Claims
- 1. A peroxide-curable organosiloxane composition comprising
- A. a polydiorganosiloxane where the organic groups bonded to silicon are selected from the group consisting of monovalent hydrocarbon and halohydrocarbon radicals;
- B. an amount of an organic peroxide sufficient to promote curing of said composition at temperatures at least equal to the decomposition temperature of said peroxide; and
- C. a benzotriazole of the general formula ##STR6## in an amount sufficient to improve the physical properties of the cured elastomer while simultaneously imparting a resistance to ultraviolet-induced degradation,
- where X is a chlorine atom and Y represents a substituted phenyl radical of the formula ##STR7## and where R.sup.1 represents hydroxyl or hydroxyalkyl containing from 1 to 4 carbon atoms, R.sup.2 represents a tertiary alkyl radical containing from 4 to 6 carbon atoms and R.sup.3 is selected from the group consisting of R.sup.2 and a hydrogen atom.
- 2. A composition according to claim 1 where said composition includes from 10 to 100 weight percent, based on the weight of said polydiorganosiloxane, of a reinforcing silica filler.
- 3. A composition according to claim 1 where said polydiorganosiloxane is represented by the formula A(R.sub.2 SiO).sub.x SiR.sub.2 A, where each R individually represents a monovalent hydrocarbon or halogenated hydrocarbon radical containing from one to ten or more carbon atoms, A is a hydroxyl group or is selected from the same group as R and the value of x is from 1000 to 10,000, the concentration of organic peroxide is from 0.1 to 5 weight percent, based on the weight of said curable composition, and the concentration of said benzotriazole is at least 0.1 weight percent, based on the weight of said composition.
- 4. A composition according to claim 3 where R is methyl, phenyl or 3,3,3-trifluoropropyl and the concentration of said benzotriazole is from 4 to 6 weight percent, based on the weight of said curable composition.
- 5. A composition according to claim 4 where at least 50 percent of the R radicals are methyl and any remaining R radicals are phenyl, R.sup.2 and R.sup.3 are both t-butyl or t-amyl, or R.sup.2 is t-butyl and R.sup.3 is hydrogen, R.sup.1 and represents hydroxyl or hydroxymethyl.
REFERENCE TO COPENDING APPLICATIONS
This application is a continuation-in-part of copending application Ser. No. 202,639, filed June 6, 1988.
US Referenced Citations (11)
Foreign Referenced Citations (2)
Number |
Date |
Country |
58-047058 |
Mar 1983 |
JPX |
61-275351 |
Dec 1986 |
JPX |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
202639 |
Jun 1988 |
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