Claims
- 1. An oxidation catalyst composition consisting essentially of a uniformly dispersed mixture of (a) a crystalline composite oxide containing vanadium and phosphorus having the characteristic X-ray diffraction peaks as identified in the following Table B, (b) an amorphous composite oxide containing vanadium and phosphorus and (c) silica, wherein (i) the content of the crystalline composite oxide is from 15 to 80% by weight, (ii) the atomic ratio of phosphorus to vanadium is from 0.8 to 1.5, (iii) the pore volume of the pores having a pore radius within a range of from 37 to 2000 .ANG. is from 0.03 to 0.3 ml/g, and (iv) the pore volume of the pores having a pore radius within a range of from 100 to 350 .ANG. is at least 50% of the pore volume of the pores having a pore radius within a range of from 37 to 2000 .ANG.;
- TABLE B______________________________________X-ray diffraction peaks(Anticathode: Cu--K.sub..alpha.)2.theta. (.+-.0.2.degree.)______________________________________14.2.degree.15.7.degree.18.5.degree.23.0.degree.28.4.degree.30.0.degree.33.7.degree.36.8.degree.______________________________________
- 2. The composition according to claim 1 wherein the weight ratio of (a) the crystalline composite oxide, (b) the amorphous composite oxide and (c) the silica is as follows;
- (a):(b):(c)=1:0.1-7:0.05-4.
- 3. The composition according to claim 2, wherein the weight ratio of (a) the crystalline composite oxide to (b) the amorphous composite oxide to (c) silica is: 1:0.3-4:0.5-2.
- 4. The composition according to claim 1, wherein the content of said crystalline composite oxide of said oxidation catalyst composition ranges from 20 to 55% by weight.
- 5. The composition according to claim 1, wherein the atomic ratio of phosphorus to vanadium in said catalyst ranges from 1.1 to 1.3.
- 6. The composition according to claim 1, wherein the specific surface area of said catalyst ranges from 0.5 to 20 m.sup.2 /g.
Priority Claims (6)
Number |
Date |
Country |
Kind |
57-52645 |
Mar 1982 |
JPX |
|
57-54502 |
Apr 1982 |
JPX |
|
57-74920 |
May 1982 |
JPX |
|
57-201728 |
Nov 1982 |
JPX |
|
57-203370 |
Nov 1982 |
JPX |
|
57-205255 |
Nov 1982 |
JPX |
|
Parent Case Info
This is a continuation of application Ser. No. 473,196, filed Mar. 8, 1983, now U.S. Pat. No. 4,472,527.
US Referenced Citations (8)
Foreign Referenced Citations (2)
Number |
Date |
Country |
7308517 |
Jul 1973 |
NLX |
1285075 |
Aug 1972 |
GBX |
Non-Patent Literature Citations (1)
Entry |
English Abstracts of Jap. Unexamined Pat. Pub. Nos. 126587/1974, 8788/1975, 33038/1981, 65035/1981, 95990/1976, 45815/1981. |
Continuations (1)
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Number |
Date |
Country |
Parent |
473196 |
Mar 1983 |
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