A -- Se I
- wherein
- A is selected from the group consisting of divalent alkylene radicals having from 9 to 20 carbon atoms, divalent aromatic radicals having from 6 to 50 carbon atoms and divalent heterocyclic radicals,
- the relative weight ratio of tellurium to cyclic diselenide in the intimate mixture ranging from about 1:1 to about 12:1.
- 2. A method for controlling the photoresponsiveness of tellurium comprising fusion of an intimate mixture of tellurium with at least one compound of the formula:
- B -- Se.sub.a b
- wherein
- B is selected from the group consisting of divalent hydrocarbylene radicals and divalent heterocyclic radicals,
- a is a positive integer of at least 3 and
- b is a positive integer greater than 1.
- the relative weight ratio of tellurium to polyselenide in the intimate mixture ranging from about 1:1 to about 12:1.
- 3. A method for controlling the photoresponsiveness of compounds ##EQU3## wherein R is selected from divalent hydrocarbylene radicals of from 5 to 50 carbon atoms, divalent heterocyclic, alicyclic and aromatic radicals having from 3 to 50 carbon atoms;
- n is a positive integer; and
- X is the radical --Se--R--Se--; or linear polymers comprising recurring units represented by the formula:
- Se -- A -- Se
- wherein
- A is selected from the group consisting of divalent alkylene radicals having at from 9 to 20 carbon atoms, divalent aromatic radicals having from 6 to 50 carbon atoms and divalent heterocyclic radicals
- or
- B -- Se.sub.a b
- wherein
- B is selected from the group consisting of divalent hydrocarbylene radicals and divalent heterocyclic radicals,
- a is a positive integer of at least 3 and
- b is a positive integer greater than 1 comprising fusing an intimate mixture of said compounds and tellurium,
- the relative weight ratio of tellurium to the above compounds in said intimate mixture ranging from about 1:1 to about 12:1.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of application Ser. No. 210,275, filed Dec. 20, 1971, now U.S. Pat. No. 3,905,958, which in turn is a divisional of application Ser. No. 59,495, filed July 30, 1970 (now U.S. Pat. 3,671,467, issued June 20, 1972).
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
2500164 |
Garwood et al. |
Mar 1950 |
|
3671467 |
Gunther |
Jun 1972 |
|
Divisions (1)
|
Number |
Date |
Country |
Parent |
59495 |
Jul 1970 |
|
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
210275 |
Dec 1971 |
|