Claims
- 1. A treated substrate prepared by a method comprising the steps of:
- (I) mixing:
- (A) 100 parts by weight of a diorganopolysiloxane having the general formula
- R.sup.2 O(R.sub.2 SiO).sub.n (RR.sup.1 SiO).sub.m R.sup.2
- wherein R is a monovalent hydrocarbon group having from 1 to 8 carbon atoms, R.sup.1 is a monovalent organic group, R.sup.2 is selected from a hydrogen atom or an alkyl group, the value of m+n is at least 10, and has a viscosity at 25.degree. C. in the range of 30-100,000 mm.sup.2 /s;
- (B) 0.1-20 parts by weight of an organosilicon compound having the general formula ##STR12## wherein R.sup.3 is a monovalent hydrocarbon group having from 1 to 8 carbon atoms, R.sup.4 is an monovalent hydrocarbon group having from 1 to 8 carbon atoms, and R.sup.5 is an alkyl group;
- (C) 1-60 parts by weight of a surfactant; and
- (D) water;
- (II) emulsifying the mixture of (I); and
- (III) applying the mixture from (II) to a substrate.
- 2. A substrate according to claim 1, wherein the method further comprises heating the mixture of (I) prior to step (II).
- 3. A substrate according to claim 1, wherein the method further comprises heating the substrate.
- 4. A substrate according to claim 1, wherein the substrate is selected from the group consisting of glass fibers, carbon-fiber feed yarns, silicon carbide fibers, polyester, polyamide, polyacrylonitrile, vinylon, polyethylene, polyvinyl chloride, polypropylene, spandex, acetate fibers, semisynthetic fibers, wool, silk, hemp, cotton, angora rabbit hair, mohair, asbestos, rayon and bemberg.
- 5. A substrate according to claim 1, wherein the substrate is a fiber selected from staple fibers, filament fibers, tow fibers, top fibers, or yarn fibers.
- 6. A substrate according to claim 1, wherein the substrate is a fabric selected from knitwear, woven fabrics, or nonwoven fabrics.
- 7. A substrate according to claim 1, wherein R is methyl.
- 8. A substrate according to claim 1, wherein R.sup.1 is selected from the group consisting of alkyl groups, alkenyl groups, aryl groups, aralkyl groups, halogen-substituted alkyl groups, amino-group-substituted alkyl groups, alkylamino-group-substituted alkyl groups, acyl-group-substituted alkyl groups, epoxy-group-containing alkyl groups, mercapto-group-substituted alkyl groups, and acyloxy-group-substituted alkyl groups.
- 9. A substrate according to claim 1, wherein R.sup.1 is selected from the group consisting of methyl, ethyl, propyl, butyl, vinyl, allyl, propenyl, phenyl, tolyl, 2-phenylethyl, 2-phenylpropyl, 3,3,3-trifluoropropyl, 3-aminopropyl, 3-(N-ethylamino)propyl, 3-(N-butylamino)propyl, 4-(N-cyclohexylamino)butyl, 4-(N-phenylamino)butyl, N-aminoethylaminopropyl, 2-(N,N-dimethylamino)ethyl, 3-glycidoxypropyl, 3,4-epoxycyclohexylpropyl, 3-mercaptopropyl, and 3-methacryloxypropyl.
- 10. A substrate according to claim 1, wherein R and R.sup.1 are methyl, R.sup.2 is selected from hydrogen or methyl, n has a value of zero, and m has a value of at least 10.
- 11. A substrate according to claim 1, wherein R is methyl, R.sup.1 is N-aminoethylaminopropyl, R.sup.2 is selected from hydrogen or methyl, n has a value of 10 to 2000, and m has a value of from 1 to 100.
- 12. A substrate according to claim 1, wherein R is methyl, R.sup.1 is 3-aminopropyl, R.sup.2 is selected from hydrogen or methyl, n has a value of 10 to 2000, and m has a value of from 1 to 100.
- 13. A substrate according to claim 1, wherein (B) is selected from the group consisting of: ##STR13##
- 14. A substrate according to claim 1, wherein (C) is selected from a nonionic surfactant, anionic surfactant, cationic surfactant, or amphoteric surfactant.
- 15. A substrate according to claim 14, wherein the nonionic surfactant is selected from the group consisting of polyoxyalkylene alkyl ether, polyoxyalkylene alkyl phenyl ether, polyoxyalkylene alkyl ester, polyoxyalkylene sorbitan alkyl ester, polyethylene glycol, polypropylene glycol, and diethylene glycol.
- 16. A substrate according to claim 14, wherein the anionic surfactant is selected from the group consisting of hexylbenzenesulfonic acid, octylbenzenesulfonic acid, decylbenzenesulfonic acid, dodecylbenzenesulfonic acid, cetylbenzenesulfonic acid, myristylbenzenesulfonic acid, CH.sub.3 (CH.sub.2).sub.6 CH.sub.2 O(C.sub.2 H.sub.4 O).sub.2 SO.sub.3 H, CH.sub.3 (CH.sub.2).sub.7 CH.sub.2 O(C.sub.2 H.sub.4 O).sub.3.5 SO.sub.3 H, CH.sub.3 (CH.sub.2).sub.8 CH.sub.2 O(C.sub.2 H.sub.4).sub.8 SO.sub.3 H, CH.sub.3 (CH.sub.2).sub.19 CH.sub.2 O(C.sub.2 H.sub.4 O).sub.4 SO.sub.3 H, CH.sub.3 (CH.sub.2).sub.10 CH.sub.2 O(C.sub.2 H.sub.4 O).sub.6 SO.sub.3 H, sodium salts, potassium salts, and amine salts of alkylnaphthylsulfonic acid.
- 17. A substrate according to claim 14, wherein the cationic surfactant is selected from the group consisting of octyltrimethylammonium hydroxide, dodecyltrimethylammonium hydroxide, hexadecyltrimethylammonium hydroxide, octyldimethylammonium hydroxide, decyldimethylammonium hydroxide, didodecyldimethylammonium hydroxide, dioctadecyldimethylammonium hydroxide, tallow trimethylammonium hydroxide, coconut oil, and trimethylammonium hydroxide.
- 18. A substrate according to claim 14, wherein the amphoteric surfactant is selected from amino acid surfactants or betaine acid surfactants.
- 19. A substrate according to claim 1, wherein the mixture of (I) further comprises an additive selected from the group consisting of organoalkoxysilanes, salts of metals selected from iron, lead, antimony, cadmium, tin, titanium, calcium, bismuth, or zirconium, triethanolamine, triethylenediamine, and dimethylphenylamine.
Priority Claims (1)
Number |
Date |
Country |
Kind |
5-347513 |
Dec 1993 |
JPX |
|
Parent Case Info
This is a divisional of application Ser. No. 08/362,626 filed on Dec. 22, 1994 now U.S. Pat. No. 5,521,238 of which the following is a specification.
US Referenced Citations (7)
Foreign Referenced Citations (4)
Number |
Date |
Country |
34-2041 |
Jun 1959 |
JPX |
41-13995 |
Mar 1966 |
JPX |
63-245466 |
Oct 1988 |
JPX |
62-26924 |
Oct 1988 |
JPX |
Divisions (1)
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Number |
Date |
Country |
Parent |
362626 |
Dec 1994 |
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